Patent Grant
8760831
The invention relates to semiconductor structures and methods of manufacture and, more particularly, to bi-directional back-to-back stacked SCRs for high-voltage pin ESD protection, methods of manufacture and design structures.
Electrostatic discharge (ESD) protection is becoming ever more important as integrated circuits become smaller and smaller. There are several ways in which to provide ESD protection, each having their own advantages and disadvantages. For example, ESD can be provided by a silicon controlled rectifier (SCR). A SCR is a solid state switching device that turns current on and off.
A semiconductor diode's behavior in a circuit is given by its current-voltage characteristic. The shape of the curve is determined by the transport of charge carriers through the so-called depletion layer or depletion region that exists at the p-n junction between differing semiconductors. The width of the depletion region cannot grow without limit. If an external voltage is placed across the diode with the same polarity as the built-in potential, the depletion zone continues to act as an insulator, preventing any significant electric current flow. This is the reverse bias phenomenon. However, if the polarity of the external voltage opposes the built-in potential, recombination can once again proceed, resulting in substantial electric current through the p-n junction (i.e., substantial numbers of electrons and holes recombine at the junction). At very large reverse bias, beyond the peak inverse voltage, a process called reverse breakdown occurs. This causes a large increase in current (i.e., a large number of electrons and holes are created at, and move away from the pn junction) that usually damages the device permanently.
Accordingly, there exists a need in the art to overcome the deficiencies and limitations described hereinabove.
In a first aspect of the invention, a device comprises a symmetrical bi-directional back-to-back stacked silicon controlled rectifier (SCR). An anode of a first of the back-to-back stacked SCR is connected to an input. An anode of a second of the back-to-back stacked SCR is connected to ground. Cathodes of the first and second of the back-to-back stacked SCR are connected together. Each of the symmetrical bi-directional back-to-back SCRs include a pair of diodes directing current towards the cathodes which, upon application of a voltage, become reverse biased effectively and deactivating elements from one of the symmetrical bi-directional back-to-back SCRs while the diodes of another of the symmetrical bi-directional back-to-back SCRs direct current in the same direction as the reverse biased diodes.
In another aspect of the invention, a structure comprises a silicon controlled rectifier (SCR). The SCR comprises an N+ region and a P+ region formed in an N-well; and an N+ region and a P+ region formed in a P-well which is adjacent to the N-well. A diode comprises a portion of the N+ region formed in the N-well located adjacent to a portion of the P+ region formed in the P-well.
In yet another aspect of the invention, a method comprises in a first portion: forming trench isolation structures using lithographic, etching and deposition processes in an upper layer of a silicon on insulator substrate (SOI); forming contiguous a N-well and P-well in the upper layer bounded by the trench isolation structures; and forming an N+ region and P+ region in each of the N-well and P-well using dopants, while blocking portions of the N-well and P-well with blocks. The method further comprises in a second portion, adjacent to the first portion: forming the trench isolation structures using same CMOS processing steps as the trench isolation structures of the first portion; forming the contiguous N-well and P-well in the upper layer bounded by the trench isolation structures using same CMOS processing steps at the N-well and P-well in the first portion; and forming a single N+ region in the N-well and a single P+ region in the P-well using same CMOS processing steps as the N+ regions and P+ regions of the first portion, with portions of the N-well and P-well separating the single N+ region and the single P+ region.
In another aspect of the invention, a design structure tangibly embodied in a machine readable storage medium for designing, manufacturing, or testing an integrated circuit is provided. The design structure comprises the structures of the present invention. In further embodiments, a hardware description language (HDL) design structure encoded on a machine-readable data storage medium comprises elements that when processed in a computer-aided design system generates a machine-executable representation of the ESD protection devices, which comprises the structures of the present invention. In still further embodiments, a method in a computer-aided design system is provided for generating a functional design model of the ESD protection devices. The method comprises generating a functional representation of the structural elements of the ESD protection devices.
