Claims
- 1. Crystalline molecular sieves comprising three-dimensional microporous framework structures of AsO.sub.2, AlO.sub.2, PO.sub.2 and SiO.sub.2 tetrahedral units having an empirical chemical composition on an anhydrous basis expressed by the formula:
- mR:(As.sub.w Al.sub.x P.sub.y Si.sub.z)O.sub.2
- wherein "R" represents at least one organic templating agent present in the intracrystalline pore system; "m" represents the molar amount of "R" present per mole of (As.sub.w Al.sub.x P.sub.y Si.sub.z)O.sub.2 and has a value of zero to about 0.3; and "w", "x", "y" and "z" represent the mole fractions of arsenic, aluminum, phosphorus and silicon, respectively, present as tetrahedral oxides, said mole fractions being such that they are within the pentagonal compositional area defined by points A, B, C, D, and E of FIG. 1, said crystalline molecular sieves having a characteristic X-ray powder diffraction pattern which contains at least the d-spacings set forth in one of Tables C, F, K, M, P, T, V, W herein.
- 2. Molecular sieves according to claim 1 wherein the mole fractions of arsenic, aluminum, phosphorus and silicon present as tetrahedral oxides are within the hexagonal compositional area defined by points a, b, c, d, e and f of FIG. 2.
- 3. The crystalline molecular sieves according to claim 2 wherein the mole fractions of arsenic, aluminum, phosphorus and silicon present as tetrahedral oxides are within the hexagonal compositional area defined by points g, h, i, j, k and 1 of FIG. 2.
- 4. Molecular sieves according to claim 1 wherein "m" is not greater than about 0.15.
- 5. The crystalline molecular sieves of claims 1 or 2 having a characteristic X-ray powder diffraction pattern which contains at least the d-spacings set forth in Table C.
- 6. The crystalline molecular sieves of claims 1 or 2 having a characteristic X-ray powder diffraction pattern which contains at least the d-spacings set forth in Table F.
- 7. The crystalline molecular sieves of claims 1 or 2 having a characteristic X-ray powder diffraction pattern which contains at least the d-spacings set forth in Table K.
- 8. The crystalline molecular sieves of claims 1 or 2 having a characteristic X-ray powder diffraction pattern which contains at least the d-spacings set forth in Table N.
- 9. The crystalline molecular sieves of claims 1 or 2 having a characteristic X-ray powder diffraction pattern which contains at least the d-spacings set forth in Table P.
- 10. The crystalline molecular sieves of claims 1 or 2 having a characteristic X-ray powder diffraction pattern which contains at least the d-spacings set forth in Table T.
- 11. The crystalline molecular sieves of claims 1 or 2 having a characteristic X-ray powder diffraction pattern which contains at least the d-spacings set forth in Table V.
- 12. The crystalline molecular sieves of claims 1 or 2 having a characteristic X-ray powder diffraction pattern which contains at least the d-spacings set forth in Table W.
- 13. Process for preparing crystalline molecular sieves having three-dimensional framework structures of AsO.sub.2, AlO.sub.2, PO.sub.2 and SiO.sub.2 tetrahedral units having an empirical chemical composition on an anhydrous basis expressed by the formula;
- mR:(As.sub.w Al.sub.x P.sub.y Si.sub.z)O.sub.2
- wherein "R" represents at least one organic templating agent present in pore system; "m" represents the molar amount of "R" present per mole of (As.sub.w Al.sub.x P.sub.y Si.sub.z)O.sub.2 and has a value of zero to about 0.3:and "w", "x", and "z" represent the mole fractions of arsenic aluminum, phosphorus and silicon, respectively, present as tetrahedral oxides, said mole fractions being such that they are within the pentagonal compositional area defined by points A, B, C, D, and E of FIG. 1, said crystalline molecular sieves having a characteristic X-ray powder diffraction pattern which contains at least the d-spacings set forth in one of Tables C, F, K, N, P, T, V, W wherein the process comprises providing at an effective temperature and for an effective time a reaction mixture composition expressed in terms of molar oxide ratios as follows:
- aR:(As.sub.w Al.sub.x P.sub.y Si.sub.z)O.sub.2 :bH.sub.2 O
- wherein "R" is an organic templating agent; "a" is the amount of "R" an effective amount greater than zero to about 6; "b" has a value of from zero to about 500; and "w", "x", "y" and "z" represent the mole fractions, respectively, of arsenic aluminum, phosphorus and silicon in the (As.sub.w Al.sub.x P.sub.y Si.sub.z)O.sub.2 constituent, and each has a value of at least 0.01, to provide said molecular sieves.
