Claims
- 1. An aromatic carboxylic acid bicyclic sulfur compound of the formula (II), wherein:X1 is one member selected from the group consisting of a C1 to C4 alkyl group, a halogen atom, a C1 to C4 haloalkyl group, a C2 to C4 alkoxyalkyl group, a C1 to C4 alkoxy group and a C1 to C4 haloalkoxy group; X2 is one member selected from the group consisting of a hydrogen atom, a C1 to C4 alkyl group and a C1 to C4 haloalkyl group, or X2 forms a bond with X5; X3 is one member selected from the group consisting of a hydrogen atom, a C1 to C4 alkyl group and a C1 to C4 haloalkyl group; X4 is one member selected from the group consisting of a hydrogen atom, a halogen atom, a C1 to C4 alkyl group, a C1 to C4 haloalkyl group and a C1 to C4 alkoxy group; X5 forms a bond with X2 or X5 forms a bond with X7; each of X6 and X8 is independently a hydrogen atom or a C1 to C4 alkyl group; X7 is a hydrogen atom, a C1 to C4 alkyl group or forms a bond with X5; p is 1; and n is an integer of 0, 1 or 2, or a salt thereof.
- 2. The compound of claim 1, wherein X1 is selected from the group consisting of methyl, ethyl, chlorine, methoxy, ethoxy, propoxy, butoxy, —OCF3, —OC2F5, —OC2H4F, —OC2H4Cl, —OCHF2, —OCH2F, —OCCl3, —OC2H3Cl2 and —OC2H3F2.
- 3. The compound of claim 2, wherein X2 and X3 are each independently selected from the group consisting of hydrogen, methyl, ethyl, —CF3, —C2F5, C2H4F, —CH2Cl, —CHF2, —CCl3, —CH2H3, Cl2 and —C2H3F2.
- 4. The compound of claim 3, wherein X4 is selected from the group consisting of hydrogen, chlorine, methyl, —CF3, —C2H5, C2H4F, —CH2Cl, —CHF2, —CCl3, —C2H3Cl, —C2H3F2, methoxy, ethoxy, propoxy and butoxy.
- 5. The compound of claim 1, wherein X2 and X5 form a bond.
- 6. The compound of claim 1, herein X5 and X7 form a bond.
- 7. A process for producing a pyrazole compound of the formula (I) whereinR1 is one member selected from the group consisting of a hydrogen atom, a C1 to C4 alkyl group, a C1 to C4 haloalkyl group and a C2 to C4 alkoxyalkyl group; R2 is one member selected from the group consisting of an alkyl group, a C2-C4 alkenyl group and a C2-C4 haloalkenyl group; X1 is one member selected from a hydrogen atom, a halogen atom, a C1-C4 alkyl group, a C1-C4 haloalkyl group, a C2-C4 alkoxyalkyl group, a C1-C4 alkoxy group and a C1-C4 haloalkoxy group; each of X2 and X3 is independently one member selected from the group consisting of a hydrogen atom, a C1-C4 alkyl group and a C1-C4 haloalkyl group; X4 is one member selected from the group consisting of a hydrogen atom, a halogen atom, a C1-C4 alkyl group, a C1-C4 haloalkyl group and a C1-C4 alkoxy group; each of X5, X6, X7, and X8 is independently a hydrogen atom or a C1-C4 alkyl group; or a combination of X2 and X5 form a bond or a combination of X5 and X7 form a bond; n is an integer of 0, 1 and 2; p is an integer of 0 or 1; and Q is a hydrogen atom or a group selected from the group consisting of in which R3 is one member selected from the group consisting of a C1-C8 alkyl group, a C3-C8 cycloalkyl group and a group of the formula (V), in which Y is a halogen atom, a nitro group, a C1-C4 alkyl group, a C1-C4 alkoxy group or a C1-C4 haloalkyl group, R4 is one member selected from the group consisting of a C1-C8 alkyl group, a C3-C8 cycloalkyl group, a pyridyl group and a group of the formula (V), R5 is a hydrogen atom or a C1-C4 alkyl group, R6 is one member selected from the group consisting of a hydrogen atom, a C1-C4 alkyl group and a group of the formula (V), and each of R7 and R8 is independently a hydrogen atom or a C1-C4 alkyl group, the process comprising (a) reacting in the presence of an inert solvent, a dehydrating agent and a base, a compound of the