Arbitrary Concentration Surface Alloys Using Ion Implantation

Information

• NSF Award
• 9060526

Owner

• IMPLANT SCIENCES CORPORATION

• Award Id

  9060526

• Award Effective Date

  1/1/1991 - 33 years ago

• Award Expiration Date

  9/30/1991 - 33 years ago

• Award Amount

  $ 49,586.00

• Award Instrument

  Standard Grant

Ion implantation has been widely used to produce novel non- equilibrium surface alloys and buried layers of new compounds. The method is used commercially for a range of materials requiring wear and corrosion reduction. However, many desirable combinations of allow concentrations have been found to be impossible to obtain due to fundamental limitations imposed by rapid sputtering of the target surface. A novel method is examined here to ion implant heavy metals, which usually saturate at 10-15% concentration due to sputtering, to arbitrarily high concentration (approaching 100%). This technique effectively eliminates the 1/S theoretical limit on concentration. The technology will have numerous applications in high performance, ultra-pure surface alloys.

• Program Officer

  Ritchie B. Coryell

• Min Amd Letter Date

  12/7/1990 - 34 years ago

• Max Amd Letter Date

  12/7/1990 - 34 years ago

• ARRA Amount

• Name

  Implant Sciences Corporation

• City

  Wakefield

• State

  MD

• Country

  United States

• Address

  107 Audubon Road, #5

• Postal Code

  018800128

• Phone Number

  6172460700

• First Name

  Stephen

• Last Name

  Bunker

• Email Address

  mail@implantsciences.com

• Start Date

  1/1/1991 12:00:00 AM

• Name

  Engineering-Metallurgy & Material

• Code

  57

• Name

  Materials Research

• Code

  106000