The present technology relates to non-volatile memory.
Solid-state memory capable of nonvolatile storage of charge, particularly in the form of EEPROM and flash EEPROM packaged as a small form factor card, has become the storage of choice in a variety of mobile and handheld devices, notably information appliances and consumer electronics products. Unlike RAM (random access memory) that is also solid-state memory, flash memory is non-volatile, and retaining its stored data even after power is turned off. Also, unlike ROM (read only memory), flash memory is rewritable similar to a disk storage device. Despite the higher cost, flash memory is increasingly being used in mass storage applications. More recently, flash memory in the form of solid-state disks (SSD) is beginning to replace hard disks in portable computers as well as in fixed location installations.
In flash memory devices, a memory cell can include a floating gate that is positioned above and insulated from a channel region in a semiconductor substrate, in a two-dimensional (2D) NAND configuration. The floating gate is positioned between source and drain regions. A control gate is provided over and insulated from the floating gate. The threshold voltage (Vth) of the transistor thus formed is controlled by the amount of charge that is retained on the floating gate. That is, the minimum amount of voltage that must be applied to the control gate before the transistor is turned on to permit conduction between its source and drain is controlled by the level of charge on the floating gate. A memory cell can have a floating gate that is used to store two or more ranges of charges, where each range represents a data state.
Moreover, ultra high density storage devices have been proposed using a three-dimensional (3D) stacked memory structure which is formed from an array of alternating conductive and dielectric layers. One example is the Bit Cost Scalable (BiCS) architecture. A memory hole is drilled in the layers, and a NAND string is formed by filling the memory hole with appropriate materials. A straight NAND string extends in one memory hole, while a pipe- or U-shaped NAND string (P-BiCS) includes a pair of vertical columns of memory cells which extend in two memory holes and which are joined by a bottom back gate. Control gates of the memory cells are provided by the conductive layers.
High performance integrated-circuit memory devices typically have multiple die or chips controlled by a memory controller. Each die contains a memory array with peripheral circuits. At any one time, many of these multiple die may be involved in various memory operations including input or output operations with the memory controller. For example, in enterprise SSD and Client SSD the input/output (I/O) requirements are demanding. In some instances, 8 to 16 die are stacked on the same I/O channel and they are operating at 200 MHz (DDR2) speed with reduced power.
One issue has to do with the proper termination of the I/O channel. At the microwave operating frequencies, the I/O channel behaves like a transmission line and improper impedance match or termination will lead to reflections. The reflections will degrade the transmission speed. Accordingly, memory devices typically include off-chip-driver (OCD) and on-die termination (ODT) circuits for driving and terminating I/O channels.
However, as process geometries shrink, many design and process challenges are presented for OCD and ODT circuits. These challenges include calibration errors and circuit non-linearities.
Each memory die 104-1, . . . , 104-M includes a memory array 110 of memory cells. In an embodiment, the memory cells are flash EEPROM memory cells arranged in a NAND architecture. In an embodiment, each memory cell is capable of being configured as a multi-level cell (MLC) for storing multiple bits of data, as well as capable of being configured as a single-level cell (SLC) for storing 1 bit of data. Each memory die 104-1, . . . , 104-M also includes peripheral circuits such as row and column decoders (not shown), read/write circuits 112 and die I/O circuits 114. An on-chip control circuit 116 controls low-level memory operations of each die. On-chip control circuit 116 is a controller that cooperates with the peripheral circuits to perform memory operations on memory array 110. On-chip control circuit 116 includes a state machine 118 to provide die or chip level control of low-level memory operations via an internal bus 120 for carrying control signals, data and addresses.
In many implementations, host 100 communicates and interacts with each of memory die 104-1, . . . , 104-M via memory controller 106. Memory controller 106 cooperates with memory die 104-1, . . . , 104-M and controls and manages higher level memory operations. Memory controller include firmware 122, which provides codes to implement the functions of memory controller 106.
For example, in a host write, host 100 sends data to be written to memory array 110 in logical sectors allocated from a file system of the host's operating system. A memory block management system implemented in the controller stages the sectors and maps and stores them to the physical structure of the memory array.
To improve read and program performance, multiple charge storage elements or memory transistors in an array are read or programmed in parallel. Thus, a “page” of memory elements are read or programmed together. In existing memory architectures, a row typically contains several interleaved pages or it may constitute one page. Preferably, all memory elements of a page are read or programmed together.
A memory device bus 124 provides communications and power between memory controller 106, power supply 108 and memory die 104-1, . . . , 104-M. An I/O channel is established between memory controller 106 and each of memory die 104-1, . . . , 104-M via memory device bus 124 and internal bus 120. Each I/O channel has a controller I/O circuit 126 and one of I/O circuits 114 of memory die 104-1, . . . , 104-M as endpoints.
When memory controller 106 sends data or commands to memory die 104-1, such as in a write operation, the data are driven by controller driver 200c via device bus 120, 124 to die receiver 202d. When memory die 104-1 sends data or status to memory controller 106, such as in a read operation, the data are driven by die driver 200d via device bus 120, 124 to controller receiver 202c.
