This application claims priority to Japanese Patent Application No. 2012-008546, filed Jan. 19, 2012, the content of which is hereby incorporated herein by reference in its entirety,
The present disclosure relates to an apparatus that is capable of generating embroidery data to sew an embroidery pattern using an embroidery sewing machine, and to a non-transitory computer-readable medium storing computer-readable instructions that cause an apparatus to generate the embroidery data.
A technique is known that creates a so-called openwork pattern (lace embroidery, for example). For example, a method is known in which, after performing embroidery to form a mesh portion on a base fabric that melts in heat or dissolves in water, the openwork pattern is formed by melting or dissolving the base fabric in the mesh portion.
As in the above-described method, when only the base fabric in the mesh portion is dissolved, the base fabric remains as a base underneath the embroidery pattern. Thus, a possibility of shrinkage of the openwork pattern itself is not taken into account. However, if a sewing object, which is the base fabric, completely dissolves, the stitches of the embroidery pattern may shrink and thus an intended design shape may become distorted. Further, even if the sewing object is a material that does not melt in heat or dissolve in water, if the sewing object is a material that shrinks extremely easily, the embroidery pattern may similarly take a design shape that is different from the intended shape, due to shrinkage as a result of sewing.
In either of the above-described cases, in order to inhibit the design shape from becoming distorted due to shrinkage of the stitches, a method may be employed in which embroidery data is generated taking shrinkage into account in advance. Additionally, in a case where the material shrinks extremely easily, a method may be employed in which underlay stitches are sewn in advance. However, in both these methods, if a person generating the data is not familiar with a degree of shrinkage of the sewing object, it is difficult to maintain the intended design shape. Moreover, as the degree of shrinkage varies depending on a type of the sewing object, the person generating the data may not always know the degree of shrinkage of the sewing object at that time.
Various exemplary embodiments of the broad principles derived herein provide an apparatus capable of generating embroidery data that may inhibit distortion of an embroidery pattern due to shrinkage of stitches after sewing, and a non-transitory computer-readable medium storing computer-readable instructions that cause may an apparatus to generate the embroidery data.
Exemplary embodiments herein provide an apparatus that includes a processor and a memory configured to store computer-readable instructions. The computer-readable instructions instruct, when executed, the apparatus to perform the steps of acquiring pattern data, the pattern data being data representing a plurality of stitches that form an embroidery pattern, determining, in a case where the embroidery pattern is to be sewn on a sewing object that is formed of a specific material, whether the embroidery pattern includes at least one of a first area and a second area, based on the acquired pattern data, the first area being an area that includes at least one long stitch each of which is a stitch that is longer than a predetermined length, and the second area being a closed area that is enclosed by a stitch line formed in a line shape by a plurality of stitches and that has a degree of roundness that is lower than a threshold value, generating, in a case where it is determined that the embroidery pattern includes at least one of the first area and the second area, supplemental data that is data representing at least one supplemental stitch each of which is a stitch that connects at least some of a plurality of stitches formed in one of the first area and the second area, and generating, from the pattern data and the generated supplemental data, embroidery data to sew the embroidery pattern and the at least one supplemental stitch.
Exemplary embodiments also provide a non-transitory computer-readable medium storing computer-readable instructions. The computer-readable instructions instruct, when executed, an apparatus to execute steps comprising acquiring pattern data, the pattern data being data representing a plurality of stitches that form an embroidery pattern, determining, in a case where the embroidery pattern is to be sewn on a sewing object that is formed of a specific material, whether the embroidery pattern includes at least one of a first area and a second area, based on the acquired pattern data, the first area being an area that includes at least one long stitch each of which is a stitch that is longer than a predetermined length, and the second area being a closed area that is enclosed by a stitch line formed in a line shape by a plurality of stitches and that has a degree of roundness that is lower than a threshold value, generating, in a case where it is determined that the embroidery pattern includes at least one of the first area and the second area, supplemental data that is data representing at least one supplemental stitch each of which is a stitch that connects at least some of a plurality of stitches formed in one of the first area and the second area, and generating, from the pattern data and the generated supplemental data, embroidery data to sew the embroidery pattern and the at least one supplemental stitch.
