Patent Application
20140106650
This application claims priority under 35 USC §119 to Korean Patent Application Nos. 10-2012-0114118 and 10-2013-0112340, filed on Oct. 15, 2012 and Sep. 23, 2013, respectively, in the Korean Intellectual Property Office (KIPO), the contents of which are herein incorporated by reference in their entireties.
A chemical mechanical polishing (CMP) process is performed by mechanically polishing a wafer using a polishing pad and simultaneously chemically polishing the wafer using slurries, and when the CMP process is repeatedly performed using the polishing pad, slurries and polishing byproducts may be deposited on the polishing pad so as to reduce the efficiency of polishing the wafer. Thus, a surface of the polishing pad may be conditioned by a pad conditioner so as to be kept clean and uniform.
The pad conditioner may include artificial diamonds on a plate, and when the pad conditioner is used in conditioning the polishing pad, the artificial diamonds may be crushed or separated from the pad conditioner to be attached to the polishing pad so that the wafer may be scratched during a CMP process using the polishing pad.
Example embodiments provide an apparatus of surface treatment of an artificial diamond.
Example embodiments provide a method of treating a surface of an artificial diamond.
Example embodiments provide a method of manufacturing a pad conditioner using the same.
Example embodiments provide a CMP method using the same.
Example embodiments provide a method of manufacturing a semiconductor device using the same.
According to example embodiments, there is provided an apparatus of surface treatment. The apparatus includes an injection part, a transfer part, a pressure supply part, a collision part and an emission part. The transfer part includes a channel having first and second opposite end portions. The transfer part channel is bent at a plurality of points thereof. The injection part is at the first end portion of the transfer part channel and the emission part is at the second end portion of the transfer part channel. The injection part is configured to inject an object into the transfer part channel. The emission part is configured to emit the object from the injection part channel. The pressure supply part is connected to the transfer part channel and is configured to supply pressure into the transfer part channel to move the object toward the emission part. At least some of the bent points of the transfer part channel are exposed to the collision part such that the object moving in the transfer part channel collides with the collision part to treat a surface of the object.
In example embodiments, the transfer part may be a substrate with the channel disposed therein. The collision part may be detachably mounted on the substrate.
In example embodiments, the collision part may be exposed by the transfer part at some of the plurality of points of the transfer part to collide with the object moving in the transfer part.
In example embodiments, the collision part may be exposed by the transfer part at odd numbered ones of the plurality of points of the transfer part to collide with the object moving in the transfer part.
In example embodiments, the transfer part may have a diameter at odd numbered ones of the plurality of points thereof larger than a diameter at even numbered ones of the plurality of points thereof.
In example embodiments, the collision part may include a first target exposed by the transfer part at odd numbered ones of the plurality of points of the transfer part to collide with the object moving in the transfer part, and a second target exposed by the transfer part at even numbered ones of the plurality of points of the transfer part to collide with the object moving in the transfer part.
In example embodiments, the pressure supply part may supply a pressure by spraying gas or liquid into the transfer part.
In example embodiments, the gas may include air, and the liquid may include water.
In example embodiments, a plurality of pressure supply parts may be formed in the apparatus.
In example embodiments, the object may be an artificial diamond.
According to other example embodiments, an apparatus for surface treatment of objects includes a body, an injection member, an emission member, a pressure supply member and a collision member. The body has a transfer passageway having first and second opposite ends, and the transfer passageway is bent at a plurality of spaced-apart bent portions of the transfer passageway. The injection member is at the first end of the transfer passageway, and the injection member is configured to inject an object into the transfer passageway. The emission member is at the second end of the transfer passageway, and the emission member is configured to emit the object from the transfer passageway. The pressure supply member is connected to the transfer passageway near the injection member and is configured to supply pressure to the transfer passageway. The collision member on the body, and at least some of the bent portions of the transfer passageway are exposed to the collision member. The apparatus is configured such that an object injected by the injection member is conveyed along the transfer passageway by pressure supplied by the pressure supply member such that the object collides with the collision member at the bent portions of the transfer passageway that are exposed to the collision member before the object is emitted by the emission member.
According to example embodiments, there is provided a method for surface treatment of objects. The method includes providing an apparatus including: an injection part; an emission part; a transfer part having a transfer channel extending between the injection part and the emission part, wherein the transfer channel is bent at a plurality of spaced-apart bent portions of the transfer channel; a collision part on the transfer part, wherein at least some of the bent portions of the transfer channel are exposed to the collision member; and a pressure supply part connected to the transfer channel. The method includes injecting an object into the transfer channel via the injection part; supplying pressure into the transfer channel via the pressure supply part; conveying the object through the transfer channel using the supplied pressure such that the object collides with the collision part at the bent portions of the transfer channel that are exposed to the collision member to treat the object's surface; and emitting the object with the treated surface via the emission part.
According to example embodiments, there is provided a method of surface treatment. In the method, an object is injected into a transfer part via an injection part. A pressure is supplied into the transfer part via a pressure supply part to move the object in the transfer part. The object collides with a collision part a plurality of times along inclined directions to a surface of the collision part to treat a surface of the object. The object of which a surface has been treated is emitted via an emission part connected to the transfer part.
