The study and applications of quantum phenomena are typically conducted in ultra-high vacuums (UHVs), e.g., within a UHV cell. Such a vacuum cell can be evacuated using an external vacuum system. Once a target vacuum level is achieved, the cell needs to be sealed without impairing the already-achieved vacuum. Preferably, the seal will add little to the size and weight of the vacuum cell. Also, preferably, the seal will provide optical access (e.g., to laser beams) to the interior of the vacuum cell.
The present invention provides a low-profile break-seal that allows evacuation to high-vacuum levels of a vacuum cell, followed by convenient hermetic sealing of the vacuum cell. Reducing the profile of the break-seal kit assembly reduces the amount of wasted materials, the size of the package on the vacuum station, and the difficulty in handling complex geometries of subassemblies for mounting on a vacuum station. Established wafer handling processes and machines can be leveraged to remove the human factor in most of the assembly and bonding process, thus enabling modified integrated circuit or Micro-Electronic Machines Systems (MEMS) assembly and process lines to be used. This allows for one vacuum station to process an array of cells at once. This parallelism can reduce the complexity of assembly at scale since individual wafers can be bonded concurrently, resulting in multiple packages that can then be vacuum processed and sealed in one step.
Reducing the profile of the break-seal itself allows for a reduction in the profile of a vacuum cell hermetically sealed by the break-seal. Reducing the cell profile improves the robustness of the sealed vacuum cell. Removing unnecessary protrusions eliminates points of snagging or impact during part handling and installation. Keeping smoother external profiles with minimal protrusions also simplifies packaging especially where stringent shock-vibe specs are required as geometrically simpler packaging is typically easier to engineer to be robust with insulation and dampening features.
As shown in
Break-seal 102 is a monolithic structure with a membrane 120 bridging inner ring 110 and outer ring 112. For example, break-seal 102 can be fabricated from a silicon disk in part by photolithographically or otherwise etching material to defined membrane 120. Inner ring 110 has cell facing surface 112 and an exhaust-facing surface 302, shown in
In the illustrated embodiment, inner-ring cell-facing surface 112 and outer-ring cell-facing surface 122 are coplanar so that outer-ring cell-facing surface 122 contacts a wall 124 of vacuum cell 106 when inner-ring 110 is bonded to wall 124. The purpose of having the outer ring contact the cell wall is to provide support for the membrane to help prevent its accidental breakage. Since wall 124 is flat in the region contacted by inner ring 110 and outer ring 114, outer-ring cell-facing surface 122 is sufficiently coplanar to inner-ring cell-facing surface 112. In an alternative embodiment in which the cell wall is not flat, the outer-ring cell-facing surface 122 and inner-ring cell-facing surface 112 are not coplanar, but are both conformal to the non-flat (e.g., conical or spherical) vacuum-cell wall.
The cell-facing surface and the exhaust-facing surface of the inner ring and the exhaust-facing surface of the outer ring may be polished or otherwise treated to promote bonding. The cell-facing surface of the outer ring may be treated to prevent or limit bonding. This treatment can include sanding, etching, or deposition of a barrier that prevents diffusion or other bonding mechanisms.
The surfaces may be in contact such that when a vacuum is pulled the atmospheric pressure does not cause flexing of the ring structure as the outer ring is able to rest against a mating but non-bonding surface of the vacuum cell, or against a temporary removable spacer ring between the outer ring and the vacuum cell. Methods of bonding of the outer ring to exhaust interface 118 may be contact, anodic, fritting, brazing, diffusion bonding, indium sealing, epoxy, adhesive, or even elastomer contact sealing. The inner ring is any permanent or sufficiently permanent version of the above set or via other permanent means of attachment, bonding, or integration to form a hermetic seal. The seal itself may or may not be the same as the means of bonding or clamping.
