Antimicrobial batch dilution system

Information

  • Patent Grant
  • 10640403
  • Patent Number
    10,640,403
  • Date Filed
    Monday, June 13, 2016
    7 years ago
  • Date Issued
    Tuesday, May 5, 2020
    4 years ago
Abstract
An antimicrobial supply system employs a process water supply and incorporates a metallic ion supply connected to the process water supply to provide a high ion concentrate to an output. A dilution reservoir is connected to the metallic ion supply output and has an input from the process water supply. A pump is connected to an output of the reservoir. A manifold connected to the pump provides a dilute concentrate to at least one washing system and a recirculation loop to the dilution reservoir for enhanced mixing of the dilute concentrate. An electronics control module is connected to a first flow controller between the process water supply and the metallic ion supply and a second flow controller between the metallic ion supply and the reservoir for dilution control establishing a desired metallic ion concentration.
Description
BACKGROUND OF THE INVENTION

Field


The present invention is in the technical field of antimicrobial treatment. More particularly, the present invention provides a system employing metallic ion generation and dilution in desired concentrations, for batch storage and entrainment in a flow for use in antimicrobial treatment.


Related Art


Shortcomings of existing antimicrobial treatments can lead to the spread of infection through direct contact, airborne disease and waterborne disease. These diseases can be acquired by their victims from contacting contaminated surfaces, breathing air containing pathogens, or drinking pathogen containing water. Contaminated drinking water especially affects populations of second world and third world countries. The lack of inexpensive means to rid drinking water of harmful living microbes results in widespread illness and death in second world and third world countries. Similarly, contamination of fabrics or linens in uniforms, surgical scrubs, sheets, blankets, napkins, table cloths and similar materials by microbial pathogens can contribute to spread of disease.


Previous antimicrobial treatments require concentrated chemicals which are potentially or actually harmful to people and the environment. Such antimicrobial treatments also do not provide a lasting antimicrobial effect after the treatment has been administered. Existing antimicrobial treatments can also lead to immunization of evolved pathogens to the respective treatment. Such immunization of evolved pathogens can result in infections which cannot be treated with the conventional treatments that caused the pathogens to become immune.


Enterprises which specifically have problems with the spread of infectious diseases include, but are not limited to: the cruise line industry, hotel and gaming, professional sports teams, health and fitness clubs, nursing homes, and hospitals. Healthcare facilities currently have a growing problem with immunized pathogens being virtually untreatable with conventional methods. With such hospital infections, the harmful microbes are often carried in the linens and clothing provided by the hospital. Once hospital linens have been laundered and treated, they are susceptible to recontamination by microbes and pathogens. Pathogens carried by these linens can infect hospital patients and even cause death.


It is therefore desirable to provide an antimicrobial treatment system which may be employed directly in water supply systems to provide efficacious antimicrobial action.


SUMMARY OF THE INVENTION

The present invention is a device which releases a lasting, metallic, antimicrobial agent to which no known pathogens can become immune. Embodiments of the antimicrobial device disclosed provide an antimicrobial supply system having a process water supply and incorporating a metallic ion supply connected to the process water supply to provide a high ion concentrate to an output. A dilution reservoir is connected to the metallic ion supply output and has an input from the process water supply. A pump is connected to an output of the reservoir. A manifold connected to the pump provides a dilute concentrate to at least one washing system and a recirculation loop to the dilution reservoir for enhanced mixing of the dilute concentrate. An electronics control module is connected to a first flow controller between the process water supply and the metallic ion supply and a second flow controller between the metallic ion supply and the reservoir for dilution control establishing a desired metallic ion concentration.





BRIEF DESCRIPTION OF THE DRAWINGS

These and other features and advantages of the present invention will be better understood by reference to the following detailed description of exemplary embodiments when considered in connection with the accompanying drawings wherein:



FIG. 1 is a block diagram of a batch dilution system for metallic ion antimicrobial agent generation, storage and distribution;



FIG. 2 is a system flow diagram of an exemplary embodiment of an electronic control and monitoring system, separate fluid lines, fluid diffusion sub-assembly and antimicrobial canister for metallic ion introduction;



FIG. 3 is a block diagram of a detailed embodiment of a batch dilution system employing antimicrobial canisters for metallic ion introduction;



FIG. 4 is a representation of a second embodiment of a metallic ion supply;



FIG. 5 is a block diagram of a detailed embodiment of a batch dilution system employing the metallic ion supply of FIG. 4; and,



FIG. 6 is a schematic representation of an industrial washing system showing inlet flow from a batch dilution system for use with a Continuous Batch Washer (CBW).





