At least one embodiment of present disclosure relates to an array substrate, a manufacturing method of the same, and a display device.
Liquid crystal displays have the advantages of low power consumption, large display information, easy color display realization, no radiation, no pollution and so on, and thus are widely used.
A liquid crystal display includes an array substrate and an opposite substrate (such as a color filter substrate) which are opposite to each other, and a liquid crystal layer disposed between the array substrate and the opposite substrate, controls the rotation of liquid crystal modules by applying a voltage to a common electrode and a pixel electrode and thus controls light. In-plane switching (IPS) mode and advanced-super dimensional switching (ADS) mode liquid crystal displays are two main horizontal electric field type liquid crystal displays.
In an ADS mode liquid crystal display, the pixel electrode and the common electrode are respectively disposed in different layers of the array substrate, and by the electric field generated by edges of slit electrodes in a same plane and the electric field generated between a slit electrode layer and a plate-like electrode layer, a multi-dimensional electric field is formed, so that the liquid crystal molecules between the slit electrodes and right above the slit electrodes and in all alignment directions in the liquid crystal cell can produce rotation.
In an IPS mode liquid crystal display, the pixel electrode and the common electrode are arranged in a same layer of the array substrate, and by controlling the rotation, in a plane, of liquid crystal molecules, brightness control is achieved.
At least one embodiment of the present disclosure provides an array substrate, a manufacturing method of the same, and a display device, to reduce the defect of color cross-talk which is caused by alignment or the like and generated at two sides of a data line or a gate line.
At least one embodiment of the present disclosure provides an array substrate, which includes a first signal line extending along a first direction and a common electrode; the first signal line is a gate line or a data line; the common electrode is arranged on the first signal line, at least one first opening is arranged in the common electrode and overlaps an orthographic projection, on a plane where the common electrode is located, of the first signal line; and the common electrode includes a first portion which partially overlaps the orthographic projection of the first signal line and a second portion which is arranged outside the orthographic projection of the first signal line and connected to the first portion, and the second portion and the first portion are disposed in a same layer.
At least one embodiment of the present disclosure further provides a display device which includes the array substrate.
At least one embodiment of the present disclosure further provides a manufacturing method of an array substrate, and the method includes: forming a first signal line extending along a first direction with the first line being a gate line or a data line; and forming a common electrode on the first signal line and at least one first opening in the common electrode through one patterning process, so that the at least one first opening overlaps an orthographic projection, on a plane where the common electrode is located, of the first signal line; and the common electrode includes a first portion which partially overlaps the orthographic projection of the first signal line and a second portion which is arranged outside the orthographic projection of the first signal line and connected to the first portion, and the second portion and the first portion are disposed in a same layer.
In order to clearly illustrate the technical solution of the embodiments of the disclosure, the drawings of the embodiments will be briefly described in the following; it is obvious that the described drawings are only related to some embodiments of the disclosure and thus are not limitative of the disclosure.
In order to make objects, technical details and advantages of the embodiments of the disclosure apparent, the technical solutions of the embodiments will be described in a clearly and fully understandable way in connection with the drawings related to the embodiments of the disclosure. Apparently, the described embodiments are just a part but not all of the embodiments of the disclosure. Based on the described embodiments herein, those skilled in the art can obtain other embodiment(s), without any inventive work, which should be within the scope of the disclosure.
Unless otherwise defined, all the technical and scientific terms used herein have the same meanings as commonly understood by one of ordinary skill in the art to which the present disclosure belongs. The terms “first,” “second,” etc., which are used in the description and the claims of the present application for disclosure, are not intended to indicate any sequence, amount or importance, but distinguish various components. Also, the terms such as “a,” “an,” etc., are not intended to limit the amount, but indicate the existence of at least one. The terms “include,” “including,” “comprise,” “comprising,” etc., are intended to specify that the elements or the objects stated before these terms encompass the elements or the objects and equivalents thereof listed after these terms, but do not preclude the other elements or objects. The phrases “connect”, “connected”, etc., are not intended to define a physical connection or mechanical connection, but may include an electrical connection, directly or indirectly. “On,” “under,” “right,” “left” and the like are only used to indicate relative position relationship, and when the position of the object which is described is changed, the relative position relationship may be changed accordingly.