The present invention is described in the detailed description which follows, in reference to the noted plurality of drawings by way of non-limiting examples of exemplary embodiments of the present invention.
a shows a circuit diagram of a bi-directional back-to-back stacked SCR for high-voltage pin ESD protection in accordance with aspects of the present invention;
b and 1c shows a representative circuit diagram of a bi-directional back-to-back stacked SCR for high-voltage pin ESD protection in accordance with an aspect of the invention;
a shows a top view of a bi-directional back-to-back stacked SCR for high-voltage pin ESD protection in accordance with an aspect of the invention;
b and 3c show cross sectional views of the bi-directional back-to-back stacked SCR for high-voltage pin ESD protection and respective processing steps of
a shows a top view of a bi-directional back-to-back stacked SCR for high-voltage pin ESD protection in accordance with an aspect of the invention;
b and 5c show cross sectional views of the bi-directional back-to-back stacked SCR for high-voltage pin ESD protection and respective processing steps of
The invention relates to semiconductor structures and methods of manufacture and, more particularly, to bi-directional back-to-back stacked SCRs for high-voltage pin ESD protection, methods of manufacture and design structures. In more specific embodiments, the devices of the present invention are bi-directional back-to-back stacked symmetrical SCRs, each having PNP and NPN bipolar junctions and parallel diodes. Conventional back to back stacked diodes have very high clamping voltage, which is not advantageous to the ESD protection.
In operation (e.g., upon application of positive or negative voltage), the diodes in one SCR can be reverse biased effectively removing elements (diodes) from the circuit; while the diodes in the other SCR remain forward biased. In this way, a forward bias ESD protection path is created upon application of a voltage, which provides superior ESD protection. Also, advantageously, the bi-directional back-to-back stacked SCR maintains low breakdown voltage and low Ron, thereby providing superior ESD protection. The bi-directional back-to-back stacked SCR for high-voltage pin ESD protection is also not process sensitive, i.e., performance is not sensitive to changes in processing conditions, from one device to another.
a shows a circuit diagram of a bi-directional back-to-back stacked SCR for high-voltage pin ESD protection in accordance with aspects of the present invention. The circuit 5 of
More specifically, the SCR 10 is connected to an input 30 at its anode 10a and the SCR 20 is connected to ground 40 by its anode 20a. The SCR 10 and SCR 20 are connected together by their respective cathodes, 10b, 20b. The SCR 10 and SCR 20 each include resistors R1 and R2 in parallel with diodes D1 and D2, respectively, each having its forward direction towards the cathodes 10b, 20b of the respective SCR 10, 20. In embodiments, the diodes D1 and D2 can be, for example, a P-well diode and N-well diode, respectively. Additional diodes D3 and D4, respectively, are provided between the diodes D1 and D2 and resistors R1 and R2. The diodes D3 and D4 can be P-well/N-well junction diodes. In embodiments, the arrangement of the diodes can create a PNP or NPN bipolar transistor.
As discussed in further detail with reference to
More specifically, as shown in
Similarly, as shown in
More specifically,
a shows a top view of a bi-directional back-to-back stacked SCR for high-voltage pin ESD protection in accordance with an aspect of the invention.
The SCR 10 includes a shallow trench isolation structure 200, surrounding N- and P-wells (covered by block 230), which can have similar widths. More specifically, at cross section A-A (e.g., diode) an N+ doped region 205 is adjacent (e.g., contiguous) (in direct contact with) an N-well (covered by block 230). The N-well is adjacent (in direct contact with) a P-well (also covered by block 230). The P-well is adjacent (in direct contact with) a P+ region 220. The P+ region 200 is adjacent (in direct contact with) to the shallow trench isolation structure 200.