According to example embodiments, there is provided a method of manufacturing a pad conditioner. In the method, an artificial diamond is injected into a transfer part via an injection part. The transfer part is bended at a plurality of points thereof. A pressure is supplied into the transfer part via a pressure supply part to move the artificial diamond in the transfer part. The artificial diamond moving in the transfer part collides with a collision part a plurality of times to treat a surface of the artificial diamond. The artificial diamond of which a surface has been treated is emitted via an emission part connected to the transfer part. The emitted artificial diamond is mounted onto a plate. An adhesion layer is formed on the plate to partially cover the mounted artificial diamond so that the mounted artificial diamond is attached to the plate.
According to example embodiments, there is provided a method of CMP. In the method, an object layer is formed on a substrate. A pad conditioner is manufactured by following steps: an artificial diamond is injected into a transfer part bended at a plurality of points thereof via an injection part; a pressure is supplied into the transfer part via a pressure supply part to move the artificial diamond in the transfer part; the artificial diamond moving in the transfer part collides with a collision part a plurality of times to treat a surface of the artificial diamond; the artificial diamond of which a surface has been treated is emitted via an emission part connected to the transfer part; the emitted artificial diamond is mounted onto a plate; and an adhesion layer is formed on the plate to partially cover the mounted artificial diamond so that the mounted artificial diamond is attached to the plate. A polishing pad is conditioned with the pad conditioner. The object layer is polished using the conditioned polishing pad and slurry.
According to example embodiments, there is provided a method of manufacturing a semiconductor device. In the method, i) an object layer is formed on a substrate. II) a pad conditioner is manufactured by following steps: an artificial diamond is injected into a transfer part bended at a plurality of points thereof via an injection part; a pressure is supplied into the transfer part via a pressure supply part to move the artificial diamond in the transfer part; the artificial diamond moving in the transfer part collides with a collision part a plurality of times to treat a surface of the artificial diamond; the artificial diamond of which a surface has been treated is emitted via an emission part connected to the transfer part; the emitted artificial diamond is mounted onto a plate; and an adhesion layer is formed on the plate to partially cover the mounted artificial diamond so that the mounted artificial diamond is attached to the plate. III) A polishing pad is conditioned with the pad conditioner. IV) The object layer is polished using the conditioned polishing pad and slurry. Each of the steps I), III) and IV) is performed at least one time.
According to example embodiments, an object, e.g., an artificial diamond may be collided with a collision part of an apparatus of surface treatment a plurality of times so that a rough surface of the artificial diamond may be smoothened and a polycrystalline artificial diamond may be divided into single crystalline artificial diamonds. Thus, when a polishing pad is conditioned with a pad conditioner of a CMP apparatus including the artificial diamond of which a surface has been treated, the artificial diamond may not be detached from the pad conditioner to stick to the polishing pad, and thus scratches may not be generated on a wafer during a CMP process for the wafer using the CMP apparatus.
Example embodiments will be more clearly understood from the following detailed description taken in conjunction with the accompanying drawings.
Various example embodiments will be described more fully hereinafter with reference to the accompanying drawings, in which some example embodiments are shown. The present inventive concept may, however, be embodied in many different forms and should not be construed as limited to the example embodiments set forth herein. Rather, these example embodiments are provided so that this description will be thorough and complete, and will fully convey the scope of the present inventive concept to those skilled in the art. In the drawings, the sizes and relative sizes of layers and regions may be exaggerated for clarity.
It will be understood that when an element or layer is referred to as being “on,” “connected to” or “coupled to” another element or layer, it can be directly on, connected or coupled to the other element or layer or intervening elements or layers may be present. In contrast, when an element is referred to as being “directly on,” “directly connected to” or “directly coupled to” another element or layer, there are no intervening elements or layers present. Like numerals refer to like elements throughout. As used herein, the term “and/or” includes any and all combinations of one or more of the associated listed items.
It will be understood that, although the terms first, second, third, fourth etc. may be used herein to describe various elements, components, regions, layers and/or sections, these elements, components, regions, layers and/or sections should not be limited by these terms. These terms are only used to distinguish one element, component, region, layer or section from another element, component, region, layer or section. Thus, a first element, component, region, layer or section discussed below could be termed a second element, component, region, layer or section without departing from the teachings of the present inventive concept.
Spatially relative terms, such as “beneath,” “below,” “lower,” “above,” “upper” and the like, may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures. It will be understood that the spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, elements described as “below” or “beneath” other elements or features would then be oriented “above” the other elements or features. Thus, the exemplary term “below” can encompass both an orientation of above and below. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.
The terminology used herein is for the purpose of describing particular example embodiments only and is not intended to be limiting of the present inventive concept. As used herein, the singular forms “a,” “an” and “the” are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms “comprises” and/or “comprising,” when used in this specification, specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof.
Example embodiments are described herein with reference to illustrations (e.g., cross-sectional illustrations) that are schematic illustrations of idealized example embodiments (and intermediate structures). As such, variations from the shapes of the illustrations as a result, for example, of manufacturing techniques and/or tolerances, are to be expected. Thus, example embodiments should not be construed as limited to the particular shapes of regions illustrated herein but are to include deviations in shapes that result, for example, from manufacturing. For example, an implanted region illustrated as a rectangle will, typically, have rounded or curved features and/or a gradient of implant concentration at its edges rather than a binary change from implanted to non-implanted region. Likewise, a buried region formed by implantation may result in some implantation in the region between the buried region and the surface through which the implantation takes place. Thus, unless otherwise indicated, the regions illustrated in the figures are schematic in nature and their shapes are not intended to illustrate the actual shape of a region of a device and are not intended to limit the scope of the present inventive concept.
Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this inventive concept belongs. It will be further understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.
Referring to
The object may include a surface of which a shape may be irregular or rough, or may include a surface having a tip or defect thereon. Alternatively, the object may have a polycrystalline structure. Thus, the surface of the object may be treated by the apparatus of surface treatment so that the surface of the object may have a regular or smooth shape or the tip or defect may be removed from the object. Alternatively, the object may be divided into a plurality of pieces each of which may have a single crystalline structure.
In example embodiments, the object may be an artificial diamond used for a pad conditioner that may condition a polishing pad of a chemical mechanical polishing (CMP) apparatus.
The injection part 110 may be a part of the apparatus of surface treatment into which the object may be injected. In example embodiments, the injection part 110 may have a funnel shape of which an entrance may have a relatively large diameter and an exit may have a relatively small diameter. In an example embodiment, the diameter of the exit of the injection part 110 may be about 1 to about 2 times a diameter of the object. Thus, even though many objects can be simultaneously injected into the injection part 110, only one of the objects may be injected into the transfer part 120 connected to the exit of the injection part 110.
An end of the transfer part 120 may be connected to the exit of the injection part 110, and the transfer part 120 may extend from the exit of the injection part 110 so as to serve as a path for the movement of the object injected into the injection part 110. In example embodiments, the transfer part 120 may extend to be bent at a plurality of points thereof (e.g., bend or transition points of the transfer part 120 where the transfer part 120 changes direction).
In example embodiments, the transfer part 120 may be a channel, passageway or hole in a body, housing or substrate 100. The substrate 100 may include, e.g., a metal such as stainless steel. Alternatively, the transfer part 120 may be a tubular component such as a pipe including a metal. Hereinafter, only the case in which the transfer part 120 has a hole shape may be illustrated for the convenience of explanations.
The pressure supply part 130 may be connected to the transfer part 120 to supply a pressure thereinto so that the object injected into the transfer part 120 may move therein. Thus, the pressure supply part 130 may be disposed at a portion of the transfer part 120 adjacent to the exit of the injection part 110.
Alternatively, a plurality of pressure supply parts 130 may be disposed to be connected to a plurality of points of the transfer part 120, and an apparatus of surface treatment including the plurality of pressure supply parts 130 is shown in
The pressure supply part 130 may supply a pressure by spraying gas, e.g., air, or liquid, e.g., water.
The collision part 140 may collide with the object moving in the transfer part 120 a plurality of times to treat a surface of the object. That is, when the object includes a surface having an irregular or rough shape, or having a tip or defect thereon, the object may collide with the collision part 140 a plurality of times so that the surface of the object may be treated. Thus, the object may have a regular or smooth shape, or the tip or defect may be removed from the object. Alternatively, when the object has a polycrystalline structure, the object may be divided into several pieces so that each object may have a single crystalline structure. The collision part 140 may include, e.g., a metal such as stainless steel.
In example embodiments, the collision part 140 may be exposed by the transfer part 120 at some of the plurality of points (e.g., bend or transition points) of the transfer part 120 at which the transfer part 120 is bent to collide with the object. For example, the transfer part 120 may be bent at first to ninth points P1-P9, and the collision part 140 may be exposed by the transfer part 120 at odd numbered points P1, P3, P5, P7 and P9 to collide with the object (e.g., collision points or portions). As illustrated, five portions of the collision part 140 may collide with the object, although a greater or lesser number of such portions are contemplated.
In example embodiments, a first diameter D1 of the odd numbered bending portions P1, P3, P5, P7 and P9 of the transfer part 120 may be larger than a second diameter D2 of the even numbered bending portions P2, P4, P6 and P8 of the transfer part 120. For example, the first diameter D1 may be about 1.5 to about 3 times the diameter of the object, and the second diameter D2 may be about 1 to about 1.5 times the diameter of the object.
In example embodiments, a first angle A of a portion of the transfer part 120 extending from the even numbered points P2, P4, P6 and P8 to the odd numbered points P1, P3, P5, P7 and P9 along a direction in which the object may move with respect to a normal line of a surface of the collision part 140 may be larger than a second angle B of a portion of the transfer part 120 extending from the odd numbered points P1, P3, P5, P7 and P9 to the even numbered points P2, P4, P6 and P8 along the direction in which the object may move with respect to the normal line of the surface of the collision part 140.
Thus, referring to
The artificial diamond 10 may move in the transfer part 120 and collide with a surface of the collision part 140 at a first point P1. At this point P1, the artificial diamond 10 may change a direction thereof. Thus, the tip 15 on a rear surface of the artificial diamond 10 along a movement direction may change its location to a front surface of the artificial diamond 10 along the movement direction. The transfer part 120 may have the first diameter D1 relatively large, and thus the artificial diamond 10 may change its direction more easily.
