Claims
- 1. A beam forming region of an electron gun for use in a cathode ray tube, comprising:
(a) a cathode for emitting electrons (b) a first electrode, having a plurality of apertures (c) a second electrode, having a plurality of apertures whereby the apertures in said first electrode and the apertures in said second electrode form a plurality of emission areas on the cathode (d) a means of combining the electrons from the respective emission areas into a single beam whereby the beam is directed through a predetermined main lens.
- 2. The beam forming region of claim 1 wherein the electrons from said emission areas on the cathode pass through the respective apertures of the first and second electrodes, and the electrons crossover each other between the first and second electrodes.
- 3. The beam forming region of claim 1 wherein said means of combining the electrons comprises a depression in the second electrode.
- 4. The beam forming region of claim 1 wherein said means of combining the electrons comprises an additional electrode disposed between the second electrode and said predetermined main lens.
- 5. The beam forming region of claim 1 wherein the plurality of apertures in the first and second electrodes are disposed in a rotationally symmetric pattern.
- 6. The beam forming region of claim 1 wherein said cathode is of the field emission type.
- 7. A method of forming an electron beam of an electron gun for use in a cathode ray tube, comprising at least the steps of:
(a) extracting electrons from a plurality of areas of a cathode (b) directing the electrons through a plurality of apertures in a first electrode (c) directing the electrons through a plurality of apertures in a second electrode (d) combining the electrons immerging from the respective apertures whereby the electrons form a single beam (e) directing the beam through a predetermined main lens.
- 8. The method of forming an electron beam of claim 7 further including crossing over the electrons from the respective areas of the cathode between the first and second electrodes.
- 9. The method of forming an electron beam of claim 7 further including providing a depression in the second electrode.
- 10. The method of forming an electron beam of claim 7 further including providing an additional electrode disposed between the second electrode and said predetermined main lens.
- 11. The method of forming an electron beam of claim 7 further including arranging the apertures in the first and second electrodes in a rotationally symmetric pattern.
- 12. The method of forming an electron beam of claim 7 further including providing a field emission cathode.
CROSS REFERENCE TO RELATED APPLICATIONS
[0001] This application is entitled to the benefit of Provisional Patent Application Ser No. 60/261,046 filed Jan. 11, 2000.
Provisional Applications (1)
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Number |
Date |
Country |
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60261046 |
Jan 2001 |
US |