Apparatus for application of a chemical process on a component surface

BACKGROUND OF THE INVENTION

The present invention relates to an apparatus and method for application of a chemical process on a component surface. More specifically, the invention provides for applying a chemical process to a copper alloy plunger that is utilized in a fiber optic repeater to oxidize a portion of the surface of the plunger. The plunger is ultimately bonded with a polyethylene at the oxidation interface. The oxidized surface increases the bonding strength between the copper alloy plunger and the polyethylene.

Undersea fiber optic communication systems carry ever-increasing amounts of information. These systems are installed in-place under the oceans of the world and carry a large majority of the information that is transmitted between the world's continents. These fiber optic transmission systems remain in-place on the bottom of the ocean for years at a time.

Long distance undersea fiber optic transmission systems include fiber optic repeaters at regular intervals that regenerate the optical signals that are received at the repeaters so that the transmitted signal does not become so attenuated during its transmission that it cannot be interpreted at the receiving station. Because these repeaters are installed under the sea and rest on the sea bottom, these repeaters must withstand extreme pressures.

As can be seen in

FIG. 1

, typically the repeater

100

is formed as a cylindrical, metal container. An input fiber optic cable

10

delivers fiber optic signals into repeater

100

and an output fiber optic cable

120

carries the regenerated optical signals from repeater

100

. Because the repeater is under extreme pressure when installed on the sea floor, a seal must be provided at the point of entry for cables

110

,

120

into repeater

100

. The seal is circular in cross-section and defines a central aperture that extends therethrough. Fiber optic cables

110

and

120

are inserted through the apertures in the seals and enter repeater

100

.

FIG. 1

illustrates input seal

130

and output seal

140

. Since each seal is similarly formed, only seal

130

will be discussed. Seal

130

is comprised of a copper alloy plunger

132

and a polyethylene portion

134

. Copper alloy plunger

132

is bonded to polyethylene portion

134

through well-known methods. In order to increase the bonding strength between plunger

132

and polyethylene portion

134

, a chemical process is applied to the surface

132

A of plunger

132

that bonds with polyethylene portion

134

. The chemical process oxidizes surface

132

A of the copper alloy plunger.

However, there are problems with the currently known method of applying the chemical process. Currently, each copper alloy plunger individually receives the chemical process. The copper alloy plunger is masked, i.e., the surfaces that are not to receive the chemical treatment are covered such that only the surfaces that are to receive the chemical treatment are exposed, by a process that is time consuming. Additionally, once each plunger is masked, each plunger individually receives the chemical treatment. There is no known apparatus or method for simultaneously chemically treating multiple masked plungers. As a result, a great amount of time is required to chemically treat a plurality of plungers. It is only possible to mask and chemically treat approximately 6 plungers per day by utilizing currently known methods.

Additionally, problems exist with the presently known method for applying the chemical treatment. As stated above, the chemical treatment process oxidizes, and thus discolors, the treated surface of the copper plunger. Typically, in other commercial and private uses of oxidized components, the purpose of the oxidation process is solely to discolor the surface of the component for decorative purposes, e.g., ornamental household fixtures. Therefore, the microscopic properties, e.g., the chemical and structural composition, of the oxidized surface are not important; rather, only the aesthetic appearance of the oxidized surface is of interest.

Whereas presently known methods and apparatuses may be adequate for oxidizing surfaces where the success or failure of the treatment is determined by aesthetic criteria, these methods and apparatuses are not able to provide an oxidized surface that is sufficient to serve as a mating surface that can provide a strong bond to a polyethylene structure. Because the copper alloy plungers must bond with the polyethylene at the oxidized surface and because the bond between the two surfaces must withstand extreme pressures, it is imperative that a relatively uniform oxidized bonding surface be formed on the copper alloy plunger.

Therefore, it is desirable to provide an improved apparatus and method for application of a chemical process on a component surface.

SUMMARY OF THE INVENTION

In accordance with the present invention, an apparatus and method for application of a chemical process on a component surface is provided. In an embodiment for an apparatus for preparing a component surface for application of a chemical process, the apparatus includes a base, an o-ring retainer, an o-ring, a boot, and a retention ring. The component is mounted on the base. The o-ring is positioned on the o-ring retainer and the o-ring retainer is inserted through an aperture in the component and mated with the base. The assembled component, base, o-ring retainer, and o-ring are positioned within the boot. The retention ring is positioned around the boot. In an embodiment for a method for applying a wet chemical solution to the component surface to oxidize the component surface, where the wet chemical solution is contained within a tank, the method steps include immersing the component in the wet chemical solution, heating the wet chemical solution with a heater, and positioning the surface of the component in a horizontal, upward facing position and within the tank such that a baffle is disposed between the surface and the heater.

