1. Field of the Invention
The present invention relates to an applied film forming apparatus and applied film forming method that form an applied film by spreading an applied film forming material on one surface of a substrate.
2. Description of the Related Art
Spin coating is conventionally known as a method of forming an applied film on one surface of a substrate used for an information recording medium. During spin coating, an applied material is dripped onto one surface of the substrate and the substrate is then rotated at high speed to spread out the applied material using centrifugal force. Accordingly, by carrying out spin coating, it is possible to form an applied film with a comparatively uniform thickness. On the other hand, when an applied material is spread out by spin coating, since the applied material protrudes beyond an outer circumferential edge part of the substrate due to centrifugal force, when the rotational velocity of the substrate falls at the end of spin coating, the protruding applied material is pulled back toward the outer circumferential edge part by the surface tension of the applied material itself, resulting in an upward convex part being formed at the outer circumferential edge part. In the case, for example, of an information recording medium where the thickness of the applied film on a side of the substrate on which a laser beam for recording (or reading) data is incident is set at around 100 μm and the distance (working distance) between an optical pickup of a drive apparatus and the applied film during driving is set at around 1001 μm, if the convex part is large, there is the risk of problems occurring due to the optical pickup of the drive apparatus contacting the convex part. As one technology for solving the above problem, Japanese Laid-Open Patent Publication No. H11-86355 discloses a manufacturing method that manufactures an optical disc (an information recording medium) by removing the convex part in a trimming process. In this manufacturing method, a UV-curing resin (hereinafter, referred to simply as “resin”) is applied to a substrate by spin coating. After this, UV rays are emitted to cure the applied resin. By doing so, a disc that has a light-transmitting layer formed on a signal surface of the substrate is completed. In this case, a convex part (a built-up part) made of resin is formed as described above at the outer circumferential edge part of the disc in this state. Next, the trimming process is carried out. More specifically, a trimming tool is pressed onto the outer circumferential edge part of the disc while the disc is being rotated. When doing so, the outer circumferential edge part (i.e., the cured resin) of the disc is cut away by the tool, thereby removing the convex part formed at the outer circumferential edge part of the disc.
By investigating the manufacturing method described above, the present inventors discovered the following problem. That is, in the above manufacturing method, after the resin applied onto the substrate has been cured, a trimming process that cuts away the resin using a tool is carried out. In this case, when the cured resin is cut away, the resin is pulverized and scattered, and may adhere to the disc. Accordingly, this manufacturing method has a problem in that errors may occur during use of the disc (optical disc) due to pulverized resin adhering to the disc. Here, it may be thought that the pulverized resin adhering to the disc could be removed by additionally carrying out a cleaning step. However, by doing so, the manufacturing cost will rise by the cost of adding the cleaning step, which makes such a method difficult to adopt.
The present invention was conceived in view of the problems described above and it is a principal object of the present invention to provide an applied film forming apparatus and an applied film forming method that can form, without a large increase in manufacturing cost, an applied film with no convex part that protrudes significantly upward at an outer circumferential edge part.
To achieve the above object, an applied film forming apparatus according to the present invention forms an applied film on one surface of a substrate and includes: a dripping unit that drips an energy beam-curing applied material onto the one surface of the substrate; a rotating unit that rotates the substrate; a curing processing unit that emits an energy beam onto the applied material to cure the applied material; an emission regulating unit that regulates emission of the energy beam onto the applied material on an outer circumferential edge part of the one surface; and a control unit, wherein after controlling the dripping unit to drip the applied material onto the one surface and controlling the rotating unit to rotate the substrate and cause the applied material to spread out, the control unit controls the curing processing unit to emit the energy beam toward the one surface and controls the emission regulating unit to regulate the emission of the energy beam onto the applied material on the outer circumferential edge part while controlling the rotating unit to rotate the substrate at a predetermined rotational velocity. It should be noted that the term “cured” in the present specification includes all cured states from a cured state where the fluidity of the applied material has fallen to a cured state where a curing reaction has occurred for all of the applied material.
The applied film forming method according to the present invention spreads out an energy beam-curing applied material on one surface of a substrate and emits an energy beam onto the spread-out applied material to cure the applied material and form an applied film on the one surface, wherein after the applied material is spread out, the energy beam is emitted toward the one surface and emission of the energy beam onto the applied material on an outer circumferential edge part of the one surface is regulated in a state where the substrate is rotated at a predetermined rotational velocity.