The artificial diamond 10 may move toward a second point P2 of the transfer part 120. The second angle B is smaller than the first angle A, and thus the artificial layer 10 may move along or attached onto a sidewall of the transfer part 120 or alternately collide with opposing sidewalls of the transfer part 120. When the artificial diamond 10 passes through the second point P2, the transfer part 120 may have the second diameter D2 relatively small, and thus the artificial diamond 10 may not change its direction.
When the artificial diamond 10 passes through a third point P3, the tip 15 on the front surface of the artificial diamond 10 may collide with a surface the collision part 140, and the artificial diamond 10 may change its direction as at the first point P 1. That is, a surface the artificial diamond 10 colliding with the collision part 140 may be changed when the artificial diamond 10 passes through the first, third, fifth, seventh and ninth points P1, P3, P5, P7 and P9, and thus the whole surface of the artificial diamond 10 may be treated.
The collision part 140 may be detachably or releasably mounted onto the substrate 100. For example, the collision part 140 may be detachably mounted onto the substrate 100 by one or more fixing members or parts 145, e.g., bolts and nuts. Thus, when the collision part 140 collides with objects more than a given number of times, the collision part 140 may be replaced with a new one, so that the function of the collision part 140, i.e., treating surfaces of objects, may be kept.
The emission part 150 may be connected to another end of the transfer part 120 to emit the object of which a surface has been treated. In an example embodiment, a detection or measurement device or unit such as or including a spectroscope may be installed at the emission part 150 to detect or measure the surface and/or the crystalline state of the object, and may collect or divert the object separately if the surface of the object has not been sufficiently treated and transfer it to the injection part 110 again.
Referring to
An end of the transfer part 220 may be connected to an exit of the injection part 210, and the transfer part 220 may extend from the exit of the injection part 210 so that another end of the transfer part 220 may be connected to the emission part 250. In example embodiments, the transfer part 220 may extend to be bent at a plurality of points thereof.
In an example embodiment, the transfer part 220 may include a plurality of first extension portions extending in a horizontal direction and a plurality of first bending portions connecting the plurality of first extension portions to each other, which are shown in
In other example embodiments, the transfer part 220 may include a plurality of second extension portions extending in an inclined direction, which is neither a horizontal direction nor a vertical direction, and a plurality of second bending portions connecting the plurality of second extension portions to each other, which are shown in
In example embodiments, the transfer part 220 may be a channel, passageway or hole in a body, housing or substrate 200. Alternatively, the transfer part 220 may be a tubular member such as a pipe including a metal. Hereinafter, only the case in which the transfer part 220 has a hole shape may be illustrated for the convenience of explanations.
The pressure supply part 230 may be connected to the transfer part 220, and supply a pressure thereinto so that an object injected into the transfer part 220 may move therein. Thus, the pressure supply part 230 may be disposed at a portion of the transfer part 220 adjacent to the exit of the injection part 210. Alternatively, a plurality of pressure supply parts 230 may be disposed to be connected to a plurality of points of the transfer part 220. In
The collision part 240 may collide with the object moving in the transfer part 220 a plurality of times to treat a surface of the object.
In example embodiments, the collision part 240 may include first and second members, portions or targets 242 and 244 opposing to each other on the substrate 200. The first target 242 may be exposed by or to the transfer part 220 at odd numbered points P1, P3, P5, P7 and P9 of the transfer part 220 among the plurality of points P1-P10 at which the plurality of bending portions are located to collide with the object. The second target 244 may be exposed by or to the transfer part 220 at even numbered points P2, P4, P6, P8 and P10 of the transfer part 220 among the plurality of points P1-P10 at which the plurality of bending portions are located to collide with the object.
In
The first and second targets 242 and 244 may include, e.g., a metal such as stainless steel, and each of the targets 242 and 244 may be detachably or releasably mounted on the substrate 200. That is, for example, the collision part 240 may be detachably mounted onto the substrate 200 by one or more fixing members or parts 245, e.g., bolts and nuts.
The apparatuses of
Referring to
In step S120, the pressure supply part 130 connected to the transfer part 120 may supply a pressure into the transfer part 120 so that the object may move in the transfer part 120.
In step S130, the object moving in the transfer part 120 may collide with the collision part 140 at a plurality of times so that the surface of the object may be treated.
In example embodiments, the transfer part 120 may extend to be bended at the plurality of points P1-P9, and the object may collide with the collision part 140 at least at some of the points P1-P9, so that the object may collide with the collision part 140 at a plurality of times along inclined directions relative to a surface of the collision part 140.
In step S140, the object of which a surface has been treated may be emitted via the emission part 150 connected to the transfer part 120.
The object emitted by the above steps may have a regular or smooth surface, a tip may be removed from the object, or the object may be divided so that each object may have a single crystalline structure.
Referring to
In example embodiments, the plate 310 may have a circular shape, and include a metal or plastic. The mask 320 may include a plurality of openings 325, and each opening 325 may expose a top surface of the plate 310. In an example embodiment, the mask 320 may be formed to include an insulating material.
Referring to
Referring to
The adhesion layer 340 may be formed to partially cover each artificial diamond 330. The adhesion layer 340 may be formed by an electroplating using, e.g., a metal such as palladium, cobalt, nickel, etc.