DETAILED DESCRIPTION OF THE INVENTION

The embodiments disclosed herein provide a system for generation and batch dilution of metallic ions for use as an antimicrobial agent in processes such as commercial washing systems. As shown in FIG. 1, the system 5 incorporates a bulk reservoir 10. A feed water source 12, such as a house soft water system in a commercial washing facility, supplies water to a deionizing system 14 and heater 16 producing process water. A flow controller 18 operated under the control of an electronics control module 20 then provides the process water to the bulk reservoir 10. A metallic ion supply 22 adds antimicrobial ions into the process water forming a high ion concentrate for release through a second flow controller 24 to the bulk reservoir 10 for mixing with the process water to yield a desired dilute concentrate with metallic ions for use as an antimicrobial agent. The dilute concentrate is then provided from the reservoir 10 through a pump 26 to a manifold 28 for distribution to the commercial washers or similar systems. Recirculation of dilute concentrate from the manifold 28 to the reservoir 10 allows the reservoir to act as a buffer so that overall demand is equivalent to total mean demand on system, irrespective of spikes in demand (which are only then gated by outlet pumping rate).



FIG. 2 shows a system flow diagram of a first embodiment of the metallic ion supply 22 with a metallic ion supply canister 208 and fluid diffusion device 209, a manual water shut off 217, a water filter 219, water inlet 231, air inlet 232, an antimicrobial fluid combination outlet 233, the electronics module 20, which is a programmable device such as a microprocessor having software or firmware for specific INITIALIZATION; IDLE; PROCESS; and SHUTDOWN sequences, a solenoid water shut off valve 220, a water temperature sensor 221, a water pressure sensor 222, a air pressure sensor 224, a solenoid air shut off valve 226, and a flow sensor 229. The metallic ion supply canister 208 may be configured as disclosed in application Ser. No. 13/968,084.


The electronics module 20 has a power switch 501, manual start button 502, manual stop button 503, cooling fans 504, LCD display 505, and Manual Mode/Automatic Mode switch 506. The electronics module 20 also has wired and/or wireless connection 507 to local area internet networks to send data to any remote monitoring system with an internet connection. This internet capability also allows the system to be controlled wirelessly over the internet. For example, the system can be turned on and off over the internet and the allowable parameters for sensor detection can be adjusted over the internet. Because, the electronics module 20 can be controlled using the various buttons and switches on the electronics module 20 itself, or remotely though a local area network, the operator can control and monitor the present invention on site or offsite. The compilation of the electronics module programs provides the electronic control and monitoring system software. If the electronics module 20 receives electronic communication from one of the sensors, the electronic control and monitoring system software can be programmed to send signals or alerts to the operator via the wireless connection 507 or as messages to the LCD 504. The electronic control and monitoring system software also continuously logs data on system events and on received transmissions from the multiple sensors.


The solenoid water shut off valve 220, is used to start and stop water flow entering through inlet 231 as shown by arrow 508 through the system. The water temperature sensor 221 communicates electronically with the electronics module 20 in order to enable the electronic control and monitoring system software to log data or send an alert to the operator if water temperature deviates from a desired range. The water pressure sensor 222 communicates electronically with the electronics module 20 in order to enable the electronic control and monitoring system software to log data or send an alert to the operator if water pressure deviates from a desired range. The air pressure sensor 224 communicates electronically with the electronics module 20 in order to enable the electronic control and monitoring system software to log data or send an alert to the operator if air pressure deviates from a desired range. The solenoid air shut off 223 is used by the electronics module to start and stop air flow through the system entering at inlet 232 as indicated by arrow 509. The flow sensor 229 determines outlet flow from the system through outlet 233 as shown by arrow 510 and communicates electronically with the electronics module in order to enable the electronic control and monitoring system software to log data or send an alert to the operator if flow rate deviates from a desired range. A water pressure regulator 218, an air pressure regulator 227, and a flow reducer 228 provide additional for the metallic ion supply system.


The antimicrobial canister 208, the diffusion device 209, the manual water shut off 217, and water filter 219 are interconnected by the water line 216 and air line 223. The electronic devices are connected to the electronics module 20 by the electronic wiring 225. The electronic devices, mechanical devices, and the interconnecting plumbing lines and wires shown are all mounted to a mounting surface 215. An example set of parameters for the electronic control and monitoring system software might be programmed to monitor and control are the following: 140° F. water temperature, 15 psi of water pressure, 25 psi of air pressure, 2 gallon per minute (GPM) of flow rate, all with an acceptance range of within +/−15% before alerting the operator via warning and/or error messages displayed on the LCD screen on the electronics module 20 or through alerts transmitted over the local area network connection when the electronic control and monitoring system transmits a status report.