As previously mentioned, memory devices typically include OCD circuits for driving I/O channels and ODT circuits for terminating I/O channels. In an embodiment, controller driver 200c and die driver 200d each include OCD circuits for driving device bus 120, 124, and controller termination 206c and die termination 206d each include ODT circuits for terminating device bus 120, 124.
As previously mentioned, at microwave operating frequencies, the I/O channel of a memory device behaves like a transmission line, and improper impedance match or termination will lead to reflections, which degrade transmission speed. To reduce such reflections, OCD and ODT circuits match impedance characteristics of the I/O channel to which they are connected. In addition, to account for variations in process, power supply voltage and temperature (PVT), OCD and ODT circuits typically have an impedance adjustment function, and an impedance control circuit provides control signals to adjust the impedance of the OCD and ODT circuits.
As also described in more detail below, during a calibration process, such as a ZQ calibration process, first control signals CP and second control signals CN are adjusted until an impedance of the replica OCD/ODT circuit matches an impedance of an external reference resistor, and then the adjusted values of first control signals CP and second control signals CN are used to set an impedance of OCD/ODT circuit 300. In this regard, the impedance of OCD/ODT circuit 300 matches an impedance proportional to the impedance of the external reference resistor. The ZQ calibration process may be used to reduce OCD/ODT circuit impedance error due to variations in process, power supply voltage and temperature.
Each of PMOS transistors MPr0, MPr1, . . . , MPr30 has a width WP and has a gate terminal coupled to a corresponding one of first control signals CP0, CP1, . . . , CP30, and each of NMOS transistors MNr0, MNr1, . . . , MNr30 has a width WN and has a gate terminal coupled to a corresponding one of second control signals CN0, CN1, . . . , CN30. First control signals CP0, CP1, . . . , CP30 and second control signals CN0, CN1, . . . , CN30 each include 31 control signals (e.g., binary bits). Persons of ordinary skill in the art will understand that control signals CP and CN each may include more or fewer than 31 controls signals.
In the embodiment of
PMOS transistors MPr0, MPr1, . . . , MPr30 and first resistor RP are also referred to herein as the “pull-up ODT structure” of ODT circuit 300b, and NMOS transistors MNr0, MNr1, . . . , MNr30 and second resistor RN are also referred to herein as the “pull-down ODT structure” of ODT circuit 300b.
Comparator 312 has a first (non-inverting) input terminal coupled to a third terminal of first switch SW1, a second (inverting) input terminal coupled to a reference voltage VREF, typically equal to VCCQ/2, and an output terminal coupled to a first terminal of second switch SW2 and an input terminal of inverter 314. Second switch SW2 has a second terminal coupled to an output terminal of inverter 314, and a third terminal LZ coupled to an input terminal of calibration control logic 316. Calibration control logic 316 provides first control signals CP0, CP1, . . . , CP30, and second control signals CN0, CN1, . . . , CN30.
OCD replica circuit 310a includes first PMOS transistors MZP0, MZP1, . . . , MZP30, second PMOS transistors MP0, MP1, . . . , MP30, and NMOS transistors MN0, MN1, . . . , MN30. First PMOS transistors MZP0, MZP1, . . . , MZP30 are coupled in parallel between a power supply VCCQ and first output terminal OUT1, second PMOS transistors MP0, MP1, . . . , MP30 are coupled in parallel between a power supply VCCQ and second output terminal OUT2, and NMOS transistors MN0, MN1, . . . , MN30 are coupled in parallel between second output terminal OUT2 and GROUND. First output terminal OUT1 provides an output of first PMOS transistors MZP0, MZP1, . . . , MZP30, and second output terminal OUT2 provides an output of second PMOS transistors MP0, MP1, . . . , MP30 and NMOS transistors MN0, MN1, . . . , MN30.
Each of first PMOS transistors MZP0, MZP1, . . . , MZP30 and second PMOS transistors MP0, MP1, . . . , MP30 has a width αWP and has a gate terminal coupled to a corresponding one of first control signals CP0, CP1, . . . , CP30, and each of NMOS transistors MN0, MN1, . . . , MN30 has a width αWN and has a gate terminal coupled to a corresponding one of second control signals CN0, CN1, . . . , CN30, where α=RVAL/RREF, and where RVAL is a nominal targeting impedance of OCD circuit 300a of
Calibration control logic 316 varies first control signals CP0, CP1, . . . , CP30 and second control signals CN0, CN1, . . . , CN30, controls first switch SW1 and second switch SW2, and receives as input the signal LZ. During a calibration process, sometimes referred to as “ZQ calibration,” impedance calibration circuit 302a implements a two-step calibration process. In a first calibration step, sometimes referred to as “pull-up calibration,” calibration control logic 316 configures first switch SW1 to connect first output terminal OUT1 and impedance adjustment terminal ZQ to the non-inverting input terminal of comparator 312, and configures second switch to connect the non-inverted output of comparator 312 as the LZ signal input to calibration control logic 316. Comparator 312 compares the output of first PMOS transistors MZP0, MZP1, . . . , MZP30, with VCCQ/2.