According to the above applied film forming apparatus and applied film forming method, after the applied material has been dripped onto the one surface and the substrate has been rotated to cause the applied material to spread out, the energy beam is emitted toward the one surface of the substrate and the emission of the energy beam onto the applied material on the outer circumferential edge part of the one surface of the substrate is regulated in a state where the substrate is rotated at a predetermined rotational velocity. For this reason, by rotating the substrate in a state where the applied material applied to parts of the one surface of the substrate aside from the outer circumferential edge part has been cured, it is possible to push only the small amount of applied material on the outer circumferential edge part outside the substrate by centrifugal force. This means it is possible to suppress the amount of applied material pulled back onto the outer circumferential edge part when the rotation stops to a sufficiently small amount, and as a result it is possible to prevent a large convex part from being formed on the outer circumferential edge part. Since a cutting away process for the applied material after curing can be made unnecessary, a cleaning step of removing the pulverized applied material produced by the cutting away process also becomes unnecessary, and therefore an applied film with no large convex part on an outer circumferential edge part thereof can be formed without causing an increase in the manufacturing cost due to such process and step. Also, by emitting an energy beam in a state where the substrate is rotated, the applied film can be formed with a more uniform thickness compared to a construction that emits an energy beam in a state where the substrate is stopped.
Also, according to the above applied film forming apparatus and applied film forming method, the step of dripping the applied material onto the one surface of the substrate, the step of spreading out the dripped applied material, and the step of emitting the energy beam onto the one surface of the substrate are carried out without changing the position of the substrate, that is, with the substrate positioned at a single location. For this reason, compared to an applied film forming apparatus and applied film forming method that carry out the various steps at different positions, the time taken to form the applied film on the substrate can be reduced by an amount corresponding to the movement of the substrate that is no longer required. Also, by carrying out the various steps with the substrate positioned at a single location, the construction of the entire applied film forming apparatus can be made more compact by an amount corresponding to movement of the substrate no longer being necessary. Additionally, since the construction of the applied film forming apparatus can be simplified by an amount corresponding to a moving device for moving the substrate not being necessary, the cost of the applied film forming apparatus can be kept low.
In this case, the emission regulating unit may include a plurality of shielding members that in a connected state construct a plate-like body in which a circular opening with a slightly smaller diameter than a diameter of the substrate is formed, and a moving mechanism for moving and connecting the shielding members to construct the plate-like body, wherein the control unit may control the movement mechanism to move and connect the shielding members to regulate the emission of the energy beam on the applied material on the outer circumferential edge part. It is also possible to use a method where the emission of the energy beam onto the applied material on the outer circumferential edge part is regulated by connecting a plurality of shielding members that in a connected state construct a plate-like body in which a circular opening with a slightly smaller diameter than a diameter of the substrate is formed. According to this applied film forming apparatus and applied film forming method, compared to a construction where the shielding members are formed as an integral body, for example, it is possible to reduce the area of a withdrawal position of the shielding members when the shielding members are not in use and therefore a corresponding reduction can be made in the size of the applied film forming apparatus.
It is also possible to use a construction where gaps between the respective shielding members in the connected state and the outer circumferential edge part are respectively in a range of 2 mm to 10 mm, inclusive. It is also possible to use a method where the respective shielding members are connected so that gaps between the respective shielding members in the connected state and the outer circumferential edge part are respectively in a range of 2 mm to 10 mm, inclusive. According to this applied film forming apparatus and applied film forming method, it is possible to reliably regulate the emission of the energy beam onto the applied material on the outer circumferential edge part. Also, even if the substrate vibrates due to rotation, for example, it is possible to reliably avoid contact between the outer circumferential edge part and the shielding members.
It is also possible to use a construction including a wall part that is disposed close to a side surface of the substrate during spreading out and causes the applied material that protrudes outside the substrate to flow downward along the side surface of the substrate. In the applied film forming method also, a wall part may be disposed close to a side surface of the substrate during spreading out and may cause the applied material that protrudes outside the substrate to flow downward along the side surface of the substrate. According to this applied film forming apparatus and applied film forming method, an applied film that is continuous from the surface to the side surface of the substrate can be formed. For this reason, it is possible to reliably prevent the applied film from becoming detached from the substrate due to an impact or contact with an object. In addition, since the applied film is formed on the side surface of the substrate, it is possible to reliably prevent damage to the side surface due to an impact or contact with an object.
It should be noted that the disclosure of the present invention relates to a content of Japanese Patent Application 2004-290789 that was filed on Oct. 1, 2004 and the entire content of which is herein incorporated by reference.
These and other objects and features of the present invention will be explained in more detail below with reference to the attached drawings, wherein:
Preferred embodiments of an applied film forming apparatus and an applied film forming method according to the present invention will now be described with reference to the attached drawings.
First, the construction of an optical recording medium 1 will be described with reference to the drawings.