BRIEF DESCRIPTION OF THE DRAWINGS

The various features of the invention will best be appreciated by simultaneous reference to the description which follows and the accompanying drawings, in which:

FIG. 1

illustrates a fiber optic repeater with an input fiber optic cable and an output fiber optic cable each entering the repeater through a seal;

FIG. 2

is an exploded, perspective view of an embodiment for an apparatus for preparing a copper alloy plunger for application of a chemical process in accordance with the present invention;

FIG. 3

is a side view of the copper alloy plunger;

FIG. 4

is a cross-sectional view of the copper alloy plunger of

FIG. 3

as taken along line

4

—

44

of

FIG. 3

;

FIG. 5

is a side view of the plunger base;

FIG. 6

is a cross-sectional view of the plunger base of

FIG. 5

as taken along line

6

—

6

of

FIG. 5

;

FIG. 7

is a side view of the plunger base and copper alloy plunger in an assembled configuration;

FIG. 8

is a perspective view of the o-ring retainer;

FIG. 9

is a side view of the o-ring retainer with an o-ring positioned thereon;

FIG. 10

is a side view of the assembled o-ring retainer and o-ring with the retainer tool coupled to the o-ring retainer;

FIG. 11

is a perspective view of an embodiment for a tightening plate;

FIG. 12

is a side view of the plunger base, plunger, o-ring retainer, and retainer tool as positioned on the tightening plate;

FIG. 13

is a side view of the plunger base, plunger, and o-ring retainer in an assembled configuration;

FIG. 14

is a cross-sectional view of the assembly of

FIG. 13

as taken along line

14

—

14

of

FIG. 13

;

FIG. 15

is a side view of the plunger base, plunger, and o-ring retainer assembly as it is about to be inserted into the rubber boot;

FIG. 16

is a side view of a masked plunger;

FIG. 17

is a cross-sectional view of the masked plunger of

FIG. 16

as taken along line

17

—

17

of

FIG. 16

;

FIG. 18

is a side view of the masked plunger and the retainer ring;

FIG. 19

is an exploded perspective view of the masked plunger, holding fixture, and fixture platform;

FIG. 20

is a perspective view of an embodiment of a positioning plate in accordance with the present invention;

FIG. 21

is a side view of a masked plunger inserted within the positioning plate with the retainer ring positioned on the masked plunger;

FIG. 22

is a side view of a plurality of masked plunger as fixtured within the holding fixture;

FIG. 23

is a partial cut-away view of a chemical treatment process wire rack with a plurality of holding fixtures, each containing a plurality of masked plungers, secured within the wire rack for application of the chemical process;

FIG. 24

is a perspective view of an alternative embodiment for the tightening plate;

FIG. 25

is a cross-sectional view of an embodiment for an oxidation tank assembly; and

FIG. 26

is a graph of oxidation surface thickness versus time of treatment.

DETAILED DESCRIPTION

FIG. 2

illustrates a first embodiment for an apparatus

200

for preparing a copper alloy plunger for application of a chemical process. Whereas the detailed description will describe the present invention in an embodiment for preparing a copper alloy plunger for application of a wet chemical process, the present invention is not limited to this embodiment. For example, the component that is prepared for receiving the chemical process could be comprised of ceramic, plastic, or organic materials, as well as other types of materials.

As can be seen in FIG.

2

and as will be described in more detail later in this specification, copper alloy plunger

210

is mounted onto plunger base

220

. O-ring

230

is positioned onto o-ring retainer

240

where the assembled o-ring retainer

240

and o-ring

230

is then positioned through copper alloy plunger

210

and threadedly received within plunger base

220

. Rubber boot

260

receives within it the copper alloy plunger

210

and plunger base

220

assembly. Retention ring

270

is positioned around rubber boot

260

after copper alloy plunger

210

and plunger base

220

have been positioned within rubber boot

260

. Retainer tool

250

is operably couplable with o-ring retainer

240

. When copper alloy plunger

210

, plunger base

220

, o-ring retainer

240

, o-ring

230

, and rubber boot

260

have been configured as described above, a masked copper alloy plunger has been assembled.

As will also be further explained later in this specification, the masked copper alloy plunger's upper beveled surfaces are exposed for application of the wet chemical process. Thus, the masking components mask all of the surfaces of the copper alloy plunger except those surfaces which are to receive the wet chemical process. Thus, the mask protects the surfaces of the copper alloy plunger that are not to receive the wet chemical process and leaves exposed the surfaces of the copper alloy plunger that are to receive the wet chemical process.

Also illustrated in

FIG. 2

is an embodiment for a masked plunger holding fixture

300

. The masked plunger holding fixture

300

defines a plurality of apertures therein which receive within them a masked plunger. After the masked plungers are secured within masked plunger holding fixture

300

, the entire assembly is placed into an apparatus where the wet chemical process may be applied to copper alloy plungers

210

. Thus, holding fixture

300

provides for application of the wet chemical process to a plurality of masked plungers in one procedure.

As will be further explained later in this specification, holding fixture

300

is comprised of a first half portion and a second half portion where each of the halves define one half of each of the plurality of masked plunger apertures. Securement members

330

join the two halves of holding fixture

300

together which in-turn securely fastens the masked plungers within holding fixture

300

. Prior to positioning the masked plungers within holding fixture

300

, holding fixture

300

is placed onto fixture platform tool

360

. Positioning holding fixture

300

onto fixture platform tool

360

assists in the positioning of the masked plungers within holding fixture

300

, as will also be further explained later.

