Claims
- 1. Process for the manufacture of styryl compounds which comprises reacting (A) a Schiff base formula ##SPC118##
- wherein h represents hydrogen or halogen and W.sub.6 represents thienyl-2, pyridyl-3, (methylenedioxy-3,4)-phenyl or a phenyl residue ##SPC119##
- wherein R.sub.x denotes halogen, with (B) at least one methyl group of an aromatic carbocyclic six-membered ring compound which (1) contains one to four methyl groups bonded to ring carbon atoms of a benzene ring and (2) contains aromatic rings which are exclusively six-membered carbocyclic rings, and wherein (3) those benzene rings whose methyl groups are to be caused to react are free of other substituents which contain atoms which are replaceable by alkali metal and (4) this compound containing either (a) one benzene ring or (b) two or three fused benzene rings or (c) consists of two to four benzene rings or fused benzene rings bonded to one another by C--C single bonds, or (d) represents an arrangement of two to four benzene rings or fused benzene ring systems which contains one to three linking members being an unsaturated carbon atom chain having 2 to 4 carbon atoms which permits a continuous conjugation from ring to ring, with this reaction being carried out in the presence of a strongly basic alkali compound having a basic strength at least equal to that of lithium hydroxide and with dimethylformamide as the reaction medium, and wherein, in the case where alkali hydroxides are used as the strongly basic alkali compound, these alkali hydroxides may have a water content of up to 25%.
- 2. Process for the manufacture of styryl compounds according to claim 1, wherein the Schiff base is one of the formula ##SPC120##
- wherein h represents hydrogen or halogen and W.sub.6 represents thienyl-2, pyridyl-3, (methylenedioxy-3,4)-phenyl or a phenyl residue ##SPC121##
- wherein R.sub.x denotes halogen, and the aromatic carbocyclic six-membered ring compound contains one benzene ring, a diphenyl residue, a terphenyl residue, a triphenylbenzene residue, a stilbene residue, a 9-styryl-anthracene residue, a .beta.-phenylstilbene residue, a tolane residue, a diphenylbutadiene residue, a naphthalene residue, an anthracene residue or a phenanthrene residue.
- 3. Process according to claim 1 characterized in that a compound of formula ##SPC122##
- wherein m denotes an integer from 1 to 4 and the free valencies not occupied by methyl groups are saturated by hydrogen is reacted with a Schiff base as defined in claim 1.
- 4. Process according to claim 1 characterized in that a diphenyl compound of formula ##SPC123##
- is reacted, wherein the symbols A.sub.1 and A.sub.2 denote a hydrogen atom, a phenyl residue or a diphenyl-4-residue, the symbols B.sub.1 and B.sub.2 indicate that each of the two phenyl groups of the diphenyl skeleton may contain further linearyl or angularly annellated benzene rings p represents an integer from 1 to 3 and m denotes an integer from 1 to 4, wherein (a) the methyl groups indicated in the formula must be bonded to ring carbon atoms of the benzene rings of the formula and (b) the benzene rings carrying methyl groups should be free of substituents of the 2nd order and of such substituents of the 1st order as contain atoms which are replaceable by alkali metal.
- 5. Process according to claim 1 characterized in that a compound of the formula ##SPC124##
- is reacted, wherein X denotes a bridge member of the series --CH=CH--, --CH=CH--CH=CH--, --CH=C--, the symbols G.sub.1 and G.sub.2 represents hydrogen atoms or phenyl groups, v and w represent an integer from 1 to 3 and the symbols K.sub.1 and K.sub.2 indicate that each of the two phenyl groups of the formula may contain further linearyl or angularly annellated benzene rings, m denotes an integer from 1 to 4 and at least one methyl group is intended to be bonded to a ring carbon atom of a phenyl residue of the above formula skeleton, and the benzene rings carrying methyl groups should be free of substituents of the 2nd order and of such substituents of the 1st order which contain atoms which are replaceable by alkali metal.
- 6. Process according to claim 1 characterized in that a compound of formula ##SPC125##
- wherein X.sub.2 denotes a bridge member of the series --CH=CH--, --CH=CH--CH=CH--, --C.tbd.C--C.tbd.C--, --C.tbd.C--, and M.sub.1 represents hydrogen or the methyl group, is reacted with a Schiff base as defined in claim 1.
