Apparatus & method for vapor phase lubrication of recording media with reduced lubricant consumption

Information

  • Patent Application
  • 20080050521
  • Publication Number
    20080050521
  • Date Filed
    August 24, 2006
    18 years ago
  • Date Published
    February 28, 2008
    16 years ago
Abstract
A vapor source for depositing a thin film of polymeric lubricant on a magnetic or MO recording medium comprises an enclosure comprised of at least one thermally conductive material and including a back wall and a front wall spaced apart by at least one sidewall thereby defining a chamber with an interior space, the front wall comprising a plurality of openings forming a vapor diffusion plate with an array of vapor orifices; at least one liquid reservoir within the interior space for containing a vaporizable liquid material; a heater for heating the interior space and forming a vapor of the liquid material; and a shutter device for controlling flow of vapor through the orifices of the vapor diffusion plate, thereby reducing lubricant consumption.
Description

BRIEF DESCRIPTION OF THE DRAWINGS

The following detailed description of the embodiments of the present invention can best be understood when read in conjunction with the following drawings, in which the various features are not necessarily drawn to scale but rather are drawn as to best illustrate the pertinent features, in which like reference numerals are employed throughout to designate similar features, wherein:



FIG. 1 is a simplified, schematic cross-sectional top view of an embodiment of an in-line, pass-by lubricant vapor deposition apparatus according to the present invention;



FIG. 2 is a simplified, schematic cross-sectional side view of the in-line, pass-by lubricant vapor deposition apparatus according to the embodiment of the present invention shown in FIG. 1;



FIG. 3 is a simplified, schematic cross-sectional side view of a linearly extended lubricant vapor source usable in the static and/or “pass-by” lubricant vapor deposition apparatuses such as described above;



FIG. 4 is a simplified, schematic cross-sectional side view of a lubricant vapor source according to an embodiment of the present invention and usable in the static and/or “pass-by” lubricant vapor deposition apparatuses such as described above; and



FIG. 5 is a simplified, schematic cross-sectional side view of a lubricant vapor source according to a further embodiment of the present invention.





DESCRIPTION OF THE INVENTION

The present invention is based upon recognition by the inventors that the above-described disadvantages and drawbacks associated with the available vapor sources for vapor depositing thin films of a material, e.g., a polymeric lubricant, on substrate surfaces, e.g., magnetic and/or MO media substrates. Specifically, according to current practice as described above, the lubricant vapor continuously diffuses out from the interior space of the source via openings in a front wall which function as orifices for lubricant vapor and as a diffusion plate. As a consequence, outward diffusion of lubricant vapor occurs even when a disc is not positioned opposite the orifices for deposition thereon. Since the interval for deposition of a lubricant layer of desired or requisite thickness on a given disc is shorter than the idle or transport interval between consecutive discs, a significant amount of lubricant vapor exiting the source is not deposited on the disks, resulting in unnecessary consumption (loss), of expensive lubricant, thereby incurring an economic disadvantage. In addition, according to current practice, only a back wall of the enclosure of the vapor source is heated, whereby other portions of the enclosure, e.g., transversely extending sidewalls, are at a lower temperature during operation. As a consequence of this unequal heating, there is a tendency for lubricant build-up to occur on the inner surfaces of the lower temperature walls, e.g., the aforementioned sidewalls. This results in higher lubricant consumption compared to conventional dip-lubricant coating processing, along with attendant higher material-per-disc cost.


According to the invention, the above-described disadvantages and drawbacks associated with use of currently available vapor sources are eliminated, or at least minimized, by providing the vapor deposition apparatus or system with at least one improved vapor source including a shutter device for limiting flow of vapor therefrom to a predetermined interval necessary for depositing a thin film of desired thickness. As a consequence, unnecessary consumption of expensive coating material, e.g., fluorine-based polymeric lubricants utilized in the manufacture of magnetic and MO recording media, is eliminated or at least substantially reduced, thereby improving the economic competitiveness of vapor deposition processing in the automated fabrication of such products. In addition, according to the present invention, modification of the heater configuration of the vapor source effectively eliminates, or at least minimizes, accumulation of liquid material on portions of the source which do not contribute to vapor generation, e.g., sidewalls of the source.


