The invention relates to electrode plates that reduce high voltage glitch rates in accelerators by improving pumping, in particular, by adding blind vent holes in the electrode plates.
In an accelerator system, biased electrodes are used for extraction of ions into a beam line. The biased electrodes in an accelerator are vulnerable to electrical breakdown (“glitch”). Similarly, plasma processing tools are known that utilize plasma electrodes vulnerable to glitches. The glitch rate of is related to: The material and surface condition of the electrodes; Gas pressure in the electrode gap; Secondary electrons and energetic photons generated at a negative electrode by impact of energetic ions or photons (i.e., x-rays); and Secondary ion and energetic photons generated at a positive electrode by the impact of energetic electrons or photons.
Previously, aperture electrode plates have frequently been made of tungsten, which stops x-rays. For example,
However, the use of tungsten electrode plates and apertures 14, 16 contributes to metal contamination of the ion implantation processes. Additionally, the replacement of tungsten parts with graphite parts causes a significant increase in glitch rate of the extraction system. This is believed to be due to x-rays from the ion source or source plate passing through the graphite part of the suppressor grid assembly 14, 16 and creating secondary ions at the ground grid assembly 20 (which is positively biased with respect to the suppressor plate). Secondary ions from the ground grid assembly 20 are then accelerated across the suppression gap, into the more negative suppressor plate 12. Secondary x-rays, generated by ground ion impact on the suppressor grid assembly 10, can also pass through the graphite parts of the suppressor grid assembly 10 and generate secondary ions on the source grid, which can also be accelerated across the extraction gap into the suppressor grid assembly 10. It should be noted that stopping energetic photons (or, x-rays) depends on both the photon energy and the stopping material. For example, x-rays generated by a 30 kV extraction set are easily stopped by tungsten, but most pass through graphite electrodes. On the other hand, 5 keV x-rays are mostly stopped by 10 mm of graphite. For some applications, process compatibility of graphite, conducting silicon, or other light conductors may outweigh the disadvantage of poor x-ray stopping compared to tungsten or other heavy metals. Graphite is used in the present application as a representative example of a lighter, process compatible conductor useful in making electrodes. What is needed is a way to provide a significant reduction in glitch rate for electrodes when using lighter conductors.
Further, gas in the gap between electrodes contributes to the glitch rate of those electrodes. So, venting electrodes with channels can improve pumping, reduce gas pressure, and reduce glitch rate. Referring now to
U.S. Pat. No. 8,153,993 to Goldberg et al., (the “'993 patent”) discloses a front plate for an ion source which includes a slot penetrating through the front plate from obverse side to reverse side at a slant, to occlude line of sight into the ion source when viewed from in front, yet provides an expansion gap. The '993 patent discloses that the slot may be formed at a constant slant through the front plate or the slant may vary as the slit extends through the front plate and/or the slot may be kinked to form a dog-leg, for example. See, for example, col. 2 of the '993 patent, lines 47-50 and col. 5 of the '993 patent, lines 9-14. However, the slot of the '993 patent is formed to provide an expansion gap for the plate, but is specifically intended to minimize venting of gas from one side of the plate to the other. Rather, the '993 patent discloses that, as a result of the slanted slot, the tendency for ions and gas to escape from the ion source through the slot is much reduced. See, for example, col. 2 of the '993 patent, lines 20-21 and col. 4 of the '993 patent, lines 65-67 (i.e., “ . . . ion loss and gas loss from the arc chamber 16 through the slit 80 is minimized”).
In the case of positive ion beams, what is needed is a vented electrode or grid (the two terms being used interchangeably, herein), such as a suppression grid, that permits venting, while reducing metal contamination and providing a ground direction stop for energetic particles and photons created by impact of energetic particles in a vent channel. What is additionally needed is a vented grid that adds a directional stop to prevent secondary particles and photons that are created in the vent channel from reaching the extraction gap. What is further needed is a vented grid that creates a “two-way” (i.e., from either side of the vented plate), double line of sight stop for energetic particles and secondaries created by the impact of energetic particles in the vent channels.
It is accordingly an object of the invention to provide a vented electrode that provides a ground direction stop for energetic particles and secondaries (i.e., secondary electrons, charged particles, photons) generated in a vent channel by ions or x-rays from the source gap. In another embodiment, a vented electrode is provided that adds a directional stop to prevent energetic particles and secondaries (i.e., secondary electrons, charged particles, photons) generated in the vent channel by ground gap ions or x-rays from reaching the source gap. In one particular embodiment of the invention, ventilation is added to at least one of the suppression and ground grid via blind-vented inserts, wherein the vents have two-way stops, and thus, do not have any direct line of sight from the suppression grid to the ground grid and vice versa, mounted into holes or slots in the suppression or ground plates, thereby improving vacuum levels in the surrounding areas. In another embodiment, the vented plates can be fabricated from a preferred conducting material, such as graphite, to replace tungsten with a more process compatible material.
Although the invention is illustrated and described herein as embodied in a blind-vented electrode, it is nevertheless not intended to be limited to the details shown, since various modifications and structural changes may be made therein without departing from the spirit of the invention and within the scope and range of equivalents of the claims.
