Claims
- 1-33. (Cancelled)
- 34. A diffraction grating operable to:
generate from a first light beam having a first wavelength first beamlets each having approximately a first intensity; and generate from a second light beam having a second wavelength a second beamlet having a second intensity and third beamlets each having approximately a third intensity.
- 35. The diffraction grating of claim 34 wherein the second beamlet comprises a beamlet at a center of a pattern formed by the second and third beamlets.
- 36. The diffraction grating of claim 34 wherein the second intensity is greater than the third intensity.
- 37. The diffraction grating of claim 34 wherein a difference between the second and third intensities is related to a difference between the first and second wavelengths.
- 38. The diffraction grating of claim 34 wherein the first beamlets each have approximately the first intensity when a difference between the intensities of the first beamlet having the highest intensity and the first beamlet having the lowest intensity divided by a sum of the highest and lowest intensities equals 0.30 or less.
- 39. The diffraction grating of claim 34 wherein the third beamlets have approximately the third intensity when a difference between the intensities of the third beamlet having the highest intensity and the third beamlet having the lowest intensity divided by a sum of the highest and lowest intensities equals 0.30 or less.
- 40. The diffraction grating of claim 34 wherein:
the first and second light beams respectively carry first and second images; the first beamlets each carry the first image; and the second and third beamlets each carry the second image.
- 41. The diffraction grating of claim 34 wherein:
the first beamlets comprise a 0th-order first beamlet, a first predetermined number of orders of odd-ordered first beamlets, and a second predetermined number of orders of even-ordered first beamlets; the second beamlet comprises a 0th-order second beamlet; and the third beamlets comprise the first predetermined number of orders of odd-ordered third beamlets and the second predetermined number of orders of even-ordered third beamlets.
- 42. The diffraction grating of claim 34 wherein:
the first beamlets comprise a 0th-order first beamlet and a predetermined number of orders of odd-ordered first beamlets; the second beamlet comprises a 0th-order second beamlet; and the third beamlets comprise the first predetermined number of orders of odd-ordered third beamlets.
- 43. The diffraction grating of claim 34 wherein the second and third beamlets are superimposed on the first beamlets.
- 44. A diffraction grating operable to generate from a first light beam having a first wavelength a 0th-order first beamlet having a first intensity, 1st- and 2nd-order first beamlets each having approximately a second intensity that is lower than the first intensity, and higher odd- and even-order first beamlets having respective intensities that decrease from the second intensity with increasing order.
- 45. The diffraction grating of claim 44, further operable to generate from a second light beam having a second wavelength a 0th-order second beamlet having a third intensity, 1st- and 2nd-order second beamlets each having approximately the third intensity, and higher odd- and even-order second beamlets having respective intensities that decrease from the third intensity with increasing order.
- 46. A diffraction grating operable to generate from a first light beam having a first wavelength a 0th-order first beamlet having a first intensity, 1st-order first beamlets each having approximately a second intensity that is lower than the first intensity, 2nd-order first beamlets each having approximately a third intensity that is lower than the second intensity, and higher odd- and even-order first beamlets having respective intensities that decrease from the second and third intensities, respectively, with increasing order.
- 47. The diffraction grating of claim 46, further operable to generate from a second light beam having a second wavelength a 0th-order second beamlet having a fourth intensity, 1st-order second beamlets each having approximately the fourth intensity, 2nd-order second beamlets each having approximately a fifth intensity that is lower than the fourth intensity, and higher odd- and even-order second beamlets having respective intensities that decrease from the fourth and fifth intensities, respectively, with increasing order.
- 48. The diffraction grating of claim 47 wherein the third and fifth intensities are approximately zero.
- 49. A display system, comprising:
a beam generator operable to generate a light beam; and a diffraction grating operable to, receive the light beam, generate beamlets each having approximately a first intensity when the light beam has a first wavelength, and generate one of the beamlets having a second intensity and the remaining beamlets each having approximately a third intensity when the light beam has a second wavelength.
- 50. The display system of claim 49, further comprising a filter located after the diffraction grating and operable to cause the beamlets to have approximately the same intensity when the light beam has the second wavelength.
- 51. The display system of claim 49 wherein the one of the beamlets is located at approximately a center of a pattern formed by the beamlets.
- 52. The display system of claim 49 wherein the second intensity is greater than the third intensity.
- 53. The display system of claim 49 wherein:
the one of the beamlets comprises a 0th-order beamlet; and the remainder of the beamlets comprise a first predetermined number of orders of odd-ordered beamlets and a second predetermined number of orders of even-ordered beamlets.
- 54. The display system of claim 49 wherein:
the one of the beamlets comprises a 0th-order beamlet; and the remainder of the beamlets comprise a predetermined number of orders of odd-ordered first beamlets.
- 55. The display system of claim 49 wherein the diffraction grating is operable to generate the beamlets each having approximately the first intensity when the light beam has only the first wavelength or only one or more wavelengths within in predetermined range from the first wavelength.
- 56. A display system, comprising:
a beam generator operable to generate a light beam; and a diffraction grating operable,
to receive the light beam, and when the light beam has a first wavelength, to generate a 0th-order beamlet having a first intensity, 1st- and 2nd-order beamlets each having approximately a second intensity that is lower than the first intensity, and higher odd- and even-order beamlets having respective intensities that decrease from the second intensity with increasing order.