Embodiments will be described below in detail with reference to the accompanying drawings in which:
Hereinafter, an embodiment of the present disclosure will be explained with reference to the drawings. First, a configuration of an embroidery data generating apparatus 1 will be explained with reference to
The embroidery data generating apparatus 1 may be an apparatus that is dedicated for use in generating embroidery data or may be a general-purpose device, such as a so-called personal computer. In the present embodiment, the general-purpose device is exemplified. As shown in
The RAM 12 is configured to temporarily store various data. The ROM 13 is configured to store a BIOS and so on. The I/O interface 14 is configured to mediate in the exchange of data. A hard disk device (HDD) 15, a mouse 22 as an input device, a video controller 16, a key controller 17, a CD-ROM drive 18, a memory card connector 23 and an image scanner 25 are connected to the I/O interface 14. Although not shown in
A display 24 as a display device is connected to the video controller 16. A keyboard 21 as an input device is connected to the key controller 17. A CD-ROM 54 can be inserted into the CD-ROM drive 18. For example, at a time of setup of an embroidery data generating program, the CD-ROM 54 storing the embroidery data generating program may be inserted into the CD-ROM drive 18. Then, the embroidery data generating program may be read and stored in a program storage area 153 of the HDD 15. The embroidery data generating program may also be acquired from the external device or via the network and stored in the program storage area 153. A memory card 55 can be connected to the memory card connector 23, and information can be read from and written to the memory card 55.
Storage areas of the HDD 15 will be explained. As shown in
Various setting values to be used in various processing executed by the embroidery data generating apparatus 1 may be stored in the setting storage area 152. A plurality of programs to be executed by the CPU 11, including the embroidery data generating program, may be stored in the program storage area 153. Initial values and setting values of various parameters, for example, may be stored in the other data storage area 154. It should be noted that the embroidery data generating program may be stored in the ROM 13 or may be stored in another storage area (a flash ROM etc).
The embroidery sewing machine 3 will be explained with reference to
An embroidery frame 41 may be disposed above the bed 30. The embroidery frame 41 is configured to hold a work cloth (not shown in the drawings) on which embroidery will be performed. A Y direction drive portion 42 and an X direction drive mechanism (not shown in the drawings) may move the embroidery frame 41 to a position that is indicated by a coordinate value of the XY coordinate system that is specific to the embroidery sewing machine 3. The X direction drive mechanism is housed in a main body case 43. A needle bar 35 on which a sewing needle 44 is mounted and a shuttle mechanism (not shown in the drawings) may be driven in conjunction with the moving of the embroidery frame 41. In this manner, the embroidery pattern is formed on the work cloth. The Y direction drive portion 42, the X direction drive mechanism and the needle bar 35 may be controlled by a control device (not shown in the drawings) that is built into the embroidery sewing machine 3. The control device may be formed of a microcomputer or the like.
A memory card slot 37 may be provided in a side face of the pillar 36 of the embroidery sewing machine 3. The memory card 55 can be inserted into and removed from the memory card slot 37. For example, embroidery data that has been generated by or edited by the embroidery data generating apparatus 1 (refer to
Main processing executed by the embroidery data generating apparatus 1 will be explained with reference to
As shown in
At step S1, the user can select a plurality of patterns. In this case, the CPU 11 acquires a plurality of sets of selected pattern data that correspond to the plurality of selected patterns, respectively, and stores the plurality of sets of selected pattern data in the RAM 12 in an order of selection. Note that the pattern to be sewn by embroidery is not limited to the stored pattern and may be, for example, a pattern for which embroidery data has been stored in the memory card 55 or in the external device. In such a case, the CPU 11 may read the selected pattern data from the memory card 55 or the external device and store the data in the RAM 12.
The CPU 11 performs editing of the selected pattern data (step S2). At step S2, for example, the CPU 11 displays, on the display 24 of the embroidery data generating apparatus 1, an editing screen (not shown in the drawings) that includes an area displaying the selected pattern, various keys to edit the pattern and an Enter key. First, in the area displaying the selected pattern, the selected pattern is displayed in a size and layout determined by initial settings. The editing of the pattern may be, for example, changing the size of the pattern (scaling up, scaling down) and changing the layout of the pattern (moving, or rotating etc.). By selecting the various keys, the user can input commands to edit the selected pattern as desired.
