This present application claims priority to Chinese Patent Disclosure No. 201910168056.0, titled “APPARATUS FOR BATCH POLISHING OF WORKPIECES”, filed with the China National Intellectual Property Administration on Mar. 6, 2019, which is incorporated herein by reference in its entirety.
The present application relates to the technical field of magnetic field assisted polishing, and in particular to an apparatus for batch polishing of workpieces.
In recent decades, magnetic field assisted polishing/finishing process has been widely used in industrial application such as finishing of surface, edge and deburring.
Currently, there are a variety of quality finishing technologies for rapid finishing to free-form surfaces, including barrel quality finishing, vibration finishing, centrifugal finishing and drag finishing. Compared with magnetic field assisted surface treatment, said processing methods reduce accuracy of initial surface shapes, and thus it is difficult to obtain surface roughness in nanoscale. In the conventional art, with the assistance of a magnetic field, a variety of polishing processes have been developed. For example, there is a process of using magnetic fluid to perform high-efficiency and fine polishing to a flat surface, which removes material by applying a magnetic field to a mixture of abrasive and magnetic fluid; applying a magnetic field on the magnetic fluid to generate hydrostatic pressure for polishing flat surface and curved surface; applying a magnetic field to a magnetorheological fluid to generate a polishing zone where the fluid contacts the workpiece to achieve a certainty finishing with high precision of optical free-form surfaces. However, most of the above polishing technologies focus on application of high-precision polishing to one free-form surface at a time, which is difficult to be applied for batch finishing with complex surfaces. Therefore, most of the above polishing technologies are not in conformity with the actual demand to the cost-effectiveness of batch production, which may not meet the requirements of the market.
Therefore, a technical problem to be addressed presently by those skilled in the art is to prevent the magnetic field assisted polishing from failing to satisfy batch processing.
An object of the present application is to provide an apparatus for batch polishing workpieces, which can not only ensure high-precision polishing feature of the magnetic field assisted polishing, but also realize the function of high-precision polishing of workpieces in batches. Meanwhile, the apparatus may be applied to polishing of free-form surface, such as artificial implant, turbine blade and insert of optical mold.
In order to achieve the above objects, an apparatus for batch polishing workpieces is provided according to the present application, which includes an annular cavity for mounting multiple workpieces, a magnetic abrasive provided inside the annular cavity for polishing the workpieces, and multiple magnet sets for generating a magnetic field for the magnetic abrasive to remove surface material of the workpieces; each of the magnet sets includes magnets provided inside and outside the annular cavity for rotating about an axis of the annular cavity.
Preferably, the apparatus for batch polishing workpieces further includes a cavity cover covered on and connected to the annular cavity for fixedly mounting the workpieces.
Preferably, the cavity cover is fixedly connected to the workpieces through a workpiece clamp for the workpieces to suspend inside the annular cavity.
Preferably, the apparatus for batch polishing workpieces further includes a rotating plate for fixedly mounting all the magnets and driving all the magnets to rotate.
Preferably, a first driving portion is located below the rotating plate and is configured to fixedly connect with the rotating plate for driving the rotating plate to rotate about an axis of the rotating plate.
Preferably, the first driving portion is connected to the rotating plate through a shaft coupler.
Preferably, the apparatus for batch polishing workpieces further includes a mounting seat for fixedly mounting the first driving portion.
Preferably, the mounting seat is provided with a worktable for fixedly mounting the annular cavity; a through hole is opened at a center of the worktable in a thickness direction for the annular cavity to pass through.
Preferably, the magnetic abrasive is specifically formed by a consolidation of magnetic particle and polishing abrasive mixed with a lubricant, or formed by magnetic particle and polishing abrasive that are free from a base fluid.
Preferably, the apparatus for batch polishing workpieces further includes multiple second driving portions provided above the annular cavity for driving the workpieces to rotate and a third driving portion for driving the workpieces to move up and down.
Compared with the above background technologies, according to different requirements for polishing free-form surfaces of workpieces, an apparatus for batch polishing workpieces is designed by the present application. Since traditional magnetic field assisted polishing technologies mostly focus on the application of high-precision polishing of one free-form surface at a time, which is difficult to be applied for batch finishing of complex surfaces. Therefore, it is necessary to use an apparatus that is capable of achieving high-precision polishing of workpieces in batches to meet market requirements.
Specifically, said apparatus for batch polishing workpieces includes an annular cavity, a magnetic abrasive, and multiple sets of magnets, where the annular cavity is configured to receive workpieces to be polished, and multiple workpieces may be fixedly mounted in the annular cavity at one time; the magnetic abrasive is provided inside the annular cavity, and multiple sets of magnets are configured to generate a rotating magnetic field. In such way, under the action of the rotating magnetic field, the magnetic abrasive is capable of impacting surface of each of the workpieces, and material on the surface of the workpieces may further be removed to achieve high-precision polishing to the entire surface of the workpieces; each of the magnet sets includes magnets provided inside and outside the annular cavity for rotating about an axis of the annular cavity to provide a rotating magnetic field. Compared with traditional finishing apparatuses, said arrangement can not only ensure the high-precession polishing feature of the magnetic field assisted polishing, but also realize the function of high-precession polishing of workpieces in batches. Moreover, the apparatus may be applied to surface treatment of alloy, ceramic, glass and various non-ferrous metals. Meanwhile, the apparatus may be applied to polishing process complex porous surface, for example, the apparatus may be applied to polishing of free-form surface such as artificial implant, turbine blade and insert of optical mold.