For example, the manufacturing process of the array substrate illustrated in
Step 1: by a first patterning process (i.e., a process of forming a preset pattern), the gate electrode 110 and a plurality of gate lines (not shown in
Step 2: by a second patterning process, the gate insulating layer 120 covering the gate electrode 110 and the gate lines is formed.
Step 3: by a third patterning process, the active layer 140 is formed on the gate insulating layer 120.
Step 4: by a fourth patterning process, the source electrode 131 and the drain electrode 132 are formed on the active layer 140 and contact the active layer 140 respectively, and a plurality of data lines 133 are formed.
Step 5: by a fifth patterning process, the first insulating layer 200 is formed to cover the source electrode 131 and the drain electrode 132, and a first insulating layer via hole located in the first insulating layer 200 is formed.
Step 6: by a sixth patterning process, the common electrode 300 and a common electrode line (not shown in
Step 7: by a seventh patterning process, the second insulating layer 400 and a second insulating layer via hole in the second insulating layer 400 are formed, and the second insulating layer via hole is in communication with the first insulating layer via hole.
Step 8: by an eighth patterning process, the pixel electrode 500 is formed on the second insulating layer 400, so that the pixel electrode 500 is connected with the drain electrode 132 of the thin film transistor 100 through both the first insulating layer via hole and the second insulating layer via hole which are formed respectively in the above steps 5 and 7.
A liquid crystal display is provided with a black matrix (BM) therein, for example, the black matrix corresponds to the gate lines and the data lines on the array substrate. In research, the inventors of the present application have noted that the formed black matrix is narrow in a current high PPI (pixels per inch) product due to the need of increasing aperture ratio, but at present the equipment for aligning the gate lines/data lines with the black matrix has a limited alignment capacity, and this may result in alignment deviation which brings about the color cross-talk.
At least one embodiment of the present disclosure provides an array substrate, a manufacturing method of the array substrate and a display device. The array substrate includes a first signal line extending along a first direction and a common electrode arranged on the first signal line; the first signal line is a gate line or a data line; at least one first opening is arranged in the common electrode and overlaps an orthographic projection, on a plane where the common electrode is located, of the first signal line; and the common electrode includes a first portion which partially overlaps the orthographic projection of the first signal line and a second portion which is arranged outside the orthographic projection of the first signal line and connected to the first portion, and the second portion and the first portion are disposed in a same layer. In the embodiment of the present disclosure, for example, by forming at least one first opening in the common electrode over the data line or the gate line, arrangement of liquid crystals between pixels respectively disposed on two sides of the data line or gate line become disordered, so that the liquid crystals cannot allow light to pass therethrough and have a function of adding an equivalent part to the black matrix, and thus the color cross-talk defect caused by alignment or the like and generated on two sides of the data line or the gate line can be reduced.
In connection with the drawings and specific implementations, the array substrate and its manufacturing method and the display device provided by embodiments of the present disclosure will be described below.
As illustrated in
As illustrated in
The embodiment is described by taking the pixel electrode 50 and the common electrode layer 30 being arranged in different layers as an example. For example, the array substrate of the present embodiment may be an ADS mode array substrate. In this case, the pixel electrode 50 may be a slit electrode and be located on the common electrode 30, as illustrated in
The array substrate of the present embodiment is also provided with a thin film transistor 10.
In the array substrate provided by the embodiment, the first signal line 71 can also be a gate line, and the gate line and the gate electrode 11 can be arranged in a same layer.
In the embodiment, at least one first opening 31 is arranged at a position, corresponding to the first signal line 71, of the common electrode 30, the common electrode 30 at the position of the edge of each first opening 31 and the first signal line 71 below the first opening 31 form an electric field which is an irregular electric field, so that the liquid crystals at the first opening 31 are arranged in disorder, does not have the light-transmitting ability, and form the so-called “dark zone.”
