Claims
- 1. A process for producing a capacitive hygrometer constituted by a layer of dielectric material between two conductive faces wherein on the said dielectric material is deposited a first conductive face comprising a conductive material having stresses such that fissures are produced in the first conductive face and in the dielectric material so as to bring said dielectric material into contact with the atmosphere.
- 2. A production process as in claim 1, wherein the conductive material is deposited by evaporation.
- 3. A process as in claim 1, wherein the dielectric material is a polyimide and the conductive material is chromium.
- 4. A process as in claim 1, comprising
- (a) depositing a first electrode made from tantalum on an insulating substrate and anodically oxidizing the same;
- (b) depositing a first contacting electrode on said first electrode and a second contacting electrode on the substrate;
- (c) depositing further a polymer layer over the complete surface area of the substrate with said layer having a certain number of holes; and
- (d) depositing a porous layer of a metal on said polymer layer to provide electrical contact with the second contacting electrode.
- 5. A process as in claim 2, wherein the dielectric material is a polyimide and the conductive material is chromium.
Priority Claims (1)
Number |
Date |
Country |
Kind |
80 15263 |
Jul 1980 |
FRX |
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Parent Case Info
This application is a division of application Ser. No. 281,603, filed July 9, 1981, now U.S. Pat. No. 4,438,480.
US Referenced Citations (7)
Non-Patent Literature Citations (1)
Entry |
Maissel et al., Handbook of Thin Film Technology, McGraw Hill Book Co., N.Y., .COPYRGT.1970, pp. 6-30 and 12-21 to 12-40. |
Divisions (1)
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Number |
Date |
Country |
Parent |
281603 |
Jul 1981 |
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