Calibration control logic 316 initially sets each of first control signals CP0, CP1, . . . , CP30 HIGH, so all of first PMOS transistors MZP0, MZP1, . . . , MZP30 are OFF, and first PMOS transistors MZP0, MZP1, . . . , MZP30 have maximum impedance much greater than RREF. As a result, the voltage level on impedance adjustment terminal ZQ is less than VCCQ/2, and the output of comparator 312 is LOW (e.g., 0). As a result, LZ=0. Calibration control logic 316 then successively sets individual ones of first control signals CP0, CP1, . . . , CP30 LOW, thereby incrementally turning ON a corresponding one of first PMOS transistors MZP0, MZP1, . . . , MZP30 step by step.
As each transistor turns ON, the composite resistance of first PMOS transistors MZP0, MZP1, . . . , MZP30 decreases. As a result, the voltage level on impedance adjustment terminal ZQ increases. When the voltage level on impedance adjustment terminal ZQ exceeds VCCQ/2, the output of comparator 312 switches from LOW to HIGH (e.g., 0 to 1). As a result, LZ switches from 0 to 1, and at that point the impedance of first PMOS transistors MZP0, MZP1, . . . , MZP30 matches the impedance of reference resistor RREF. Calibration control logic 316 stores the values of first control signals CP0, CP1, . . . , CP30 when LZ switches from 0 to 1 as CPmatch.
In a second calibration step, sometimes referred to as “pull-down calibration,” calibration control logic 316 configures first switch SW1 to connect second output terminal OUT2 to the non-inverting input terminal of comparator 312, and configures second switch SW2 to connect the output of inverter 314 as the LZ signal input to calibration control logic 316. Comparator 312 compares the output of second PMOS transistors MP0, MP1, . . . , MP30 and NMOS transistors MN0, MN1, . . . , MN30 with VCCQ/2. Calibration control logic 316 sets the values of first control signals CP0, CP1, . . . , CP30 to CPmatch. As a result, second PMOS transistors MP0, MP1, . . . , MP30 have a impedance equal to the impedance of first PMOS transistors MZP0, MZP1, . . . , MZP30 that matched reference resistor RREF from the first calibration step.
Calibration control logic 316 initially sets each of second control signals CN0, CN1, . . . , CN30 LOW, so all of NMOS transistors MN0, MN1, . . . , MN30 are OFF, and NMOS transistors MN0, MN1, . . . , MN30 have maximum impedance much greater than RREF. As a result, the voltage level of second output terminal OUT2 is greater than VCCQ/2, the output of comparator 312 is HIGH (e.g., 1), and the output of inverter 314 is LOW (e.g., 0). As a result, LZ=0. Calibration control logic 316 then successively sets individual ones of second control signals CN0, CN1, . . . , CN30 HIGH, thereby turning ON a corresponding one of NMOS transistors MN0, MN1, . . . , MN30.
As each transistor turns ON, the composite impedance of NMOS transistors MN0, MN1, . . . , MN30 decreases. As a result, the voltage level of second output terminal OUT2 decreases. When the voltage level of second output terminal OUT2 falls below VCCQ/2, the output of comparator 312 switches from HIGH to LOW (e.g., 1 to 0), the output of inverter 314 switches from LOW to HIGH (e.g., 0 to 1). As a result, LZ switches from 0 to 1, and at that point the impedance of NMOS transistors MN0, MN1, . . . , MN30 matches the impedance of second PMOS transistors MP0, MP1, . . . , MP30. Calibration control logic 316 stores the values of second control signals CN0, CN1, . . . , CN30 when LZ switches from 0 to 1 as CNmatch.
The stored values CPmatch of first control signals CP0, CP1, . . . , CP30 and CNmatch of second control signals CN0, CN1, . . . , CN30 may then be used to set an output impedance of OCD circuit 300a of
Comparator 312 has a first (non-inverting) input terminal coupled to a third terminal of first switch SW1, a second (inverting) input terminal coupled to reference voltage VREF, and an output terminal coupled to a first terminal of second switch SW2 and an input terminal of inverter 314. Second switch SW2 has a second terminal coupled to an output terminal of inverter 314, and a third terminal LZ coupled to an input terminal of calibration control logic 316. Calibration control logic 316 provides first control signals CP0, CP1, . . . , CP30, and second control signals CN0, CN1, . . . , CN30.
OCD replica circuit 310b includes first PMOS transistors MZP0, MZP1, . . . , MZP30, second PMOS transistors MP0, MP1, . . . , MP30, NMOS transistors MN0, MN1, . . . , MN30, first resistor RP, second resistor RN and third resistor RZP. First PMOS transistors MZP0, MZP1, . . . , MZP30 are coupled in parallel between a power supply VCCQ and a first terminal of third resistor RZP, which has a second terminal coupled to first output terminal OUT1. Second PMOS transistors MP0, MP1, . . . , MP30 are coupled in parallel between a power supply VCCQ and a first terminal of first resistor RP, which has a second terminal coupled to second output terminal OUT2. NMOS transistors MN0, MN1, . . . , MN30 are coupled in parallel between GROUND and a first terminal of second resistor RN, which has a second terminal coupled to second output terminal OUT2.