The utility and advantageous performance of the improved vapor source according to the present invention will now be described in detail with respect to an in-line type pass-by apparatus such as disclosed in U.S. Pat. No. 6,808,741 B1 described above. However, it should be emphasized that the improved vapor source of the present invention is not limited to use with such linearly configured apparatus, but rather may be utilized to advantage in any of the above-described types of vapor deposition apparatus and systems, including, but not limited to, static, circularly configured pass-by, and linearly configured pass-by apparatus and systems.


Referring now to FIGS. 1-2, shown therein, in simplified, schematic cross-sectional top and side views, respectively, is an embodiment of an in-line, “pass-by” lubricant vapor deposition apparatus 10, which apparatus can form a module of a larger, in-line apparatus for continuous, automated manufacture of, e.g., magnetic and/or magneto-optical (MO) recording media such as hard disks, and wherein a plurality of substrates/workpieces (e.g. disks) are transported in a linear path transversely past at least one linearly elongated lubricant vapor source for deposition of a thin film of lubricant on at least one surface of each of the plurality of substrates.


More specifically, apparatus 10 comprises a series of linearly elongated, vacuum chambers interconnected by gate means G of conventional design, including a centrally positioned deposition chamber 1 including at least one, preferably a pair of spaced-apart, opposingly facing, linearly elongated lubricant vapor sources 2, and a pair of buffer/isolation chambers 3, 3′ at opposite lateral ends of central deposition chamber 1 for insertion and withdrawal, respectively, of a plurality of vertically oriented substrates/workpieces, illustratively a plurality disc-shaped substrates 4 carried by substrate/workpiece mounting/support means 5, e.g., a perforated, flat planar pallet including conventional means (not shown in the drawing for illustrative simplicity) for releasably mounting/supporting the disc-shaped substrates 4 such that each of the opposing surfaces thereof faces a respective linearly elongated lubricant vapor source 2 during “pass-by” transport. Chambers 6, 6′ respectively connected to the distal ends of inlet and outlet buffer/isolation chambers 3, 3′ are provided for use of apparatus 10 as part of a larger continuously operating, in-line apparatus wherein substrates/workpieces 4 receive processing antecedent and/or subsequent to processing in apparatus 10.


Apparatus 10 is provided with conventional vacuum means (not shown in the drawing for illustrative simplicity) for maintaining the interior spaces of each of the constituent chambers 1, 3, 3′, etc. at a reduced pressure below atmospheric pressure, e.g., from about 10−5 to about 10−9 Torr, and is further provided with a substrate/workpiece conveyor/transporter means of conventional design (not shown in the drawings for illustrative simplicity) for linearly transporting substrate/workpiece mounting/supporting means 5 through the respective gate means G from chamber-to-chamber in its travel through apparatus 10.


As indicated above, according to a preferred embodiment of the present invention of particular utility in the manufacture of disc-shaped magnetic and/or MO recording media, the substrates/workpieces 4 carried by the substrate/workpiece mounting/supporting means 5 are in the form of annular discs, with inner and outer diameters corresponding to those of conventional hard disc-type magnetic and/or MO media, and the central, deposition chamber 1 of apparatus 10 is provided with a pair of opposingly facing, linearly extending vapor deposition sources 2 for deposition of a lubricant thin film on each surface of each of the plurality of discs carried by the perforated pallet mounting/supporting means 5.


Referring to FIG. 3, shown therein, in simplified, schematic cross-sectional side view, is a linearly extended lubricant vapor source 2 for use in linearly configured (“in-line”) apparatus 10 or in any of the static and/or “pass-by” lubricant vapor deposition apparatuses described above. As illustrated, linearly extended lubricant vapor source 2 comprises an enclosure (illustratively, but not limitatively, a rectangular shaped enclosure) 7 including a back wall 8 and a front wall 9 connected by longitudinally extending sidewalls (illustratively sidewalls 11, 11′) forming a chamber with an interior space 13. The front wall 9 of the linearly extending enclosure 7 functions as a diffusion plate 14 and is provided with an array of spaced-apart openings 15, which openings 15 form orifices for lubricant vapor exiting the chamber formed by enclosure 7. As should be evident from FIG. 1, a linearly extending array of substantially equally spaced openings or orifices 15 allows formation of a linearly extending vapor stream extending for a significant portion of the length (vertical dimension) of enclosure 7. Each of the walls comprising vapor source enclosure 7 is fabricated of a high thermal conductivity material, e.g., a metal such as copper.


