Claims
- 1. A system automated for providing stabilization of a chemical bath, including at least periodic removal of metal ions and contaminants from the chemical bath, said system comprising:
- a first tank containing deionized water (DI water);
- a second tank containing chemical regenerant;
- a third tank containing a chemical bath comprising a fluid mixture;
- an ion exchange (IEX) column containing ion exchange resin for removing metal ion contaminants from said chemical bath passed therethrough;
- a waste port for discharging waste products from said system for treatment;
- first pump means energizable by a first pump control signal;
- second pump means energizable by a second pump control signal;
- first valve means connected in series with said first pump means, and said IEX column, between said third tank and said waste port;
- second valve means connected in a series loop with said first pump means, said IEX column, and said third tank, for providing a fluid path for passing said chemical bath from said third tank, through said IEX column, and returning from said IEX column back to said third tank;
- third valve means connected in series with said second pump means and said IEX column, between said first tank and said third tank;
- fourth valve means connected in series with said second pump means and said IEX column, between said first tank and said waste port, for providing a fluid path for DI water to flow through said IEX column in one direction;
- fifth valve means connected in series with said second pump means and said IEX column, between said second tank and said waste port; and
- controller means programmed to provide an automatic process control sequence for successive states of operation including:
- a first state for removing residual DI water from said IEX column, and discharging from said waste port the DI water removed, said first state programming including:
- means for producing and applying operating signals to said first valve means for opening the same; and
- means for producing and applying said first pump control signal to said first pump means for pumping a predetermined quantity of said chemical bath into said IEX column, for displacing excess DI water therefrom, and discharging the excess DI water from said waste port; and
- a second state for feeding said chemical bath through said IEX column, for removing metal ions from said chemical bath, said second state programming including:
- means for producing and applying operating signals to said second valve means for opening the same; and
- means for producing and applying said first pump control signal to said first pump means for pumping a predetermined quantity of said chemical bath through said IEX column for treatment, and therefrom back to said third tank.
- 2. The system of claim 1, further including means for programming said controller means for a third state for removing residual chemical bath from said IEX column, and returning the residual chemical bath to said third tank, said third state programming means including:
- means for producing and applying operating signals to said third valve means for opening the same; and
- means for producing and applying said second pump control signal to said second pump means for pumping a predetermined quantity of DI water into said IEX column, for displacing residual chemical bath, forcing the latter to return to said third tank.
- 3. The system of claim 2, further including means for programming said controller means for a fourth state for a first rinsing of said IEX column with DI water, and discharging the DI water from said waste port, said fourth state programming means including:
- means for producing and applying operating signals to said fourth valve means for opening the same; and
- means for producing and applying said second pump control signal to said second pump means for pumping a first predetermined quantity of DI water through said IEX column in one direction, and therefrom to said waste port.
- 4. The system of claim 3, further including means for programming said controller means for a fifth state for flushing said IEX column with said chemical regenerant, for regenerating resin material in said IEX column, said fifth state programming means including:
- means for producing and applying said operating signals to said fifth valve means for opening the same; and
- means for producing and applying said second pump control signal to said second pump means for pumping a predetermined quantity of chemical regenerant through said IEX column, and therefrom to said waste port.
- 5. The system of claim 4, further including means for programming said controller means for a sixth state for a second rinsing of said IEX column with DI water after completion of said fifth state of operation, said sixth state programming means including:
- means for producing and applying said operating signals to said fourth valve means for opening the same; and
- means for producing and applying said second pump control signal to said second pump means for pumping a second predetermined quantity of DI water through said IEX column in one direction, and therefrom to said waste port.
- 6. The system of claim 5, further including:
- sixth valve means connected in series with said second pump means and said IEX column, between said first tank and said waste port, for providing a fluid path for DI water to flow through said IEX column in an opposite direction relative to said one direction, for insuring substantially all foreign particulates are removed from said IEX column.
- 7. The system of claim 5, further including:
- first filter means connected between said third tank and said IEX column in a series fluid circuit also including said first valve means and said second valve means, respectively, for filtering said chemical bath before it passes into said IEX column.