Each of first PMOS transistors MZP0, MZP1, . . . , MZP30 and second PMOS transistors MP0, MP1, . . . , MP30 has a width WTP and a length LTP, and has a gate terminal coupled to a corresponding one of first control signals CP0, CP1, . . . , CP30. Each of NMOS transistors MN0, MN1, . . . , MN30 has a width WTN and a length LTN, and has a gate terminal coupled to a corresponding one of second control signals CN0, CN1, . . . , CN30. First resistor RP has a width WRP and a length LRP, second resistor RN has a width WRN and a length LRN, and third resistor RZP has a width WRP and a length LRP. During a ZQ calibration process, impedance calibration circuit 302b implements the two-step pull-up/pull-down calibration process described above with respect to impedance calibration circuit 302a of
As described above, a ZQ calibration process may be used with impedance calibration circuits 302a and 302b to reduce OCD/ODT circuit impedance error due to variations in process, power supply voltage and temperature. However, several problems exist with previously known impedance calibration circuits. First, in the ZQ calibration process described above, the OCD/ODT impedance is adjusted to a target impedance at a finite step size (e.g., the incremental impedance of each turned ON transistor). Therefore, the worst calibration error can be as large as the step size. To reduce the error, the step size needs to be smaller. However, reducing the step size results in a larger number of transistors and resistors, which detrimentally increases pin capacitance, layout area, number of signals and power consumption.
Second, if the OCD/ODT impedance is adjusted to the lowest value, but the lowest value is still higher than the target impedance, the impedance calibration function has to return a “fail” status to the user. This is because the lowest impedance can be unacceptably higher than the target impedance. But in some cases, the lowest impedance is close to the target impedance. If the difference between the lowest impedance and the target impedance is within the step size, we may not have to return a “fail” status to the user. So some “pass” status cases are lost. To avoid this, the lowest impedance needs to be low enough so that it is always lower than the target impedance. To achieve such low impedance, the OCD/ODT transistor size needs to be increased. However, increasing the transistor size detrimentally increases pin capacitance, layout area, and power consumption.
Third, the OCD/ODT impedance varies due to non-linearity of transistors in the OCD/ODT circuit. Such non-linearity is larger when the transistor Ids (drain-source current) is varied smaller. Then the smaller Ids transistor results in larger RON/RTT error. To reduce the non-linearity, the transistor impedance needs to be low enough and the resistor impedance needs to be high enough. However, a low impedance transistor needs to have a large width and a high impedance resistor needs to have a large length. Such wide transistors and long resistors detrimentally results in increased pin capacitance, layout area and power consumption.
Technology is described which seeks to address these problems.
OCD replica circuit 510a includes first PMOS transistors MZP0, MZP1, . . . , MZP30, second PMOS transistors MP0, MP1, . . . , MP30, and first NMOS transistors MN0, MN1, . . . , MN30. In addition, OCD replica circuit 510a includes a third PMOS transistor MZPe and a second NMOS transistor MNe. Third PMOS transistor MZPe is coupled in parallel with first PMOS transistors MZP0, MZP1, . . . , MZP30, between a power supply VCCQ and first output terminal OUT1. Second NMOS transistor MNe is coupled in parallel with first NMOS transistors MN0, MN1, . . . , MN30 between second output terminal OUT2 and GROUND.
First output terminal OUT1 provides a first output signal of third PMOS transistor MZPe and first PMOS transistors MZP0, MZP1, . . . , MZP30, and second output terminal OUT2 provides a second output signal of second PMOS transistors MP0, MP1, . . . , MP30 and second NMOS transistor MNe and first NMOS transistors MN0, MN1, . . . , MN30.
Each of first PMOS transistors MZP0, MZP1, . . . , MZP30 and second PMOS transistors MP0, MP1, . . . , MP30 has a first width αWP and has a gate terminal coupled to a corresponding one of first control signals CP0, CP1, . . . , CP30, and each of first NMOS transistors MN0, MN1, . . . , MN30 has a second width αWN and has a gate terminal coupled to a corresponding one of second control signals CN0, CN1, . . . , CN30. Third PMOS transistor MZPe has a third width one-half the first width of first PMOS transistors MZP0, MZP1, . . . , MZP30 (i.e., ½ αWP) and has a gate terminal coupled to a third control signal
Calibration control logic 316 varies first control signals CP0, CP1, . . . , CP30, second control signals CN0, CN1, . . . , CN30, third control signal
In particular,
In particular, the upper chart in
Referring again to
The pull-up impedance deviation may be defined as the difference between PCAL and the Target impedance:
Impedance deviationP=PCAL−Target impedance
So a minimum and a maximum pull-up impedance deviation are −Stepsize_P and 0, respectively.
The lower chart in
Referring again to
The pull-down impedance deviation may be defined as the difference between NCAL and the Target impedance:
Impedance deviationN=NCAL−Target impedance
So a minimum and a maximum pull-down impedance deviation are (−Stepsize_P−Stepsize_N) and 0, respectively.