formula (III) wherein R1 and R2 are as defined above, with an aromatic carboxylic acid compound of the formula (II) wherein X1 is one member selected from the group consisting of a C1-C4 alkyl group, a halogen atom, a C1-C4 haloalkyl group, a C2-C4 alkoxyalkyl group, a C1-C4 alkoxy group and a C1-C4 haloalkoxy group; each of X2 and X3 is independently one member selected from the group consisting of a hydrogen atom, a C1-C4 alkyl group and a C1-C4 haloalkyl group; X4 is one member selected from the group consisting of a hydrogen atom, a halogen atom, a C1-C4 alkyl group, a C1-C4 haloalkyl group and a C1-C4 alkoxy group; each of X5, X6, X7 and X8 is independently a hydrogen atom or a C1-C4 alkyl group; or a combination of X2 and X5 form a bond or a combination of X5 and X7 form a bond; p is an integer of 0 or 1; and n is an integer of 0, 1 or 2, to produce a pyrazole compound of the formula (Ia) (b) reacting in the presence of an inert solvent and a base, the compound of formula (Ia) with a compound of the formula Q1 wherein Hal is a halogen atom and Q1 is selected from the group consisting of wherein R3, R4, R5, R6, R7 and R8 are as defined above.
Priority Claims (3)
Number |
Date |
Country |
Kind |
5-191428 |
Aug 1993 |
JP |
|
6-71788 |
Apr 1994 |
JP |
|
7-24102 |
Feb 1995 |
JP |
|
Parent Case Info
This application is a continuation application of application Ser. No. 10/218,707, filed Aug. 14, 2002, now abandoned, which is a continuation application of application Ser. No. 10/047,070, filed Jan. 14, 2002 (abandoned), which is a continuation application of application Ser. No. 09/782,729, filed Feb. 13, 2001 (abandoned), which is a continuation application of application Ser. No. 09/546,826, filed Apr. 11, 2000 (abandoned), which is a continuation application of application Ser. No. 09/351,402, filed Jul. 9, 1999 (abandoned), which is a divisional application of application Ser. No. 08/990,657, filed Dec. 15, 1997 (U.S. Pat. No. 6,063,936), which is a divisional application of application Ser. No. 08/727,915, filed Oct. 9, 1996 (U.S. Pat. No. 5,767,289) which is a divisional application of application Ser. No. 08/595,359, filed Feb. 1, 1996 (U.S. Pat. 5,607,898), which is a CIP of International Application PCT/JP94/01264, filed Aug. 1, 1994 (not published in English).
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4609739 |
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Sep 1986 |
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Number |
Date |
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63-122672 |
May 1988 |
JP |
63-122673 |
May 1988 |
JP |
63-170365 |
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JP |
2-173 |
Jan 1990 |
JP |
4-257503 |
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JP |
Continuations (5)
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Number |
Date |
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Parent |
10/218707 |
Aug 2002 |
US |
Child |
10/441749 |
|
US |
Parent |
10/047070 |
Jan 2002 |
US |
Child |
10/218707 |
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US |
Parent |
09/782729 |
Feb 2001 |
US |
Child |
10/047070 |
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US |
Parent |
09/546826 |
Apr 2000 |
US |
Child |
09/782729 |
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US |
Parent |
09/351402 |
Jul 1999 |
US |
Child |
09/546826 |
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US |
Continuation in Parts (1)
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Number |
Date |
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Parent |
PCT/JP94/01264 |
Aug 1994 |
US |
Child |
08/595359 |
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US |