Once membrane 120 is broken and vacuum cell 106 is separated from exhaust interface 118, inner ring 110 remains bonded to vacuum cell 106, while outer ring 114 remains bonded to exhaust interface 118. As shown in the bottom portion of
As shown in
In the illustrated embodiment, break-seal 102 is fabricated from monocrystalline silicon. In other embodiments, the break-seal can include other forms of silicon, Pyrex® or other glasses, and ceramics. In the illustrated embodiment, the cap is Pyrex®. In other embodiments, the cap can be, another type of glass or it can be silicon. In embodiments with a silicon cap, the cap can be a window for wavelengths for which silicon is transparent. In an embodiment with a glass break-seal and a silicon cap, the cap can be an electrical conductor to the interior of the cell, while the glass break-seal can an insulator.
As shown in
A ferromagnetic, e.g., UHV compatible steel, piston 214 moves up and down on the inside of tube 208 to track the movement of magnet 212. A pedestal 216 is coupled to piston 214 via a bellows-like spring 218 and a shaft 220. Thus, pedestal 216 moves up and down with the like movement of piston 214 and magnet 212. Pedestal 216 is designed to hold cap 108. When magnet 212 is down, cap 108 is held in a position retracted from break-seal 102, e.g., during pump-down of vacuum cell 106. When pedestal magnet 212 is up, cap 108 can be pressed against break-seal 102 so that cap 106 can be bonded to break-seal inner ring 110 (
As shown in
In
In
As shown in
A break-seal process 900 is flow-charted in
At 902, the inner ring is bonded to a vacuum cell, while the outer ring is bonded to the exhaust interface. The outer ring contacts the vacuum cell, but is either not bonded to it or is reversibly bonded to it such that, when the vacuum cell is separated from the exhaust interface, the outer ring separates from the vacuum cell and remains bonded to the exhaust interface.
At 903, an external pump system evacuates the vacuum cell. Material flows form the cell, through the break-seal, into the exhaust interface and out through a branch of the exhaust interface and into the external vacuum system.
At 904, using a mechanism of the exhaust interface, moving the cap into contact with the inner ring to block a break-seal aperture. A spring of the exhaust interface ensures that the contact is flush. At 905, the cap is bonded to the inner ring. For example, using a conductive path of the exhaust interface to implement electrically-assisted (e.g., anodic) bonding, the cap can be bonded to the inner ring. Bonding the cap results in hermetic sealing of the vacuum cell. Once the cap is bonded, the mechanism used to move the cap into position for bonding can be retracted.
At 906, the break-seal membrane is broken. The method of inducing a fracture into the intermediate thinned or weakened ring may include: electric arc stressing, mechanical force or torqueing of the inner ring with respect to the outer ring, vibratory or acoustic energy in an impulse or resonant scheme of induction, electro-inductive heating to cause local or targeted expansion of one or multiple rings with respect to others, directed or diffuse radiation coupled with absorptive and reflective features either native or engineered into various surfaces or parts, direct electrical current for heating, electromotive force from a coil or other inductive coupled device, initiation, ignition, or detonation of micro charges or rapid expansion of materials to act as micro charges such as flash evaporation of gases (thus channel may be thin enough to capillary such liquids or pack volatile solids or powders prior to initiation), rapid or slow expansion of compacted or wicked materials in the inner ring such as through water freezing, or moisture absorption of a tough sponge-like material, direct laser ablation, direct ultrasonic erosion, direct arc erosion or electro-discharge machining, or even simply reversing a bond between any of the discs and the outer connecting nipple that goes to the vacuum station.
At 907, the vacuum cell is moved relative to the exhaust interface so that they separate. The inner ring, which is bonded to the vacuum cell, moves with the vacuum cell. The outer ring, which is bonded to the exhaust interface, remains with the exhaust interface.
At 908, a laser beam is directed through the cap (e.g., of a glass): to initiate an ion pump of the vacuum cell; to interact with atoms or other particles; and/or to align an imaging system, e.g., to observe and interact with atoms or other particles. At 909, the operational ion pump either maintains the vacuum level achieved by the external vacuum system or achieves and maintains a greater vacuum level, e.g., UHV.
As best seen in
In some scenarios, even with the ridges, some bump or other perturbation might dislodge cap 108. Moreover, changes of orientation (relative to a gravity field) and acceleration might displace cap 108. To address some of these “rougher” scenarios, the cap can be bonded to break-away components of the pedestal; in that case, after the cap is bonded to the inner ring and the pedestal (or at least most of it) retracted, the break-away components may remain with the assembly of the vacuum cell, inner ring, and cap.