Details of an implementation of the first embodiment of the metallic ion supply for the batch dilution system are shown in FIG. 3. The deionizer 14 employs a granulated activated carbon (GAC) 302 receiving water from the house soft water source 12. Water drawn from the GAC flows through a reverse osmosis (RO) filter 304 and into a deionizing (DI) bath 306 from which process water is provided to the heater 16 through a solenoid valve 308 controlled by the electronic control module 20 acting as one element of the controller 18. A pressure gage 310 is provided for process control. Process water from the heater 16 is then provided to the metallic ion supply 22 as previously described with respect to FIG. 2. For the embodiment of FIG. 3, three canisters 208a, 208b and 208c each with the associated control valves described in FIG. 2 are employed. The canisters may be operated individually or in parallel for delivery of desired concentrations of metallic ions to the reservoir 10. Multiple canisters allow the system to keep up with demand. To achieve desired concentration of antimicrobial metallic ions in a water stream flowing through canisters 208 analysis demonstrates that the fluid combination entrains antimicrobial metallic ions as a log function with respect to uptake time (contact time of the fluid combination with the substrate in the canister), uptake function Y=A ln(x)−B, where Y is the entrained ion concentration in parts per million (ppm) and x is the uptake time (seconds). Use of multiple canisters allows either an increase concentration (followed by dilution in reservoir at higher rate) or a higher total flowrate through the canisters with less bypass dilution as described subsequently, Deionization removes organic and ionic constituents from feed water. These constituents are considered contaminants. With contaminants removed, the equilibrium driving force for silver ion dissolution into the fluid combination increases as a result of the high purity (18 megaohm) of the DI fluid combination. Effectively, the DI fluid combination is a more effective solvent when ionizing/dissolving Ag0 (metallic silver) to Ag+ (aqueous silver ions), (such is the case with the finely woven metallic silver coated nylon cloth) when compared to city/tap feed water sources. Additionally, controllability and consistency of the system increase with anionic and organic contaminants removed. With reactive anions, such as chloride, removed from feed water via DI, kinetic conditions are consistent regardless of installation site beginning water quality. Anionic oxidants, such as chloride, affect the Ag0 to Ag+ dissolution process with varying degrees of impact depending on respective concentrations, by affecting the ability of dissolved oxygen to react with the surface of the silver coated nylon cloth or other metal bearing structure in the canister. In the absence of contaminants, the antimicrobial canister releases Ag+ dependent upon the fluid combination dissolved oxygen content, temperature, and velocity (according to Reynold's number) and reaction time allowed between the fluid combination and silver coated nylon cloth inside the canister


A dilution bypass 312 activated by solenoid valve 314 acting as a second element of controller 18 connects the process water from the deionizer 14 directly to the dilution reservoir 10. A flow totalizer 316 in the dilution bypass 312 is provided for process control by the electronic control module.


The dilution reservoir is filled and resupplied by activation of the metallic ion supply flowing hot process water from the heater 16 into one or more of the canisters 208a, 208b and 208c to provide high ion concentrate to the reservoir 10. A concentration probe such as a total dissolved solids (TDS) probe 318 (or in alternative embodiments a conductivity probe) measures ion concentration in the reservoir 10 which is provided to the electronics control module 20 and the electronic control module controls bypass solenoid valve 314 to add process water to the reservoir using flow totalizer 316 to achieve a desired dilute concentrate for fluid in the reservoir. A level probe system 320 provides at least a “tank full” level measurement and a “tank empty” measurement to the electronic control module for activation of the fill sequence. One or more intermediate fluid levels in the reservoir may be measured to allow intermediate fill or other process control.


As previously described, circulation pump 26 draws dilute concentrate from the reservoir 10 in a continuous flow loop through the manifold 28 thereby maintaining the mixed condition of the antimicrobial dilute concentrate solution. An adjustable flow meter 322 provides for flow measurement. For the embodiment shown, multiple individual Conventional Washer-Extractors (CWE) 324a-324d draw antimicrobial dilute concentrate solution from the manifold through solenoid valves 326a-326d as required in their wash cycles.