As shown in
As one example, the information layer 12 is a functional layer composed of a reflective layer, a dielectric layer, a phase-change-type recording layer, and the like, and is formed using an information layer forming device 23 (see
Next, the construction of the manufacturing apparatus 21 for manufacturing the optical recording medium 1 will be described with reference to the drawings.
As shown in
The resin layer forming device 24 corresponds to the applied film forming apparatus according to the present invention, and as shown in
As shown in
As shown in
The moving mechanism 62 corresponds to a “moving mechanism” for the present invention and as shown in
As shown in
The energy ray emitting unit 34 corresponds to a “curing processing unit” for the present invention and as shown in
In this case, in the resin layer forming device 24, the dripping of the resin material R onto the surface of the substrate 11, the spreading of the dripped resin material R, and the emission of the UV rays toward the surface of the substrate 11 are carried out without moving the substrate 11 from the turntable 51, that is, in a state where the substrate 11 is mounted on the turntable 51. For this reason, compared to an applied film forming apparatus that carries out the various steps at different positions, the construction of the entire resin layer forming device 24 can be made more compact by an amount corresponding to movement of the substrate 11 no longer being necessary. Also, since the construction of the resin layer forming device 24 can be simplified by an amount corresponding to a moving device for moving the substrate 11 not being necessary, the cost of the resin layer forming device 24 can be kept low.
The center hole forming device 25 includes, for example, a tubular punching-out blade, a moving mechanism that raises and lowers the punching-out blade, and an ultrasonic generator for ultrasonically vibrating the punching-out blade (none of such components is shown), and forms the attachment center hole 1a by punching out a part of the preform 2 (see
Next, a manufacturing method that manufactures the optical recording medium 1 using the manufacturing apparatus 21 will be described with reference to the drawings, focusing on the method (the applied film forming method according to the present invention) that forms the resin layer 13 using the resin layer forming device 24.
First, using the substrate fabricating device 22 of the manufacturing apparatus 21, the substrate 11 is fabricated by injection molding polycarbonate, for example. In this case, a convex/concave pattern of a stamper set inside an injection molding mold (neither is shown) of the substrate fabricating device 22 is transferred to form a groove pattern in the surface side of the substrate 11. Next, using the information layer forming device 23 of the manufacturing apparatus 21, the reflective layer, the dielectric layer, the phase-change-type recording layer, and another dielectric layer are laminated in that order on the surface of the substrate 11 by sputtering to form the information layer 12.
Next, using the resin layer forming device 24 of the manufacturing apparatus 21, the resin layer 13 is formed on the substrate 11 so as to cover the information layer 12. More specifically, as shown in
In this case, the control unit 36 first controls the emission regulating unit 33 to have a shield member moving step (step 101 in
Next, the control unit 36 drives a suction pump, not shown, that is connected to the suction opening 38b of the cover 38. At this time, as air (gas) inside the cover 38 is sucked out from the suction opening 38b, outside air flows into the cover 38 from the gaps between the surface outer circumferential edge part 11c of the substrate 11 and the respective shielding members 61 and the gaps between the edge of the opening 38a of the cover 38 and the respective shielding members 61. Next, the control unit 36 controls the motor 52 of the rotating unit 32 and as shown in
Next, the control unit 36 controls the rotating unit 32 to have a spreading step (step 103 shown in
Next, the control unit 36 controls the rotating unit 32 and the energy ray emitting unit 34 to have a first curing step (step 104 shown in
Next, the control unit 36 controls the energy ray emitting unit 34 to maintain the emission of UV rays and has the rotational velocity of the motor 52 reduced to an intermediate velocity (for example, 1400 rpm). Next, after having the emission of UV rays by the energy ray emitting unit 34 stopped, the control unit 36 has the motor 52 maintain the rotational velocity of 1400 rpm for a predetermined period. At this time, as shown in
Next, the control unit 36 controls the electromagnetic valve of the cam mechanism 71 of the moving mechanism 62 so that air is supplied to another air supply opening of the air cylinder 81 shown in
Next, the control unit 36 controls the energy ray emitting unit 34 to have a second curing step (step 105 shown in
In this case, in the method of forming the resin layer 13 (the applied film forming method according to the present invention), the dripping step (step 102 shown in
Next, the substrate 11 is removed from the turntable 51 and taken out of the opening 38a of the cover 38. By doing so, as shown in
In this way, according to the resin layer forming device 24 and the applied film forming method, after the resin material R is dripped onto the surface of the substrate 11 and the substrate 11 has been rotated to spread out the resin material R, UV rays are emitted toward the surface of the substrate 11 in a state where the substrate 11 is rotated at a predetermined rotational velocity and the emission of UV rays onto the resin material R on the surface outer circumferential edge part 11c is regulated, so that by rotating the substrate 11 in a state where the resin material R applied to parts of the substrate 11 aside from the surface outer circumferential edge part 11c has been cured, only the small amount of resin material R on the surface outer circumferential edge part 11c is pushed out beyond the substrate 11 by centrifugal force. For this reason, it is possible to suppress the amount of resin material R pulled back toward the surface outer circumferential edge part 11c when the rotation is stopped to a sufficiently small amount, and as a result, it is possible to prevent a large convex part from being formed on the surface outer circumferential edge part 11c. Since a cutting away process for the resin material R after curing can be made unnecessary, a cleaning step of removing the pulverized applied material produced by the cutting away process also becomes unnecessary, and therefore the resin layer 13 with no large convex part on the surface outer circumferential edge part 11c can be formed without causing an increase in the manufacturing cost due to such process and step. Also, by emitting UV rays in a state where the substrate 11 is rotated, the resin layer 13 can be formed with a more uniform thickness compared to a construction that emits UV rays in a state where the substrate 11 is stopped.