- 7. Process according to claim 1 characterized in that a Schiff base as defined in claim 1 is reacted with a compound of formula ##SPC126##
- wherein, in this formula, A.sub.3 represents a hydrogen atom, a phenyl group or a diphenylyl-4group, A.sub.4 represents a hydrogen atom, a phenyl group or a condensed-on benzene ring, and p represents an integer from 1 to 3, and at least one methyl group is bonded to a phenyl residue of the diphenyl nucleus.
- 8. Process according to claim 1 characterized in that a compound of formula ##SPC127##
- wherein M.sub.2 represents hydrogen, the methyl group or phenyl, is reacted with a Schiff base as defined in claim 1.
- 9. Process according to claim 1 characterized in that a compound of formula ##SPC128##
- wherein n represents the numbers 1 or 2 is reacted with an aldehyde-anil as defined in claim 1.
- 10. Process according to claim 1 characterized in that a Schiff base as defined in claim 1 is reacted with a compound of the formula ##SPC129##
- and wherein the symbol D.sub.3 represents a phenyl residue present in positions 6, 7 or, to the extent that they are available, in positions 5 or 8, n denotes an integer from 1 to 3 at least one methyl group is bonded to the naphthalene nucleus.
- 11. Process according to claim 1 characterized in that a compound of formula ##SPC130##
- wherein p represents an integer from 1 to 3 is reacted with an aldehyde-anil as defined in claim 1.
- 12. Process according to claim 1 characterized in that a Schiff base as defined in claim 1 is reacted with an aromatic compound of formula ##SPC131##
- wherein G.sub.3 as well as G.sub.3 ' represent hydrogen or a phenyl residue, whilst n represents an integer from 1 to 2 and at least one methyl group is bonded to a phenyl residue of the stilbene skeleton, and wherein the benzene rings carrying methyl groups should be free of substituents of the 2nd order and of such substituents of the 1st order which contain atoms replaceable by alkali metal, and the nuclei which are free of methyl groups may contain substituents of the 1st order.
- 13. Process according to claim 1 characterized in that a compound of formula ##SPC132##
- wherein R.sub.5 represents hydrogen or an alkoxy group having 1 to 4 carbon atoms and R.sub.6 represents hydrogen, an alkoxy group having 1 to 4 carbon atoms or a phenyl group, and n denotes the numbers 1 or 2, is reacted with a Schiff base as defined in claim 1.
- 14. Process according to claim 1 characterized in that a compound is reacted which corresponds to the formula ##SPC133##
- wherein R.sub.1 represents hydrogen or other substituents of the 1st order which are free of atoms which are replaceable by alkali metal and m represents an integer from 1 to 4.
- 15. Process according to claim 1 characterized in that a compound is reacted which corresponds to the formula ##SPC134##
- and wherein the methyl groups are preferably in positions 2 and 6, R.sub.1 represents hydrogen atoms or other substituents of the 1st order which are free of atoms which are replaceable by alkali metal, and p represents an integer from 1 to 3.
- 16. Process according to claim 1 characterized in that an anil of an aldehyde of the benzene series is reacted with a compound which corresponds to the formula ##SPC135##
- and wherein R.sub.1 epresents hydrogen or other substituents of the 1st order which are free of atoms which are replaceable by alkali metal, and p represents an interger from 1 to 3.
- 17. Process according to claim 1 characterized in that an alkali metal compound of formula
- KOC.sub.x.sub.-1 H.sub.2x.sub.-1
- wherein x denotes an integer having a value of at most 6 is used as the strongly basic alkali compound.
- 18. Process according to claim 1 characterized in that potassium tert.-butylate is used as the stongly basic alkali compound.
- 19. Process according to claim 1 characterized in that potassium hydroxide having a water content of 0 to 15% is used as the strongly basic alkali compound.
Priority Claims (1)
Number |
Date |
Country |
Kind |
101110/67 |
Jul 1967 |
CH |
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Parent Case Info
This is a continuation of application Ser. No. 292,229, filed on Sept. 25, 1972, now abandoned which is a continuation of application Ser. No. 743,001 filed on July 8, 1968, now abandoned.
US Referenced Citations (3)
Number |
Name |
Date |
Kind |
3177153 |
Pommer et al. |
Apr 1965 |
|
3177208 |
Stilz et al. |
Apr 1965 |
|
3825534 |
Weber |
Jul 1974 |
|
Continuations (2)
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Number |
Date |
Country |
Parent |
292229 |
Sep 1972 |
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Parent |
743001 |
Jul 1968 |
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