The construction and method of operation of the invention, however, together with additional objects and advantages thereof will be best understood from the following description of specific embodiments when read in connection with the accompanying drawings.
The present invention relates to electrode plates that reduce high voltage glitch rates in accelerators by improving pumping, in particular, by adding blind vent holes in electrode plates. Note that, for purposes of the present application, the terms “electrode” and “grid assembly” are used interchangeably, herein. Referring now to
The suppression base plate 120 includes a central slot 130 configured to receive a suppression electrode aperture 140, which is secured thereto using the appropriate fasteners (not shown). In order to promote venting through the suppression grid 110, the base plate 120 additionally includes a plurality of holes or slots 132 that are configured to receive the body of the blind venting inserts 150 (i.e., wherein a flange is mated with a recess in the rear of the plate 120 and secured to the plate 120 via a fastener, not shown). Note that, if desired, blind venting holes could be made directly into the base plate 120; into a single separate piece; and/or into a separate flange, as shown.
Similarly, in the present preferred embodiment, the ground grid 160 includes a ground plate 170, to which a ground electrode aperture 180 is secured using fasteners (not shown) in the central slot 172. As with the suppression base plate 120, the ground plate 170 includes a plurality of slots 174 (two, in the present example) that are configured to receive the blind venting inserts 190, as described above in connection with the blind venting inserts 150.
The blind venting inserts 150, 190 are configured to add ventilation on the suppression and ground grids 110, 160, thereby improving vacuum levels in the surrounding areas. The blind venting inserts 150, 190 are, preferably, made of graphite, as well. Inserts 150 may be identical to inserts 190, or may be different, as desired. Each of the inserts 150, 190 includes a plurality of venting channels 152, 192, respectively, which do not have any line of sight from the source side of the suppression grid to the analysis side of the ground grid and/or vice versa.
Referring now to
In contrast, in the present embodiment illustrated in
Thus, the embodiment illustrated in
Referring now to
Thus, as illustrated more particularly in
Referring now to
For example, in one exemplary embodiment illustrated in
In the present embodiment, one vertical channel 310 is provided for each vertical column (i.e., vertically aligned plurality) of wells 312, 314. For example, in the embodiment illustrated in
As can be seen from the foregoing exemplary description of the preferred embodiments, the present invention provides a vented electrode that eliminates the line of sight through the vent holes, to stop stray energetic charged particles and some photons from going through the suppressor plate from the extraction gap to the ground plate, and/or from the suppression gap to the source plate. The impact of x-rays or energetic through particles can generate ions that would be accelerated into the suppressor plate, which, in turn, can generate electrons that strike the source or ground electrodes.
Although discussed herein in connection with suppression and ground electrodes, the present invention can be applied to other types of electrodes, including accelerator and plasma electrodes, without departing from the scope or spirit of the present invention.
Note that, although both the suppression grid and ground grid have been illustrated in the preferred embodiment as including blind-venting according to the present invention, it should be understood that it is possible only one of the two could include such venting without departing from the scope and spirit of the present invention. Additionally, instead of being incorporated as inserts into the plates, the plates themselves can be vented, as taught herein, and still be within the scope of the present invention.
It should be understood that this principle can be applied in environments in which particular materials may be preferred for process compatibility. In particular, all or parts of the accelerator grids may be made of preferred conducting materials, such as, Tungsten, graphite, Molybdenum, stainless steel and/or other conducting materials, as desired, without departing from the scope or spirit of the present invention.
While a preferred embodiment of the present invention is shown and described herein, it will be understood that the invention may be embodied otherwise than as herein specifically illustrated or described, and that within the embodiments certain changes in the detail and construction, as well as the arrangement of the parts, may be made without departing from the principles of the present invention as defined by the appended claims.
Number | Name | Date | Kind |
---|---|---|---|
5956562 | Lo | Sep 1999 | A |
8153993 | Goldberg et al. | Apr 2012 | B2 |
8368309 | Horsky et al. | Feb 2013 | B2 |
8573153 | Fischer et al. | Nov 2013 | B2 |
9412555 | Augustino et al. | Aug 2016 | B2 |
9520276 | Takahashi et al. | Dec 2016 | B2 |
20070187229 | Aksenov | Aug 2007 | A1 |
20140084396 | Jenkins | Mar 2014 | A1 |
20140102640 | Yokogawa et al. | Apr 2014 | A1 |
Number | Date | Country |
---|---|---|
2007005491 | Jan 2007 | JP |
2010521765 | Jun 2010 | JP |
2012043796 | Mar 2012 | JP |
2013110277 | Jun 2013 | JP |
2014053319 | Mar 2014 | JP |
2014082354 | May 2014 | JP |
2016219820 | Dec 2016 | JP |
Entry |
---|
“Ion implantation: Ideal extraction assembly for VIISta HCP, HCS, Trident, and NexGen”, Plansee High Performance Materials, Feb. 12, 2014. |
Number | Date | Country | |
---|---|---|---|
20180218800 A1 | Aug 2018 | US |