Mounted at spaced locations along the inner surface of back wall 8 of enclosure 7 (or integrally formed therewith) are a plurality of liquid lubricant reservoirs, illustratively, but not limitatively, lubricant reservoirs 16A, 16B, and 16C, each fabricated from a block of thermally conductive material, e.g., a metal such as copper. At least one heater element 17, typically an electrical resistance heater, is mounted on or within the outer surface 8′ of the back wall 8 of enclosure 7 for heating and vaporizing liquid lubricant 18 contained in each of the reservoirs 16A, 16B, and 16C. Thermocouples (not shown in the figure for illustrative simplicity) are also provided in order to control the temperature of the vapor source as to maintain a constant lubricant vapor flux.


Generally, the deposition rate of the lubricant vapor is controlled by regulating the temperature of the at least one heater element 17, and vapor phase lubrication processing as described supra typically affords a number of advantages vis-à-vis conventional dip-coating, including solvent-free processing and more uniform lubricant thicknesses. However, design deficiencies of a vapor source such as source 2 result in several disadvantages in vapor phase lubrication processing of recording media. Specifically, according to the current design of the lubricant vapor source 2, the lubricant vapor continuously diffuses out from the interior space of the source via the openings 15 in the front wall 9 functioning as orifices for lubricant vapor and forming a diffusion plate 14. As a consequence, outward diffusion of lubricant vapor occurs even when a disc is not positioned opposite the orifices for deposition thereon. Since the interval for deposition of a lubricant layer of desired or requisite thickness on a given disc is shorter than the idle or transport interval between consecutive discs, a significant amount of lubricant vapor exiting the source is not deposited on the disks, resulting in unnecessary consumption (loss), of expensive lubricant, thereby incurring an economic disadvantage.


Another disadvantage associated with a lubricant vapor source, such as source 2, results from placement of the heater element 17 on or within the back wall 8′ of enclosure 7. Since the heater element 17 contacts only the back wall of the enclosure or reservoir, the transversely extending sidewalls (illustratively sidewalls 11, 11′) are at a lower temperature than that of the back wall 8 and liquid reservoirs 16A, 16B, and 16C during operation, and, as a consequence, there is a tendency for a quantity of lubricant build-up 18′ to occur on the inner surfaces of the sidewalls (illustratively along the interior surface of sidewall 11′. This phenomenon also results in higher lubricant consumption compared to conventional dip-lubricant coating processing, along with attendant higher material-per-disc cost.


Adverting to FIG. 4, shown therein, in simplified, schematic cross-sectional side view, is an improved lubricant vapor source 20 according to an embodiment of the present invention and usable in any of the static and/or “pass-by” lubricant vapor deposition apparatuses described above. As illustrated, vapor source 20 is similar in essential respect to vapor source 2 shown in FIG. 3, but is provided with a shutter device 21 for regulating/controlling flow of vapor outwardly from the interior space 13 of the source to the exterior. According to embodiments of the invention, shutter device 21 comprises at least one shutter positioned at at least one of the following locations: shutter 21A located within the interior space 13 of the chamber adjacent the output end of each liquid reservoir 16A, 16B, and 16C; shutter 21B located within the interior space 13 of the chamber adjacent interior face 9′ of the front wall 9; and shutter 21C located adjacent exterior face 9″ of the front wall 9. As shown in the figure, each shutter 21A, 21B, and 21C is vertically movable (as by conventional means not shown in the drawing for illustrative simplicity) to controllably block outward flow of vapor toward the exterior of the source.