It is to be noted that
As illustrated in
Because the first opening 31 is formed in the common electrode 31, for example, by removing the common electrode material at a preset position in manufacturing the common electrode 30, the first opening 31 is formed at the position, and thus the first opening 31 can be a closed opening.
In order to form a dark zone at each first opening 31, it is better that the size, along the first direction, of each first opening 31 is not too large. For example, the common electrode 30 may be provided with a plurality of the first openings 31 therein. Thus, a portion, corresponding to the first signal line 71, of the common electrode 30 is divided by the plurality of first openings, the more the number of the first openings, the size, along the first direction, of each first opening may be smaller, and this contributes to the disordered arrangement of liquid crystals at the position of each first opening to form a dark zone.
It is to be noted that, the number of the first opening(s) (especially in a situation where the common electrode at the position corresponding to the first signal line is provided with one first opening or a small quantity of first openings) may be selected according to the liquid crystal material and the size, along the first direction, of the portion, corresponding to the first signal line, of the common electrode and the like in a practical situation, to prevent the first opening of a too large size along the first direction from causing a non-noticeable dark region between the common electrode at the position of the first opening and the first signal line. The present embodiment does not limit the number and size of the first opening, as long as electric fields at different directions are formed between the common electrode at each first opening and the first signal line below the first opening, to form a dark zone at the first opening.
For example, the size, along the first direction, of the first opening 31 can be smaller than or equal to the size, along a direction perpendicular to the first direction, of the first opening 31. This can prevent the first opening of a too large size along the first direction from causing a relatively regular electric field between the common electrode at the first opening and the first signal line.
For example, the first opening 31 can be axisymmetric with respect to the first signal line 71, as illustrated in
In the present embodiment, the common electrode 30 may also include a third portion 30c located outside the orthographic projection of the first signal line 71, as shown in
As illustrated in
By allowing the edge, extending substantially along the first direction, of the first opening to have a non-linear structure, a relatively disordered electric field can be formed as much as possible between the edge 311 of the common electrode 30 at the first opening 31 and the first signal line 71.
Compared with the first embodiment, the array substrate of the present embodiment further includes a second signal line 72 extending along a second direction which intersects the first direction; and as illustrated in
In the present embodiment, for example, as illustrated in
The array substrate provided by the present embodiment differs from that in the first embodiment mainly in that: the array substrate further includes a color filter layer, namely the array substrate adopts a COA (color filter on array) technology.
For example, as illustrated in
It is to be noted that,
The array substrate provided by the present embodiment differs from the first embodiment mainly in that: as illustrated in
For example, in
The array substrate provided by the present embodiment can further be provided with a thin film transistor 10 which can be referred to the related descriptions in the first embodiment, and repeated descriptions are omitted herein.
Among the above first to fifth embodiments, the first embodiment or the fifth embodiment can be combined with at least one of the second embodiment to the fourth embodiment.
The present embodiment provides a display device which includes the array substrate provided by any one of the above embodiments or any combination thereof.
For example, the display device of the present embodiment may be a liquid crystal panel, an electronic paper, a touch panel, a mobile phone, a tablet computer, a television, a monitor, a notebook computer, a digital photo frame, a navigation or any other product or component having a display function.
For example, as illustrated in
For example, the display device of the present embodiment can further include a color filter layer 80′, for example, the color filter layer 80′ includes a plurality of filter pattern (for example, red filter patterns R, green filter patterns and blue filter patterns B) columns, filter patterns of each filter pattern column are arranged along the first direction, filter patterns of a same filter pattern column are in a same color or in different colors, and in two filter pattern columns which are arranged respectively at two sides of the first signal line 71, filter patterns adjacent to the first signal line 71 and respectively at corresponding positions in same rows are in different colors.
For example, the color filter layer may be provided on the array substrate 01 or the opposite substrate 02.
The color filter layer in the present embodiment can be arranged by referring to the related descriptions in the above fourth embodiment and repeated descriptions are omitted herein.