The pull-up/pull-down imbalance may be defined as:
Then for previously known impedance calibration circuit 302a of
In contrast, the upper chart in
Referring again to
The lower chart in
As depicted in the lower chart of
Without wanting to be bound by any particular theory, it is believed that third PMOS transistor MPe and second NMOS transistor MNe work to reduce both the magnitudes of the pull-up and pull-down impedance deviation and the magnitude of the P/N imbalance.
In contrast,
Without wanting to be bound by any particular theory, it is believed that impedance calibration circuit 502a1 can be used to avoid losing impedance calibration margin such as minimum power source voltage or maximum temperature.
Referring again to
OCD replica circuit 510b includes first PMOS transistors MZP0, MZP1, . . . , MZP30, second PMOS transistors MP0, MP1, . . . , MP30, and first NMOS transistors MN0, MN1, . . . , MN30. In addition, OCD replica circuit 510b includes a second resistor RNe coupled between first PMOS transistors MZP0, MZP1, . . . , MZP30 first output terminal OUT1.
First resistor RPe has a resistance equal to ½ Stepsize_P and second resistor MNe has a resistance equal to ½ Stepsize_N. For example, if Stepsize_P=10 ohms and Stepsize_N=10 ohms, first resistor RPe has a resistance of 5 ohms, and second resistor RNe has a resistance of 5 ohms. Other resistance values may be used. First resistor RPe and second resistor RNe each can be formed using metal, polysilicon or other materials. Persons of ordinary skill in the art will understand that because resistor impedance varies independently from transistor impedance, unlike third PMOS transistor MZPe and second NMOS transistor MNe of
[(Stepsize_N−RNe)/(Target impedance)] and [RNe/(Target impedance)].
Thus, the pull-down impedance deviation is better than that of previously known impedance calibration circuit 302a of
In particular, impedance calibration circuit 502a3 includes a first circuit 510c (also referred to herein as OCD replica circuit 510c), first switch SW1, comparator 312, inverter 314, second switch SW2, calibration control logic 316 and reference resistor RREF. OCD replica circuit 510c has a first output terminal OUT1 coupled to a first terminal of first switch SW1 and impedance adjustment terminal ZQ, and a second output terminal OUT2 coupled to a second terminal of first switch SW1. Reference resistor RREF has a first terminal coupled to impedance adjustment terminal ZQ, and a second terminal coupled to GROUND. In an embodiment, reference resistor RREF is 240 ohms, although other values may be used.
OCD replica circuit 510c includes first PMOS transistors MZP0, MZP1, . . . , MZP30, second PMOS transistors MP0, MP1, . . . , MP30, and first NMOS transistors MN0, MN1, . . . , MN30. In addition, OCD replica circuit 510a includes third PMOS transistor MZPe, second NMOS transistor MNe, first pull-up resistor RZP, second pull-up resistor RP and pull-down resistor RN.
First PMOS transistors MZP0, MZP1, . . . , MZP30 are coupled in parallel between power supply VCCQ and a first terminal of first pull-up resistor RZP, which has a second terminal coupled to first output terminal OUT1. Third PMOS transistor MZPe is coupled in parallel with first PMOS transistors MZP0, MZP1, . . . , MZP30, between power supply VCCQ and the first terminal of first pull-up resistor RZP. First pull-up resistor RZP may have a value about 50% of RREF. For example, in an embodiment, RREF=240 ohms, and RZP=120 ohms. Other values may be used. However, larger values of RZP (e.g., 70% of RREF) require larger layout area and transistor sizes for first PMOS transistors MZP0, MZP1, . . . , MZP30. Smaller values of RZP (e.g., 30% of RREF) may result in larger shoot-through current due to stronger non-linearity. Thus, a value of RZP of about 50% of RREF is a good compromise between these two alternatives.
Second PMOS transistors MP0, MP1, . . . , MP30 are coupled in parallel between power supply VCCQ and a first terminal of second pull-up resistor RP, which has a second terminal coupled to second output terminal OUT2. Second pull-up resistor RP may have a value of about 50% of RREF. For example, in an embodiment, RREF=240 ohms, and RP=120 ohms. Other values may be used. However, larger values of RP (e.g., 70% of RREF) require larger layout area and transistor sizes for second PMOS transistors MP0, MP1, . . . , MP30. Smaller values of RP (e.g., 30% of RREF) may result in larger shoot-through current due to stronger non-linearity. Thus, a value of RP of about 50% of RREF is a good compromise between these two alternatives.
First NMOS transistors MN0, MN1, . . . , MN30 are coupled in parallel between GROUND and a first terminal of pull-down resistor RN, which has a second terminal coupled to second output terminal OUT2. Second NMOS transistor MNe is coupled in parallel with first NMOS transistors MN0, MN1, . . . , MN30 between GROUND and the first terminal of pull-down resistor RN. Pull-down resistor RN may have a value of about 50% of RREF. For example, in an embodiment, RREF=240 ohms, and RN=120 ohms. Other values may be used. However, larger values of RN (e.g., 70% of RREF) require larger layout area and transistor sizes for first NMOS transistors MN0, MN1, . . . , MN30. Smaller values of RN (e.g., 30% of RREF) may result in larger shoot-through current due to stronger non-linearity. Thus, a value of RN of about 50% of RREF is a good compromise between these two alternatives.