FIGS. 3 and 4

illustrate copper alloy plunger

210

. Plunger

210

is circular in cross-section and defines a central aperture

218

therethrough. Plunger

210

includes a seawater end

212

and an oxidation end

214

. Seawater end

212

is that portion of plunger

210

that is exposed to the sea when plunger

210

has been installed within a repeater and which does not receive the wet chemical process. Oxidation end

214

is that portion of plunger

210

that serves as the interface with the polyethylene structure within the seal assembly and is thus that end of plunger

210

that is oxidized through the wet chemical process. The oxidation end

214

, or top end, of plunger

210

includes an outside beveled surface

215

, a top surface

217

, and an inside beveled surface

216

. Outside beveled surface

215

extends completely around an outer circumference of plunger

210

and inside beveled surface

216

extends completely around an inner circumference of plunger

210

.

FIG. 5

illustrates plunger base

220

. Plunger base

220

includes a seat portion

221

and a mounting member

224

. Both scat portion

221

and mounting member

224

are circular in cross-section. Seat portion

221

defines slot

222

which extends completely through seat portion

221

. Plunger base

220

is comprised of a material that will not degrade from contact with the chemical treatment and may be manufactured from, e.g.,

316

stainless steel.

FIG. 6

provides a cross-sectional view of plunger base

220

. As can be seen in

FIG. 6

, mounting member

224

of plunger base

220

defines a central bore

225

which extends therethrough. Seat

221

further defines a threaded bore

223

which extends through the upper portion of seat

221

, i.e., that portion of seat

221

that does not define slot

222

. Within central bore

225

of mounting member

224

, seat

221

defines a shoulder

221

A.

FIG. 7

illustrates an assembly where plunger

210

has been mounted onto plunger base

220

. As can be seen, the outer diameter of copper alloy plunger

210

is the same as the outer diameter of plunger base

220

. When copper alloy plunger

210

is mounted onto plunger base

220

, mounting member

224

of plunger base

220

is received within central aperture

218

that is defined by copper alloy plunger

210

. In

FIG. 7

mounting member

224

is shown in phantom. The outside diameter of mounting member

224

is just sightly smaller than the diameter of central aperture

218

such that mounting member

224

is snugly received within central aperture

218

.

When copper alloy plunger

210

has been mounted onto plunger base

220

, the top end

225

of mounting member

224

is positioned below a lower end of the inside beveled surface

216

of copper alloy plunger

210

. Thus, the entire inside beveled surface of copper alloy plunger

210

is not in contact with plunger base

220

and a portion of the structure of copper alloy plunger

210

which defines central aperture

218

, and which is below the lower end of inside beveled surface

216

, is also not in contact with plunger base

220

and are thus exposed surfaces with respect to plunger base

220

.

As can also be seen in

FIG. 7

, the entire oxidation end

214

of copper alloy plunger

210

is not in contact with plunger base

220

. Thus, outside beveled surface

215

is also an exposed surface when copper alloy plunger

210

is mounted onto plunger base

220

.

FIG. 8

illustrates an embodiment for o-ring retainer

240

. As can be seen, o-ring retainer

240

includes a threaded stem portion

242

, an o-ring mounting structure

244

, and a tool receiving structure

246

. Tool receiving structure

246

defines a central bore

247

that extends therethrough. Central bore

247

narrows at its lower end, i.e., that end closest to o-ring mounting structure

244

. Tool receiving structure

246

also defines a retainer tool locking aperture

248

, the purpose of which will be described later, and four drain holes

249

, of which only two are visible in FIG.

8

. The four drain holes

249

are equally spaced around the circumference of tool receiving structure

246

at the lower end of the tool receiving structure and extend completely through the wall of tool receiving structure

246

where they intersect with the narrow-diameter portion of bore

247

. The purpose of the narrow portion of bore

247

is to funnel any liquid that enters bore

247

as a result of application of the wet chemical process to the lower portion of bore

247

such that it may be drained from bore

247

, and thus o-ring retainer

240

, through drain holes

249

.

As was mentioned previously, o-ring retainer

240

receives an o-ring on it. The o-ring retainer

240

and o-ring are then mated with the assembled copper alloy plunger

210

and plunger base

220

.

FIG. 9

illustrates the positioning of o-ring

230

on o-ring retainer

240

. As can be seen, o-ring

230

is positioned on an upper end of o-ring mounting structure

244

. As can also be seen in

FIG. 9

, the outer diameter of o-ring

230

is generally the same diameter as that of tool receiving structure

246

of o-ring retainer

240

. As will be further explained and illustrated later in

FIGS. 13 and 14

o-ring mounting structure

244

and threaded stem

242

are received within central aperture

218

of copper alloy plunger

210

. Threaded stem

242

is received within threaded bore

223

of plunger base

220

. A portion of o-ring mounting structure

244

is received within central bore

225

of mounting member

224

of plunger base

220

. Bottom surface

245

of o-ring mounting structure

244

engages with shoulder

221

A of plunger base

220

to prevent further insertion of o-ring mounting structure

244

within mounting member

224

.