A second embodiment of the metallic ion supply 22 is shown in FIG. 4. A pelletized metallic supply system 400 incorporates a revolving carousel 402 that supports multiple cartridges 404 containing a metallic or metallic compound powder (compressed/pelletized or loose), for an exemplary embodiment AgNO3 powder. A rinse head 406 having a nozzle 408 sized to engage the cartridges 404 is connected to the deionizer 14 for process water supply. The carousel 402 aligns a cartridge 404 with the nozzle 408 and process water is sluiced through the cartridge into a capture container 410 providing a dose of high ion concentrate which is connected for flow into the reservoir 10 or alternative flow path through inlet 411.


As shown in FIG. 5, for a metallic ion supply system employing the pelletized metallic compound supply system 400 of FIG. 4, a dilution bypass 412 is provided to the reservoir 10 from the deionizer 14 supplying process water to the reservoir for dilution to the desired dilute concentrate. For an exemplary embodiment, reservoir 10 is a 1000 liter tank and cartridges 404 contain approximately 28.49 cc (or 14.47 cc compressed) of AgNO3 powder. When diluted to the 1000 L volume of reservoir 10, a dilute concentrate of approximately 63 ppm is provided. Recirculation of the dilute concentrate by circulation pump 26 through manifold 28 maintains a mixed condition of the dilute concentrate. 1000 L storage tank will provide dilute concentrate through manifold 28 for one day to an inlet tunnel on the current largest washer in the world (Milnor CBW 250 lb) with a 3.4 L per tunnel injection to dose yielding 1 mg Ag/kg linen (63 ppm AgNO3 provides 40 ppm Ag as the active antimicrobial agent).


Aeration of the concentrate to enhance measurement accuracy with TDS or conductivity probes in the reservoir 10, as previously described, is provided by a diffusion device 414, which may be of comparable structure to the diffusion device 209 described with respect to FIG. 2, in one or more of the bypass line 412, inlet to the rinse head 406 or high ion concentrate inlet 411 to the reservoir 10. The desired aeration induced by the diffusion device is above 100% saturation (relative to published values).


An example integration of the described embodiments into a commercial washing system is described in more detail with reference to FIG. 6 which shows a schematic of an industrial laundry facility. The washing machine may have multiple modules, thereby known as a Continuous Batch Washer (CBW). FIG. 6 depicts an instance where the present invention is integrated into a CBW process. Linens enter the system soiled 601 in batches of several hundred pounds and are transferred 602 manually by plant workers to a conveyor belt 603 that carries them to an elevated height where they are then gravity fed 604 into the CBW. The most effective integration of the present invention into this particular example of an industrial laundry facility is represented in FIG. 6 through placement of the antimicrobial and antimicrobial fluid combination outlet in manifold 28 which the example embodiment uses to inject the antimicrobial agent into the CBW rinse module 636. The example embodiments from FIG. 3 or 5 may be used in connection with water source 12, pressurized air source 235 and the CBW rinse module 636. The water source 12 receives municipal water 606 which is conditioned by a resin based, ion exchange, water softening system 607 and is heated using multiple boilers 608. The water source 12 provides water for the CBW wash modules 605 and delivers water to the system 5 for the embodiment shown. The antimicrobial fluid manifold 28 delivers the antimicrobial agent into the CBW rinse module 636. Once the linens have been treated with the antimicrobial agent in the CBW rinse module 636, they are automatically loaded 611 into a linen press 612, which presses excess rinse water out of the linens. That pressed water is recycled back into the beginning of the CBW system through rinse water recycle line 613. The rinse water recycle line 613 for the embodiment shown reintroduces the antimicrobial agent into the beginning of the wash cycle for added efficacy in antimicrobial treatment of the washed linens. Upon exiting the press 614, the linens may enter dryers or other machines within the laundry facility.


Having now described the invention in detail as required by the patent statutes, those skilled in the art will recognize modifications and substitutions to the specific embodiments disclosed herein. Such modifications are within the scope and intent of the present invention as defined in the following claims.

