This invention relates to an autonomous method and system for minimizing the magnitude of plasma discharge current oscillations in a Hall Effect plasma device.
Plasma discharge current from a plasma device such as Hall effect or similar type plasma device is known to be unstable and oscillatory. Because lifetime erosion is proportional to its power and the instantaneous power at the peak current is very high, the large magnitude of plasma discharge current oscillations are suspected to cause increased erosion and reduced the lifetime of the plasma device. Some evidence that plasma discharge current oscillations may reduce lifetime of a Hall plasma device is disclosed in Optical Boron Nitride Insulator Erosion Characterization of a 200W Xenon Hall Plasma device, by Hargus et al., AIAA-2005-3529, 41st Joint Propulsion Conference, July 2005, incorporated by reference herein. As disclosed therein, an increased boron nitride presence in the plasma was correlated with discharge oscillations.
One conventional method to minimize the magnitude of plasma discharge current oscillations is to manually adjust the amount of magnet current delivered to the plasma device. However, manually adjusting the magnet current is cumbersome and may not be performed when the plasma device is operational.
In one aspect, an autonomous method for minimizing the magnitude of plasma discharge current oscillations in a Hall effect plasma device is featured. The method includes iteratively measuring plasma discharge current oscillations of the plasma device and iteratively adjusting the magnet current delivered to the plasma device in response to measured plasma discharge current oscillations to reduce the magnitude of the plasma discharge current oscillations.
In one embodiment, adjusting the magnet current delivered to the plasma device may be constrained by the DC value of the plasma discharge current. The method may include iteratively measuring the AC component magnitude of the plasma discharge current oscillations. The method of claim may include determining the root-mean-square (RMS) value of the plasma discharge current oscillations. The method may include calculating the slope of the AC component value as a function of the magnet current. The method may include determining if the slope is positive or negative. The method may include changing magnet current set point by a predetermined amount in response to the determined slope. The method may include decreasing the magnet current set point when the slope is positive and increasing the magnet current set point when the slope is negative. The method may include determining if the magnet current set point is within an allowable range of magnet current for a given plasma device operating point. The method may include changing the magnet current when the current set point is within the allowable range. The method may include not changing the magnet current when the current set point is outside the allowable range. The method may include measuring the peak-to-peak value of the AC component. The method may include measuring the frequency of the plasma discharge current oscillations and adjusting the magnet current to reduce the magnitude of the plasma discharge current oscillations based in the measured frequency.
In another aspect, an autonomous method for minimizing the magnitude of plasma discharge current oscillations of a Hall effect plasma device is featured. The method includes iteratively measuring plasma discharge current oscillations of the plasma device and iteratively adjusting the magnet current delivered to the plasma device in response to measured plasma discharge current oscillations to reduce the magnitude of the plasma discharge current oscillations constrained by the DC value of the plasma discharge current.
In another aspect, a system for minimizing the magnitude of plasma discharge oscillations of a Hall effect plasma device is featured. The system includes a power processing unit configured to provide magnet current and power to the plasma device to establish plasma discharge current. A plasma discharge current measurement circuit is configured to measure plasma discharge current oscillations. A closed loop controller responsive to measured plasma discharge current oscillations is configured to iteratively adjust the magnet current delivered to the plasma device to reduce the magnitude of plasma discharge current oscillations.
In one embodiment, the closed loop controller may be configured to iteratively measure the AC component magnitude of the plasma discharge current oscillations. The closed loop controller may be configured to determine the root-mean-square (RMS) value of the plasma discharge current oscillations. The closed loop controller may be configured to calculate the slope of the AC component value as a function of the magnet current. The closed loop controller may be configured to determine if the slope is positive or negative. The closed loop controller may be configured change magnet current set point by a predetermined amount in response to the determined slope. The closed loop controller may be configured to decrease the magnet current set point when the slope is positive and increasing the magnet current set point when the slope is negative. The closed loop controller may be configured to determine if the magnet current set point is within an allowable range of magnet current for a given plasma device operating point. The closed loop controller may be configured to change the magnet current when the current set point is within the allowable range. The closed loop controller may be configured to not change the magnet current when the current set point is outside the allowable range. The closed loop controller may be configured to determine the peak-to-peak value of the AC component. The closed loop controller may be configured to measure the frequency of the plasma discharge current oscillations and adjust the magnet current to reduce the magnitude of the plasma discharge current oscillations based on the measured frequency.
Other objects, features and advantages will occur to those skilled in the art from the following description of a preferred embodiment and the accompanying drawings, in which:
Aside from the preferred embodiment or embodiments disclosed below, this invention is capable of other embodiments and of being practiced or being carried out in various ways. Thus, it is to be understood that the invention is not limited in its application to the details of construction and the arrangements of components set forth in the following description or illustrated in the drawings. If only one embodiment is described herein, the claims hereof are not to be limited to that embodiment. Moreover, the claims hereof are not to be read restrictively unless there is clear and convincing evidence manifesting a certain exclusion, restriction, or disclaimer.