When o-ring retainer

240

is positioned through central aperture

218

of copper alloy plunger

210

and into plunger base

220

, o-ring

230

is positioned within central aperture

218

of copper alloy plunger

210

at a location such that the upper end of o-ring

230

is positioned just slightly below the lower end of inside beveled surface

216

. As such, o-ring

230

is positioned 0.025 inches±0.010 inches below the lower end of inside beveled surface

216

. Thus, as can be understood and as will be further discussed in connection with

FIG. 14

, when o-ring retainer

240

has been mated with plunger

210

and plunger base

220

, the assembled structures of mounting structure

224

of plunger base

220

and o-ring

230

will leave the inside beveled surface

216

and a slight portion of the structure of copper alloy plunger

210

which defines central aperture

218

, as described above, as the only inside surfaces of plunger

210

that are exposed.

FIG. 10

illustrates the assembled o-ring retainer

240

and o-ring

230

with the retainer tool

250

inserted therein.

FIG. 10

illustrates one embodiment for retainer tool

250

, however, the present invention is not limited to any particular embodiment for retainer tool

250

. The purpose of retainer tool

250

is to engage with o-ring retainer

240

such that o-ring retainer

240

may be moved, positioned, and rotated such that it can be threadedly received within plunger base

220

. Thus, retainer tool

250

provides for easy manipulation of o-ring retainer

240

by an operator.

In the embodiment of

FIG. 10

for retainer tool

250

, retainer tool

250

includes a handle portion

252

, a stem

254

, and an actuator

256

. Actuator

256

is slidably movable within handle portion

252

and stem

254

. Actuator

256

may be moved in the directions as illustrated by the arrows in FIG.

10

. Actuator

256

cooperates with ball joint

258

that is carried in the lower end of stem

254

, i.e., that portion of stem

254

that is inserted within o-ring retainer

240

. Ball joint

258

is carried within stem

254

and is biased outward from stem

254

through apertures that are included in the lower end of stem

254

. When actuator

256

, which is biased into its upper most position with respect to handle portion

252

, is inserted further into handle portion

252

, the portion of actuator

256

that cooperates with ball joint

258

allows the biasing force that biases ball joint

258

outward from the aperture in stem

254

to be relaxed. Thus, the ball joint can be retracted within stem

254

. With the actuator

256

and the ball joint

258

retracted within stem

254

, retainer tool

250

, and thus stem

254

, may be rotated within o-ring retainer

240

. When ball joint

258

aligns with retainer tool locking aperture

248

and the pressure on actuator

256

is released, ball joint

258

is again biased outward from stem

254

where it is received within aperture

248

of o-ring retainer

240

. Thus, through the interaction of ball joint

258

with aperture

248

of o-ring retainer

240

, retainer tool

250

is coupled to o-ring retainer

240

.

As can be understood, if an operator desires to release retainer tool

250

from o-ring retainer

240

, the operator would depress actuator

256

which would in-turn remove the outward biasing force applied to ball joint

258

. Ball joint

258

may then be retracted from aperture

248

, thus allowing retainer tool

250

to be removed from o-ring retainer

240

. Again, the embodiment of

FIG. 10

for retainer tool

250

is only one of a variety of different embodiments that may be utilized for providing a tool for manipulating o-ring retainer

240

and the present invention is not limited to any particular embodiment for retainer tool

250

.

As was mentioned previously, o-ring retainer

240

is positioned through copper alloy plunger

210

and threaded into plunger base

220

. In order to restrain plunger base

220

from rotating when threading o-ring retainer

240

into plunger base

220

, a tightening plate

280

may be utilized in the present invention.

FIG. 11

illustrates an embodiment for tightening plate

280

. As can be seen in

FIG. 11

, tightening plate

280

includes a base

282

from which extends tongue

284

. Tongue

284

is an elongated member that extends from base

282

and along the entire width of base

282

, in this embodiment.

As can be understood, and as illustrated in

FIG. 12

, plunger base

220

is positioned onto tightening plate

280

prior to threading o-ring retainer

240

through copper alloy plunger

210

and into plunger base

220

. Slot

222

, which is defined by seat

221

of plunger base

220

, receives within it tongue

284

of tightening plate

280

. Thus, as o-ring retainer

240

is threaded into plunger base

220

, the interaction of plunger base

220

with tightening plate

280

will prevent plunger base

220

from rotating.

FIGS. 13 and 14

illustrate an assembled configuration for o-ring retainer

240

, copper alloy plunger

210

, and plunger base

220

. As was discussed previously, o-ring retainer

240

is received within central aperture

218

of plunger

210

and is threaded into bore

223

which is defined by seat

221

of plunger base

220

. A lower portion of o-ring mounting structure

244

is received within central bore

225

of mounting member

224

of plunger base

220

. Bottom surface

245

of o-ring mounting structure

244

engages with shoulder

221

A of seat

221

to prevent further insertion of o-ring retainer

240

into plunger base

220

.