A protection layer 350 may be formed on the adhesion layer 340 to partially cover each artificial diamond 330 so that the pad conditioner may be manufactured.
The pad conditioner manufactured by the above method may include the artificial diamonds 330 having a regular or smooth surface, having no tips, or having a single crystalline structure, and thus a polishing pad may be easily conditioned by the pad conditioner.
Referring now to
The plurality of artificial diamonds 330 of which surfaces have been treated may be disposed in the conditioning area 360, and polishing residues and/or slurry residues may be removed from a polishing pad used in a CMP process by the artificial diamonds 330. In example embodiments, the plate 310 may have a plurality of conditioning areas 360 that may be disposed in a tornado shape.
The flow path area 370 may serve as a passage through which slurries remaining on the polishing pad may move, and thus the artificial diamonds 330 may not be disposed therein. In example embodiments, the plate 310 may have a plurality of flow path areas 370, and the conditioning areas 360 may be divided by the plurality of flow path areas 370,
In example embodiments, the holding area 380 may be disposed at a central portion of the plate 310. For example, one or more fixing grooves or openings 385 may be formed in the holding area 380, and the plate 310 may be fixed to the holder by the fixing groove(s) 385.
Referring to
The driver or driving axis 410 may be disposed beneath the platen 420 to rotate the platen 420, and thus the polishing pad 430 mounted on the platen 420 may be also rotated.
In example embodiments, the platen 420 and the polishing pad 430 may have a disc shape. The polishing pad 430 may include grooves through which a slurry 465 supplied by the slurry supply part 460 may move and micropores that may contain the slurry 465 therein. The polishing pad 430 may be a hard pad or a soft pad, and may include, e.g., polyurethane.
The polishing head 440 may hold a substrate on which an object layer is formed, e.g., a wafer W therebeneath, and may move in a vertical direction by the first driving member 450 so that the wafer W may contact a top surface of the polishing pad 430. Thus, the polishing head 440 may apply a given pressure onto the wafer W or the polishing pad 430. While the wafer W contacts the polishing pad 430, the polishing head 440 may be rotated or moved linearly by the first driving member 450 so that the wafer W may be also rotated or moved linearly. The object layer may be mechanically polished by the rotation or linear motion of the wafer W, and chemically polished by the slurry 465 supplied by the slurry supply part 460.
The pad conditioner 300 manufactured by the method illustrated with reference to
Referring to
In step S210, an object layer may be formed on a substrate, e.g., the wafer W. The object layer may include an insulating material or a conductive material.
In step S220, the pad conditioner 300 may be manufactured by the method illustrated with reference to
In step S230, the polishing pad 430 may be conditioned by the pad conditioner 300.
That is, while the polishing pad 430 is rotated by rotating the platen 420 via the driving axis 410, the pad conditioner 300 may contact a top surface of the polishing pad 430 via the second driving member 470, and the pad conditioner 300 may be rotated or moved linearly, such that the pad conditioner 300 and the polishing pad 430 may be rubbed against each other. Thus, the polishing residues and/or the slurry residues remaining on the polishing pad 430 by repeatedly performing a CMP method may be removed, and a roughness of the polishing pad 430 may be enhanced.
Particularly, surfaces of the artificial diamonds in the pad conditioner 300 that may contact the top surface of the polishing pad 430 may be treated as above, and thus no tips or parts of the artificial diamonds may be present that may be detached from the artificial diamonds to stick to the polishing pad 430 by the rubbing.
In step S240, the wafer W on which the object layer is formed may be loaded to the polishing head 440 and mounted thereto. While the polishing pad 430 is rotated by rotating the platen 420 via the driving axis 410, the polishing head 440 may be moved in a vertical direction via the first driving member 450 to contact the wafer W to a top surface of the polishing pad 430, and the polishing head 440 may be rotated or moved linearly to rub the wafer W against the polishing pad 430. Additionally, the slurry 465 may be supplied onto the polishing pad 430 by the slurry supply part 460 to contact the object layer on the wafer W. Thus, the object layer may be polished by a mechanical rubbing with the polishing pad 430 and a chemical reaction with the slurry 465.
As described above, when the polishing pad 430 is conditioned by the pad conditioner 300 in step S230, the surfaces of the artificial diamonds in the pad conditioner 300 have been treated, and thus no or substantially no tips or part of the artificial diamonds may be detached from the artificial diamonds. Even if some tips or part of the artificial diamonds may be detached therefrom, surfaces of the tips or parts may be smooth so that the wafer W may not be damaged or scratched due to the artificial diamonds.
Meanwhile, the process for conditioning the polishing pad 430 with the pad conditioner 300 in step S230 may be performed simultaneously with or after the polishing process in step S240.
Comparative Experiment
In order to confirm the characteristics of the method of surface treatment using the apparatus of surface treatment in accordance with example embodiments, when a polishing pad is conditioned using the pad conditioner manufactured by the apparatus and method of surface treatment, a ratio of scratches on a wafer polished by the polishing pad was measured.