In particular, impedance calibration circuit 900a can target plural resistances instead of targeting a fixed resistance. When the non-linearity of the pull-up and pull-down transistor is larger (as a result of variations in process, voltage and temperature), the impedance error will be smaller if a lower target resistance is used. To use a lower target resistance, impedance calibration circuit 900a uses N ODT replica circuits 9300, 9301, . . . , 930N-1. When an impedance calibration is executed, replica selection circuit 908, which is controlled by calibration control logic 316, selects one of N ODT replica circuits 9300, 9301, . . . , 930N-1 based on process, voltage and temperature information provided by power supply detector circuit 902, temperature detector circuit 904, memory 906.
Each of ODT replica circuits 9300, 9301, . . . , 930N-1 has a first output terminal OUT1 coupled to a first terminal of first switch SW1 and an impedance adjustment terminal ZQ, and a second output terminal OUT2 coupled to a second terminal of first switch SW1. Reference resistor RREF has a first terminal coupled to impedance adjustment terminal ZQ, and a second terminal coupled to GROUND. In an embodiment, reference resistor RREF is 240 ohms, although other values may be used.
First PMOS transistors MZP0, MZP1, . . . , MZP30 are coupled in parallel between power supply VCCQ and a first terminal of first pull-up resistor RZP, which has a second terminal coupled to first output terminal OUT1. Each of first PMOS transistors MZP0, MZP1, . . . , MZP30 has a width/length of WTPm/LTP. First pull-up resistor RZP has a width/length of WRP/LRPm.
Second PMOS transistors MP0, MP1, . . . , MP30 are coupled in parallel between power supply VCCQ and a first terminal of second pull-up resistor RP, which has a second terminal coupled to second output terminal OUT2. Each of second PMOS transistors MP0, MP1, . . . , MP30 has a width/length of WTPm/LTP. Second pull-up resistor RP has a width/length of WRP/LRPm.
First NMOS transistors MN0, MN1, . . . , MN30 are coupled in parallel between GROUND and a first terminal of pull-down resistor RN, which has a second terminal coupled to second output terminal OUT2. Each of first NMOS transistors MN0, MN1, . . . , MN30 has a width/length of WTNm/LTN. Pull-down resistor RN has a width/length of WRN/LRNm.
With respect to resistor width/length values WRP/LRPm and WRN/LRNm, the wider the width, the lower the impedance of the resistor, and the shorter the length, the lower the impedance of the resistor. With respect to linearity, the greater the ratio WTPm/LTP, the more linear is the on-resistance of the transistor, and the lower the ratio WTNm/LTN, the more linear is the resistance of the resistor. However, generally transistor and resistor size increases for better linearity.
The width/length values for first PMOS transistors MZP0, MZP1, . . . , MZP30, second PMOS transistors MP0, MP1, . . . , MP30, first NMOS transistors MN0, MN1, . . . , MN30, first pull-up resistor RZP, second pull-up resistor RP and pull-down resistor RN are:
where WTP/LTP, WTN/LTN, WRP/LRP and WRN/LRN are nominal width/length values for first PMOS transistors MZP0, MZP1, . . . , MZP30, second PMOS transistors MP0, MP1, . . . , MP30, first NMOS transistors MN0, MN1, . . . , MN30, first pull-up resistor RZP, second pull-up resistor RP and pull-down resistor RN, respectively, Xm is the scalar coefficient associated with ODT replica circuit 930m, and Y=(2×RTT)/RREF, where (2×RTT) is a nominal target resistance. In an example embodiment, (2×RTT)=300 ohms and RREF=240 ohms, although other values may be used.
In an example embodiment, X0=1, X1=0.95, X2=0.90, . . . , although other scalar coefficient values may be used, and may be empirically determined. In such an embodiment, ODT replica circuit 9300 (with X0=1) may be used for targeting the nominal impedance (2×RTT), ODT replica circuit 9301 (with X1=0.95) may be used for targeting an impedance 0.95×(2×RTT), ODT replica circuit 9302 (with X2=0.90) may be used for targeting an impedance 0.90×(2×RTT), and so on. ODT replica circuit 9301 may be used instead of ODT replica circuit 9300 when in the ODT structure resistance varies low and transistor impedance varies high (i.e., the impedance linearity is worse). The same principle applies for both the replica ODT pull-down structure and the replica ODT pull-up structure.
