The present disclosure relates to liquid crystal display technology, and more particularly to an array substrate, a liquid crystal display (LCD) panel, and a LCD device.
In a contracture of a liquid crystal display (LCD) panel using a Color Filter on Array (COF) technology, a color resists layer is mounted on one side of an array substrate. Color resists respectively having different colors may overlap at a junction of the color resists between two adjacent pixels, and the junction may have a stacking uplift. Since transmittances of the color resists having different colors are different, display quality of the LCD panel may be influence. In addition, a pixel has a Thin Film Transistor (TFT) area and an aperture display area. When a gray scale voltage is applied to the TFT, parasitic capacitances may be form between each two of metal layers of the array substrate. Voltages produced by capacitive coupling effect of the parasitic capacitances may pull down the gray scale voltage received by a pixel electrode, and an aperture ratio may be influence. Therefore, how to decrease the parasitic capacitances is research trends for raising pixel aperture ratio.
The present disclosure relates to an array substrate, a liquid crystal display (LCD) panel, and a LCD device that can eliminate influence of display quality produced by a stacking uplift of a junction of the color resists, and that can raise pixel aperture ratio.
An array substrate of an embodiment of the claimed invention includes a substrate base, and a first metal layer, a first insulating layer, a semiconductor layer, a second metal layer, a second insulating layer, a color resists layer, and a third metal layer formed on the substrate base in sequence. The first metal layer configured to form a gate of a thin-film transistor (TFT) of the array substrate. The second metal layer is configured to form a source and a drain of the TFT. The third metal layer is configured to form pixel electrodes of the array substrate. The array substrate further includes at least one of a first organic insulating layer and a second organic insulating layer; wherein the first organic insulating layer is configured between the color resists layer and the second insulating layer; wherein the second organic insulating layer is configured between the color resists layer and the third metal layer.
An array substrate of a liquid-crystal display (LCD) panel of an embodiment of the claimed invention includes a substrate base, and a first metal layer, a first insulating layer, a semiconductor layer, a second metal layer, a second insulating layer, a color resists layer, and a third metal layer formed on the substrate base in sequence. The first metal layer of the array substrate is configured to form a gate of a thin-film transistor (TFT) of the array substrate. The second metal layer of the array substrate is configured to form a source and a drain of the TFT. The third metal layer of the array substrate is configured to form pixel electrodes of the array substrate. The array substrate further includes at least one of a first organic insulating layer and a second organic insulating layer; wherein the first organic insulating layer is configured between the color resists layer and the second insulating layer; wherein the second organic insulating layer is configured between the color resists layer and the third metal layer.
A liquid-crystal display (LCD) device of an embodiment of the claimed invention includes a LCD panel and a backlight module providing lights to the LCD panel. An array substrate of the LCD panel includes a substrate base, and a first metal layer, a first insulating layer, a semiconductor layer, a second metal layer, a second insulating layer, a color resists layer, and a third metal layer formed on the substrate base in sequence. The first metal layer of the array substrate is configured to form a gate of a thin-film transistor (TFT) of the array substrate. The second metal layer of the array substrate is configured to form a source and a drain of the TFT. The third metal layer of the array substrate is configured to form pixel electrodes of the array substrate. The array substrate further includes at least one of a first organic insulating layer and a second organic insulating layer; wherein the first organic insulating layer is configured between the color resists layer and the second insulating layer; wherein the second organic insulating layer is configured between the color resists layer and the third metal layer.
Beneficial effect: The claimed invention designs that the first organic insulating layer mounted between the color resists layer and the second insulating layer, and/or that the second organic insulating layer mounted between the color resists layer and the third metal layer. Therefore, a distance between the second metal layer and the third metal layer and a distance between the first metal layer and the third metal layer may be increased to decrease parasitic capacitances between the metal layers, and the pixel aperture ratio may be raised. In addition, the second organic insulating layer mounted on the color resists layer is equivalent to flattening an upper surface of the color resists layer. Therefore, the influence of display quality produced by a stacking uplift of a junction of the color resists may be eliminated.
Embodiments of the invention will now be described more fully hereinafter with reference to the accompanying drawings, in which embodiments of the invention are shown.
With reference to
The CF substrate 11 is configured common electrodes. The common electrodes may be a transparent conductive film, such as an Indium Tin Oxide (ITO) film.