That is, when the polishing pad was conditioned using the pad conditioner manufactured with the artificial diamonds of which surfaces had been treated in accordance with Embodiments 1 and 2 and Comparative Examples 1 to 3, respectively, ratios of scratches on the wafer generated while being polished by the polishing pad were measured. Embodiment 1 used artificial diamonds of which surfaces had been treated using the apparatus of surface treatment of
In order to measure ratios of scratches on a wafer, a polishing pad having no pores and a diameter of about 190 mm was mounted on a platen, the wafer was mounted on a polishing head, the polishing head applied a pressure of about 25 lbf onto the polishing pad, and the polishing pad and the polishing head were rotated. Additionally, a deionized water was supplied at a flow rate of about 150 cc/min onto the polishing pad to polish the wafer.
The pad conditioners in accordance with Embodiments 1 and 2 and Comparative Example 1 to 3 applied a pressure of about 33 lbf onto the polishing pad for about 60 seconds and were rotated to condition the polishing pad. The ratios of scratches generated on the wafer are listed in the following Table.
Referring to Table, when the polishing pad was conditioned with the apparatuses of surface treatment in accordance with Embodiments 1 and 2, the scratch generation ratios were very low when compared to the apparatuses of surface treatment in accordance with Comparative Examples 1 to 3.
That is, the method of surface treatment using the apparatus of surface treatment in accordance with Embodiments 1 and 2 may have such a good effect that artificial diamonds having a smooth surface may be produced. Accordingly, when a polishing pad is conditioned using a pad conditioner manufactured with the above artificial diamonds, the wafer that may be polished by the polishing pad may not be scratched or damaged.
Referring to
In step S320, the pad conditioner 300 may be manufactured by the method illustrated with reference to
In step S330, the polishing pad 430 may be conditioned by the pad conditioner 300. Surfaces of the artificial diamonds in the pad conditioner 300 that may contact a top surface of the polishing pad 430 may be treated as above, and thus no tips or parts of the artificial diamonds may be present that may be detached from the artificial diamonds to stick to the polishing pad 430 by the rubbing.
In step S340, the wafer W on which the object-layer is formed may be loaded to the polishing head 440 and mounted thereto. The object layer may be polished by a mechanical rubbing with the polishing pad 430 and a chemical reaction with the slurry 465. When the polishing pad 430 is conditioned by the pad conditioner 300 in step S330, the surfaces of the artificial diamonds in the pad conditioner 300 have been treated, and thus no tips or part of the artificial diamonds may be detached from the artificial diamonds.
In step S350, the steps S310, S330 and 340 may be repeatedly performed to polish the object layer so that the semiconductor device may be manufactured.
This method is an application of the method of manufacturing the semiconductor device illustrated with reference to
Referring to
An isolation layer may be formed on the substrate 500 to sufficiently fill the first trench 505, and an upper portion of the isolation layer may be planarized until a top surface of the substrate 500 may be exposed to form an isolation layer pattern 520 in the first trench 505. The isolation layer may be formed to include an oxide, e.g., silicon oxide.
In example embodiments, the planarization process may be performed by a CMP process and/or an etch back process. The CMP process may be performed using the CMP apparatus of
A region of the substrate 500 on which the isolation layer pattern 520 is formed may be defined as a field region, and a region of the substrate 500 on which no isolation layer pattern is formed may be defined as an active region. In example embodiments, a plurality of active regions may be formed, and each active region may extend in a third direction that is substantially parallel to the top surface of the substrate 500, however, neither parallel nor perpendicular to the first and second directions.
Impurities may be implanted into upper portions of the substrate 500 to form impurity regions. The impurity regions may form a transistor together with a first gate structure 560 (refer to
Referring to
A first gate insulation layer 530 may be formed on upper surfaces of the substrate 500 exposed by the second trenches, and a first gate electrode 540 and a capping layer pattern 550 may be sequentially formed in each second trench. The first gate electrode 540 may fill a lower portion of each second trench and the capping layer pattern 550 may fill an upper portion of each second trench.
In example embodiments, the first gate insulation layer 530 may be formed by a thermal oxidation process or a chemical vapor deposition (CVD) process, and thus may be formed to include an oxide, e.g., silicon oxide.
The first gate electrode 540 may be formed by forming a first gate electrode layer on the first gate insulation layer 530, the first hard mask 510 and the isolation layer pattern 520 to sufficiently fill the second trenches, and removing an upper portion of the first gate electrode layer through an etch back process and/or a CMP process. As described above, the CMP process may be performed using the CMP apparatus of
The first gate electrode layer may be formed to include a metal, e.g., tungsten, titanium, tantalum, etc., or a metal nitride, e.g., tungsten nitride, titanium nitride, tantalum nitride, etc.
The capping layer pattern 550 may be formed by forming a capping layer on the first gate electrode 540, the first gate insulation layer 530, the first hard mask 510 and the isolation layer pattern 520 to sufficiently fill remaining portions of the second trenches, and planarizing an upper portion of the capping layer until top surfaces of the first hard mask 510 and the isolation layer pattern 520 may be exposed. In example embodiments, the planarization process may be performed by a CMP process. The capping layer may be formed to include a nitride, e.g., silicon nitride.
By the above process, the first gate structure 560 including the first gate insulation layer 530, the first gate electrode 540 and the capping layer pattern 550 may be formed in each second trench. In example embodiments, the first gate structure 560 may extend in the second direction.
