Claims
- 1. An antimicrobial skin cleansing composition consisting essentially of
- (A) an antimicrobially effective amount of one or more antimicrobial agents selected from the group consisting of
- (a) a compound having the structural formula ##STR14## wherein R taken alone is phenyl substituted by alkyl, alkoxy, nitro or halo, p-(2,2-dichlorocyclopropyl)phenyl, alkyl having from 6 to 16 carbon atoms, cycloalkyl or polycyclic alkyl having more than 6 carbon atoms or lower-alkyl-cycloalkyl or cycloalkyl-lower-alkyl having from 1 to 4 carbons in lower alkyl; R' taken alone is hydrogen; R and R' taken together are 3-azabicyclo(3,2,2)nonyl; and n is an integer from 3 to 9; or a pharmaceutically acceptable salt thereof;
- (b) a compound having the structural formula ##STR15## wherein R.sup.1 is long-chain alkyl or aralkyl; R.sup.2 is short-chain alkyl, long-chain alkyl or aralkyl, benzyl or part of an aromatic system or non-aromatic system; R.sup.3 and R.sup.4 are short-chain alkyl or part of an aromatic ring system or non-aromatic ring system; Z is a carbon-hydrogen chain; and X is a pharmaceutically acceptable anion; and
- (c) a compound having the structural formula ##STR16## wherein R is an alkyl group containing from 6 to 18 carbon atoms, a cycloalkyl group containing from 5 to 7 carbon atoms, benzyl, benzyl substituted by one or two substituents selected from the group consisting of halogen, hydroxy, lower-alkyl, lower-alkoxy, nitro, cyano and trifluoromethyl or phenyl substituted by methylenedioxy or one or two substituents selected from the group consisting of halogen, lower-alkyl, lower-alkoxy, nitro, cyano and trifluoromethyl;
- Y is an alkylene group containing from 4 to 18 carbon atoms and separating the two 4-(R-NH)-1-pyridinyl groups by from 4 to 18 carbon atoms;
- A is a pharmaceutically acceptable anion;
- m is 1 or 3;
- n is 1 or 2;
- x is 1, 2 or 3; and
- (m)(2)=(n)(x);
- (B) from about 0.75% to about 30% by weight of one or more polyethylene glycol ester surfactants having the structural formulas ##STR17## wherein R is alkyl or alkenyl having from about 8 to about 20 carbon atoms or lanolin and n is an integer from about 8 to about 200;
- (C) from about 0.5% to about 30% by weight of one or more surfactants selected from the group consisting of
- (a) betaines having the structural formulas ##STR18## wherein R.sup.1 is alkyl or alkenyl having from about 8 to about 18 carbon atoms; R.sup.2 is methyl, ethyl or 2-hydroxyethyl; R.sup.3 is 2-hydroxyethyl or CH.sub.2 COO.sup.- ; R.sup.4 is CH.sub.2 COO.sup.- or CH.sub.2 CH.sub.2 -O-CH.sub.2 COO.sup.- ; an n is 2 or 3; and
- (b) amine oxides having the structural formula ##STR19## wherein R.sup.1 taken alone is methyl, ethyl or 2-hydroxyethyl; R.sup.2 taken alone is methyl, ethyl or 2-hydroxyethyl; R.sup.1 and R.sup.2 taken together are morpholino; R.sup.3 is alkyl having from about 8 to about 18 carbon atoms or R.sup.4 CONH(CH.sub.2).sub.3 wherein R.sup.4 is alkyl having from about 8 to about 18 carbon atoms; and wherein 2-hydroxyethyl can be condensed with from 1 to about 200 units of ethylene oxide; and
- (D) water, aqueous ethyl alcohol, aqueous isopropyl alcohol or an aqueous ethyl alcohol-isopropyl alcohol mixture.
- 2. A composition according to claim 1 wherein the amount of antimicrobial agent is from about 0.01% to about 10% by weight of the composition.
- 3. The process of reducing the number of microbes on living skin which comprises applying to the skin an antimicrobially effective amount of a composition according to claim 2.