As can also be seen in

FIG. 14

, o-ring

230

is positioned between the upper surface of mounting member

224

and the lower surface of the structure which defines tool receiving structure

246

of o-ring retainer

240

and within central aperture

218

of plunger

210

. As mentioned previously, the upper end of seal

230

is positioned approximately 0.025 inches±0.010 inches below the lower end of inside beveled surface

216

of copper alloy plunger

210

. Thus, the only interior surfaces that are exposed on plunger

210

is the inside beveled surface

216

and that slight portion of the surface defining central aperture

218

that is located below the lower end of inside beveled surface

216

. Thus, o-ring

230

establishes a liquid seal and an inside masking boundary for copper alloy plunger

210

. The liquid seal established by o-ring

230

prevents any liquid as applied during the wet chemical treatment process from contacting the interior surfaces of plunger

210

except those that are deliberately exposed, as described above.

As can be further seen in

FIG. 14

, and as discussed previously, the entire outside beveled surface

215

and the entire top surface

217

of plunger

210

are not in contact with any surfaces and are thus exposed surfaces.

FIGS. 15 through 17

illustrate the o-ring retainer

240

, copper alloy plunger

210

, and plunger base

220

assembly as it is received within rubber boot

260

. Rubber boot

260

is a hollow structure that includes a circumferential rubber wall and a rubber base. The assembled o-ring retainer

240

, copper alloy plunger

210

, and plunger base

220

is positioned within boot

260

. As can be seen in

FIGS. 16 and 17

, when the assembly is positioned within boot

260

, oxidation end

214

of plunger

210

extends above a top edge

261

of boot

260

, and is therefore exposed from boot

260

. As such, outside beveled surface

215

, top surface

217

, and inside beveled surface

216

, along with the additional structure on the interior of copper alloy plunger

210

as described earlier, are exposed from boot

260

. As such, boot

260

masks the outer surface of copper alloy plunger

210

such that the surface covered by boot

260

will not be subject to the wet chemical process. As with the positioning of o-ring

230

with respect to inside beveled surface

216

, top

261

of rubber boot

260

is positioned a distance of approximately 0.025 inches±0.010 inches below the lower end of outside beveled surface

215

.

For reference purposes for the remainder of this specification, the assembly of the o-ring retainer

240

, o-ring

230

, copper alloy plunger

210

, plunger base

220

, and rubber boot

260

will be referred to as a masked plunger

400

. As was described previously, and as can be understood, masked plunger

400

provides for only exposing those surfaces of copper alloy plunger

210

which are to receive the wet chemical treatment process thereon.

FIG. 18

illustrates retainer ring

270

. Retainer ring

270

can be manufactured from stainless steel and is a circular ring that is positioned around rubber boot

260

. Retainer ring

270

is discontinuous in its circumference and includes complementary surfaces at ends

272

and

274

. The complementary surfaces are formed in a v-shaped configuration such that as the retainer ring

270

is compressed around rubber boot

260

, the complementary surfaces may align. Retainer ring

270

is provided to support masked plunger

400

and provide additional strength to masked plunger

400

as it is received within masked plunger holding fixture

300

, as will be further explained later. The purpose for the discontinuity in the circumference of retainer ring

270

is to provide for being able to position retainer ring

270

around boot

260

but yet being able to compress retainer ring

270

when the masked plunger is securely received within holding fixture

300

. As can also be seen in

FIG. 18

, apertures

276

and

278

are defined by retainer ring

270

. The purpose of apertures

276

and

278

are to receive prongs from a tool that may be used to grip retainer ring

270

and place retainer ring

270

over boot

260

.

The wall structure that comprises retainer ring

270

may be formed with a uniform interior surface, i.e., that surface that contacts rubber boot

260

, such that the entire surface area of the interior surface contacts rubber boot

260

. Alternatively, the interior surface may be formed in a u-shaped configuration such that only the upper-most most and lower-most surface areas of the interior surface contact the rubber boot

260

. Forming the interior surface of retainer ring

270

in this configuration may provide for increased pressure at the contacting surfaces when the retainer ring

270

is compressed around rubber boot

260

.

As was described previously, and as is illustrated in

FIG. 19

, a plurality of masked plungers

400

may be positioned within holding fixture

300

. Holding fixture

300

defines a plurality of masked plunger apertures

340

, each of which may receive a masked plunger

400

within it. As such, a plurality of masked plungers

400

may be fixtured within holding fixture

300

such that the plurality of masked plungers

400

may be positioned at the same time within a machine for treatment by the wet chemical process.

Holding fixture

300

will now be described in further detail. As can be seen in

FIG. 19

, holding fixture

300

is comprised of a first half portion

310

and a second half portion

320

. Thus, holding fixture

300

may be divided in half along its longitudinal axis. As such, first half portion

310

defines one half of each of the plurality of masked plunger apertures

340

and second half portion

320

defines the other half portion of each of the plurality of masked plunger apertures

340

. Securement members

330

are received within one of the half portions of holding fixture

300

and extend through to the other of the half portions of holding fixture

300

and thus join first half portion

310

to second half portion

320

. As such, securement members

330

may be threadedly received within first half portion

310

and/or second half portion

320

.