For example, in a case where the user wishes to create a larger pattern by combining a plurality of the stored patterns, the user selects a plurality of the patterns while observing the editing screen, and inputs commands to change the size and the layout of the selected patterns. When the Enter key is selected after editing the patterns as appropriate, the CPU 11 confirms the editing content and corrects the selected pattern data read at step S1 in accordance with the editing content. More specifically, in accordance with the editing content, the CPU 11 changes coordinate values representing needle drop points included in the selected pattern data.
After editing the selected pattern data, the CPU 11 displays, on the display 24, a specification screen (not shown in the drawings) that is used to specify design features of the selected pattern (step S3). Design features of the selected pattern may include, for example, classification of the sewing object, whether or not a supplemental stitch is needed and so on. The classification of the sewing object is whether or not the sewing object is a specific material. The specific material is a material on which stitches of the pattern may easily shrink after sewing. The specific materials may include, for example, a soluble material (a water-soluble material or a heat-soluble material, for example), a material that has a comparatively high shrinkage factor (a knit, for example) and so on.
In a case where the user wishes to remove the sewing object after sewing the selected pattern on the sewing object to obtain an openwork pattern, a soluble material is used as the sewing object. In such a case, when the sewing object is melted or dissolved after the embroidery sewing of the pattern, a degree of shrinkage of the stitches of the pattern is greater than a case in which the sewing object remains. Thus, there is a higher possibility that the shape of the pattern will be distorted. Further, in a case of a material that has a comparatively high shrinkage factor, similarly, there is a possibility that, depending on a type of the pattern, the stitches of the pattern may shrink after sewing and the shape of the pattern may be distorted. The supplemental stitch is a stitch that is added in such cases in order to suppress shrinkage of the stitches and to maintain the shape of the pattern. The supplemental stitch will be explained in detail later.
Next, the CPU 11 determines whether or not the sewing object has been specified as the specific material on the specification screen (step S4). In a case where the sewing object is not the specific material (no at step S4), there is no particular need to add the supplemental stitch and thus the CPU 11 ends the main processing. In a case where the sewing object is the specific material (yes at step S4), the CPU 11 determines whether or not it has been specified that creation of the supplemental stitch is necessary (step S5). Even if the sewing object is the specific material, the user may specify that the creation of the supplemental stitch is not necessary, such as when the user knows from previous experience that the possibility of the shape of the selected pattern becoming distorted is low, etc. In a case where it is specified that the creation of the supplemental stitch is not necessary (no at step S5), the CPU 11 ends the main processing.
On the other hand, in a case where it is specified that the creation of the supplemental stitch is necessary (yes at step S5), if the selected pattern includes an area (at least one of a first area and a second area that will be explained later) that fulfills specific conditions, the CPU 11 performs processing to generate embroidery data to which the supplemental stitch is added (step S6 to step S23).
First, the CPU 11 identifies a total number N of the selected patterns (hereinafter referred to as a number of patterns N) selected at step S1 and for which the corresponding selected pattern data has been acquired and stored in the RAM 12, and stores the number N in the RAM 12 (step S6). The CPU 11 sets a counter value n that is stored in the RAM 12 to an initial value of 1 (step S7). n is a variable that is used to sequentially process the N selected patterns. From the selected pattern data of the N selected patterns acquired and stored in the RAM 12, the CPU 11 selects the embroidery data of an n-th pattern (hereinafter referred to as a pattern n) as a processing target(step S8). Based on the embroidery data of the pattern n, the CPU 11 determines whether or not the first area is included in the pattern n (step S9).
The first area is an area that includes at least one long stitch. A long stitch of the present embodiment is a single stitch that joins two needle drop points and that is longer than a predetermined length L0 (approximately 10 mm, for example). The long stitch is a stitch that may easily shrink when the sewing object dissolves or shrinks severely. Therefore, in the present embodiment, the long stitch is set as a target to which the supplemental stitch is added.