Claims
  • 1. An antimicrobial supply system comprising: a metallic ion supply comprising a high metal ion concentrate supply and an output for providing the high metal ion concentrate;a dilution reservoir, wherein the dilution reservoir is a bulk reservoir, in fluid connection to the output of the metallic ion supply and having an input from a process water supply, and wherein the dilution reservoir is configured to form a dilute concentrate from (i) a process water received from a process water supply via the input of the dilution reservoir and (ii) the high metal ion concentrate received from the metallic ion supply via the output of the metallic ion supply;a concentration probe in the dilution reservoir and configured to measure an ion concentration of the dilute concentrate in the dilution reservoir;an output of the dilution reservoir coupled to at least one washing system; and,an electronics control module connected to (i) a first flow controller between a process water supply and the dilution reservoir and (ii) a second flow controller between the metallic ion supply and the dilution reservoir,wherein the electronics control module is configured to: receive, from the concentration probe, an indication of the ion concentration of the dilute concentrate in the dilution reservoir, andcontrol, based on the indication of the ion concentration, the first flow controller and the second flow controller to achieve a desired ion concentration of the dilute concentrate in the dilution reservoir.
  • 2. The antimicrobial supply system of claim 1, wherein the electronics control module is connected to a third flow controller that controls the flow of the dilute concentrate to the at least one wash system.
  • 3. The antimicrobial supply system of claim 1, further comprising a deionizer for process water.
  • 4. The antimicrobial supply system of claim 1, further comprising a reverse osmosis filter for process water.
  • 5. The antimicrobial supply system of claim 1, further comprising a sensor in communication with the electronics control module, wherein the sensor comprises at least one of a water temperature sensor, a water pressure sensor, an air pressure sensor, or a flow sensor.
  • 6. The antimicrobial supply system of claim 5, wherein the sensor consists of the water temperature sensor.
  • 7. The antimicrobial supply system of claim 5, wherein the sensor consists of the water pressure sensor.
  • 8. The antimicrobial supply system of claim 5, wherein the sensor consists of the air pressure sensor.
  • 9. The antimicrobial supply system of claim 5, wherein the sensor consists of the flow sensor, wherein senses a flow of the dilute concentrate supplied from the dilution reservoir to a manifold.
  • 10. The antimicrobial supply system of claim 5, wherein the electronics control module is configured to: receive data from the sensor; andlog the data received from the sensor.
  • 11. The antimicrobial supply system of claim 5, wherein the electronics control module is configured to: receive data from the sensor;determine that the data received from the sensor deviates from a parameter associated with the sensor; andresponsive to a determination that the data received from the sensor deviates from the parameter, transmit, via a communication network, an alert signal to a remote system.
  • 12. The antimicrobial supply system of claim 11, wherein the electronics control module is configured to: receive, via the communication network, a control signal; andresponsive to the control signal, adjust the parameter associated with the sensor.
  • 13. The antimicrobial supply system of claim 5, wherein the electronics control module is configured to: receive data from the sensor;transmit, via a communication network, the data to a remote monitoring system.
  • 14. The antimicrobial supply system of claim 1, further comprising a manifold coupling the output of the dilution reservoir to the at least one washing system.
REFERENCE TO RELATED APPLICATIONS

This application is a continuation in part of application Ser. No. 13/968,084 filed on Aug. 15, 2013 entitled ANTIMICROBIAL DEVICE which is a continuation in part of application Ser. No. 13/402,771 filed on Feb. 22, 2012 entitled ANTI-MICROBIAL DEVICE, both having a common assigned with the present application, the disclosures of which are incorporated herein by reference.