It is desirable that each of the plurality of masked plunger apertures, and thus the masked plungers, be positioned a distance P

1

of between one-quarter to an entire diameter width PW of a masked copper alloy plunger apart from each other. Additionally, the circumferential edge closest to a longitudinal end of fixture

300

of an encased masked plunger closest to the end of fixture

300

should be positioned a distance P

2

from the longitudinal end of the holding fixture that is at least equivalent to the height H of the copper alloy plunger that extends above the upper surface of the holding fixture. These positions can be clearly seen in FIG.

22

.

Before the masked plungers

400

are inserted into the masked plunger apertures

340

, holding fixture

300

is mounted onto fixture platform tool

360

. Fixture platform tool

360

includes a base

362

upon which are included four mounting pins

370

, in this embodiment. Each mounting pin

370

is formed by a head portion

372

and a shoulder portion

374

. Head portion

372

of each pin

370

is received within one of four pin apertures

350

that are included in holding fixture

300

. When head

372

has been received within pin aperture

350

, holding fixture

300

rests upon shoulder

374

such that fixture

300

is positioned a distance above base

362

of fixture platform tool

360

. Shoulder

374

extends a height above base

362

such that when holding fixture

300

is positioned on fixture platform tool

360

, a separation distance is maintained between holding fixture

300

and fixture platform tool

360

such that as the masked plungers

400

are inserted within the masked plunger apertures

340

, the masked plungers will be properly positioned within the masked plunger apertures such that the compressive forces exerted by holding fixture

300

on masked plungers

400

will be received by retainer rings

270

. Thus, when masked plungers

400

are inserted within masked plunger apertures

340

, the bottoms of boots

260

rest upon base

362

and retainer rings

270

are positioned within the structure of holding fixture

300

that defines masked plunger apertures

340

. In this manner, as described above, the forces applied by holding fixture

300

on masked plungers

400

are received by retainer rings

270

, which are structurally strong members, particularly when compared to the strength of the rubber boots

260

.

After the masked plungers

400

are positioned within holding fixture

300

, securement members

330

are threaded into holding fixture

300

in order to draw first half portion

310

and second half portion

320

together. The drawing of first half portion

310

to second half portion

320

will tighten holding fixture

300

around each of the masked plungers

400

and will thus rigidly retain masked plungers

400

within holding fixture

300

.

Pin apertures

350

in holding fixture

300

may be formed in different configurations. For example, the two pin apertures

350

on first half portion

310

could be formed as circularly-shaped apertures and the two pin apertures

350

on second half portion

320

could be formed as oblong slots with a longitudinal axis perpendicular to the longitudinal axis of holding fixture

300

. Forming the pin apertures in such a manner would permit for aligning holding fixture

300

on fixture platform tool

360

on both the X longitudinal axis and the Y transverse axis. The first half portion

310

and second half portion

320

of holding fixture

300

are aligned on the X axis by positioning pins

370

within apertures

350

. When securement members

330

are threaded into holding fixture

300

to draw second half portion

320

towards first half portion

310

, the oblong slots

350

in second half portion

320

allow second half portion

320

to move along the Y axis relative to pins

370

. Thus, the positioning and relative movement of pins

370

within oblong slots

350

serve to align and guide second half portion

320

, and thus holding fixture

300

, on the transverse Y axis as the second half portion

320

is drawn toward the first half portion

310

on fixture platform tool

360

.

After each of the masked plungers

400

are inserted and retained within holding fixture

300

, the position of the boots

260

on the plungers

210

should be inspected such that the top edge

261

of each boot

260

is positioned with respect to outside beveled surface

215

as described previously. If the positioning of boot

260

with respect to copper alloy plunger

210

has shifted as a result of securing masked plunger

400

within holding fixture

300

, the masked plunger

400

should be removed from holding fixture

300

and the boot should be repositioned on copper alloy plunger

210

.

It was mentioned previously that stainless steel retainer ring

270

is positioned around, and on, rubber boot

260

. In order to assist in positioning retainer ring

270

on rubber boot

260

, a positioning plate

290

, as illustrated in

FIG. 20

, may be utilized. As can be seen in

FIG. 20

, positioning plate

290

has a uniform thickness T

1

of 0.250±0.010 inches and defines an aperture

292

within it. Aperture

292

has a diameter that is able to accommodate rubber boot

260

of masked plunger

400

within it. In order to position retainer ring

270

on rubber boot

260

, the bottom of rubber boot

260

, and thus masked plunger

400

, is positioned within aperture

292

of positioning plate

290

, as illustrated in FIG.

21

. Retainer ring

270

, which is of a larger diameter than aperture

292

and is thus not able to be positioned within it, is positioned around rubber boot

260

such that it engages on its lower-most edge

279

with positioning plate

290

. In this manner, the lower-most edge

279

of retainer ring

270

is accurately positioned 0.250±0.010 inches above the bottom surface of rubber boot

260

.

As can be seen in

FIG. 22

, in this embodiment, up to four masked plungers may be fixtured within holding fixture

300

. As such, masked plungers

400

,

410

,

420

, and

430

, are retained within holding fixture

300

. As can also be seen in

FIG. 22

, holding fixture

300

is resting upon shoulder portions

374

of pins

370

. As such, heads

372

of pins

370

are received within the pin apertures that are defined by holding fixture

300

. After each of the masked plungers

400

,

410

,

420

, and

430

have been inserted within holding fixture

300

, securement members

330

are threaded into holding fixture

300

to securely mate first half portion

310

and second half portion

320

of holding fixture

300

around each of the masked plungers.