- 14. Process according to claim 13 wherein "w", "x", "y" and "z" are within the area defined by points F, G, H, 1 and J of FIG. 3.
- 15. Process according to claim 13 Wherein "a" is not greater than about 1.0.
- 16. Process according to claim 13 wherein "b" is not greater than about 60.
- 17. Process according to claim 13 wherein the reaction mixture contains from about 1 to about 2 moles of aluminum per mole of phosphorus.
- 18. Process according to claim 13 wherein the reaction mixture contains from about 1 to about 2 total moles of silicon and arsenic per mole of phosphorus.
- 19. Process according to claim 13 wherein the source of phosphorus in the reaction mixture is orthophosphoric acid.
- 20. Process according to claim 13 wherein the source of phosphorus in the reaction mixture is orthophosphoric acid and the source of aluminum is at least one compound selected from the group consisting of pseudo-boehmite and aluminum alkoxide, and aluminum chlorhydrate.
- 21. Process according to claim 20 wherein the aluminum alkoxide is aluminum isopropoxide.
- 22. Process according to claim 13 wherein the source of arsenic is selected from the group consisting of oxides, hydroxides, alkoxides, chlorides, bromides, iodides, acetates, sulfates, nitrates, carboxylates and mixtures thereof.
- 23. Process according to claim 13 wherein the silicon source, is silica.
- 24. Process according to claim 13 wherein the silica source is a tetraelkyl orthosilicate.
- 25. Process according to claim 13 wherein the organic templating agent is a quaternary ammonium or quaternary phosphonium compound having the formula:
- R.sub.4 X.sup.+
- wherein X is nitrogen or phosphorus and each R is an alkyl or aryl group containing from 1 to 8 carbon atoms.
- 26. Process according to claim 13 wherein the organic templating agent is an amine.
- 27. Process according to claim 13 wherein the templating agent is selected from the group consisting of tetrapropylammonium ion; tetraethylammonium ion; tripropylamine; triethylamine; triethanolamine; piperidine; cyclohexylamine; 2-methyl pyridine; N,N-dimethylbenzylamine; N,N-dimethylethanolamine; choline; N,N-dimethylpiperazine; 1,4-diaziabicyclo-(2,2,2) octane; N-methyldiethanolamine; N-methylethanolamine; N-methylpiperidine; 3-methylpiperidine; N-methylcyclohexylamine; 3-methylpyridine; 4-methylpyridine; quinuclidine; N,N,-dimethyl-1,4-diazabicyclo (2,2,2) octane ion; tetramethylammonium ion; tetrabutylammonium ion; tetrapentylammonium ion; di-n-butylamine; neopentylamine; di-n-pentylamine; isopropylamine; t-butylamine; ethylenediamine; pyrrolidine; 2-imidazolidone; di-n-propylamine; and a polymeric quaternary ammonium salt [(C.sub.14 H.sub.32 N.sub.2)(OH).sub.2 ].sub.x wherein x is a value of a least 2.
- 28. Molecular sieve prepared by calcining the compositions of claim 1, claim 2 or claim 3 at a temperature sufficiently high to remove at least some of any organic templating agent present in the intracrystalline pore system.
Parent Case Info
This application is a continuation-in-part of our copending application Ser. No. 599,808 filed Apr. 13, 1984, now abandoned.
US Referenced Citations (12)
Foreign Referenced Citations (5)
Number |
Date |
Country |
0054364 |
Jun 1982 |
EPX |
0055046 |
Jun 1982 |
EPX |
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EPX |
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EPX |
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Non-Patent Literature Citations (1)
Entry |
Haggin, Chemical & Engineering, Jun. 20, 1983, pp. 36 & 37. |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
599808 |
Apr 1984 |
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