Claims
- 1. A base material for hair cosmetics, which comprises a linear block copolymer comprising 5 to 70% by weight of a polysiloxane segment having a repeating unit of the formula ##STR13## wherein each R.sub.1 is hydrogen, lower alkyl or cyano; each R.sub.2 is hydrogen, alkyl, haloalkyl or aryl; A is NH or O; B is lower alkylene, oxygen interupted lower alkylene or lower alkenyloxy; p is 0 or an integer of 1 to 6; and m is 0 or an integer of 1 to 200;
- 10to 90% by weight of a monomer moiety of an ethylenically unsaturated carboxylic acid having a repeating unit of the formula ##STR14## wherein R.sub.3 is hydrogen, lower alkyl or carboxyl; and R.sub.4 is hydrogen, lower alkyl or lower carboxyalkyl; and
- 80% or less by weight of a monomer moiety of an ethylenically unsaturated carboxylic acid ester having a repeating unit of the formula ##STR15## wherein R.sub.5 is a hydrogen, lower alkyl or alkoxycarbonyl; and R.sub.6 is hydrogen, lower alkyl, lower carboxyalkyl or alkyloxycarbonylalkyl; and R.sub.7 is alkyl.
- 2. The base material for hair cosmetics according to claim 1, wherein the block copolymer has a number-average molecular weight of 60,000 to 150,000.
- 3. The base material for hair cosmetics according to claim 1, wherein the block copolymer is obtained by polymerizing an ethylenically unsaturated carboxylic acid and an ethylenically unsaturated carboxylic acid ester in the presence of a polyazo group-containing polysiloxane compound.
- 4. A base material for hair cosmetics, which comprises a block copolymer comprising 5 to 70% by weight of polysiloxane segments having repeating units of the formulas ##STR16## wherein each R.sub.1 is hydrogen, lower alkyl or cyano; each R.sub.2 is hydrogen, alkyl, haloalkyl or aryl; A is NH or O; B is lower alkylene, oxygen interupted lower alkylene or lower alkenyloxy; p is 0 or an integer of 1 to 6; m is 0 or an integer of 1 to 200; and --CO--Y--CO-- is a residue of a dibasic carboxylic acid;
- 10to 90% by weight of a monomer moiety of an ethylenically unsaturated carboxylic acid having a repeating unit of the formula ##STR17## wherein R.sub.3 is hydrogen, lower alkyl or carboxyl; and R.sub.4 is hydrogen, lower alkyl or lower carboxyalkyl; and
- 80% or less by weight of a monomer moiety of an ethylenically unsaturated carboxylic acid ester having a repeating unit of the formula ##STR18## wherein R.sub.5 is hydrogen, lower alkyl or alkyloxycarbonyl; R.sub.6 is hydrogen lower alkyl, lower carboxyalkyl or alkyloxycarbonylalkyl; and R.sub.7 is alkyl.
- 5. The base material for hair cosmetics according to claim 4, wherein the block copolymer is obtained by polymerizing an ethylenically unsaturated carboxylic acid and an ethylenically unsaturated carboxylic acid ester in the presence of two different polyazo group-containing polysiloxane compounds.
Priority Claims (1)
Number |
Date |
Country |
Kind |
7-286685 |
Oct 1995 |
JPX |
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Parent Case Info
This application is a continuation of application Ser. No. 08/722,601 filed Sep. 27, 1996, now abandoned.
US Referenced Citations (3)
Number |
Name |
Date |
Kind |
5023305 |
Onozuka et al. |
Jun 1991 |
|
5480634 |
Hayama et al. |
Jan 1996 |
|
5523365 |
Geck et al. |
Jun 1996 |
|
Foreign Referenced Citations (3)
Number |
Date |
Country |
0 582 152 A2 |
Feb 1994 |
EPX |
WO 9323009 |
Nov 1993 |
WOX |
WO 9503776 |
Feb 1995 |
WOX |
Continuations (1)
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Number |
Date |
Country |
Parent |
722601 |
Sep 1996 |
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