For example, from the coordinate values of the needle drop points of the embroidery data, the CPU 11 calculates a distance between two successive needle drop points. By determining whether or not the calculated distance is greater than the predetermined length L0, the CPU 11 may determine whether or not the corresponding stitch is the long stitch. In the present embodiment, in a case where another long stitch that is longer than the predetermined length L0 is arranged within a predetermined distance D (equal to or less than 5 mm, for example) from a given long stitch, the CPU 11 regards these long stitches as one group, and identifies the first area. Thus, the first area is identified as an area that includes at least one long stitch.
Of a pattern 60 shown in
With respect to the pattern 60 shown in
As shown in
For example, the CPU 11 may set the number of the at least one supplemental stitch by referring to a table (not shown in the drawings) that is stored in advance in the setting storage area 152 of the HDD 15. In the table, the number of supplemental stitches may be defined for each of ranges of lengths of the long stitch. For example, it may be defined that the number of supplemental stitches is one in a case where the length of the long stitch is equal to or longer than 10 mm and less than 15 mm, and the number of supplemental stitches is two in a case where the length is equal to or longer than 15 mm and less than 20 mm. However, these numerical values are illustrative examples, and the range and the number of supplemental stitches can be changed as appropriate. It should be noted that in a case where a plurality of the long stitches having different lengths are included in the first area, the above-described number of the at least one supplemental stitch may be set while taking the longest long stitch as a reference.
Further, the CPU 11 may set a position of the supplemental stitch in the following manner, for example. In a case where the number of the supplemental stitches is one, the CPU 11 may arrange supplemental stitches 611, 621 and 631 that intersect with long stitches of the first areas R1 to R3 in center positions of the long stitches, respectively, as shown in
It is preferable that an angle of the supplemental stitch with respect to the long stitch be an angle other than 90 degrees (approximately 60 degrees, for example), as almost no effect of suppressing the shrinkage of the long stitch is obtained with an angle of 90 degrees. Further, a length (5 mm to 10 mm, for example) that is set in advance and stored in the setting storage area 152 of the HDD 15 may be used as a length of the supplemental stitch. Alternatively, a length specified by the user may be used. Note that it is preferable that the length of the supplemental stitch be such that the supplemental stitch intersects with all of the at least one long stitch within the first area.
After the CPU 11 sets the number and the position of the at least one supplemental stitch in this manner, the CPU 11 generates the supplemental data by calculating the coordinate values of the needle drop points to form the at least one supplemental stitch and stores the supplemental data in the RAM 12 (step S106). Note that the supplemental data of the at least one supplemental stitch that is generated in the first area processing is data representing at least one stitch, and includes the coordinate values of at least two needle drop points. For example, the supplemental stitch 611 shown in
When the CPU 11 ends the generation of the supplemental data for the area m, the CPU 11 adds 1 to the counter value m stored in the RAM 12 (step S107) and determines whether or not the counter value m has exceeded the number of first areas M (step S108). For as long as the counter value m does not exceed the number of first areas M (no at step S108), an unprocessed first area remains. Thus, the CPU 11 returns the processing to step S103 and repeats the processing to arrange the supplemental stitch with respect to the long stitch within the next area m, and generate the supplemental data (step S103 to step 5108). In the example of the pattern 60 shown in
As shown in
C=(4π×S)/L2
The closer the embroidery pattern is to a circular shape, namely, the closer the degree of roundness is to 1, the less there is distortion of the shape, when shrinkage occurs. In contrast, the further the embroidery pattern differs from a circular shape, namely, the smaller the degree of roundness becomes than 1, the larger the distortion when shrinkage occurs. Thus, the stitch line that encloses the area having a comparatively low degree of roundness is formed of stitches that may easily shrink when the sewing object is dissolved or shrinks severely. Therefore, in the present embodiment, such a stitch line is set as a target to which the supplemental stitch is added.