For more clearly illustrating embodiments of the present application or the technical solutions in the conventional technology, figures referred to for describing the embodiments or the conventional technology will be briefly described hereinafter. Obviously, figures in the following description are only examples of the present application, and for the person skilled in the art, other figures may be obtained based on the provided figures without any creative efforts.
1—mounting seat, 2—first driving portion, 3—motor clamp, 4—shaft coupler, 5—rotating plate, 6—magnet, 7—annular cavity, 8—workpiece clamp, 9—worktable, 10—cavity cover, 11—second driving portion, 12—magnetic abrasive, 13—third driving portion.
A core of the present application is to provide an apparatus for batch polishing workpieces, which can not only ensure high-precession polishing feature of the magnetic field assisted polishing, but also realize the function of high-precession polishing to workpieces in batches. Meanwhile, the apparatus may be applied to polishing of free-form surface, such as artificial implant, turbine blade and insert of optical mold.
In order to enable those skilled in the art to better understand the solution of the present application, the present application will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.
It should be noted that directional wordings such as “upper end, lower end, left side, right side” mentioned below are all defined based on the accompanying drawings herein.
Referring to
The apparatus for batch polishing workpieces provided according to the present application includes an annular cavity 7, a magnetic abrasive 12, and multiple magnet sets., where the annular cavity 7 is configured to receive workpieces to be polished, and multiple workpieces may be fixedly mounted in the annular cavity 7 at one time; the magnetic abrasive 12 is provided inside the annular cavity 7, and multiple magnet sets are configured to generate a rotating magnetic field. In such way, under the action of the rotating magnetic field, the magnetic abrasive 12 is capable of impacting surface of the workpieces, and material on the surface of the workpieces may further be removed to achieve high-precision polishing of the entire surface of the workpieces.
Each of the magnet sets includes magnets 6 provided both inside and outside the annular cavity 7 for rotating about the axis of the annular cavity 7 so as to provide a rotating magnetic field required for polishing the workpieces. The magnets 6 may be configured as a permanent magnet or an electromagnet, and the magnetic field strength of the magnets 6 may be varied between 0.01 and 5 Tesla.
Specifically, each magnet set may be provided with two magnets 6 respectively arranged inside and outside of the annular cavity 7, and all the magnet sets are evenly distributed in the circumferential direction of the annular cavity 7. Of course, according to actual processing requirements, a preset gap should be provided between the magnets 6 in the same magnet set and the annular cavity 7, and a preset gap between a magnet 6 located inside the annular cavity 7 and the annular cavity 7 equal to a preset gap between a magnet 6 located outside the annular cavity 7 and the annular cavity 7 in the same magnet set, as shown in
Furthermore, according to target workpieces in different materials, said magnetic abrasive 12 may be provided in different ways. For example, the magnetic abrasive 12 may be formed by using magnetic particle and polishing abrasive as raw materials, which are consolidated and further mixed with lubricant; or, the magnetic particle and polishing abrasive may also be unconsolidated, which are freed in a base liquid, thereby forming an abrasive with polishing performance. In such way, the magnetic abrasive 12 becomes a polishing strap under the action of the rotating magnetic field. In case that all the magnets 6 start to rotate, the magnetic abrasive 12 removes material at scratches on target surfaces. A combination of these actions makes material to be removed randomly, thereby achieving polishing performance, as shown in
Of course, according to actual requirements, the polishing abrasive formed by the magnetic abrasive 12 may specifically be diamond, silicon carbide, aluminum oxide, silicon oxide, cerium oxide and other materials. The size of the magnetic abrasive 12 may range from several micrometers to hundreds of micrometers for fineness polishing and rough polishing, respectively.
Compared with traditional finishing apparatuses, said arrangement provides a more cost-effective method for batch finishing of free-form surfaces. The apparatus can not only ensure the high-precession polishing feature of the magnetic field assisted polishing, but also realize the function of high-precession polishing of workpieces in batches. Further, the apparatus may be applied to surface treatment of alloy, ceramic, glass and various non-ferrous metals. Meanwhile, the apparatus may be applied to polishing process to complex porous surface, for example, the apparatus may be applied to polishing to free-form surface such as artificial implant, turbine blade and insert of optical mold.
It should be noted that all the workpieces inside the annular cavity 7 should be arranged at the same height, and a height of the workpieces should be less than or equal to a height of the magnets 6. That is, on the one hand, a height of the bottom surface of the workpieces may be arranged higher than that of the magnets 6, on the other hand, a height of the top of the workpieces may be arranged not to exceed that of the magnets 6, so that the entire surface of all the workpieces are arranged inside the magnetic field, so as to achieve high-precision polishing of the entire surface of the workpieces.