As discussed in the Background section, plasma discharge current from a plasma device, such as a Hall Effect plasma device or similar type plasma device, is known to be unstable and oscillatory. The large magnitude of the plasma discharge current oscillations may cause erosion which may reduce the lifetime of the plasma device. Plot 10,
The method of autonomously minimizing the magnitude or amplitude of plasma discharge current oscillations of a Hall effect plasma device of one embodiment of this invention includes iteratively measuring plasma discharge current oscillations in plasma device, step 20,
In one example, step 20 preferably includes iteratively measuring the AC component magnitude, e.g., a root-mean-square (RMS) value, of the plasma discharge current. Preferably, the slope of the AC component value is then calculated as a function of the plasma device magnet current, step 22. The change in the AC component magnitude that occurred between two measurement iterations is then divided by the change in the magnet current in the same interval. A determination is then made if the slope is positive or negative and the magnet current set point is changed by a predetermined amount in response to the determined slope, step 24. For example, if the slope is positive, the magnet current set point is decreased by a predetermined amount and if the slope is negative, the magnet current set point is increased by a predetermined amount. A determination is made if the magnet current set point is within allowable range of magnet current for a given plasma device operating point. If it is, the magnet current is changed. If it is not, the magnet current is not changed, step 26. Steps 20 to 26 are repeated while the plasma device is operational, indicated at 28. The predetermined magnet current change is dependent on the specific design of the plasma device, the number of turns in the magnet coil and a particular operating point of the plasma device. Typically the magnet current change is less than 5% of its nominal value.
In one embodiment, the method may be constrained by the DC value of the plasma discharge current. The method may also include measuring the peak-to-peak value of the AC component. In one example, the method may include measuring the frequency of the plasma discharge current oscillations and adjusting the magnet current to minimize the magnitude of the plasma discharge current oscillations based in the measured frequency.
Plot 80,
Histogram 100,
Histogram 120,
The result is the autonomous method for minimizing the magnitude of plasma discharge current oscillations in a Hall effect plasma device autonomous and automatically minimizes the magnitude of plasma discharge current oscillations. This may reduce plasma device erosion and extend plasma device lifetime, reduce plasma radiated electromagnet emissions, reduce the size of an output filter of the power processing unit. In terrestrial applications, the method of one or more embodiments of this invention may provide a steady plasma beam current for providing fabrication of microelectronic devices, and may provide steady plasma beam current that ensures deposition or sputtering is uniform.
System 150,
In one example, the closed loop controller may be part of digital control unit 170 of power processing unit 154, or it may be an analog closed loop controller 182. Power processing unit 154 may also include magnet power supply 186 and plasma discharge current power supply 188.
In one embodiment, the closed loop controller iteratively measures the AC component of the plasma discharge current oscillations. The closed loop controller may iteratively determine the change, or slope in the RMS value of the AC component. The closed loop controller may also determine if the change is a positive or a negative and iteratively increase the magnet current delivered by magnet power supply 186 on line 156 to plasma device 152 in response to a negative value or decrease the magnet current delivered by magnet power supply 186 by line 156 to plasma device 152 in response to the positive value until the magnitude of the plasma discharge current oscillations are minimized. The closed loop controller may also measure the peak-to-peak value of the AC component of the plasma discharge current oscillations. In one example, the closed loop controller may measure the frequency of the plasma discharge current oscillations by line 160 and change the magnet current to decrease the magnitude of the plasma discharge current oscillations in response to the measured frequency.
Although specific features of the invention are shown in some drawings and not in others, this is for convenience only as each feature may be combined with any or all of the other features in accordance with the invention. The words “including”, “comprising”, “having”, and “with” as used herein are to be interpreted broadly and comprehensively and are not limited to any physical interconnection. Moreover, any embodiments disclosed in the subject application are not to be taken as the only possible embodiments.
In addition, any amendment presented during the prosecution of the patent application for this patent is not a disclaimer of any claim element presented in the application as filed: those skilled in the art cannot reasonably be expected to draft a claim that would literally encompass all possible equivalents, many equivalents will be unforeseeable at the time of the amendment and are beyond a fair interpretation of what is to be surrendered (if anything), the rationale underlying the amendment may bear no more than a tangential relation to many equivalents, and/or there are many other reasons the applicant cannot be expected to describe certain insubstantial substitutes for any claim element amended.
Other embodiments will occur to those skilled in the art and are within the following claims.
This application claims benefit of and priority to U.S. Provisional Application Ser. No. 61/627,064 filed Sep. 16, 2011 under 35 U.S.C. §§119, 120, 363, 365, and 37 C.F.R. §1.55 and §1.78 incorporated herein by this reference.
This invention was made with U.S. Government support under Contract No. NNX09CD12P awarded by the NASA Phase I SBIR. The Government may have certain rights in the subject invention.
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U.S. Appl. No. 61/627,064, Vladimir Hruby. |
William A. Hargus, Jr., “A Diagnostic for Hall Thruster Boron Nitride Insulator Erosion”, JANNAF Meeting, May 2004, pp. 1-8. |
Fife et al., “A Numerical Study of Low-Frequency Discharge Oscillations in Hall Thrusters”, American Institute of Aeronautics and Astronautics, AIAA-97-3052, 33rd Joint Propulsion Conference, Jul. 1997, pp. 1-11. |
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Number | Date | Country | |
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20130093350 A1 | Apr 2013 | US |
Number | Date | Country | |
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61627064 | Sep 2011 | US |