Note that in the present embodiment, the stitch line is not just a stitch line that is formed of a plurality of stitches arranged in a single line, such as running stitches, but also includes cases in which zigzag stitches, or decorative type stitches are arranged in a line shape along a single line. For example, in a pattern 70 shown in
In a case where there is a closed area having a lower degree of roundness than the threshold value (0.5, for example) in the pattern n, it is determined at step S11 that the second area is included in the pattern n (yes at step S11). The threshold value may be set in advance and stored in the HDD 15, for example, or may be a value that is specified by the user. It should be noted that, as in the pattern 70 shown in
As shown in
The CPU 11 sets a minimum rectangle S0 that contains the area b (step S204) and identifies a longitudinal direction of the minimum rectangle S0 as a longitudinal direction of the area b (step S205). In the example of the pattern 70 shown in
The CPU 11 performs division of the area b using the following method, for example. The CPU 11 first equally divides up the minimum rectangle S0 into the k divided areas in the longitudinal direction. Specifically, the CPU 11 divides up the area b into the k divided areas, using a division line of the minimum rectangle S0, namely, a boundary line between two adjacent areas among the k divided areas as a division line of the area b. In the example of the pattern 70 shown in
The CPU 11 calculates a degree of roundness of each of the k divided areas, and determines whether or not the degrees of roundness of all the divided areas are equal to or more than the above-described threshold value (step S208). In a case where the degrees of roundness of all of the divided areas are not equal to or more than the threshold value (no at step S208), the CPU 11 adds 1 to the counter value k (step S209). The CPU 11 then divides the area b into a number of divided areas that is increased by one compared to the number of divided areas in the previous round (step S207). The CPU 11 repeats the processing until the degrees of roundness of all the divided areas are equal to or more than the threshold value (step S207 to step S209). In a case where the degrees of roundness of all the divided areas are equal to or more than the threshold value (yes at step S208), the CPU 11 arranges a supplemental stitch on each division line of the area b (S211). Specifically, the CPU 11 arranges the supplemental stitch on each boundary line between two adjacent areas among the k divided areas, the supplemental stitch connecting to the stitch line of the area b at two points at both ends of the boundary line.
The CPU 11 generates the supplemental data by calculating coordinate values of needle drop points to form the supplemental stitch, and stores the supplemental data in the RAM 12 (step S212). Note that, in the second area processing of the present embodiment, the CPU 11 generates supplemental data of the supplemental stitch that is the same type as the type of the stitches forming the stitch line of the area b and identified at step S203. Thus, it is possible to form the supplemental stitch that does not appear incongruous with respect to the original pattern corresponding to the area b. After the generation of the supplemental data for the area b, the CPU 11 adds 1 to the counter value b stored in the RAM 12 (step S213). The CPU 11 determines whether or not the counter value b exceeds the number of second areas B identified at step S201 (step S214). In a case where the counter value b does not exceed the number of second areas B (no at step S214), an unprocessed second area remains. Therefore, the CPU 11 returns the processing to step S203 and repeats the processing to divide the next area b, arrange the supplemental stitch and generate the supplemental data (step S203 to step S214).
When the second area R5 corresponding to the pattern 70 shown in
As shown in
More specifically, the CPU 11 sets a sewing order of the needle drop points included in the embroidery data and the supplemental data of the pattern n, such that, in the sewing order, a first needle drop point among the needle drop points of the supplemental stitches continues subsequently to a last needle drop point among the needle drop points of the pattern n. The CPU 11 thus unifies the embroidery data of the pattern n and the supplemental data as one set of embroidery data. When the sewing is performed in accordance with the resulting embroidery data, the supplemental stitches are sewn after the pattern n. However, the sewing order of the supplemental stitches is not limited to this example, and the supplemental stitches may be sewn before the pattern n. When the CPU 11 finishes generating the embroidery data, the CPU 11 advances the processing to step S23. In a case where the supplemental data is not generated (no at step S21), the CPU 11 advances the processing to step S23.