- 8. The system of claim 7, further including:
- second filter means connected between said third tank and said IEX column in a series fluid circuit also including said first valve means, for filtering said chemical bath after treatment through said IEX column, and before it returns to said third tank.
- 9. The system of claim 8, further including:
- first and second pressure sensing means connected to said first and second filter means, respectively, for producing respective pressure signals indicative of the operating condition of said first and second filters, respectively;
- said controller means being responsive to said pressure signals from said first and second pressure sensing means, for generating a first clogging signal if the differential pressure across said first filter increases above a predetermined magnitude, and a second clogging signal if outlet pressure at said second filter decreases to below a predetermined magnitude;
- alarm means responsive to said first and second clogging signals, for both generating individual alarms indicative of clogging of said first and second filters, respectively; and
- said controller means being further responsive to said pressure signals, for completing either of said first and second states of operating that may be in progress, and for thereafter inhibiting further operation of said system until said first and second filters are both operative.
- 10. The system of claim 8, further including:
- first sensing means connected across said first filter means, for producing a first pressure signal if the differential pressure across said first pressure means increases above a predetermined value;
- said controller means being responsive to said first pressure signal, for generating a first alarm signal, and completing said first or second states of operation, if either is operative, and inhibiting further states of operation until the differential pressure problem is corrected; and
- first alarm means responsive to said first alarm signal, for producing an alarm indicative of the pressure problem to alert an operator to take necessary corrective action.
- 11. The autodeposition system of claim 10, further including:
- second pressure sensing means connected to an outlet of said second filter means, for producing a second pressure signal if the outlet pressure reduces to below a predetermined magnitude;
- said controller means being responsive to said second pressure signal for generating a second alarm signal, completing said first or second states of operation, if either is operative, and inhibiting further states of operation until proper pressure is restored; and
- second alarm means responsive to said second alarm signal, for producing an alarm indicative of the undesirable reduction in outlet pressure.
- 12. The system of claim 5, further including:
- first stroke means connected to said first pump means, for producing first stroke signals indicative of each stroke of said first pump means; and
- said controller means being programmed for counting said first stroke signals, for determining the amount of said chemical bath pumped by said first pump means over a period of time.
- 13. The system of claim 12, further including:
- second stroke means connected to said second pump means, for producing second stroke signals indicative of each stroke of said second pump means; and
- said controller means being programmed for counting said second stroke signals, for determining the amount of fluid being pumped by said second pump means in pumping either DI water or chemical regenerant over a period of time.
- 14. The system of claim 5, further including:
- alarm means connected to said first through fifth valve means, for both sensing faulty operation thereof, and producing an alarm signal indicative of such faulty operation of at least one of said first through fifth valve means.
- 15. The system of claim 14, wherein said alarm means further includes means for producing individual alarm signals indicative of each defaulting valve included in said first through fifth valve means, respectively.
- 16. The system of claim 14, wherein said controller means further includes means responsive to said alarm signal, for terminating any operation of said first and second pump means until after the malfunction is corrected.
RELATED INVENTION
This is a Divisional application of U.S. Ser. No. 08/231,075, filed on Nov. 7, 1994, which is itself a Divisional application of Ser. No. 08/008,956, filed on Jan. 26, 1993, now U.S. Pat. No. 5,393,416.
The invention of the present application is related to the commonly assigned invention of application Ser. No. 07/847,543, filed on Mar. 6, 1992, now abandoned, for "PROCESS FOR SEPARATING MULTIVALENT METAL IONS FROM AUTODEPOSITION COMPOSITIONS AND PROCESS FOR REGENERATING CHELATING TYPE ION EXCHANGE RESINS USEFUL THEREWITH". The teachings of this application are incorporated into this present application in their entirety by reference, provided any such teachings are not inconsistent with any teaching herein.
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CAX |
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Entry |
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Divisions (2)
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Number |
Date |
Country |
Parent |
231075 |
Nov 1994 |
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Parent |
08956 |
Jan 1993 |
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