Further with reference to
With reference to
The first metal layer M1 is configured to form the scan wires 22, a gate of a TFT T0, a common electrode 40, and wires 401. The wires 401 span over an active area of the array substrate 12, and connect to the common electrode of one side of the array substrate 12 in a rim of the active area to receive common voltage signals. The common electrode 40 and pixel electrodes of the array substrate 12 are stacked by insulating layers between the common electrode 40 and the pixel electrodes to form a storage capacitance of the array substrate 12.
The first insulating layer 41 is a gate insulating layer, and covers on the first metal layer M1.
The second metal layer M2 is configured to form the data wires 21, a source and a drain of the TFT T0.
The third metal layer M3 is configured to form the pixel electrode of the array substrate 12.
In the embodiment, at least one connecting hole O1 is formed through the third insulating layer 46, the color resists layer 45, the organic insulating layer 44, and the second insulating layer 43. The drain of the TFT T0 is exposed through the connecting hole O1. The third metal layer M3 covers the connecting hole O1 to connect to the second metal layer M2. Therefore, the third metal layer M3 connects to the drain of the TFT T0.
In the prior art, only the second insulating layer 43, the color resists layer 45, and the third insulating layer 46 are mounted between the second metal layer M2 and the third metal layer M3. The embodiment further includes the organic insulating layer 44 mounted between the second metal layer M2 and the third metal layer M3. Therefore, a distance between the second metal layer M2 and the third metal layer M3 and a distance between the first metal layer M1 and the third metal layer M3 may be increased to decrease parasitic capacitances between the second metal layer M2 and the third metal layer M3, and parasitic capacitances between the first metal layer M1 and the third metal layer M3. Pixel aperture ratio may be raised.
The organic insulating layer 44 covers the second insulating layer 43, and materials of the organic insulating layer 44 comprises resin.
The present disclosure further provides an array substrate of another embodiment of the LCD panel 10.
With reference to
The first metal layer M4 is configured to form the scan wires 22, the gate of TFT T0, the common electrodes, and the wires. The common electrodes and the wires are same as the common electrode 40 and the wires 401 shown in
The first insulating layer 71 is a gate insulating layer, and covers on the first metal layer M4.
The second metal layer M5 is configured to form the data wires 21, the source and the drain of the TFT T0.
The third metal layer M6 is configured to form the pixel electrode of the array substrate 12.
In the embodiment, at least one connecting hole O2 is formed through the third insulating layer 76, the second organic insulating layer 742, the color resists layer 75, the first organic insulating layer 741, and the second insulating layer 73. The drain of the TFT T0 is exposed through the connecting hole O2. The third metal layer M6 covers the connecting hole O2 to connect to the second metal layer M5. Therefore, the third metal layer M6 connects to the drain of the TFT T0.
In the prior art, only the second insulating layer 73, the color resists layer 75, and the third insulating layer 76 are mounted between the second metal layer M5 and the third metal layer M6. The embodiment further includes the first organic insulating layer 741 and the second organic insulating layer 742 mounted between the second metal layer M5 and the third metal layer M6. Therefore, a distance between the second metal layer M5 and the third metal layer M6 and a distance between the first metal layer M4 and the third metal layer M6 may be increased to decrease parasitic capacitances between the second metal layer M5 and the third metal layer M6, and parasitic capacitances between the first metal layer M4 and the third metal layer M6. Pixel aperture ratio may be raised. In addition, the second organic insulating layer 742 mounted on the color resists layer 75 is equivalent to flattening an upper surface of the color resists layer 75. Therefore, the influence of display quality of the LCD panel 10 produced by a stacking uplift of a junction of the color resists 75 may be eliminated.
The first organic insulating layer 741 and the second organic insulating layer 742 of the embodiment are a whole surface structure covering two sides of the color resists layer 75, and materials of the first organic insulating layer 741 and the second organic insulating layer 742 include resin.
Further with reference of
The present disclosure further provides a liquid-crystal display (LCD) device 80 as shown in
It is believed that the present embodiments and their advantages will be understood from the foregoing description, and it will be apparent that various changes may be made thereto without departing from the spirit and scope of the invention or sacrificing all of its material advantages, the examples hereinbefore described merely being preferred or exemplary embodiments of the invention.
Number | Date | Country | Kind |
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201710412913.8 | Jun 2017 | CN | national |
Filing Document | Filing Date | Country | Kind |
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PCT/CN2017/089935 | 6/26/2017 | WO | 00 |