This application is related to co-pending applications having Attorney Docket Nos. 08/235,626, 08/236,913, and 08/235,609, all filed concurrently on 29 Apr. 1994.
Number | Name | Date | Kind |
---|---|---|---|
3625846 | Murdoch et al. | Dec 1971 | |
3723290 | Hamblyn et al. | Mar 1973 | |
3933608 | Haas et al. | Jan 1976 | |
3979503 | Koartien | Sep 1976 | |
4386258 | Akashi et al. | May 1983 | |
4438706 | Boday et al. | Mar 1984 | |
4509434 | Boday et al. | Apr 1985 | |
4644877 | Barton | Feb 1987 | |
4657738 | Kanter et al. | Apr 1987 | |
4695448 | Anthony | Sep 1987 | |
4759300 | Hansen et al. | Jul 1988 | |
4766287 | Morrisroe et al. | Aug 1988 | |
4833294 | Montaser et al. | May 1989 | |
4926021 | Streusand et al. | May 1990 | |
4985219 | Helfritch et al. | Jan 1991 | |
5026464 | Mizuno et al. | Jun 1991 | |
5110579 | Anthony et al. | May 1992 | |
5131941 | Lemelson | Jul 1992 | |
5187344 | Mizuno et al. | Feb 1993 | |
5213758 | Kawashima et al. | May 1993 | |
5230931 | Yamazaki et al. | Jul 1993 | |
5266548 | Koradia et al. | Nov 1993 | |
5290392 | Lau et al. | Mar 1994 | |
5322567 | Deaton et al. | Jun 1994 |
Number | Date | Country |
---|---|---|
0577344 | May 1994 | EPX |
4279179 | May 1992 | JPX |
705011 | Mar 1952 | GBX |
2071970 | Sep 1981 | GBX |
2136258 | Sep 1984 | GBX |
Entry |
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H. Sawin, "Alternative Chemistries for Dry Etching", presentation give Feb. 15-16, 1994, Austin, Texas. |
Sugano et al., "Microwave Plasma Etching", Application of Plasma Process to VLSI Technology, 1985, 1985, pp. 142-157, (no month). |
F.W. Breitbarth et al., "Fluorocarbon Conversion in a Hetergenous Low-Pressure Plasma Reaction--A Gas-Phase FT-IR Study," 11th International Symposium on Plasma Chemistry, pp. 728-733, (no date). |
H.J. Tiller et al., "Toxic Products by Plasma Process using Fluorocarbons," 11th International Symposium on Plasma Chemistry, pp. 698-703, (no date). |
Herbert H. Sawin, "Challenges in dry etching: uniformity, selectivity, pattern dependencies, damage, and cleaning," Microelectronics Engineering 23 (1994), pp. 15-21 (no month). |
Sugano et al., "Damage by Plasma Etching", Application of Plasma Process to VLSI Technology, 1985, 1985, pp. 298-311, (no month). |