As shown in
After the break-seal membrane is broken, as shown in
In alternative embodiments, the cap may be reversibly bonded to the pedestal In some of these embodiments, the pedestal and cap of the same material type to enable debonding of the pedestal remnant after the vacuum cell is sealed with the cap. Reversible bonding may also be solder, indium, or anodic bonding through a permeation barrier (a.k.a. electrostatically assisted contact bonding).
For this embodiment, a couple of actions can be added to break-seal process 900, shown in
An array of vacuum chambers could be formed in a large wafer (4″-12″ or more in diameter) such that the assembled array of chambers are bonded to an arrayed break seal which only bonds at the ID ring and everywhere else is unable to bond, but still provides stable strain relief with unbondable lapped or passivated surfaces such that the entire array can be mounted and pulled down to vacuum, and then a single plate of sealing windows with identical aligned break grooves is brought into contact and sealed via anodic or other bonding methods. Once bonded the parts are then singulated by encouraging fractures along the break lines allowing for simultaneous and therefore cheaper and faster vacuum processing of large arrays of parts which are then easily singulated without further machining.
Herein, the following definitions apply. “Bridging” an inner ring and an outer ring means extending from the inner ring to the outer ring. Herein, “monolithic” means fabricated from a single piece. For example, the illustrated break-seal can be fabricated from a silicon disk, e.g., by removing material to form the aperture and the membrane. The “outer diameter” of a ring or aperture is the maximum distance between points on a plane orthogonal to an axis of rotational symmetry of the ring or aperture. The “inner diameter” of a ring is the maximum diameter of an aperture defined by the ring. “Flush”, as in “in flush contact” refers to a condition in which objects are contact each other over a surface area. Flat surfaces or non-flat conformal surfaces may be in “flush” contact with each other.
Herein, all art labelled “prior art”, if any, is admitted prior art; art not labelled “prior art”, if any, is not admitted prior art. The illustrated embodiments, variations thereupon, and modifications thereto are provided for by the present invention, the scope of which is defined by the following claims.
This application is a continuation of U.S. patent application Ser. No. 16/544,834 entitled BREAK-SEAL SYSTEM WITH BREAKABLE-MEMBRANE BRIDGING RINGS filed Aug. 19, 2019, which claims priority to U.S. Provisional Patent Application No. 62/739,277 entitled LOW-PROFILE BREAKSEAL filed Sep. 30, 2018, both of which are incorporated herein by reference for all purposes
Number | Name | Date | Kind |
---|---|---|---|
1785696 | Hackett | Dec 1930 | A |
2908555 | Grosskopf | Oct 1959 | A |
3053413 | Feuer | Sep 1962 | A |
3091489 | Vaughn | May 1963 | A |
3514115 | Gallo | May 1970 | A |
3630532 | Traub | Dec 1971 | A |
3670914 | Poulsen, Jr. | Jun 1972 | A |
3744805 | Heinrich | Jul 1973 | A |
3749271 | Ellis, Jr. | Jul 1973 | A |
4457455 | Meshberg | Jul 1984 | A |
4523764 | Albers | Jun 1985 | A |