Referring to
A first spacer 580 may be formed on a sidewall of each first contact hole 575. The first spacers 580 may be formed by forming a first spacer layer on the sidewalls of the first contact holes 575, the exposed top surface of the active regions and the first insulating interlayer 570, and anisotropically etching the first spacer layer. The first spacer layer may be formed to include a nitride, e.g., silicon nitride.
Referring to
The first contact plugs 612 may be formed by forming a barrier layer on the exposed top surface of the active regions, the first spacers 580 and the first insulating interlayer 570, forming a first metal layer to sufficiently fill remaining portions of the first contact holes 575, and planarizing upper portions of the barrier layer and the first metal layer until a top surface of the first insulating interlayer 570 may be exposed. In example embodiments, the planarization process may be performed by a CMP process.
The barrier layer may be formed to include a metal nitride, e.g., tungsten nitride, titanium nitride, tantalum nitride, etc., and the first metal layer may be formed to include a metal, e.g., tungsten, aluminum, copper, etc. Alternatively, the first contact plugs 612 may be formed to include doped polysilicon.
Referring to
The first bit line 622 and the second hard mask 632 may be formed by sequentially forming a second metal layer and a second hard mask layer on the first insulating interlayer 570, the first contact plugs 612 and the first spacers 580, and patterning the second hard mask layer and the second metal layer through a photolithography process. In example embodiments, each of the first bit line 622 and the second hard mask 632 may extend in the first direction, and a plurality of first bit lines 622 and a plurality of second hard mask 632 may be formed in the second direction. The second metal layer may be formed to include a metal, e.g., tungsten, aluminum, copper, etc., and the second hard mask layer may be formed to include a nitride, e.g., silicon nitride.
Referring to
The second spacers 642 may be formed by forming a second spacer layer on the first bit lines 622, the second hard masks 632, the first contact plugs 612 and the first insulating interlayer 570, and anisotropically etching the second spacer layer. The second spacer layer may be formed to include a nitride, e.g., silicon nitride. In example embodiments, the second spacer 642 may extend in the first direction, and a plurality of second spacers 642 may be formed in the second direction.
The bit line 622, the second hard mask 632 and the second spacer 642 may define a first bit line structure.
Referring to
A second contact plug 662 filling a lower portion of each second contact hole 655 may be formed. The second contact plugs 662 may be formed by forming a first conductive layer on the exposed top surfaces of the active regions, the first bit line structures and the second insulating interlayer 650 to sufficiently fill the second contact holes 655, and removing an upper portion of the first conductive layer. The first conductive layer may be formed to include, e.g., doped polysilicon.
Metal silicide patterns may be further formed on top surfaces of the second contact plugs 662, thereby reducing a resistance between the second contact plugs 662 and landing pads 672 (refer to
Referring to
An upper portion of the second conductive layer 670 may be planarized by a CMP process.
Referring to
Referring to
That is, a third insulating interlayer 680 may be formed on the first bit line structures and the second insulating interlayer 650 to cover the landing pads 672, an upper portion of the third insulating interlayer 680 may be planarized until a top surface of the landing pads 672 may be exposed. An etch stop layer 690 and a mold layer may be sequentially formed on the third insulating interlayer 680 and the landing pads 672, and may be partially etched to form third contact holes exposing top surfaces of the landing pads 672, respectively. In the etching process, a top surface of the third insulating interlayer 680 may be also partially exposed.
After a lower electrode layer may be formed on sidewalls of the third contact holes, the exposed top surfaces of the landing pads 672, the exposed top surface of the third insulating interlayer 680 and the mold layer, a sacrificial layer may be formed on the lower electrode layer to sufficiently fill remaining portions of the third contact holes, and upper portions of the sacrificial layer and the lower electrode layer may be planarized until a top surface of the mold layer may be exposed to divide the lower electrode layer into a plurality of pieces. The planarization process may be performed by a CMP process.
The sacrificial layer and the mold layer may be removed. Thus, a plurality of cylindrical lower electrodes 700 may be formed on the sidewalls of the third contact holes, the exposed top surfaces of the landing pads 672, and the exposed top surface of the third insulating interlayer 680. Alternatively, a plurality of pillar-shaped lower electrodes may be formed instead of the plurality of cylindrical lower electrodes 700, and in this case, the lower electrode layer may entirely fill the third contact holes and the sacrificial layer may not be formed. Hereinafter, only the case in which the cylindrical lower electrodes 700 are formed will be illustrated.
A dielectric layer 710 may be formed on the lower electrodes 700 and the etch stop layer 690, and an upper electrode 720 may be formed on the dielectric layer 710 to form the capacitors 730, each of which may include the lower electrode 700, the dielectric layer 710 and the upper electrode 720. The lower and upper electrodes 700 and 720 may be formed to include doped polysilicon, a metal, a metal nitride, etc., and the dielectric layer 710 may be formed to include a metal oxide, silicon oxide, etc.
As illustrated above, various types of layers may be planarized by a CMP process, and the substrate 500 and the structures on the substrate 500 may not be damaged.