US Referenced Citations (162)
Number Name Date Kind
3751885 McNeely Aug 1973 A
3841116 Klein Oct 1974 A
4048032 Eibl Sep 1977 A
4098660 Eibl et al. Jul 1978 A
4119518 Miller Oct 1978 A
4145291 Console et al. Mar 1979 A
4198296 Doumas et al. Apr 1980 A
4525253 Hayes et al. Jun 1985 A
4545956 Ciszewski et al. Oct 1985 A
4696742 Shimazaki Sep 1987 A
4710282 Chak et al. Dec 1987 A
4755268 Matsuo et al. Jul 1988 A
4889644 Amberg Dec 1989 A
4933870 Chang Jun 1990 A
4995975 Jacquot et al. Feb 1991 A
5190659 Wang et al. Mar 1993 A
5281312 Woodside Jan 1994 A
5342528 Adachi et al. Aug 1994 A
5364512 Earl Nov 1994 A
5632904 Samad et al. May 1997 A
5765403 Lincoln et al. Jun 1998 A
5782109 Spriggs et al. Jul 1998 A
5787537 Mannillo Aug 1998 A
5829275 Babuin Nov 1998 A
5843284 Waters et al. Dec 1998 A
5858246 Rafter et al. Jan 1999 A
6022459 Briggs et al. Feb 2000 A
6128931 Woods Oct 2000 A
6254894 Denkewicz, Jr. et al. Jul 2001 B1
6267885 Briggs et al. Jul 2001 B1
6303039 Back et al. Oct 2001 B1
6398927 Merzhauser Jun 2002 B1
6508929 Mercer Jan 2003 B1
6514406 Katehis Feb 2003 B1
6524540 Heinig, Jr. Feb 2003 B1
6562243 Sherman May 2003 B2
6634048 Hornung et al. Oct 2003 B1
6641829 Green et al. Nov 2003 B1
6761827 Coffey Jul 2004 B2
6838095 Newman et al. Jan 2005 B2
6929740 Hayes Aug 2005 B2
6982039 Butkus et al. Jan 2006 B1
7012053 Barnabus et al. Mar 2006 B1
7152759 Walton Dec 2006 B2
7322065 Kim et al. Jan 2008 B2
7384564 Bo Jun 2008 B2
7413667 Routberg et al. Aug 2008 B1
7422759 Kepner et al. Sep 2008 B2
7481081 Hsu et al. Jan 2009 B2
7487876 Maeda Feb 2009 B2
7540966 Costa et al. Jun 2009 B2
7597718 Yoshikawa et al. Oct 2009 B2
7617704 Iimori et al. Nov 2009 B2
7624601 Ikemizu et al. Dec 2009 B2
7708896 Ooe et al. May 2010 B2
7807199 Allen et al. Oct 2010 B2
7807661 Ylitalo et al. Oct 2010 B2
7819127 Huffman Oct 2010 B1
7882647 Ikemizu Feb 2011 B2
7934402 Lee May 2011 B2
7942024 Lee May 2011 B2
7950254 Gray et al. May 2011 B2
7972519 Koos et al. Jul 2011 B2
8002898 Schepers et al. Aug 2011 B2
8118912 Rodriguez et al. Feb 2012 B2
8173067 Eldred May 2012 B2
8239990 Lim et al. Aug 2012 B2
8309506 Sunder et al. Nov 2012 B2
8361505 Perry Jan 2013 B1
8394420 Kepner et al. Mar 2013 B2
8449732 Choi May 2013 B2
8460395 Smulowitz Jun 2013 B2
8563447 Canada Oct 2013 B2
8641947 Schmuhl et al. Feb 2014 B2
8729008 Begli et al. May 2014 B2
9132296 Wingfield Sep 2015 B2
20010049846 Guzzi et al. Dec 2001 A1
20020189954 Miyazaki et al. Dec 2002 A1
20030170453 Foss et al. Sep 2003 A1
20030176928 Lee Sep 2003 A1
20030190370 Kim et al. Oct 2003 A1
20030196282 Fyvie et al. Oct 2003 A1
20030229474 Suzuki Dec 2003 A1
20030230122 Lee Dec 2003 A1
20040025263 Kim et al. Feb 2004 A1
20040031764 Heinig, Jr. Feb 2004 A1
20040205899 Park et al. Oct 2004 A1
20040214495 Foss et al. Oct 2004 A1
20050019568 Foss et al. Jan 2005 A1
20050037057 Schuette et al. Feb 2005 A1
20050095158 Kirschner et al. May 2005 A1
20050118281 Newman et al. Jun 2005 A1
20050155939 Stadelmann Jul 2005 A1
20050188731 Aouad Sep 2005 A1
20050194297 Dorward Sep 2005 A1
20050224419 Wien et al. Oct 2005 A1
20050252255 Gray Nov 2005 A1
20060110258 Iimura et al. May 2006 A1
20060123562 Ghosh et al. Jun 2006 A1