Referring again to
In an embodiment, replica selection circuit 908 can use a look up table (LUT), such as depicted in
After replica selection circuit 908 selects one of ODT replica circuits 9300, 9301, . . . , 930N-1, calibration control logic 316 performs a calibration. In an embodiment, calibration control logic 316 may be a state machine that receives signal LZ and performs calibration, such as ZQ calibration described above. Persons of ordinary skill in the art will understand that the multiple target impedance method also may be applied to OCD calibration.
where VIH, VIL, IDQ(VIH) and IDQ (VIL) are input high voltage (e.g., 0.8*VCCQ), input low voltage (e.g., 0.2*VCCQ), the current that flows into the DQ pin when the voltage at the DQ pin, VDQ=VIH, and the current that flow into the DQ pin when VDQ=VIL, respectively. At first, the impedance calibration function adjusts pull-up Ion such that Ion(50% of VCCQ) and (50% of VCCQ)/200 ohms match (at the dot in the center of the chart). Then the impedance calibration function adjusts pull-down Ion such that pull-up Ion(50% of VCCQ) and pull-down Ion(50% of VCCQ) match.
Because both the pull-up ODT structure and the pull-down ODT structure turn ON when the ODT circuit is on, IDQ(VIH)=pull-up Ion(VIH)−pull down Ion(VIL), i.e., the length of the line segment “de.” In addition, IDQ(VIL)=pull-up Ion(VIL)−pull-down Ion(VIL), i.e., the length of the line segment “ab.” If the ODT structures were composed of only pure resistance of 200 ohms, IDQ(VIH) would be the length of the line segment “df,” and IDQ(VIL) would be the length of the line segment “ac.” RTT would exactly be 100 ohms. So the larger (the length of the line segment “bc”+the length of the line segment “ef”), the greater is the RTT error.
When the impedance calibration function targets 200 ohms for pull-up ODT structure, RTT is 155 ohms for the case of the chart in
In contrast to impedance calibration circuit 900a of
For example, to reduce the target impedance, replica selection circuit 908 selects a VREF voltage higher than 0.5*VCCQ during pull-up ODT structure calibration. As a result, the pull-up ODT structure then needs to achieve lower impedance, so that the target impedance is reduced. During pull-down ODT structure calibration, VREF is set to 0.5*VCCQ because the pull-up ODT structure has already been adjusted to a lower impedance, and the pull-down ODT structure impedance is adjusted to match the pull-up structure impedance
An example embodiment of ODT replica circuit 930s is depicted in
First PMOS transistors MZP0, MZP1, . . . , MZP30 are coupled in parallel between power supply VCCQ and a first terminal of first pull-up resistor RZP, which has a second terminal coupled to first output terminal OUT1. Each of first PMOS transistors MZP0, MZP1, . . . , MZP30 has a width/length of WTPs1/LTPs1. First pull-up resistor RZP has a width/length of WRPs1/LRPs1.
Second PMOS transistors MP0, MP1, . . . , MP30 are coupled in parallel between power supply VCCQ and a first terminal of second pull-up resistor RP, which has a second terminal coupled to second output terminal OUT2. Each of second PMOS transistors MP0, MP1, . . . , MP30 has a width/length of WTPs2/LTPs2. Second pull-up resistor RP has a width/length of WRPs2/LRPs2.
First NMOS transistors MN0, MN1, . . . , MN30 are coupled in parallel between GROUND and a first terminal of pull-down resistor RN, which has a second terminal coupled to second output terminal OUT2. Each of first NMOS transistors MN0, MN1, . . . , MN30 has a width/length of WTNs/LTNs. Pull-down resistor RN has a width/length of WRNs/LRNs.
The width/length values for first PMOS transistors MZP0, MZP1, . . . , MZP30, second PMOS transistors MP0, MP1, . . . , MP30, first NMOS transistors MN0, MN1, . . . , MN30, first pull-up resistor RZP, second pull-up resistor RP and pull-down resistor RN are:
where WTP/LTP, WTN/LTN, WRP/LRP and WRN/LRN are nominal width/length values for first PMOS transistors MZP0, MZP1, . . . , MZP30, second PMOS transistors MP0, MP1, . . . , MP30, first NMOS transistors MN0, MN1, . . . , MN30, first pull-up resistor RZP, second pull-up resistor RP and pull-down resistor RN, respectively, Y1=(2×RTT)/RREF, where (2×RTT) is a nominal target resistance for first PMOS transistors MZP0, MZP1, . . . , MZP30 and first pull-up resistor RZP, and Y2=RTT2/RREF, where RTT2 is a nominal target resistance for second PMOS transistors MP0, MP1, . . . , MP30, first NMOS transistors MN0, MN1, . . . , MN30, pull-up resistor RP and pull-down resistor RN.
Accordingly, it can be seen that in one embodiment, an impedance calibration circuit is provided for off-chip driver/on-die termination circuits. The impedance calibration circuit includes a first circuit receiving first control signals, second control signals, a third control signal and a fourth control signal. The first circuit includes a plurality of first PMOS transistors coupled in parallel between a power supply terminal and a first output terminal, each of the first PMOS transistors coupled to a corresponding one of the first control signals; a plurality of second PMOS transistors coupled in parallel between the power supply terminal and a second output terminal, each of the second PMOS transistors coupled to a corresponding one of the first control signals; a plurality of first NMOS transistors coupled in parallel between the second output terminal and a GROUND terminal, each of the first NMOS transistors coupled to a corresponding one of the second control signals; a third PMOS transistor coupled in parallel with the plurality of first PMOS transistors between a power supply terminal and a first output terminal, and coupled to the third control signal; and a second NMOS transistor coupled in parallel with the plurality of first NMOS transistors between the second output terminal and a GROUND terminal, and coupled to the fourth control signal.