Operation of in-line, pass-by apparatus 10 provided with the improved vapor source(s) 20 according to the invention involves controllable actuation of at least one shutter 21A, 21B, and 21C of each source to effectuate vapor flow therefrom for selected (predetermined) intervals consistent with deposition of thin films of selected (predetermined) thickness. Controllable actuation of the shutters for permitting vapor outflow to occur only during desired intervals is accomplished in conventional manner, e.g., by means of a control unit and solenoid devices, pneumatic actuators, etc., not shown in the drawing for illustrative simplicity. The inventive apparatus and methodology therefore effect significant reduction in consumption of expensive liquid material, e.g., fluorine-based polymericant lubricant, by limiting outflow of vapor from the vapor source to only that amount required for forming a thin film of requisite thickness, thereby enhancing cost-effectiveness of the vapor deposition processing.


Referring to FIG. 5, shown therein, in simplified, schematic cross-sectional side view, is an improved lubricant vapor source 30 according to a further embodiment of the present invention. According to this embodiment, heater element 17 of the sources shown in FIGS. 3 and 4, limited to contact with the exterior surface 8′ of back wall 8, is replaced with “wrap-around” heater element 17′ which extends over and in contact with the exterior surfaces of sidewalls 11 and 11′, thereby providing increased heating area and effectively eliminating any temperature differentials between the back and side walls of enclosure 7. As a consequence, condensation of vaporized liquid on cooler interior surfaces of source 30 is eliminated, or at least minimizing, thereby further reducing liquid utilization inefficiency. Preferably, the feature (i.e., heater configuration) of the embodiment of FIG. 5 is utilized together with the shutter feature of FIG. 4 to provide vapor sources of optimal lubricant usage efficiency.


The present invention thus provides a number of advantages over conventional vapor deposition apparatus and methodology, and is of particular utility in cost-effective automated manufacturing processing of thin film magnetic and MO recording media requiring deposition of uniform thickness lubricant topcoat layers for obtaining improved tribological properties. Specifically, the present invention provides for lubricant deposition with substantially reduced lubricant consumption vis-à-vis vapor deposition apparatus and methodology utilizing vapor sources which emit vapor continuously and include temperature gradients resulting in vapor condensation on interior surfaces of the source. Further, the inventive apparatus and methodology can be readily utilized as part of conventional manufacturing apparatus/technology in view of their full compatibility with all other aspects of automated manufacture of magnetic and MO media. Finally, the inventive apparatus and methodology are broadly applicable to a variety of vapor deposition processes utilized in the manufacture of a number of different products, e.g., mechanical parts, gears, linkages, etc., requiring lubrication.


In the previous description, numerous specific details are set forth, such as specific materials, structures, processes, etc., in order to provide a better understanding of the present invention. However, the present invention can be practiced without resorting to the details specifically set forth. In other instances, well-known processing materials, structures, and techniques have not been described in detail in order not to unnecessarily obscure the present invention.


Only the preferred embodiments of the present invention and but a few examples of its versatility are shown and described in the present invention. It is to be understood that the present invention is capable of use in various other embodiments and is susceptible of changes and/or modifications within the scope of the inventive concept as expressed herein.

