This present disclosure claims the priority to Chinese patent application No. 202111116758.8, entitled “BULK ACOUSTIC WAVE RESONATOR AND BULK ACOUSTIC WAVE FILTER”, and filed on Sep. 23, 2021 in China, and the contents of which are hereby incorporated by reference in its entirety.
The present disclosure relates to the technical field of filters, in particular to a bulk acoustic wave resonator and a bulk acoustic wave filter.
A radio-frequency filter plays a crucial role in a radio frequency front-end module, and especially in high-frequency communication, a filter which is based on a bulk acoustic wave resonator technology plays an important role because of its excellent performance. The bulk acoustic wave resonator has characters of high resonant frequency, Complementary Metal-Oxide-Semiconductor (CMOS) process compatibility, high-quality factors, low losses, a low temperature coefficient, high power carrying capacity, etc., thereby gradually replacing a surface acoustic wave resonator to become market mainstream.
The bulk acoustic wave resonator can be divided into an air gap type, a back-etch type, a solid fabrication type, etc., and an ideal working principle includes: radio frequency electric signals are applied to a top electrode and a bottom electrode, vibration in a longitudinal mode is generated by a piezoelectric effect of piezoelectric materials, accordingly, longitudinally-propagated acoustic signals are generated in a sandwich structure consisting of the top electrode, the bottom electrode and the piezoelectric materials, the acoustic signals oscillate in the sandwich structure and then the acoustic signals are converted into electric signals through the piezoelectric effect to be output, and only radio frequency signals matched with the piezoelectric materials in resonant frequency can be transmitted through the bulk acoustic wave resonator, thereby achieving a filtering function. The radio frequency signals are applied to the top electrode and the bottom electrode of the sandwich structure of the bulk acoustic wave resonator, the resonator longitudinally vibrates only in a thickness direction, which is the most ideal situation, but due to influences from a shear piezoelectric effect of the piezoelectric materials, defects possibly existing in the prepared piezoelectric materials, incomplete C-axis orientation and other factors, the resonator transversely vibrates while longitudinally vibrating, which brings a transverse parasitic mode, thereby influencing performance of the resonator.
A pentagon electrode is designed in the prior art so as to reduce influences of transverse propagation of acoustic waves on the parasitic mode. But which an acoustic wave transverse propagation restraining effect in the pentagon electrode is weak.
This present disclosure aims to provide a bulk acoustic wave resonator and a bulk acoustic wave filter for overcoming defects in the prior art and with a desirable restraining effect on transverse propagation of acoustic waves.
In order to achieve the above purpose, the embodiment of this present disclosure adopts following technical solutions:
on one aspect of the embodiment of this present disclosure, a bulk acoustic wave resonator is provided and includes a substrate and a piezoelectric stack structure arranged on the substrate, the piezoelectric stack structure includes a bottom electrode, a piezoelectric material layer and a top electrode which are sequentially stacked, and an outline of an orthographic projection of the top electrode on the substrate includes at least one Bezier curve of order greater than or equal to 2.
Optionally, the outline may be formed through sequential end-to-end connection of a plurality of Bezier curves of order greater than or equal to 2.
Optionally, the outline may be formed through end-to-end connection of a Bezier curve of order greater than or equal to 3.
Optionally, the outline may be formed through sequential end-to-end connection of at least one Bezier curve of order greater than or equal to 2 and at least one linear segment.
Optionally, at least one Bezier curve with the order greater than or equal to 2 and at least one linear segment are alternately connected.
Optionally, the outline of an orthographic projection of a top electrode on a substrate is the same in shape with an outline of an orthographic projection of the bottom electrode on the substrate, an outline area of the top electrode is less than an outline area of the bottom electrode, and a distance from the outline of the top electrode to the outline of the bottom electrode is 2-5 microns.
Optionally, a cavity is further arranged in one side, close to the piezoelectric stack structure, of the substrate, and the piezoelectric stack structure is located above the cavity; or, a high-low-acoustic-resistance stack is further arranged between the substrate and the piezoelectric stack structure.
Optionally, wherein material of the piezoelectric layer is one of AIN, ScAIN, ZnO, PZT, LiNbO3 and LiTaO3.
Optionally, wherein material of the piezoelectric layer is one of AIN, ScAIN, ZnO, PZT, LiNbO3 and LiTaO3.
According to the other aspect of the embodiment of this present disclosure, a bulk acoustic wave filter is provided and includes a plurality of any kind of above bulk acoustic wave resonators, where every two adjacent bulk acoustic wave resonators are connected in series or in parallel.