In another embodiment, an impedance calibration circuit is provided for off-chip driver/on-die termination circuits. The impedance calibration circuit includes a first circuit receiving first control signals and second control signals. The first circuit includes a plurality of first PMOS transistors coupled in parallel between a power supply terminal and a first terminal of a first resistor, each of the first PMOS transistors coupled to a corresponding one of the first control signals, the first terminal of the first resistor coupled to the first output terminal; a plurality of second PMOS transistors coupled in parallel between the power supply terminal and a first terminal of a second resistor, each of the second PMOS transistors coupled to a corresponding one of the first control signals, the second resistor including a second terminal coupled to the second output terminal; and a plurality of first NMOS transistors coupled in parallel between the second output terminal and a GROUND terminal, each of the first NMOS transistors coupled to a corresponding one of the second control signals.
In another embodiment, an impedance calibration circuit is provided for off-chip driver/on-die termination circuits. The impedance calibration circuit includes a first circuit receiving first control signals, second control signals, a third control signal and a fourth control signal. The first circuit includes a plurality of first PMOS transistors coupled in parallel between a power supply terminal and a first terminal of a first resistor, each of the first PMOS transistors coupled to a corresponding one of the first control signals, the first resistor comprising a second terminal coupled to the first output terminal; a plurality of second PMOS transistors coupled in parallel between the power supply terminal and a first terminal of a second resistor, each of the second PMOS transistors coupled to a corresponding one of the first control signals, the second resistor comprising a second terminal coupled to the second output terminal; a plurality of first NMOS transistors coupled in parallel between a first terminal of a third resistor and a GROUND terminal, each of the first NMOS transistors coupled to a corresponding one of the second control signals, the third resistor comprising a second terminal coupled to the second output terminal; a third PMOS transistor coupled in parallel with the plurality of first PMOS transistors between the power supply terminal and the first terminal of the first resistor, and coupled to the third control signal; and a second NMOS transistor coupled in parallel with the plurality of first NMOS transistors between the first terminal of the third resistor and the GROUND terminal, and coupled to the fourth control signal.
In another embodiment, an impedance calibration circuit is provided for off-chip driver/on-die termination circuits. The impedance calibration circuit includes a plurality of first circuits and a selector circuit configured to received process, temperature and power supply data and provide the enable signals to the plurality of first circuits. Each first circuit receives first control signals, second control signals, and a corresponding enable signal. Each of the first circuits includes a plurality of first PMOS transistors coupled in parallel between a power supply terminal and a first terminal of a first resistor, each of the first PMOS transistors coupled to a corresponding one of the first control signals, the first resistor including a second terminal coupled to the first output terminal; a plurality of second PMOS transistors coupled in parallel between the power supply terminal and a first terminal of a second resistor, each of the second PMOS transistors coupled to a corresponding one of the first control signals, the second resistor including a second terminal coupled to the second output terminal; and a plurality of first NMOS transistors coupled in parallel between a first terminal of a third resistor and a GROUND terminal, each of the first NMOS transistors coupled to a corresponding one of the second control signals, the third resistor including a second terminal coupled to the second output terminal.
In still another embodiment, an impedance calibration circuit is provided for off-chip driver/on-die termination circuits. The impedance calibration circuit includes a first circuit receiving first control signals and second control signals, a comparator including a first input terminal, a second input terminal, and an output terminal, and a selector circuit configured to received process, temperature and power supply data and provide one of a plurality of reference voltages to the second input terminal of the comparator. The first input terminal of the comparator is selectively coupled to the first output terminal and the second output terminal of the first circuit. The first circuit includes a plurality of first PMOS transistors coupled in parallel between a power supply terminal and a first terminal of a first resistor, each of the first PMOS transistors coupled to a corresponding one of the first control signals, the first resistor including a second terminal coupled to the first output terminal; a plurality of second PMOS transistors coupled in parallel between the power supply terminal and a first terminal of a second resistor, each of the second PMOS transistors coupled to a corresponding one of the first control signals, the second resistor including a second terminal coupled to the second output terminal; and a plurality of first NMOS transistors coupled in parallel between a first terminal of a third resistor and a GROUND terminal, each of the first NMOS transistors coupled to a corresponding one of the second control signals, the third resistor including a second terminal coupled to the second output terminal.
Corresponding methods, systems and computer- or processor-readable storage devices for performing the methods provided herein are provided.
The foregoing detailed description has been presented for purposes of illustration and description. It is not intended to be exhaustive or limited to the precise form disclosed. Many modifications and variations are possible in light of the above teaching. The described embodiments were chosen in order to best explain the principles of the technology and its practical application, to thereby enable others skilled in the art to best utilize the technology in various embodiments and with various modifications as are suited to the particular use contemplated. It is intended that the scope of the technology be defined by the claims appended hereto.