- 4. An antimicrobial skin cleansing composition consisting essentially of
- (A) an antimicrobially effective amount of one or more antimicrobial agents selected from the group consisting of a compound having the structural formula ##STR20## wherein R taken alone is phenyl substituted by alkyl, alkoxy, nitro or halo, p-(2,2-dichlorocyclopropyl)phenyl, alkyl having from 6 to 16 carbon atoms, cycloalkyl or polycyclic alkyl having more than 6 carbon atoms or lower-alkyl-cycloalkyl or cycloalkyl-lower-alkyl having from 1 to 4 carbons in lower alkyl; R' taken alone is hydrogen; R and R' taken together are 3-azabicyclo(3,2,2)nonyl; and n is an integer from 3 to 9; or a pharmaceutically acceptable salt thereof;
- (B) from about 0.75% to about 30% by weight of one or more polyethylene glycol ester surfactants having the structural formulas ##STR21## wherein R is alkyl or alkenyl having from about 8 to about 20 carbon atoms or lanolin and n is an integer from about 8 to about 200;
- (C) from about 0.5% to about 30% by weight of one or more surfactants selected from the group consisting of
- (a) betaines having the structural formulas ##STR22## wherein R.sup.1 is alkyl or alkenyl having from about 8 to about 18 carbon atoms; R.sup.2 is methyl, ethyl or 2-hydroxyethyl; R.sup.3 is 2-hydroxyethyl or CH.sub.2 COO.sup.- ; R.sup.4 is CH.sub.2 COO.sup.- or CH.sub.2 CH.sub.2 -O-CH.sub.2 COO.sup.- ; and n is 2 or 3; and
- (b) amine oxides having the structural formula ##STR23## wherein R.sup.1 taken alone is methyl, ethyl or 2-hydroxyethyl; R.sup.2 taken alone is methyl, ethyl or 2-hydroxyethyl; R.sup.1 and R.sup.2 taken together are morpholino; R.sup.3 is alkyl having from about 8 to about 18 carbon atoms or R.sup.4 CONH(CH.sub.2).sub.3 wherein R.sup.4 is alkyl having from about 8 to about 18 carbon atoms, and wherein 2-hydroxyethyl can be condensed with from 1 to about 200 units of ethylene oxide; and
- (D) water, aqueous ethyl alcohol, aqueous isopropyl alcohol or an aqueous ethyl alcohol-isopropyl alcohol mixture.
- 5. A composition according to claim 4 wherein the amount of antimicrobial agent is from about 0.01% to about 10% by weight of the composition.
- 6. The process of reducing the number of microbes on living skin which comprises applying to the skin an antimicrobially effective amount of a composition according to claim 5.
- 7. A composition according to claim 5 wherein the antimicrobial agent is chlorhexidine or a pharmaceutically acceptable salt thereof.
- 8. The process of reducing the number of microbes on living skin which comprises applying to the skin an antimicrobially effective amount of a composition according to claim 7.
- 9. A composition according to claim 7 wherein the salt is the digluconate salt.
- 10. The process of reducing the number of microbes on living skin which comprises applying to the skin an antimicrobially effective amount of a composition according to claim 9.
- 11. A composition according to claim 9 wherein the surfactant of part (C) is a betaine.
- 12. A composition according to claim 11 wherein the betaine has the structural formula ##STR24## wherein R.sup.1 represents the coconut radical, R.sup.3 is 2-hydroxyethyl and R.sup.4 is CH.sub.2 COO.sup.-.
- 13. A composition according to claim 12 which contains two polyethylene glycol ester surfactants of part (B), both having the structural formula ##STR25## wherein ##STR26## represents the coconut acid radical, one wherein n has an average value of 78 and the other wherein n has an average value of 30.
- 14. The process of reducing the number of microbes on living skin which comprises applying to the skin an antimicrobially effective amount of a composition according to claim 11.