Optionally, one end of each serially connected bulk acoustic wave resonator is connected to a first signal end, the other end of the serially connected bulk acoustic wave resonator is connected to a second signal end; one end of each bulk acoustic wave resonator connected in parallel is connected to the serially connected bulk acoustic wave resonator, and the other end of the bulk acoustic wave resonator connected in parallel is connected to a grounding end.
The present disclosure has such beneficial effects:
The present disclosure provides the bulk acoustic wave resonator and the bulk acoustic wave filter, the substrate and the piezoelectric stack structure arranged on the substrate are included, the piezoelectric stack structure includes the bottom electrode, the piezoelectric material layer and the top electrode which are sequentially stacked, and the outline of the orthographic projection of the top electrode on the substrate includes at least one Bezier curve of order greater than or equal to 2. Accordingly, a length of a transverse propagation path of transverse acoustic waves can be increased, thereby increasing losses of the transverse acoustic waves in a propagation process, and reducing influences of the transverse acoustic waves on a transverse parasitic mode caused by the bulk acoustic wave resonator, and namely, an effect of restraining the transverse parasitic mode is improved by the bulk acoustic wave resonator so as to improve performance of the bulk acoustic wave filter.
In order to describe technical solutions in the embodiments of this present disclosure more clearly, the drawings required to be used in the embodiments will be simply introduced below, it is to be understood that the following drawings only show some embodiments of this present disclosure, which cannot be regarded as limitation on a scope, and ordinary persons skilled in the art can further obtain other related drawings according to the drawings without creative work.
Icons: 10-outline of top electrode of existing bulk acoustic wave resonator; 11-transverse propagation path of existing bulk acoustic wave resonator; 100-outline; 101-transverse propagation path; 301-second Bezier curve; 302-second linear segment; 303-third linear segment; 304-third Bezier curve; 305-fourth linear segment; 306-fourth Bezier curve; 401-first Bezier curve; 402-first linear segment; 403-fifth linear segment; 404-sixth linear segment; 405-fifth Bezier curve; 406-sixth Bezier curve; 407-seventh linear segment; 408-ninth linear segment; 409-seventh Bezier curve; 410-ninth Bezier curve; 411-eighth linear segment; 412-eighth Bezier curve; 501-top electrode; 502-piezoelectric material layer; 503-bottom electrode; 504-first signal end; 505-second signal end; 803-series bulk acoustic wave resonator; 804-parallel bulk acoustic wave resonator; and 802-grounding end.
To make purposes, technical solutions and advantages of embodiments of this present disclosure more clearly, the technical solutions in the embodiments of this present disclosure are clearly and integrally described in combination with drawings in the embodiments of this present disclosure as below, and it is apparent that the described embodiments are only a part rather all of embodiments. Assemblies, described and shown in the drawings herein, in the embodiments of this present disclosure may be generally arranged and designed according to different configurations.
It is to be understood that terms such as “first” and “second” may be used for describing various elements in this present disclosure but cannot limit the elements. The terms are only used for distinguishing one element from another element. For instance, a first element may be called as a second element without departing from a scope of the present disclosure, and similarly, the second element may be called as the first element. A term “and/or” used in this present disclosure includes any one or more and all combinations of associated listed items.
It is to be understood that when one element (such as a layer, an area or a substrate) is “arranged on another element” or “extends to another element”, the element may be directly arranged on another element or directly extend to another element, or a middle element may exist. On the contrary, when one element is “directly arranged on another element” or “directly extends to another element”, a middle element does not exist. Similarly, it is to be understood that when one element (such as a layer, an area or a substrate) is “arranged above another element” or “extends above another element”, the element may be directly arranged above another element or directly extend above another element, or a middle element may exist. On the contrary, when one element is “directly arranged above another element” or “directly extends above another element”, a middle element does not exist. It is to be understood that when one element is “ connected” or “coupled” to another element, the element may be directly connected or coupled to another element, or a middle element may exist. On the contrary, when one element is “directly connected” or “directly coupled” to another element, a middle element does not exist.
Except additional definition, all terms (including technological and scientific terms) used in this present disclosure have the same meaning usually understood by ordinary persons skilled in the art of the present disclosure. It is to be understood that the terms used in this present disclosure are explained to be consistent to those in the Description and related fields in meaning instead of being explained with ideal or too formal meaning, except clear definition in this present disclosure.