20060127457 Buchalter Jun 2006 A1
20060130533 Ooe et al. Jun 2006 A1
20060163135 Ellis Jul 2006 A1
20060164093 Ooe Jul 2006 A1
20060265814 Ritter Nov 2006 A1
20070004300 Kreider et al. Jan 2007 A1
20070044820 Chan et al. Mar 2007 A1
20070045176 Chandra et al. Mar 2007 A1
20070134301 Ylitalo et al. Jun 2007 A1
20070163097 Metcalfe et al. Jul 2007 A1
20070175833 Ikeboh et al. Aug 2007 A1
20070243380 Vegad et al. Oct 2007 A1
20070243781 Chou Oct 2007 A1
20080016919 Lee Jan 2008 A1
20080023385 Baker, Jr. et al. Jan 2008 A1
20080041117 Lee Feb 2008 A1
20080085326 Ruan Apr 2008 A1
20080131471 Kolbe et al. Jun 2008 A1
20080217807 Lee et al. Sep 2008 A1
20080248075 Brambilla et al. Oct 2008 A1
20080256719 Radev Oct 2008 A1
20080267812 Kawachi Oct 2008 A1
20080299006 Ikemizu Dec 2008 A1
20080302713 Patrick Dec 2008 A1
20090000040 Ikemizu Jan 2009 A1
20090104239 Parsons et al. Apr 2009 A1
20090181592 Dugan Jul 2009 A1
20090193593 Kirigakubo et al. Aug 2009 A1
20090194562 Kessler Aug 2009 A1
20090218266 Sawafta et al. Sep 2009 A1
20090259157 Thomas Oct 2009 A1
20100000268 Kohne Jan 2010 A1
20100047321 Sandford et al. Feb 2010 A1
20100050872 Lee Mar 2010 A1
20100102002 O'Brien et al. Apr 2010 A1
20100116689 Greene et al. May 2010 A1
20100140185 Hill Jun 2010 A1
20100183739 Newman Jul 2010 A1
20100193449 Shang et al. Aug 2010 A1
20100243432 Ikemizu Sep 2010 A1
20110017609 Choi Jan 2011 A1
20110094972 King et al. Apr 2011 A1
20110100838 Kim et al. May 2011 A1
20110120921 Kim May 2011 A1
20110139632 Beringer et al. Jun 2011 A1
20110120423 Barry et al. Jul 2011 A1
20110224120 Meine et al. Sep 2011 A1
20110262556 Holladay et al. Oct 2011 A1
20110297609 Hu Dec 2011 A1
20120003326 Meine et al. Jan 2012 A1
20120055862 Parekh et al. Mar 2012 A1
20120091070 Sjaunta et al. Apr 2012 A1
20120187052 Elliott Jul 2012 A1
20120192363 King Aug 2012 A1
20120213665 Bik et al. Aug 2012 A1
20130022686 Rademan et al. Jan 2013 A1
20130281345 Burkinshaw et al. Oct 2013 A1
20130327419 Morham Dec 2013 A1
20140202943 Pradeep et al. Jul 2014 A1
20140369953 Purschwitz et al. Dec 2014 A1
20150047718 Brown et al. Feb 2015 A1
20150159314 Morham et al. Jun 2015 A1
20150159319 Morris et al. Jun 2015 A1
Foreign Referenced Citations (150)
Number Date Country
698955 Dec 2009 CH
1218009 Jun 1999 CN
1558016 Dec 2004 CN
1671911 Sep 2005 CN
2725278 Sep 2005 CN
2753774 Jan 2006 CN
2780804 May 2006 CN
200984347 Dec 2007 CN
101411958 Apr 2008 CN
201056507 May 2008 CN
101307555 Nov 2008 CN
201254480 Jun 2009 CN
101670123 Mar 2010 CN
101731269 Jun 2010 CN
101863581 Oct 2010 CN
101864670 Oct 2010 CN
101926363 Dec 2010 CN
101967025 Feb 2011 CN
201737797 Feb 2011 CN
201738163 Feb 2011 CN
101991870 Mar 2011 CN
201791121 Apr 2011 CN
201873556 Jun 2011 CN
201902711 Jul 2011 CN
202021117 Nov 2011 CN
202023990 Nov 2011 CN
202036069 Nov 2011 CN
102330844 Jan 2012 CN
202121806 Jan 2012 CN
102421295 Apr 2012 CN
102535114 Jul 2012 CN
202386643 Aug 2012 CN
202390678 Aug 2012 CN
102666397 Sep 2012 CN
202410344 Sep 2012 CN
202430491 Sep 2012 CN
102781814 Nov 2012 CN
19853193 May 2000 DE
102007034215 May 2008 DE
0128782 Nov 1987 EP
1296895 Apr 2003 EP
1334073 Aug 2003 EP
1600545 Nov 2005 EP
1785518 May 2007 EP