Also, according to the resin layer forming device 24 and the applied film forming method, the dripping step that drips the resin material R onto the surface of the substrate 11, the spreading step of spreading out the dripped resin material R, and the first curing step and second curing step that cure the resin material R by emitting UV rays toward the surface of the substrate 11 are carried out without moving the substrate 11 from the turntable 51, i.e., in a state where the substrate 11 is mounted on the turntable 51. For this reason, compared to an applied film forming apparatus and an applied film forming method where the respective steps are carried out at different positions, the time taken to form the resin layer 13 can be reduced by an amount corresponding to the movement of the substrate 11 that is no longer required. Also, since the respective steps are carried out with the substrate 11 mounted on the turntable 51, compared to an applied film forming apparatus that carries out the various steps at different positions, the construction of the entire resin layer forming device 24 can be made more compact by an amount corresponding to the movement of the substrate 11 that is no longer necessary. Also, since the construction of the resin layer forming device 24 can be simplified by not requiring a moving device for moving the substrate 11, the cost of the resin layer forming device 24 can be suppressed.
By regulating the emission of UV-rays onto the resin material R on the surface outer circumferential edge part 11c by connecting the shielding members 61 that in a connected state construct the annular body, compared to a construction where the shielding members 61 are formed as an integral body, for example, it is possible to reduce the area of a withdrawal position of the shielding members 61 when the shielding members 61 are not in use and therefore a corresponding reduction can be made in the size of the resin layer forming device 24.
Also, by connecting the respective shielding members 61 so that the gaps between the shielding members 61 in the connected state and the surface outer circumferential edge part 11c of the substrate 11 are around 5 mm that is in a range of 2 mm to 10 mm, inclusive, it is possible to reliably regulate the emission of UV rays onto the resin material R on the surface outer circumferential edge part 11c. It is also possible to reliably avoid contact between the shielding members 61 and the surface outer circumferential edge part 11c even if the substrate 11 vibrates due to the rotation, for example.
It should be noted that the present invention is not limited to the construction and method described above. For example, it is also possible to use a resin layer forming device 24A shown in
Also, as shown in
Also, the applied material for the present invention is not limited to the UV-curing resin material R described above, and electron-beam curing resin materials and thermal curing resin materials are also included. Also, the applied material is not limited to resin and the applied material of the present invention also includes various types of organic material. In this case, an energy beam emitting unit that can emit an electron beam or heat rays as an energy beam for curing the resin is used in place of the energy ray emitting unit 34, and by using shielding members that can shield against such energy beam, the resin layer 13 can be formed of the various types of applied materials mentioned above. In addition, although an example where the resin layer 13 that functions as a light-transmitting layer is positioned on the laser-beam emitting side of the substrate has been described, the present invention can be applied when an applied film that functions as a cover layer or the like is formed. Also, although an example has been described for the case when manufacturing the optical recording medium 1 on which only one information layer 12 is formed, the present invention can be applied to forming a spacer layer between respective information layers in a manufacturing process that manufactures a multilayer information recording medium on which a plurality of information layers are formed.
Also, although an example has been described above where the present invention is applied to manufacturing the optical recording medium 1 including the information layer 12 constructed of a reflective layer, a dielectric layer, a phase-change type recording layer, and the like, it is also possible to apply the present invention to manufacturing an information recording medium with a write-once information layer or a read-only information recording medium where a convex/concave pattern for information is formed in the surface of a substrate and a spacer layer.
Number | Date | Country | Kind |
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2004-290789 | Oct 2004 | JP | national |