- 15. An antimicrobial skin cleansing composition consisting essentially of
- (A) an antimicrobially effective amount of one or more antimicrobial agents selected from the group consisting of a compound having the structural formula ##STR27## wherein R.sup.1 is long-chain alkyl or aralkyl; R.sup.2 is short-chain alkyl, long-chain alkyl or aralkyl, benzyl or part of an aromatic system or non-aromatic system; R.sup.3 and R.sup.4 are short-chain alkyl or part of an aromatic ring system or non-aromatic ring system; Z is a carbon-hydrogen chain; and X is a pharmaceutically acceptable anion;
- (B) from about 0.75% to about 30% by weight of one or more polyethylene glycol ester surfactants having the structural formulas ##STR28## wherein R is alkyl or alkenyl having from about 8 to about 20 carbon atoms or lanolin and n is an integer from about 8 to about 200;
- (C) from about 0.5% to about 30% by weight of one or more surfactants selected from the group consisting of
- (a) betaines having the structural formulas ##STR29## wherein R.sup.1 is alkyl or alkenyl having from about 8 to about 18 carbon atoms; R.sup.2 is methyl, ethyl or 2-hydroxyethyl; R.sup.3 is 3-hydroxyethyl or CH.sub.2 COO.sup.- ; R.sup.4 is CH.sub.2 COO.sup.- or CH.sub.2 CH.sub.2 --O--CH.sub.2 COO.sup.- ; and n is 2 or 3; and
- (b) amine oxides having the structural formula ##STR30## wherein R.sup.1 taken alone is methyl, ethyl or 2-hydroxyethyl; R.sup.2 taken alone is methyl, ethyl or 2-hydroxyethyl; R.sup.1 and R.sup.2 taken together are morpholino; R.sup.3 is alkyl having from about 8 to about 18 carbon atoms or R.sup.4 CONH(CH.sub.2).sub.3 wherein R.sup.4 is alkyl having from about 8 to about 18 carbon atoms, and wherein 2-hydroxyethyl can be condensed with from 1 to about 200 units of ethylene oxide; and
- (D) water, aqueous ethyl alcohol, aqueous isopropyl alcohol or an aqueous ethyl alcohol-isopropyl alcohol mixture.
- 16. A composition according to claim 15 wherein the amount of antimicrobial agent is from about 0.01% to about 10% by weight of the composition.
- 17. The process of reducing the number of microbes on living skin which comprises applying to the skin an antimicrobially effective amount of a composition according to claim 16.
- 18. A composition according to claim 16 wherein the antimicrobial agent is benzalkonium chloride.
- 19. The process of reducing the number of microbes on living skin which comprises applying to the skin an antimicrobially effective amount of a composition according to claim 18.
- 20. An antimicrobial skin cleansing composition consisting essentially of
- (A) an antimicrobially effective amount of one or more antimicrobial agents selected from the group consisting of a compound having the structural formula ##STR31## wherein R is an alkyl group containing from 6 to 18 carbon atoms, a cycloalkyl group containing from 5 to 7 carbon atoms, benzyl, benzyl substituted by one or two substituents selected from the group consisting of halogen, hydroxy, lower-alkyl, lower-alkoxy, nitro, cyano and trifluoromethyl or phenyl substituted by methylenedioxy or one or two substituents selected from the group consisting of halogen, lower-alkyl, lower-alkoxy, nitro, cyano and trifluoromethyl;
- Y is an alkylene group containing from 4 to 18 carbon atoms and separating the two 4-(R-NH)-1-pyridinyl groups by from 4 to 18 carbon atoms;
- A is a pharmaceutically acceptable anion;
- m is 1 or 3;
- n is 1 or 2;
- x is 1, 2 or 3; and
- (m)(2)=(n)(x);
- (B) from about 0.75% to about 30% by weight of one or more polyethylene glycol ester surfactants having the structural formulas ##STR32## wherein R is alkyl or alkenyl having from about 8 to about 20 carbon atoms or lanolin and n is an integer from about 8 to about 200;
- (C) from about 0.5% to about 30% by weight of one or more surfactants selected from the group consisting of
- (a) betaines having the structural formulas ##STR33## wherein R.sup.1 is alkyl or alkenyl having from about 8 to about 18 carbon atoms; R.sup.2 is methyl, ethyl or 2-hydroxyethyl; R.sup.3 is 2-hydroxyethyl or CH.sub.2 COO.sup.- ; R.sup.4 is CH.sub.2 COO.sup.- or CH.sub.2 CH.sub.2 --O--CH.sub.2 COO.sup.- ; and n is 2 or 3; and
- (b) amine oxides having the structural formula ##STR34## wherein R.sup.1 taken alone is methyl, ethyl or 2-hydroxyethyl; R.sup.2 taken alone is methyl, ethyl or 2-hydroxyethyl; R.sup.1 and R.sup.2 taken together are morpholino; R.sup.3 is alkyl having from about 8 to about 18 carbon atoms or R.sup.4 CONH(CH.sub.2).sub.3 wherein R.sup.4 is alkyl having from about 8 to about 18 carbon atoms, and wherein 2-hydroxyethyl can be condensed with from 1 to about 200 units of ethylene oxide; and
- (D) water, aqueous ethyl alcohol, aqueous isopropyl alcohol or an aqueous ethyl alcohol-isopropyl alcohol mixture.
