Claims
- 1. A bucket-brigade charge transfer means disposed on a silicon substrate of a first conductivity type, said transfer means including a plurality of stages each comprising:
- a first and a second spaced apart region of a second conductivity type, each having a p-n junction and being disposed in said substrate;
- a third region of said second conductivity type disposed in said substrate spaced apart from said first and second regions, said third region being more lightly doped than said first and second regions;
- a first gate disposed above and generally between said first and second regions;
- a second gate disposed above and generally between said second and third regions;
- a member disposed generally above said third region, said member coupled to said second gate, said member and third region forming a capacitance means;
- a fourth region, disposed in said substrate below said first and second gates, which fourth region completely surrounds the p-n junction of said second region, said fourth region being more heavily doped with a first conductivity type dopant than said substrate;
- contact means for contacting a region in said substrate, said contact means contacting said first to permit sensing of charge in said regions;
- whereby, by the application of potentials to said first and second gates, charge may be transferred in said bucket-brigade charge transfer means.
- 2. The bucket-brigade charge transfer means defined by claim 1 including means for coupling said second gates of first alternate stages of said transfer means to a first timing signal and means for coupling said second gates of second alternate stages of said transfer means to a second timing signal.
- 3. The bucket-brigade charge transfer means defined by claim 2 including means for coupling said first gates of each of said stages to a source of potential.
- 4. The bucket-brigade charge transfer means defined by claim 1 wherein said first conductivity type is p-type.
- 5. The bucket-brigade charge transfer means defined by claim 4 wherein in each stage said first and second gates comprise polycrystalline silicon disposed at a first level above said substrate and wherein said member comprises polycrystalline silicon disposed at a second level above said substrate, said second level being above said first level.
Parent Case Info
This is a continuation of Ser. No. 687,370, filed May 17, 1976, now abandoned, which is a continuation-in-part of Ser. No. 614,655, filed Sept. 18, 1975, now abandoned. A continuation-in-part of Ser. No. 687,370, Ser. No. 710,596, was filed on Aug. 2, 1976, and issued as U.S. Pat. No. 4,100,513 on July 11, 1978.
US Referenced Citations (9)
Foreign Referenced Citations (1)
Number |
Date |
Country |
2508833 |
Sep 1975 |
DEX |
Non-Patent Literature Citations (4)
Entry |
White et al., "CCD and MNOS Devices for Programmable Analog Signal Processing . . ." IEEE Int. Electron Devices Meeting (12/73) Tech. Dig., pp. 130-133. |
Sequin et al., Charge Transfer Devices, Academic Press, N.Y. (7/75), pp. 24-32, 91-97, 110, 111. |
Sangster, "Integrated Bucket-Brigade Delay Line Using MOS Tetrode" Philips Technical Review, vol. 31 (1970), p. 266. |
Berglund et al., "Performance Limitations of the IGFET Bucket-Brigade Shift Register" IEEE Trans. Electron Devices, vol. ED-19 (7/72), pp. 852-860. |
Continuations (1)
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Number |
Date |
Country |
Parent |
687370 |
May 1976 |
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Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
614655 |
Sep 1975 |
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