At cross section B-B (e.g., SCR), the N+ doped region 205 is adjacent (in direct contact with) an N-well (covered by block 210). The N-well is adjacent (in direct contact with) a P+ region 220a. The P+ region 220a is adjacent (in direct contact with) the N-well (covered by block 230), which is adjacent (in direct contact with) the P-well (also covered by block 230). The P-well is adjacent (in direct contact with) a N+ region 205a. The N+ region 205a is adjacent (in direct contact with) a P-well (covered by block 210). The P-well (covered by block 210) is adjacent (in direct contact with) the P+ region 220. The P+ region 200 is adjacent (in direct contact with) the shallow trench isolation structure 200.
b shows a cross sectional view along A-A of the bi-directional back-to-back stacked SCR of
Referring to
N-wells 235 and P-wells 240 are formed in the substrate 170 using conventional doping processes. In embodiments, the N-wells 235 can be formed by phosphorous doping and the P-wells 240 can be formed by arsenic or boron doping, using known concentrations and doses. Thereafter, N+ regions 205, 205a and P+ regions 220a, 220 are formed in the substrate 170 using conventional dopants, while blocking the N-wells 235 and P-wells 240 with blocks 210 and 230, respectively. The N+ regions 205, 205a and P+ regions 220a, 220 can be formed using conventional dopants such as, for example, phosphorous (for N+ regions) and arsenic or boron (for P+ regions) at known concentrations and doses. In embodiments, the N+ regions 205, 205a and P+ regions 220a, 220 (much like the N-wells and P-wells) extend to the insulator layer 160.
a shows a top view of a bi-directional back-to-back stacked SCR for high-voltage pin ESD protection in accordance with an aspect of the invention.
The SCR 10 includes a trench isolation structure 500 surrounding N+ doped regions and P+ doped regions. More specifically, at cross section A-A (e.g., diode), the trench isolation structure 500 is adjacent (in direct contact with) N+ region 505. The N+ region 505 (formed in a N-well) is separated from P+ region 510 (formed in a P-well) by a shallow trench isolation structure 502. In embodiments, the P-well and the N-well can have similar widths. At cross section B-B (e.g., SCR), the trench isolation structure 500 is adjacent (in direct contact with) the N+ region 505. The N+ region 505 (formed in an N-well) is separated from P+ region 510a (formed in the N-well) by a shallow trench isolation structure 502. The P+ region 510a is separated from N+ region 505a (formed in the N-well) by the shallow trench isolation structure 502. The N+ region 505a (formed in the N-well) is separated from P+ region 510 (formed in the N-well) by a shallow trench isolation structure 502.
b shows a cross sectional view along A-A of the bi-directional back-to-back stacked SCR of
Referring to
For both the trench isolation structures 500 and shallow trench isolation structures 502, a photoresist can be provided on the substrate 170, and exposed to light to form a pattern (holes) exposing portions of the substrate 170. A pattern of trenches is then etched into the substrate 170 using conventional etching processes such as, for example, reactive ion etching. The photoresist can be stripped and an insulator material such as, for example, oxide can then be deposited into the pattern of trenches. A planarization process can then follow such as, for example, chemical mechanical polishing.
N-wells 235 and P-wells 240 are then formed in the substrate using conventional doping processes. In embodiments, the N-wells 235 can be formed by phosphorous doping and the P-wells 240 can be formed by arsenic or boron doping, using known concentrations and doses. In embodiments, the N-wells 235 and P-wells 240 are isolated from by the trench isolation structures 500.
Thereafter, N+ regions 505, 505a and P+ regions 510, 510a are formed in the substrate 170 using conventional dopants, while blocking the N-wells 235 and P-wells 240 with blocks. The N+ regions 505, 505a and P+ regions 510a, 510 can be formed using conventional dopants such as, for example, phosphorous (for N+ regions) and arsenic or boron (for P+ regions) at known concentrations and doses. In embodiments, the N+ regions 505, 505a and P+ regions 510a, 510 do not extend to the insulator layer 160 and are separated by the shallow trench isolation structures 502; whereas, the N-wells 235 and P-wells 240 extend to the insulator layer 160.
Design flow 900 may vary depending on the type of representation being designed. For example, a design flow 900 for building an application specific IC (ASIC) may differ from a design flow 900 for designing a standard component or from a design flow 900 for instantiating the design into a programmable array, for example a programmable gate array (PGA) or a field programmable gate array (FPGA) offered by Altera® Inc. or Xilinx® Inc.