- 21. A composition according to claim 20 wherein the amount of antimicrobial agent is from about 0.01% to about 10% by weight of the composition.
- 22. The process of reducing the number of microbes on living skin which comprises applying to the skin an antimicrobially effective amount of a composition according to claim 21.
- 23. A composition according to claim 21 wherein in the structural formula of the antimicrobial agent R is CH.sub.3 (CH.sub.2).sub.7, Y is (CH.sub.2).sub.10, A is Cl or Br, m is 1, n is 2 and x is 1.
- 24. The process of reducing the number of microbes on living skin which comprises applying to the skin an antimicrobially effective amount of a composition according to claim 23.
- 25. A composition according to claim 23 wherein the surfactant of part (C) is a betaine.
- 26. The process of reducing the number of microbes on living skin which comprises applying to the skin an antimicrobially effective amount of a composition according to claim 25.
- 27. A composition according to claim 23 wherein the surfactant of part (C) is an amine oxide.
- 28. A composition according to claim 27 wherein in the amine oxide having the structural formula ##STR35## R.sup.1 is hydroxyethyl, R.sup.2 is hydroxyethyl and R.sup.3 is the coconut radical.
- 29. A composition according to claim 27 wherein the polyethylene glycol surfactant of part (B) has the structural formula ##STR36## wherein ##STR37## represents the coconut acid radical and n has an average value of 78.
- 30. The process of reducing the number of microbes on living skin which comprises applying to the skin an antimicrobially effective amount of a composition according to claim 27.
- 31. An antimicrobial skin cleansing composition consisting essentially of
- (A) an antimicrobially effective amount of chlorhexidine gluconate;
- (B) from about 0.75% to about 30% by weight of two polyethylene glycol ester surfactants having the structural formula ##STR38## wherein ##STR39## represents the coconut acid radical, one wherein n has an average value of 78 and the other wherein n has an average value of 30;
- (C) from about 0.5% to about 30% by weight of a betaine surfactant having the structural formula ##STR40## wherein R.sup.1 represents the coconut radical, R.sup.3 is 2-hydroxyethyl and R.sup.4 is CH.sub.2 COO.sup.- ; and
- (D) water.
CROSS-REFERENCE TO RELATED APPLICATIONS
This application is a continuation-in-part of our copending application Ser. No. 245,089 filed Mar. 18, 1981 now abandoned, which is a continuation-in-part of our copending application Ser. No. 158,737 filed June 12, 1980 and now abandoned, which is a continuation-in-part of our copending application Ser. No. 65,885 filed Aug. 13, 1979 and now abandoned.
US Referenced Citations (11)
Foreign Referenced Citations (1)
Number |
Date |
Country |
1533952 |
|
GBX |
Non-Patent Literature Citations (4)
Entry |
The Merck Index, Ninth Edition, Merck & Co., Inc., 1976:Monographs 224, 1059, 1078, 1987, 2060 and 2874. |
Disinfection, Sterilization and Preservation (Block), 2nd Edition, Lea & Febiger, 1977, pp. 325-360. |
Nonionic Surfactants (Schick), Marcel Dekker Inc., 1967, pp. 142-174. |
AROMOX Amine Oxides, Armak Co. Bulletin No. 74-21, 1974. |
Continuation in Parts (3)
|
Number |
Date |
Country |
Parent |
245089 |
Mar 1981 |
|
Parent |
158737 |
Jun 1980 |
|
Parent |
65885 |
Aug 1979 |
|