1983085 Oct 2008 EP
2045389 Apr 2009 EP
2461676 Jun 2012 EP
2499916 Sep 2012 EP
2513370 Oct 2012 EP
2544804 Jan 2013 EP
2674523 Dec 2013 EP
2298858 Mar 1995 GB
2419590 May 2006 GB
H0560721 Mar 1993 JP
2001025772 Jan 2001 JP
2001062458 Mar 2001 JP
2001066090 Mar 2001 JP
2001276484 Oct 2001 JP
2001340281 Dec 2001 JP
2002113288 Apr 2002 JP
2004057423 Feb 2004 JP
2004105692 Apr 2004 JP
2004313752 Nov 2004 JP
2004346024 Dec 2004 JP
2005098606 Apr 2005 JP
2005261830 Sep 2005 JP
2005296671 Oct 2005 JP
2007061757 Mar 2007 JP
2007167785 Jul 2007 JP
2008119287 May 2008 JP
2008183283 Aug 2008 JP
2008220450 Sep 2008 JP
2008279056 Nov 2008 JP
2009017907 Jan 2009 JP
2009039320 Feb 2009 JP
2010136738 Jun 2010 JP
2010136739 Jun 2010 JP
2010194484 Sep 2010 JP
2012161728 Aug 2012 JP
2014176448 Sep 2014 JP
1990069099 Sep 1999 KR
20000037120 Jul 2000 KR
20020012369 Feb 2002 KR
20020074306 Sep 2002 KR
20040085107 Oct 2004 KR
20040093957 Nov 2004 KR
20050004614 Jan 2005 KR
20050004616 Jan 2005 KR
20050004618 Jan 2005 KR
20050004620 Jan 2005 KR
20050004621 Jan 2005 KR
20050004623 Jan 2005 KR
20050004625 Jan 2005 KR
20050004626 Jan 2005 KR
20050065718 Jun 2005 KR
20050068357 Jul 2005 KR
20050089257 Sep 2005 KR
20070028012 Mar 2007 KR
100736819 Jul 2007 KR
100818561 Apr 2008 KR
20080075694 Aug 2008 KR
20090001293 Jan 2009 KR
20090090501 Aug 2009 KR
20110062719 Jun 2011 KR
20110075870 Jul 2011 KR
20120000652 Jan 2012 KR
101430906 Aug 2014 KR
2940 Dec 2005 MD
2135417 Aug 1999 RU
2182128 May 2002 RU
2193528 Nov 2002 RU
2264990 Nov 2005 RU
2324026 May 2008 RU
2373156 Nov 2009 RU
2381182 Feb 2010 RU
I252268 Apr 2006 TW
200902790 Jan 2009 TW
201013008 Apr 2010 TW
201127948 Aug 2011 TW
201138638 Nov 2011 TW
22673 Apr 2007 UA
1999039749 Aug 1999 WO
2002036499 May 2002 WO
2003051780 May 2003 WO
2004104153 Dec 2004 WO
2006014080 Jan 2006 WO
2006129982 Dec 2006 WO
2007057077 May 2007 WO
2008075992 Jun 2008 WO
2011015429 Feb 2011 WO
2011067748 Jun 2011 WO
2011073697 Jun 2011 WO
2011110550 Sep 2011 WO
2011126395 Oct 2011 WO
2011139835 Nov 2011 WO
2012025943 Mar 2012 WO
2012031853 Mar 2012 WO
2012059992 May 2012 WO
2012077122 Jun 2012 WO
2012095665 Jul 2012 WO
2012095828 Jul 2012 WO
2012107422 Aug 2012 WO
2012140520 Oct 2012 WO
2012142025 Oct 2012 WO
2012150506 Nov 2012 WO
2012155269 Nov 2012 WO
2014196881 Dec 2014 WO
2015001870 Jan 2015 WO
2015084568 Jun 2015 WO
2015084569 Jun 2015 WO
Non-Patent Literature Citations (4)
Entry
FilterWaterDirect. “Hard Water can easily be treated before it damages fixtures and appliances in your home”. Wayback Machine capture from Jan. 26, 2010 (Year: 2010).
Liu et al., “Controlled Release of Biologically Active Silver from Nanosilver Surfaces,” ACS Nano, 2010, pp. 6903-6913, vol. 4, No. 11.
Mitrano et al., “Presence of Nanoparticles in Wash Water from Conventional Silver and Nano-silver Textiles,” ACS Nano, 2014, pp. 7208-7219, vol. 8, No. 7.
Putro et al., “Silver Nano Perfume Ejector to Destroy Bacteria for Clothes,” AASIC, 2013, pp. 72-75.
Related Publications (1)
Number Date Country
20170008783 A1 Jan 2017 US
Continuation in Parts (2)
Number Date Country
Parent 14099066 Dec 2013 US
Child 15180908 US
Parent 13968084 Aug 2013 US
Child 14099066 US