At step S23, the CPU 11 adds 1 to the counter value n that identifies the selected pattern as the processing target, and sets the next selected pattern in the order as the processing target. The CPU 11 determines whether or not the counter value n exceeds the number of patterns N (step S24). In a case where the counter value n does not exceed the number of patterns N (no at step S24), an unprocessed selected pattern remains. Thus, the CPU 11 returns the processing to step S8 and performs processing to generate the supplemental data as necessary with respect to the next pattern n, as described above (step S8 to step S24). In a case where the counter value n exceeds the total number of patterns N (yes at step S24), the CPU 11 ends the main processing shown in
As described above, according to the embroidery data generating apparatus 1 of the present embodiment, in a case where the pattern that is to be sewn on a sewing object formed of a specific material includes at least one of the first area, which includes at least one long stitch, and the second area, which has a degree of roundness lower than the threshold value, embroidery data to which supplemental data is added is generated. The supplemental data is the data of at least one supplemental stitch that connects at least some of a plurality of stitches formed in the first area or the second area (namely, the long stitch or a stitch line enclosing the second area). Thus, even if the sewing object is dissolved or shrinks severely after the pattern has been formed, due to the supplemental stitch, it is possible to inhibit the long stitch or the stitch line enclosing the second area from shrinking and the shape of the pattern from being distorted.
More specifically, in the case of the first area, the number and position of the at least one supplemental stitch that intersects with the long stitch can be appropriately set in accordance with the length of the long stitch. As a result, it is possible to reliably inhibit the shape of the long stitch from being distorted. Further, in the case of the second area, the second area is divided into a plurality of divided areas each having the degree of roundness that is equal to or more than the threshold value, and the supplemental stitch that connects to the stitch line enclosing the second area is formed on the boundary line. Thus, it is possible to efficiently arrange the supplemental stitch that inhibits the shape of the stitch line from being distorted.
Various modifications can be made to the above-described embodiment. For example, in the above-described embodiment, the soluble material is exemplified by the water-soluble material and the heat-soluble material. However, the soluble material may be another material that is soluble in a type of liquid. In such a case, it is necessary for the liquid to be a type in which an embroidery thread does not dissolve.
The main processing of the above-described embodiment is an example in which the supplemental data of the supplemental stitch is generated in a case where the pattern n includes at least one of the first area and the second area. However, in the main processing, the CPU 11 may, for example, generate the supplemental data for the supplemental stitch that intersects with the long stitch when the pattern includes the first area only. Specifically, the CPU 11 need not perform the processing from step S11 to step S20 relating to the second area. The number and arrangement position of the at least one supplemental stitch that intersects with the long stitch may be set by a method that is different form the method of the above embodiment. For example, the number and position specified by the user may be used. Alternatively, the number and position of the supplemental stitch may be set uniformly, irrespective of the length of the long stitch.
Further, in the main processing, the CPU 11 may generate the supplemental data of the supplemental stitch that connects the two points on the stitch line enclosing the second area in a case where the pattern includes the second area only. Specifically, the CPU 11 need not perform the processing from step S9 to step S10 relating to the first area. The number and the arrangement position of the at least one supplemental stitch need not be set by using the minimum rectangle and dividing the pattern into the plurality of divided areas. For example, the CPU 11 may divide up the pattern using division lines specified by the user. In such a case, the CPU 11 may arrange the supplemental stitch on the boundary line between the divided areas at a point in time at which the degree of roundness of each of the divided areas becomes equal to or more than the threshold value. The CPU 11 may take, as the position of the supplemental stitch, a position that is specified by the user while using the boundary line as a reference. Furthermore, the type of the supplemental stitch in the second area processing need not be the same type of stitch as the type of the stitch line enclosing the second area.
In the above-described embodiment, in a case where the sewing object is the specific material and the pattern includes at least one of the first area and the second area, the CPU 11 generates the supplemental data in the first area processing and the second area processing only if the user specifies that it is necessary to generate the supplemental stitch. In such a case, the CPU 11 can perform the processing efficiently in accordance with the wishes of the user. However, the CPU 11 may always generate the supplemental data in a case where the sewing object is the specific material and the pattern includes at least one of the first area and the second area. Specifically, the determination processing at step S5 of the main processing, which is performed in accordance with the user specification, may be omitted.
The apparatus and methods described above with reference to the various embodiments are merely examples. It goes without saying that they are not confined to the depicted embodiments. While various features have been described in conjunction with the examples outlined above, various alternatives, modifications, variations, and/or improvements of those features and/or examples may be possible. Accordingly, the examples, as set forth above, are intended to be illustrative. Various changes may be made without departing from the broad spirit and scope of the underlying principles.
Number | Date | Country | Kind |
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2012-008546 | Jan 2012 | JP | national |