On one aspect of the embodiment of this present disclosure, a bulk acoustic wave resonator is provided, and as shown in
In some implementation modes, the substrate may be a silicon substrate, a sapphire substrate, etc. In some implementation modes, the piezoelectric material layer 502 may be made of one of AIN, ScAIN, ZnO, PZT, LiNbO3 and LiTaO3.During specific selection, reasonable selection may be performed according to actual needs and is not limited in the embodiment.
As shown in
The Bezier curve may be controlled by n points, and when given points are P0, P1...Pn, a general parameter formula of the Bezier curve is:
Where, t∈[0,1], a point Pi is a control point of the Bezier curve, a Bezier polygon is formed by connecting the control points of the linear Bezier curve, and a shape of the Bezier curve and a shape of the Bezier polygon may be reasonably designed by controlling positions of the given points P0, P1...Pn from P0 to Pn.n is a control number of the order of the Bezier curve, when n is 1, the control points are p0 and p1, and the order of the Bezier curve is 1, namely a line segment; and when n is greater than or equal to 3, the control points are P0, P1...Pn, and if p0 coincides with Pn, the Bezier curve may form an end-to-end closed curve.
Optionally, as shown in
Optionally, an outline 100 of a top electrode 501 may be formed through sequential end-to-end connection of a plurality of Bezier curves of order greater than or equal to 2, accordingly, all parts of the outline 100 may be irregular and smooth curves, and therefore after acoustic waves enter the top electrode 501, a transverse propagation path 101 is long, thereby effectively increasing losses of the acoustic waves during transverse propagation.
Optionally, an outline 100 of a top electrode 501 may be formed through sequential end-to-end connection of at least one Bezier curve of order greater than or equal to 2 and at least one linear segment, for instance:
in an implementation mode, an outline 100 of a top electrode 501 shown in
In some implementation modes, an outline 100 of a top electrode 501 shown in
In some implementation modes, an outline 100 of a top electrode 501 shown in
Optionally, at least one Bezier curve of order greater than or equal to 2 and at least one linear segment are alternately connected, for instance:
in some implementation modes, an outline 100 of a top electrode 501 shown in
In some implementation modes, an outline 100 of a top electrode 501 shown in
Optionally, as shown in
As shown in
Optionally,
In some implementation modes, a cavity is formed in one side, close to a piezoelectric stack structure, of a substrate, the piezoelectric stack structure is located above the cavity, namely, a groove with the cavity is formed in an upper surface of the substrate through an etching process, and then, the piezoelectric stack structure is arranged on the substrate and at least covers an opening of the groove, thereby improving performance of a bulk acoustic wave resonator.
In some implementation modes, a high-low-acoustic-resistance stack is further arranged between a substrate and a piezoelectric stack structure, and namely, alternate layers of a high-acoustic-resistance material layer and a low-acoustic-resistance material layer are formed on an upper surface of the substrate in an alternate lamination manner, thereby improving performance of a bulk acoustic wave resonator.
Optionally, as shown in
On the other aspect of the embodiment of this present disclosure, a bulk acoustic wave filter is provided, and as shown in
As shown in
During actual work, radio frequency signals are transmitted through top electrodes 501 and bottom electrodes 503 in the filter. Along with transmission of electric signals in the resonators, the resonators generate resonance due to a piezoelectric effect and constantly generate heat. As shown in
Machining is performed according to an embodiment structure shown in
In a work process of the bulk acoustic wave resonators, acoustic signals oscillate in sandwich structures. As shown in
A main purpose of this present disclosure is to design the bulk acoustic wave resonator shape into the Bezier curve shape, thereby increasing the length of the transverse propagation path of the transverse acoustic waves, increasing losses of the transverse acoustic waves in the propagation process, and reducing influences of the transverse acoustic waves on the transverse parasitic mode caused to the bulk acoustic wave resonators. As shown in
The resonator presented and designed by this present disclosure is in the Bezier curve shape, and the outline of the orthographic projection of the resonator top electrode 501 on the substrate includes at least one Bezier curve with the order greater than or equal to 2. As shown in
As shown in
The above embodiments are merely preferable embodiments of this present disclosure and not used for limiting this present disclosure, and this present disclosure can be variously modified and changed for persons skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and the principle of this present disclosure shall fall within the scope of protection of this present disclosure.
Number | Date | Country | Kind |
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202111116758.8 | Sep 2021 | CN | national |