After each of the masked plungers have been retained within holding fixture

300

, holding fixture

300

is removed from fixture platform tool

360

and fixture

300

is secured within a chemical treatment process wire rack

500

, as illustrated in FIG.

23

. Once holding fixture

300

has been secured within chemical treatment process wire rack

500

, the chemical treatment process may be applied to each of the masked plungers simultaneously. The chemical treatment process wire rack

500

may contain pins that are received within wire rack apertures

352

that are included at each end of holding fixture

300

, one of which is visible in FIG.

19

. However, the present invention is not limited to any particular embodiment for a chemical treatment process wire rack. In the illustrated embodiment, three fixtures

300

, each containing from one to four masked plungers, are placed onto chemical treatment process wire rack

500

. Thus, potentially up to twelve masked plungers may simultaneously undergo the wet chemical treatment process when practicing the present invention. Whereas

FIG. 23

illustrates the holding fixtures being oriented vertically within the process wire rack, it may be advantageous to orient the holding fixtures horizontally such that the exposed surfaces of the masked plungers are facing upward, as will be discussed later in this specification.

FIG. 24

illustrates an alternative embodiment for a tightening plate as discussed previously. As will be remembered, the tightening plate provides for restraining plunger base

220

against rotation as o-ring retainer

240

is threaded into plunger base

220

. The embodiment of

FIG. 11

for tightening plate

280

includes a single tongue

284

on a base

282

. In the embodiment of

FIG. 24

, tightening plate

600

includes four tightening stations such that four plunger bases

220

may be accommodated on a single tightening plate. Tightening stations

610

,

620

,

630

, and

640

may be seen in FIG.

24

. Since each tightening station is similarly formed, a discussion will only be provided for tightening station

610

. Tightening station

610

is defined by a first recess

612

and a second recess

614

. Recess

612

and recess

614

define between them a tongue

616

. Tongue

616

is received within slot

222

of a plunger base

220

. Structure of seat

221

of plunger base

220

which defines slot

222

is received within recesses

612

and

614

. Thus, when slot

222

of plunger base

220

receives tongue

616

within it, as o-ring retainer

240

is threaded into plunger base

220

, plunger base

220

is restrained against rotation by tightening station

610

.

The present invention also provides an improved method and apparatus for applying the wet chemical treatment process. In the present invention, after the copper alloy plungers have been cleaned and prepared for receipt of the chemical process, the plungers are masked and fixtured as described above. The plungers may be cleaned and prepared by any of a variety of methods and the present invention is not limited to any process for these steps. After masking and fixturing, the plungers are immersed in an etching solution and rinsed. The prepared plungers are then placed into the oxidizing solution. Again, the post-masking and fixturing etching and rinsing process can utilize any of a variety of methods and the present invention is not limited to any particular process for these steps.

FIG. 25

illustrates an embodiment for an oxidation tank assembly

700

that may be utilized when practicing the present invention. As can be seen, a wet chemical oxidation solution

710

is contained within tank

720

. The oxidation solution could be any of a variety of chemicals depending upon the material composition of the component that is to receive the treatment process and the characteristics required for the oxidation surface and the present invention is not limited to any particular physical configuration for tank

720

or chemical composition for oxidation solution

710

.

Disposed within tank assembly

700

is a fixture

300

which contains a plurality of masked plungers

400

. Fixture

300

may be secured to the walls of tank

720

through support brackets that are not visible in FIG.

25

. As can be seen in

FIG. 25

, and as discussed earlier, the fixture

300

is positioned within tank

720

such that the surface of each of the masked plungers that are to be oxidized are placed horizontal and facing upwards. This is desirable because, with the oxidation surfaces facing upwards, in a direction opposed to a flow direction for the wet chemical due to the forces of gravity acting upon the wet chemical, a more evenly distributed flow pattern of the wet chemical across the entire surface area of the oxidation surface can be achieved as represented by flow pattern

712

of wet chemical

710

. An evenly applied and distributed flow pattern of the wet chemical across the surface area of the oxidation surface will result in a more uniform formation of the oxidation surface on the copper alloy plunger. As can be understood, if the oxidation surface was oriented vertically within tank

720

, the wet chemical would flow down the surface of the oxidation surface and result in an uneven formation of the oxidation surface on the copper alloy plunger which would result in a weaker bond when the surface is bonded with the polyethylene. Additionally, the horizontal orientation of the oxidation surfaces in combination with the positioning of the masked plungers

400

within fixture

300

, as discussed and illustrated in

FIG. 22

, provides for a more evenly distributed flow pattern of the wet chemical across the oxidation surface of the copper alloy plunger. For example, if the outer-most edge of an oxidation surface was positioned directly adjacent to the longitudinal end of fixture

300

, again, there could be the possibility of near vertical flow of the wet chemical across that outer-most edge of the oxidation surface. By positioning the masked plungers a distance from the longitudinal ends of fixture

300

and from each other, a more controlled flow pattern can be achieved across the oxidation surface, and thus a more uniform oxidation surface can be chemically grown on the copper alloy plunger, which will result in a stronger bond between the copper alloy plunger and the polyethylene.