Referring to
The substrate 800 may be divided into an active region and a field region by an isolation layer. In example embodiments, the active region may extend in a first direction parallel with a top surface of the substrate 800, and a plurality of active regions may be formed in a second direction substantially perpendicular to the first direction. The substrate 800 may include a cell region in which memory cells may be formed and a peripheral region in which peripheral circuits may be formed. In
Each gate structure 860 may be formed by sequentially forming and patterning a tunnel insulation layer, a floating gate layer, a dielectric layer and a control gate layer on the substrate 800. In an example embodiment, after forming a gate mask on the control gate layer, the control gate layer, the dielectric layer, the floating gate layer and the tunnel insulation layer may be patterned using the gate mask as an etching mask to form the gate structures 860. Thus, each gate structure 860 may be formed to include a tunnel insulation layer pattern 820, a floating gate 830, a dielectric layer pattern 840 and a control gate 850 sequentially stacked on the substrate 800. In example embodiments, a plurality of gate structures 860 may be formed in the first direction.
The tunnel insulation layer may be formed using an oxide, e.g., silicon oxide, an oxynitride, e.g., silicon oxynitride, silicon oxide doped with impurities or a low-k dielectric material, etc., and the floating gate layer may be formed using doped polysilicon, a metal having a high work function, e.g., tungsten, titanium, cobalt, nickel, etc. The dielectric layer may be formed using an oxide and/or a nitride to have an ONO structure or using a metal oxide having a high dielectric constant. The high-k metal oxide may include, e.g., hafnium oxide, titanium oxide, tantalum oxide, zirconium oxide, aluminum oxide, etc. The control gate layer may be formed using doped polysilicon, a low resistance metal, e.g., aluminum, copper, etc., a metal nitride, a metal silicide, etc.
In example embodiments, the tunnel insulation layer patterns 820 may be formed to have an island shape from or relative to each other on the active region of the substrate 800, and the floating gates 830 may be also formed to have an island shape from each other thereon. Each of the dielectric layer patterns 840 and the control gates 850 may be formed to extend in the second direction on the floating gates 830 and the isolation layer. Alternatively, the tunnel insulation layer patterns 820 may be formed not to have an island shape but to extend in the first direction on the active region of the substrate 800.
Referring to
A spacer layer may be formed on the substrate 800 to cover the gate structures 860. The spacer layer may be formed using a nitride, e.g., silicon nitride by a CVD process, an ALD process, a sputtering process, etc. The spacer layer may be etched by an anisotropic etching process to form spacers 870 on sidewalls of the gate structures 860. Spaces between the gate structures 860 spaced apart from each other at a relatively small distance may be filled with the spacers 870.
Referring to
A first insulating interlayer 890 covering the protection layer pattern 880 may be formed on the substrate 800. The first insulating interlayer 890 may be formed using silicon oxide, e.g., borophosphosilicate glass (BPSG), undoped silicate glass (USG), spin-on glass (SOG), etc., by a chemical vapor deposition (CVD) process, an ALD process, a sputtering process, etc.
A first opening may be formed through the first insulating interlayer 890 to expose the second impurity region 805, and a first conductive layer filling the first opening may be formed on the exposed second impurity region 805 and the first insulating interlayer 890. The first conductive layer may be formed using doped polysilicon, a metal or a metal silicide. The first conductive layer may be planarized until the first insulating interlayer 890 may be exposed to form a CSL 900 filling the first opening and making contact with the second impurity region 805. In example embodiments, the planarization process may be performed by a CMP process.
Referring to
Referring to
Particularly, a barrier layer may be formed on the exposed top surfaces of the third impurity region 807 and sidewalls of the second opening 950, and a second conductive layer sufficiently filling the second opening 950 may be formed on the barrier layer. Upper portions of the second conductive layer and the barrier layer may be planarized until a top surface of the second insulating interlayer 940 may be exposed. The planarization process may be performed by a CMP process. In example embodiments, the barrier layer may be formed using a metal or a metal nitride, and the second conductive layer may be formed using a low resistance metal, e.g., aluminum, copper, etc., a metal nitride and/or a metal silicide.
The contact plug 980 may include a barrier layer pattern 960 and a second conductive layer pattern 970. In example embodiments, the contact plug 980 may serve as a bit line contact plug.
Referring to
As illustrated above, various types of layers may be planarized by a CMP process, and the substrate 800 and the structures on the substrate 800 may not be damaged in the CMP process.
The apparatus of surface treatment may be applied to various types of objects of which surfaces need treating. For example, when the object is an artificial diamond, a pad conditioner may be manufactured using the artificial diamond of which a surface has been treated by the apparatus of surface treatment, and a CMP apparatus including the pad conditioner may be used in a planarization process for layers formed in, e.g., DRAM devices, flash memory devices, static random access memory (SRAM) devices, phase-change random access memory (PRAM) devices, magnetic random access memory (MRAM) devices, etc.
Although a few example embodiments have been described, those skilled in the art will readily appreciate that many modifications are possible in the example embodiments without materially departing from the novel teachings and advantages of the present inventive concept. Therefore, it is to be understood that the foregoing is illustrative of various example embodiments and is not to be construed as limited to the specific example embodiments disclosed, and that modifications to the disclosed example embodiments, as well as other example embodiments, are intended to be included within the scope of the appended claims.
| Number | Date | Country | Kind |
|---|---|---|---|
| 10-2012-0114118 | Oct 2012 | KR | national |
| 10-2013-0112340 | Sep 2013 | KR | national |