Claims
  • 1. A vapor source comprising: (a) an enclosure comprised of at least one thermally conductive material, said enclosure including a back wall and a front wall spaced apart by at least one sidewall and defining a chamber with an interior space, said front wall comprising a plurality of openings extending therethrough and forming a vapor diffusion plate with an array of vapor orifices;(b) at least one liquid reservoir within said interior space of said chamber and adapted for containing a quantity of a vaporizable liquid material therein;(c) a heater for heating said interior space of said chamber and forming therein a vapor of said liquid material; and(d) a shutter device for controlling flow of said vapor through said plurality of orifices of said vapor diffusion plate.
  • 2. The source according to claim 1, wherein: said plurality of openings form a linearly extending array of vapor orifices.
  • 3. The source according to claim 1, comprising: a plurality of liquid reservoirs within said interior space, each adapted for containing a quantity of said vaporizable liquid material therein.
  • 4. The source according to claim 3, wherein: each of said plurality of liquid reservoirs is adjacent said back wall of said enclosure.
  • 5. The source according to claim 4, wherein: each of said plurality of liquid reservoirs is integrally formed with said back wall of said enclosure.
  • 6. The source according to claim 1, wherein said shutter device comprises at least one shutter positioned at at least one of the following locations: (i) within said interior space of said chamber adjacent said at least one reservoir;(ii) within said interior space of said chamber adjacent an interior face of said front wall; and(iii) adjacent an exterior face of said front wall.
  • 7. The source according to claim 1, wherein: said heater is adapted for heating said backwall and said at least one sidewall for minimizing accumulation of said liquid on interior surfaces of said at least one sidewall.
  • 8. The source according to claim 7, wherein: said heater is in thermal contact with exterior surfaces of said back wall and said at least one sidewall.
  • 9. An apparatus for performing static vapor deposition of a thin film of a material on at least one surface of a substrate, comprising at least one vapor source according to claim 1.
  • 10. An apparatus for performing pass-by vapor deposition of a thin film of a material on at least one surface of at least one substrate, comprising at least one vapor source according to claim 1.
  • 11. A method of vapor depositing a thin film of a material on at least one surface of at least one substrate, comprising steps of: (a) providing an apparatus comprising: (i) a chamber having an interior space maintained below atmospheric pressure;(ii) a substrate holder for supplying said interior space with at least one substrate and for withdrawing said at least one substrate from said interior space; and(iii) at least one vapor source for supplying said interior space with a flow of vapor of said material, said at least one vapor source including a shutter device for regulating said flow of said vapor into said interior space;(b) supplying said interior space with at least one substrate having at least one surface;(c) depositing a predetermined thickness film of said material on said at least one surface of said at least one substrate, said depositing comprising utilizing said shutter device for limiting said flow of said vapor from said source to a predetermined interval; and(d) withdrawing said at least one substrate from said interior space.
  • 12. The method as in claim 11, wherein: step (c) comprises performing said depositing while said at least one substrate remains statically positioned relative to said at least one vapor source.
  • 13. The method as in claim 11, wherein: step (c) comprises performing said depositing while said at least one substrate continuously moves past said at least one vapor source.
  • 14. The method as in claim 11, wherein: step (a) comprises providing an apparatus including at least one vapor source for supplying a vapor of a lubricant material; andstep (b) comprises supplying a substrate for a data/information storage/retrieval medium.
  • 15. The method as in claim 14, wherein: step (a) comprises providing an apparatus including at least one vapor source for supplying a vapor of a polymeric fluorine-containing lubricant material; andstep (b) comprises supplying a substrate for a disc-shaped magnetic or magneto-optical (MO) recording medium.
  • 16. The method as in claim 11, wherein step (a) comprises providing an apparatus including a vapor source comprising: an enclosure comprised of at least one thermally conductive material, said enclosure including a back wall and a front wall spaced apart by at least one sidewall and defining a chamber with an interior space, said front wall comprising a plurality of openings extending therethrough and forming a vapor diffusion plate with an array of vapor orifices;at least one liquid reservoir within said interior space of said chamber and adapted for containing a quantity of a vaporizable liquid material therein; anda heater for heating said interior space of said chamber and forming therein a vapor of said liquid material; wherein:said shutter device controls flow of said vapor through said plurality of orifices of said vapor diffusion plate.
  • 17. The method as in claim 16, wherein: said plurality of openings form a linearly extending array of vapor orifices; andsaid vapor source comprises a plurality of liquid reservoirs integrally formed with said back wall of said enclosure, each adapted for containing a quantity of said vaporizable liquid material therein.
  • 18. The method as in claim 16, wherein: said shutter device comprises at least one shutter positioned at at least one of the following locations: (i) within said interior space of said chamber adjacent said at least one reservoir;(ii) within said interior space of said chamber adjacent an interior face of said front wall; and(iii) adjacent an exterior face of said front wall.
  • 19. The method as in claim 16, wherein: said heater is adapted for heating said backwall and said at least one sidewall for minimizing accumulation of said liquid on interior surfaces of said at least one sidewall.
  • 20. The method as in claim 19, wherein: said heater is in thermal contact with exterior surfaces of said back wall and said at least one sidewall.