The present embodiment provides a manufacturing method of the array substrate provided by any one of the above embodiments or any combination thereof and the method can include: forming a first signal line extending along a first direction; and forming a common electrode on the first signal line and at least one first opening in the common electrode through one patterning process, so that the at least one first opening overlaps an orthographic projection, on a plane where the common electrode is located, of the first signal line. In the method provided by the present embodiment, the common electrode includes a first portion which partially overlaps the orthographic projection of the first signal line and a second portion which is arranged outside the orthographic projection of the first signal line and connected to the first portion, and the second portion and the first portion are disposed in a same layer. Besides, the first line is a gate line or a data line.
For example, the manufacturing method provided by the present embodiment can further include, before or after forming the first signal line, forming a second signal line extending along a second direction which intersects the first direction; and forming the common electrode can further include forming at least one second opening in the common electrode, and the at least one second opening overlaps an orthographic projection, on the plane where the common electrode is located, of the second signal line.
For example, in the manufacturing method, a pixel electrode can be formed through a patterning process different from that for forming the common electrode, and in this case, the pixel electrode can be arranged on or below the common electrode. For example, the array substrate can adopt an ADS mode.
Alternatively, for example, the common electrode can be further formed along a pixel electrode. In this case, the common electrode can include a plurality of strip common sub-electrodes, and the pixel electrode can include a plurality of strip pixel sub-electrodes which are alternated with the strip common sub-electrodes, namely the array substrate adopts an IPS mode.
With respect to the ADS mode array substrate illustrated by
Step 71: by a first patterning process, a gate electrode 11 and a gate line (not shown in
Step 72: by a second patterning process, a gate insulating layer 12 is formed to cover the gate electrode 11 and the gate line.
Step 73: by a third patterning process, an active layer 14 is formed on the gate insulating layer 12.
Step 74: by a fourth patterning process, a source electrode 13a and a drain electrode 13b are formed on the active layer 14 and contact the active layer 14, and a data line 13c are formed.
Step 75: by a fifth patterning process, a first insulating layer 20 is formed to cover the source electrode 13a, the drain electrode 13b and the data lines 13c, and a first insulating layer via hole 21 in the first insulating layer 20 is formed.
Step 76: by a sixth patterning process, a common electrode 30 is formed on the first insulating layer 20, and at least one first opening 31 located in the common electrode 30 and vertically overlapping the data line 13c, and a common electrode line (not shown in
Step 77: by a seventh patterning process, a second insulating layer 40 is formed on the common electrode 30, a second insulating layer via hole 41 in the second insulating layer 40 is formed, and the second insulating layer via hole 41 is in communication with the first insulating layer via hole 21.
Step 78: by an eighth patterning process, a pixel electrode 50 is formed on the second insulating layer 40, so that the pixel electrode 50 is connected to the drain electrode 13b of the thin film transistor 10 through the first insulating layer via hole 21 and the second insulating layer via hole 41 respectively formed in the step 75 and the step 77.
The above steps are described by taking the example that the common electrode and the common electrode line are disposed in a same layer. Of course, the common electrode and the common electrode line may be in different layers. For example, the common electrode line may be formed simultaneously with the gate lines in the step 71, and in this case, the common electrode formed in the step 76 may be connected to the common electrode line through a via hole in the first insulating layer 20.
In the method of manufacturing the array substrate of the present embodiment, the first signal line, the second signal line, the first opening, the second opening, etc. in the array substrate may be referred to the related descriptions in the first embodiment to the fifth embodiment, and repeated descriptions are omitted herein.
What are described above is related to the illustrative embodiments of the disclosure only and not limitative to the scope of the disclosure; the scopes of the disclosure are defined by the accompanying claims.
This application claims the benefit of Chinese Patent Application No. 201510400851.X, filed on Jul. 9, 2015, which is hereby entirely incorporated by reference as a part of the present application.
Number | Date | Country | Kind |
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201510400851.X | Jul 2015 | CN | national |
Filing Document | Filing Date | Country | Kind |
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PCT/CN2015/098269 | 12/22/2015 | WO | 00 |