- 57. The display system of claim 56 wherein the diffraction grating is further operable, when the light beam has a second wavelength, to generate the 0th-order beamlet having a third intensity, the 1st- and 2nd-order beamlets each having approximately the third intensity, and the higher odd- and even-order beamlets having respective intensities that decrease from the third intensity with increasing order.
- 58. The display system of claim 56, further comprising a filter located after the diffraction grating and operable to cause the 0th-, 1st-, and 2nd-order beamlets to each have approximately the same intensity.
- 59. A display system, comprising:
a beam generator operable to generate a light beam; and a diffraction grating operable,
to receive the light beam, and when the light beam has a first wavelength, to generate a 0th-order beamlet having a first intensity, 1st-order beamlets each having approximately a second intensity that is lower than the first intensity, 2nd-order beamlets each having approximately a third intensity that is lower than the second intensity, and higher odd- and even-order beamlets having respective intensities that decrease from the second and third intensities, respectively, with increasing order.
- 60. The display system of claim 59 wherein the diffraction grating is further operable, when the light beam has a second wavelength, to generate the 0th-order beamlet having a fourth intensity, the 1st-order beamlets each having approximately the fourth intensity, the 2nd-order beamlets each having approximately a fifth intensity that is lower than the fourth intensity, and higher odd- and even-order beamlets having respective intensities that decrease from the fourth and fifth intensities, respectively, with increasing order.
- 61. The display system of claim 59, further comprising a filter located after the diffraction grating and operable to cause the 0th- and 1st-order beamlets to each have approximately the same intensity.
- 62. A method, comprising:
diffracting a first wavelength of light into first beamlets each having approximately a first intensity; and simultaneously diffracting a second wavelength of light into a second beamlet having a second intensity and into third beamlets each having approximately a third intensity.
- 63. The method of claim 62, further comprising superimposing the second and third beamlets on the first beamlets to generate a first resulting beamlet having a fourth intensity and second resulting beamlets each having approximately a fifth intensity.
- 64. The method of claim 62 wherein:
the fourth intensity is greater than the first and second intensities; and the fifth intensity is greater than the first and third intensities and less than the fourth intensity.
- 65. The method of claim 63 wherein:
the first resulting beamlet comprises a 0th-order beamlet; and the second resulting beamlets comprise a first predetermined number of orders of odd-ordered beamlets and a second predetermined number of orders of even-ordered beamlets.
- 66. The method of claim 63 wherein:
the first resulting beamlet comprises a 0th-order beamlet; and the second resulting beamlets comprise a predetermined number of orders of odd-ordered beamlets.
- 67. A method, comprising:
receiving a light beam including first and second wavelengths of light; and diffracting the first wavelength into a 0th-order first beamlet having a first intensity, 1st- and 2nd-order first beamlets each having approximately a second intensity that is lower than the first intensity, and higher odd- and even-order first beamlets having respective intensities that decrease from the second intensity with increasing order.
- 68. The method of claim 67, further comprising diffracting the second wavelength into a 0th-order second beamlet having a third intensity and being superimposed on the 0th-order first beamlet, 1st- and 2nd-order second beamlets each having approximately the third intensity and being superimposed on the 1st- and 2nd-order first beamlets, and higher odd- and even-order second beamlets having respective intensities that decrease from the third intensity with increasing order and being superimposed on the higher odd- and even-order first beamlets.
- 69. A method, comprising:
receiving a light beam including first and second wavelengths of light; and diffracting the first wavelength into a 0th-order first beamlet having a first intensity, 1st-order first beamlets each having approximately a second intensity that is lower than the first intensity, 2nd-order first beamlets each having approximately a third intensity that is lower than the second intensity, and higher odd- and even-order first beamlets having respective intensities that decrease from the second and third intensities, respectively, with increasing order.
- 70. The method of claim 69, further comprising diffracting the second wavelength into a 0th-order second beamlet having a fourth intensity and being superimposed on the 0th-order first beamlet, 1st-order second beamlets each having approximately the fourth intensity and being superimposed on the 1st-order first beamlets, 2nd-order second beamlets each having approximately a fifth intensity that is lower than the fourth intensity and being superimposed on the 2nd-order second beamlets, and higher odd- and even-order second beamlets having respective intensities that decrease from the fourth and fifth intensities, respectively, with increasing order and being superimposed on the higher odd- and even-order first beamlets.
RELATED APPLICATIONS
[0001] This application is related to commonly owned U.S. patent application Ser. No. ______ (Atty. Docket No. 1788-9-5), titled “APPARATUS AND METHODS FOR GENERATING MULTIPLE EXIT-PUPIL IMAGES IN AN EXPANDED EXIT PUPIL”, which is incorporated by reference and was filed on the same day as this application.
Provisional Applications (2)
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Number |
Date |
Country |
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60350089 |
Nov 2001 |
US |
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60350089 |
Nov 2001 |
US |
Continuations (2)
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Number |
Date |
Country |
Parent |
10205858 |
Jul 2002 |
US |
Child |
10890501 |
Jul 2004 |
US |
Parent |
10206177 |
Jul 2002 |
US |
Child |
10890501 |
Jul 2004 |
US |