In addition, the number of workpieces may be adjusted according to dimension of the annular cavity 7 and the size of the workpieces to be polished. For example, the number of workpieces to be polished in the apparatus may be set to 6, of course, may be more; in addition, the number of the magnet sets may also be set to 6. It should be noted that the number of workpieces may be set to be greater than the number of magnet sets.
In an embodiment of the present application, said apparatus further includes a cavity cover 10, which is obviously provided at an upper end of the annular cavity 7, and is covered on and connected to the annular cavity 7. The cavity cover 10 is used for fixedly mounting multiple workpieces, so that all the workpieces are arranged inside the annular cavity 7.
Of course, all the workpieces may be fixedly mounted on the cavity cover 10 through a preset workpiece clamp 8, so that all the workpieces may be suspended inside the annular cavity 7; in addition, according to the shape and structure of the annular cavity 7, the cavity cover 10 may be specifically provided as a circular cavity cover, so that all the workpieces may be evenly arranged at a lower end of the cavity cover 10 at preset circumferential positions.
Specifically, said apparatus further includes a rotating plate 5, on which all the magnet sets are fixedly mounted. The rotating plate 5 should be arranged below the annular cavity 7, and the rotating plate 5 is configured to drive all the magnets 6 to rotate about an axis of the rotating plate 5. Moreover, the rotating plate 5 is coaxially arranged with the annular cavity 7. In order to ensure that the magnets 6 do not interfere with the annular cavity 7 when the rotating plate 5 drives the magnets 6 to rotate, an annular slot may be provided at a preset position of the rotating plate 5. The bottom of the annular cavity 7 may be arranged inside the annular slot, and the dimension of the annular slot may be adjusted according to the dimension of the annular cavity 7.
The first driving portion 2 is located below the rotating plate 5 and is configured to fixedly connect with the rotating plate 5. The first driving portion 2 is capable of providing power for driving the rotating plate 5 to rotate about an axis of the rotating plate 5. For example, the first driving portion 2 may be specifically provided as a motor, and the rotation speed of the motor may be set from 50 rpm to 5000 rpm; in addition, the motor may be fixedly connected to the rotating plate 5 by the shaft coupler 4, and the mounting and connection method of the motor and the shaft coupler 4 may refer to the relevant technical requirements in the conventional art, which will not be described here.
More specifically, in order to ensure the stability and safety of the operation of the apparatus, a mounting seat 1 may further be provided. In such way, the first driving portion 2 may be fixedly mounted on the mounting seat 1, and the first driving portion 2 may also be fixed on the mounting seat 1 by the motor clamp 3; in addition, in order to make the positioning and connection to the annular cavity 7, a worktable 9 may be fixedly mounted at the upper end of the mounting seat 1 in a detachable manner to facilitate substitution by the annular cavities 7 with different dimensions. Moreover, a through hole is opened at the center of the worktable 9 for the annular cavity 7 to pass through. Obviously, the through hole is opened in the thickness direction of the worktable 9, so that the annular cavity 7 is capable of being assembled in the through hole of the worktable 9.
It should be noted that the diameter of the through hole may be set to be slightly larger or equal to the outer diameter of the annular cavity 7. However, the diameter of the through hole should be smaller than the diameter of the cavity cover 10, so that the cavity cover 10 may be connected to the outer periphery of the through hole through bolt connection.
In order to optimize the above embodiment, said apparatus may further be provided with several second driving portions 11, all of the second driving portions 11 may be arranged above the annular cavity 7 and passing through the cavity cover 10 to be connected with the workpieces to be polished inside the annular cavity 7. The second driving portions 11 are configured to drive the workpieces to be polished to rotate; in addition, said apparatus may also be provided with a third driving portion 13, which is configured to drive the workpieces to move up and down, located above the annular cavity 7.
In such way, rotational movement and up-and-down movement of the workpieces to be polished and the rotational movement of the magnets 6 are combined, so it may ensure that the entire surface of the workpieces to be polished inside the annular cavity 7 is uniformly polished;
of course, according to actual requirements, the second driving portion 11 and the third driving portion 13 may be arranged in other different ways, provided that the entire surface of the workpieces may be uniformly polished, and the connection of the second driving portion 11 and the third driving portion 13 may refer to the relevant technical requirements in the conventional art, which will not be described herein.
It should be noted that, relational terms herein such as first and second are only used to distinguish one entity from several other entities, and do not necessarily require or imply there is any actual relationship or order between these entities.
The apparatus for batch polishing workpieces provided according to the present application has been described in detail above. The principle and the embodiments of the present application are illustrated herein by specific examples. Said description of embodiments is only intended to facilitate the understanding of the method and spirit of the present application. It should be noted that for those of ordinary skill in the art, various improvements and modifications may be made to the present application without departing from the spirit or scope of the present application, and these improvements and modifications fall within the protection scope of claims of the present application.
Number | Date | Country | Kind |
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201910168056.0 | Mar 2019 | CN | national |
Filing Document | Filing Date | Country | Kind |
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PCT/CN2019/106047 | 9/17/2019 | WO | 00 |