4562942 | Diamond | Jan 1986 | A |
4641765 | Diamond | Feb 1987 | A |
4645414 | Dehart | Feb 1987 | A |
4696411 | Graf | Sep 1987 | A |
4851821 | Howard | Jul 1989 | A |
4857160 | Landau | Aug 1989 | A |
4886178 | Graf | Dec 1989 | A |
4889250 | Beyer | Dec 1989 | A |
4923584 | Bramhall, Jr. | May 1990 | A |
5041267 | Randtke | Aug 1991 | A |
5102010 | Osgar | Apr 1992 | A |
5106565 | Saitoh | Apr 1992 | A |
5155969 | Kuethe | Oct 1992 | A |
5333882 | Azibert | Aug 1994 | A |
5375853 | Wasser | Dec 1994 | A |
5433639 | Zahuta | Jul 1995 | A |
5457939 | Bardou | Oct 1995 | A |
5468002 | Wasser | Nov 1995 | A |
5493177 | Muller | Feb 1996 | A |
5560182 | Garwood | Oct 1996 | A |
5713576 | Wasser | Feb 1998 | A |
6109617 | Laney | Aug 2000 | A |
6142478 | Pecht | Nov 2000 | A |
6454268 | Muraki | Sep 2002 | B1 |
6485256 | Iketani | Nov 2002 | B1 |
6506272 | Aggas | Jan 2003 | B1 |
6626436 | Pecht | Sep 2003 | B2 |
7255494 | Zheng | Aug 2007 | B2 |
7308819 | Kamio | Dec 2007 | B2 |
7311308 | Iketani | Dec 2007 | B2 |
7348203 | Kaushal | Mar 2008 | B2 |
7377518 | Lai | May 2008 | B2 |
7501151 | Long | Mar 2009 | B2 |
7589950 | Parkhe | Sep 2009 | B2 |
7638168 | Boroson | Dec 2009 | B2 |
7647970 | Mueller | Jan 2010 | B2 |
7665975 | Parmeter | Feb 2010 | B2 |
7758051 | Roberts-Haritonov | Jul 2010 | B2 |
7922656 | Beckman | Apr 2011 | B2 |
8251900 | Ortiz | Aug 2012 | B2 |
8409901 | El-Gamal | Apr 2013 | B2 |
8596314 | Py | Dec 2013 | B2 |
9169155 | Dennis | Oct 2015 | B2 |
9599229 | Evans | Mar 2017 | B2 |
9732552 | Jones | Aug 2017 | B2 |
9960025 | Hughes | May 2018 | B1 |
9969022 | Parkhe | May 2018 | B2 |
20020179921 | Cohn | Dec 2002 | A1 |
20030109903 | Berrang | Jun 2003 | A1 |
20040232152 | Schimmelmann | Nov 2004 | A1 |
20050034427 | Higer | Feb 2005 | A1 |
20050092933 | Moriya | May 2005 | A1 |
20050148823 | Vaugh | Jul 2005 | A1 |
20050173870 | Gunderson | Aug 2005 | A1 |
20060161050 | Butler | Jul 2006 | A1 |
20060173492 | Akerfeldt | Aug 2006 | A1 |
20060260713 | Pyszczek | Nov 2006 | A1 |
20080315527 | Ristic | Dec 2008 | A1 |
20090007492 | Rudduck | Jan 2009 | A1 |
20090014867 | Krawiec | Jan 2009 | A1 |
20090045349 | Sprinzak | Feb 2009 | A1 |
20090218349 | Metzger | Sep 2009 | A1 |
20100059937 | Castleman | Mar 2010 | A1 |
20100112815 | O'Dougherty | May 2010 | A1 |
20100193398 | Marsh | Aug 2010 | A1 |
20110015491 | Ravikumar | Jan 2011 | A1 |
20110215530 | Vasagar | Sep 2011 | A1 |
20110271650 | Ehrmann | Nov 2011 | A1 |
20120074691 | Bantz | Mar 2012 | A1 |
20130183121 | Isomura | Jul 2013 | A1 |
20140054905 | Brandt | Feb 2014 | A1 |
20140059933 | Jones | Mar 2014 | A1 |
20140087099 | Veerasamy | Mar 2014 | A1 |
20150069713 | Epshetsky | Mar 2015 | A1 |
20150200029 | Hughes | Jul 2015 | A1 |
20150348745 | Gardiner | Dec 2015 | A1 |
20160116066 | Watanabe | Apr 2016 | A1 |
20170305586 | Rizzi | Oct 2017 | A1 |
20180118389 | Harrison | May 2018 | A1 |
20180233338 | Hughes | Aug 2018 | A1 |
20190084166 | Arizono | Mar 2019 | A1 |
20210130948 | Lam | May 2021 | A1 |
Number | Date | Country | |
---|---|---|---|
20220390016 A1 | Dec 2022 | US |
Number | Date | Country | |
---|---|---|---|
62739277 | Sep 2018 | US |
Number | Date | Country | |
---|---|---|---|
Parent | 16544834 | Aug 2019 | US |
Child | 17680123 | US |