Design process 910 preferably employs and incorporates hardware and/or software modules for synthesizing, translating, or otherwise processing a design/simulation functional equivalent of the components, circuits, devices, or logic structures shown in
Design process 910 may include hardware and software modules for processing a variety of input data structure types including netlist 980. Such data structure types may reside, for example, within library elements 930 and include a set of commonly used elements, circuits, and devices, including models, layouts, and symbolic representations, for a given manufacturing technology (e.g., different technology nodes, 32 nm, 45 nm, 90 nm, etc.). The data structure types may further include design specifications 940, characterization data 950, verification data 960, design rules 970, and test data files 985 which may include input test patterns, output test results, and other testing information. Design process 910 may further include, for example, standard mechanical design processes such as stress analysis, thermal analysis, mechanical event simulation, process simulation for operations such as casting, molding, and die press forming, etc. One of ordinary skill in the art of mechanical design can appreciate the extent of possible mechanical design tools and applications used in design process 910 without deviating from the scope and spirit of the invention. Design process 910 may also include modules for performing standard circuit design processes such as timing analysis, verification, design rule checking, place and route operations, etc.
Design process 910 employs and incorporates logic and physical design tools such as HDL compilers and simulation model build tools to process design structure 920 together with some or all of the depicted supporting data structures along with any additional mechanical design or data (if applicable), to generate a second design structure 990.
Design structure 990 resides on a storage medium or programmable gate array in a data format used for the exchange of data of mechanical devices and structures (e.g. information stored in a IGES, DXF, Parasolid XT, JT, DRG, or any other suitable format for storing or rendering such mechanical design structures). Similar to design structure 920, design structure 990 preferably comprises one or more files, data structures, or other computer-encoded data or instructions that reside on transmission or data storage media and that when processed by an ECAD system generate a logically or otherwise functionally equivalent form of one or more of the embodiments of the invention shown in
Design structure 990 may also employ a data format used for the exchange of layout data of integrated circuits and/or symbolic data format (e.g. information stored in a GDSII (GDS2), GL1, OASIS, map files, or any other suitable format for storing such design data structures). Design structure 990 may comprise information such as, for example, symbolic data, map files, test data files, design content files, manufacturing data, layout parameters, wires, levels of metal, vias, shapes, data for routing through the manufacturing line, and any other data required by a manufacturer or other designer/developer to produce a device or structure as described above and shown in
The method as described above is used in the fabrication of integrated circuit chips. The resulting integrated circuit chips can be distributed by the fabricator in raw wafer form (that is, as a single wafer that has multiple unpackaged chips), as a bare die, or in a packaged form. In the latter case the chip is mounted in a single chip package (such as a plastic carrier, with leads that are affixed to a motherboard or other higher level carrier) or in a multichip package (such as a ceramic carrier that has either or both surface interconnections or buried interconnections). In any case the chip is then integrated with other chips, discrete circuit elements, and/or other signal processing devices as part of either (a) an intermediate product, such as a motherboard, or (b) an end product. The end product can be any product that includes integrated circuit chips, ranging from toys and other low-end applications to advanced computer products having a display, a keyboard or other input device, and a central processor.
The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the singular forms “a”, “an” and “the” are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms “comprises” and/or “comprising,” when used in this specification, specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof.
The corresponding structures, materials, acts, and equivalents of all means or step plus function elements in the claims, if applicable, are intended to include any structure, material, or act for performing the function in combination with other claimed elements as specifically claimed. The description of the present invention has been presented for purposes of illustration and description, but is not intended to be exhaustive or limited to the invention in the form disclosed. Many modifications and variations will be apparent to those of ordinary skill in the art without departing from the scope and spirit of the invention. The embodiment was chosen and described in order to best explain the principals of the invention and the practical application, and to enable others of ordinary skill in the art to understand the invention for various embodiments with various modifications as are suited to the particular use contemplated. Accordingly, while the invention has been described in terms of embodiments, those of skill in the art will recognize that the invention can be practiced with modifications and in the spirit and scope of the appended claims.
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| Number | Date | Country | |
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| Number | Date | Country | |
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| Parent | 12898013 | Oct 2010 | US |
| Child | 13762948 | US |
