Black matrix of color filter and method of manufacturing the black matrix

Abstract

A black matrix used with color filters and a method of manufacturing the black matrix. The black matrix is formed on a substrate and defines a plurality of pixel regions. The black matrix has an ink-phobic upper surface having a plurality of nano-sized grooves formed therein, and ink-philic lateral surfaces.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

These and/or other aspects and advantages of the present general inventive concept will become apparent and more readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:

FIG. 1 is a perspective view illustrating a black matrix of a color filter according to an embodiment of the present general inventive concept;

FIG. 2 illustrates a cross-section of the black matrix illustrated in FIG. 1;

FIG. 3 illustrates a color filter manufactured using the black matrix illustrated in FIGS. 1 and 2; and

FIGS. 4A through 4D are cross-sectional views illustrating a method of manufacturing the black matrix shown in FIGS. 1 and 2.

Claims

1. A black matrix used with color filters that is formed on a substrate and defines a plurality of pixel regions, the black matrix comprising: an upper surface having a plurality of nano-sized grooves formed therein and being ink-phobic; andlateral surfaces being ink-philic.

2. The black matrix for color filters of claim 1, wherein the black matrix is formed of an ink-philic material.

3. The black matrix for color filters of claim 2, wherein the black matrix is formed of a polymer-based organic resin.

4. The black matrix for color filters of claim 1, wherein each of the grooves is 20-200 nm in size.

5. The black matrix for color filters of claim 4, wherein each of the grooves is 1000-100000 nm2 in cross-sectional area.

6. The black matrix for color filters of claim 4, wherein the grooves occupy 20-50% of the upper surface.

7. The black matrix for color filters of claim 4, wherein each of the grooves is 50-200 nm in depth.

8. A color filter comprising: a substrate;a black matrix formed on the substrate and defining a plurality of pixel regions; andink of predetermined colors filled within the pixel regions, wherein the black matrix comprises: an upper surface having a plurality of nano-sized grooves formed therein and being ink-phobic, andlateral surfaces being ink-philic.

9. The color filter of claim 8, wherein the black matrix is formed of an ink-philic material.

10. The color filter of claim 8, wherein each of the grooves is 20-200 nm in size.

11. The color filter of claim 10, wherein each of the grooves is 1000-100000 nm2 in cross-sectional area.

12. The color filter of claim 10, wherein the grooves occupy 20-50% of the upper surface of the black matrix.

13. The color filter of claim 10, wherein each of the grooves is 50-200 nm in depth.

14. A method of manufacturing a black matrix used with color filters, the method comprising: forming a light shade layer of an ink-philic material on a substrate;patterning the light shade layer to define a plurality of pixel regions on the substrate; andforming a black matrix by forming nano-sized grooves on an upper surface of the patterned light shade layer using a nano-imprinting process.

15. The method of claim 14, wherein the light shade layer is formed of a polymer-based organic resin.

16. The method of claim 14, wherein the forming of the light shade layer comprises: coating the ink-philic material on the substrate; andsoft baking the ink-philic material.

17. The method of claim 16, wherein the soft baking is performed at 80-120° C.

18. The method of claim 14, further comprising: hard baking the patterned light shade layer after the patterning of the light shade layer.

19. The method of claim 18, wherein the hard baking is performed at about 200-230° C.

20. The method of claim 18, wherein the nano-imprinting process is executed during the hard baking of the patterned light shade layer.

21. The method of claim 14, wherein the forming of the grooves using the nano-imprinting process comprises: installing a stamp over the patterned light shade layer, the stamp having nano-sized protrusions formed on its bottom;pressing the stamp down on the upper surface of the patterned light shade layer so as to form grooves having shapes depending on the shapes of the protrusions on the stamp in the upper surface of the patterned light shade layer; andseparating the stamp from the light shade layer.

22. The method of claim 21, wherein the stamp is formed of a material selected from the group consisting of glass, quartz, silicon (Si), and poly(dimethylsiloxane) (PDMS).

23. The method of claim 14, wherein each of the grooves is formed to have a size of 20-200 nm.

24. The method of claim 23, wherein each of the grooves is formed to have a cross-sectional area of 1000-100000 nm2.

25. The method of claim 23, wherein the grooves occupy 20-50% of the upper surface of the black matrix.

26. The method of claim 23, wherein each of the grooves is formed to have a depth of 50-200 nm.

27. A black matrix used with a color filter defining a plurality of pixel regions, the black matrix comprising: an ink-phobic upper surface; andink-philic lateral surfaces formed of a same material as the upper surface.

28. The black matrix of claim 27, wherein the black matrix is formed of a ink-phillic material.

29. The black matrix of claim 27, wherein the ink-phobic upper surface comprises a plurality of grooves.

30. The black matrix of claim 29, wherein each of the plurality of grooves is 20-200 nm in diameter.

31. The black matrix of claim 29, wherein the distance between inner walls of the plurality of grooves is 20-200 nm.

32. The black matrix of claim 29, wherein each of the plurality of grooves is 50-200 nm in depth.

33. The black matrix of claim 29, wherein the plurality of grooves occupy 20-50% of a total area of the upper surface of the black matrix.

34. A method of manufacturing a black matrix used with a color filter, the method comprising: patterning a layer on a substrate to define a plurality of pixel regions;forming a plurality of nano-sized grooves on a top surface of the patterned layer to form ink-phobic regions.

35. The method of claim 34 wherein the patterned layer comprises an ink-philic material, and the patterning of the layer comprises: coating the ink-philic material on the substrate; andsoft-baking the ink-philic material on the substrate.

36. The method of claim 34, wherein the patterning of the layer further comprises: hard-baking the patterned layer.

37. The method of claim 36, wherein the forming of the plurality of grooves comprises: pressing a stamp having a plurality of protrusions onto the top surface of the patterned layer.

38. The method of claim 37, wherein the forming of the plurality of grooves is performed during the hard-baking of the patterned layer.

39. The method of claim 35, wherein the forming of the plurality of grooves is performed during the soft-baking of the patterned layer.

40. The method of claim 34, wherein each of the grooves is formed to have a size of 20-200 nm.

41. The method of claim 34, wherein each of the grooves is formed to have a cross-sectional area of 1000-100000 nm2.

42. The method of claim 34, wherein each of the grooves is formed to have a depth of 50-200 nm.

43. The method of claim 34, wherein the grooves is formed to occupy 20-50% of the upper surface of the layer.