As can also be seen in

FIG. 25

, heaters

730

are provided near the walls of tank

720

. The heaters arc utilized to heat the wet chemical solution which enhances the formation of the oxidation surface on the copper alloy plungers. The heaters may be any of a variety of different types of heating devices and the present invention is not limited to any particular embodiment for a heater. In fact, whereas the heaters are illustrated as being located outside of tank

720

, the heaters could be either integrally formed within the wall of tank

720

or positioned within tank

720

. However, the heaters should not be positioned underneath the plungers during the oxidizing process. The heaters heat the solution to a temperature of between 208±5° F.

Baffles

740

may also be provided in tank

720

. Baffles

740

may be formed of separate structural members or may be a single structural member and may extend around an entire inner circumference of tank

720

or around a portion thereof. Baffles

740

are positioned within tank

720

between fixture

300

and heaters

730

. The purpose of baffles

740

are to reduce the movement, and thus agitation, of the wet chemical solution

710

that may be caused by the heating of the solution by heaters

730

. It is desirable that minimal agitation of the wet chemical solution occurs so that a more uniform oxidation surface can be grown on the copper alloy plungers. Because the solution is heated, convection currents

732

are likely to develop in the solution which may travel from the heat source and be propagated in a direction toward the fixture

300

. Baffles

740

serve to redirect the convection currents such that they do not directly flow across the forming oxidation surface and also serve to attenuate the currents. However, baffles still allow heat

734

to pass through baffles

740

through conduction of the heat from heaters

730

.

Baffles

740

may be formed of any of a variety of materials and may include apertures

742

within them. Any sizing and positioning of apertures

742

would be based on further optimizing the function of baffles

740

, as described above.

As discussed above, when the plungers are immersed within the wet chemical solution, the solution should not be boiled or stirred while the treatment is being applied to the plungers. Additionally, the processing temperature range, discussed above, should be reestablished, if necessary, within two minutes after immersing the plungers into the solution. Gentle agitation should only be accomplished within the first two minutes of immersion.

The plungers should remain in the wet chemical solution for approximately 18-22 minutes, with a target time being 20 minutes. An oxidizing time of at least 10 minutes is required. It has been found that because the oxidation surface is chemically grown on the copper alloy plunger, the thickness of the oxidation surface is a function of the duration of time that the copper alloy plungers are immersed in the wet chemical. As can be seen in

FIG. 26

, the thickness of the oxidation surface grows significantly during the first 10 minutes of immersion, virtually stops growing during the next 8 minutes, and continues to grow much less rapidly thereafter. Whereas an immersion time of less than 5 minutes is adequate for oxidation surfaces that are formed for aesthetic and decorative purposes, a longer immersion time is required to grow a thicker and denser oxide layer.

After the masked plungers are removed from the wet chemical solution, the plungers are rinsed in a rinse tank, running deionized water over them for ten minutes at room temperature. The fixtured plungers are then removed from the tank, visually inspected, and moved to a final rinse station. The fixtured plungers are then rinsed for two minutes at room temperature. The specific resistance of the rinse water is monitored and 2 megohms minimum shall be reached within 30 seconds after immersing fixtured plungers.

To dry the plungers, the plungers may be spin-dried and/or blow dried. However, in addition to any other drying step, the plungers are then oven dried. The fixtured plungers are placed in a drying oven for 60 minutes at a temperature of between 100-400° F., and preferably between 120-130° F.

After drying, the masked plungers are unmasked and removed from the fixture by reversing the process steps as described previously. The plungers are the placed onto a metal or glass tray by utilizing a lifting tool to lift the plungers. The plungers are then baked under nitrogen (N

2

) and air. The tray of plungers is placed into a drying oven and dried for 120 minutes at a temperature of at least 200° F. The tray of plungers is then removed and placed into a dry box under a nitrogen atmosphere.

With respect to all of the variety of additional or different method steps that may be practiced with the present invention, regardless of the steps utilized, it may be desirable to store the plungers in deionized water between each of the process steps.

In this manner, therefore, as discussed in above in this detailed description, an improved apparatus and method for application of a chemical process on a component surface is described. As discussed earlier, the present invention is not limited to being practiced with any particular component for application of the chemical process. Additionally, embodiments of the present invention are not limited to only be practiced with a wet chemical process. The disclosed embodiments are illustrative of the various ways in which the present invention may be practiced. Other embodiments can be implemented by those skilled in the art without departing from the spirit and scope of the present invention.

Number	Name	Date
3440705	Johnson	Apr 1969
4246088	Murphy et al.	Jan 1981
4441976	Iemmi et al.	Apr 1984
4690747	Smith et al.	Sep 1987
5750014	Stadler et al.	May 1998

Apparatus for application of a chemical process on a component surface

Information

Patent Number

Date Filed

Date Issued

Inventors

Original Assignees

Examiners

CPC

US Classifications

Field of Search

US

International Classifications

Abstract

Description

Claims

US Referenced Citations (5)