Claims
- 1. A glass exhibiting a strain point higher than 660.degree. C., a liquidus temperature no higher than 1,175.degree. C., a weight loss of less than 1 mg/cm.sup.2 after immersion for 24 hours in an aqueous 5% by weight HCl solution at 95.degree. C., and long term stability against devitrification at melting and forming temperatures, said glass being essentially free from alkali metal oxides and consisting essentially, expressed in terms of mole percent on the oxide basis, of
- ______________________________________SiO.sub.2 65-76 MgO 0-5Al.sub.2 O.sub.3 7-11 CaO 0-10 TiO.sub.2 0-3BaO 12-19 SrO 0-10 Ta.sub.2 O.sub.5 0-3B.sub.2 O.sub.3 0-5 MgO + 0-15 TiO.sub.2 + 0.5-5. CaO + Ta.sub.2 O.sub.5 SrO______________________________________
- 2. A glass according to claim 1 consisting essentially of
- ______________________________________SiO.sub.2 68-76Al.sub.2 O.sub.3 7-10 TiO.sub.2 0-2.5BaO 14-19 Ta.sub.2 O.sub.5 0-2.5B.sub.2 O.sub.3 0-5 TiO.sub.2 + Ta.sub.2 O.sub.5 0.5-5.______________________________________
- 3. In a liquid crystal display device which employs polycrystalline silicon thin film transistors as switches, which device contains a flat, transparent glass substrate, the improvement wherein said glass exhibits a strain point higher than 660.degree. C., a liquidus temperature no higher than 1,175.degree. C., a weight loss of less than 1 mg/cm.sup.2 after immersion for 24 hours in an aqueous 5% by weight HCl solution at 95.degree. C., and long term stability against devitrification at melting and forming temperatures, said glass being essentially free from alkali metal oxides and consisting essentially, expressed in terms of mole percent on the oxide basis, of
- ______________________________________SiO.sub.2 65-76 MgO 0-5Al.sub.2 O.sub.3 7-11 CaO 0-10 TiO.sub.2 0-3BaO 12-19 SrO 0-10 Ta.sub.2 O.sub.5 0-3B.sub.2 O.sub.3 0-5 MgO + 0-15 TiO.sub.2 + 0.5-5. CaO + Ta.sub.2 O.sub.5 SrO______________________________________
- 4. In a liquid crystal display device according to claim 3 wherein said glass consists essentially of
- ______________________________________SiO.sub.2 68-76Al.sub.2 O.sub.3 7-10 TiO.sub.2 0-2.5BaO 14-19 Ta.sub.2 O.sub.5 0-2.5B.sub.2 O.sub.3 0-5 TiO.sub.2 + Ta.sub.2 O.sub.5 0.5-5.______________________________________
- ______________________________________SiO.sub.2 68-76Al.sub.2 O.sub.3 7-10 TiO.sub.2 0-2.5BaO 14-19 Ta.sub.2 O.sub.5 0-2.5B.sub.2 O.sub.3 0-5 TiO.sub.2 + Ta.sub.2 O.sub.5 0.5-5.______________________________________
Parent Case Info
This application is a continuation-in-part of U.S. application Ser. No. 08/008,561, filed Jan. 22, 1993 and now abandoned.
US Referenced Citations (10)
Foreign Referenced Citations (1)
Number |
Date |
Country |
1143702 |
Mar 1985 |
SUX |
Continuation in Parts (1)
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Number |
Date |
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Parent |
8561 |
Jan 1993 |
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