Claims
- 1. A method for coupling a water repellant silicone film to a solid surface containing a hydrogen atom attached to an oxygen atom in an OH group, comprising the steps of:
reacting the OH group on the surface with a silicone precursor including an Si—X group where X is an acid forming group, to form an O—Si—X molecule and a first H—X molecule; combining the O—Si—X molecule with water to form an O—Si—O—H molecule and a second H—X molecule; prior to the reacting step, applying a tertiary amine to the surface; and after the reacting step and combining step reacting the tertiary amine with the first and second H—X molecules to form a non-reactive and water soluble molecule in the form of an amine salt.
- 2. The method recited in claim 1 wherein the applying step includes the steps of:
forming a premix including the tertiary amine and the Si—X group; and prior to the first reacting step, applying the premix to the surface.
- 3. The method recited in claim 2 further comprising the step of:
coating the surface with the premix prior to the first reacting step and the combining step.
- 4. The method recited in claim 1 further comprising the step of:
repeating the reacting step and the combining step in the presence of the tertiary amine.
- 5. The method recited in claim 1 wherein the H—X molecules are corrosive.
- 6. The method recited in claim 5 wherein the H—X molecules are volatile.
- 7. The method recited in claim 6 wherein X is one of chlorine and bromine.
- 8. A process for treating a surface of a substrate G containing OH or nitrogen-hydrogen bonds and being surrounded by air, the process including the steps of:
a) moistening the surface with water; b) contacting the surface with a mixture of a tertiary amine and a substituted silane molecule having the formula 21wherein
R represents polar or nonpolar groups comprising hydrocarbons or halogenated hydrocarbons, and X is a unit selected from a group consisting of esters, ethers, and halogens; c) allowing the silane molecules to react with the OH or nitrogen-hydrogen bonds and water to create a first molecule having the formula 22d) allowing the X unit at the end of the first molecule to react with the water to produce a second molecule having a structure 23 at the end of the first molecule; e) contacting the surface with a mixture of a tertiary amine and a capping agent having the formula 24wherein
R1 may include any combination of inert and reactive groups; and f) allowing the capping agent to react with the molecule to result in a new molecule having the formula 25
- 9. The process according to claim 8, wherein the substrate G includes silica molecules.
- 10. The process according to claim 9, wherein the substrate G is formed from a material selected from the group consisting of glass, ceramics and silica-containing minerals.
- 11. The process according to claim 8, wherein the substrate G includes organic molecules.
- 12. The process according to claim 8, wherein R is methyl.
- 13. The process according to claim 8, wherein R is selected from a group consisting of phenyl, ethyl, methyl, butyl, amyl, and alkyl groups.
- 14. The process according to claim 8, wherein R comprises about 50% methyl groups and 50% phenyl groups.
- 15. The process according to claim 8, wherein R consists of polar groups.
- 16. The process according to claim 8, wherein R consists of nonpolar groups.
- 17. The process according to claim 8, wherein R1 consists of chemically inert groups.
- 18. The process according to claim 8, wherein R1 consists of chemically reactive groups.
- 19. The process according to claim 8, wherein the step of contacting the surface with silane molecules comprises chemically depositing the silane molecules on the surface using a vapor machine.
- 20. The process according to claim 8, wherein the step of contacting the surface with silane groups comprises the step of wiping the silane group onto the surface.
- 21. The process according to claim 8, wherein the step of contacting the surface with silane groups comprises a dipping procedure.
- 22. The process according to claim 8, wherein the step of moistening the surface comprises a step of priming the surface with cyclohexylamine.
- 23. The process of claim 8 wherein the applying step includes the step of forming a premix including the tertiary amine and the silicone molecule.
- 24. A process for manufacturing water-resistant glass in an environment including air, comprising the steps of:
a) coating the glass with a film formed of a first molecule chemically bonded with the glass and having the formula 26wherein
R consists of nonpolar groups, X is a unit selected from the group consisting of esters, ethers and halogens; b) allowing the X unit at the end of the first molecule to react with water to produce a second molecule having the structure 27 at the end of the second molecule; c) contacting the surface with a capping agent having the formula 28wherein
R1 consists of inert groups; d) allowing the capping agent to react with the second molecule to result in a water-resistant film formed from a new molecule having the formula 29e) applying a tertiary amine to the surface in order to form a non-reactive amine salt during the coating and the contacting steps.
- 25. The process according to claim 24, wherein the water-resistant film comprises chains of dimethylsiloxane.
- 26. The process according to claim 24, wherein the capping agent is trimethylchlorosilane.
- 27. The process according to claim 24, wherein R is selected from a group consisting of phenyl, ethyl, methyl, butyl, amyl and alkyl groups.
- 28. The method according to claim 24, wherein R comprises about 50% methyl groups and 50% phenyl groups.
- 29. A process for treating a surface of a substrate G containing OH or nitrogen-hydrogen bonds surrounded by air, the process including the steps of:
a) moistening the surface with water; b) contacting the surface with a mixture of a tertiary amine and a first molecule having the formula 30wherein
R consists of polar or nonpolar groups, and X is unit selected from the group consisting of esters, ethers and halogens; c) allowing the first molecule to react with the OH or nitrogen-hydrogen bonds and water at the surface to create a film including a second molecule having the formula 31wherein
the film is chemically bonded to the surface; d) allowing the X unit at the end of the second molecule to react with water to produce a third molecule having the structure 32 at the end of the third molecule; e) contacting the surface with a capping agent having the formula 33wherein
R1 consists of chemically active groups; and f) allowing the capping agent to react with a mixture of a tertiary ammine and the third molecule to result in a new end structure having the formula 34wherein
the third molecule with the new end structure serves as a solid state ion exchanger or attachment point.
- 30. The process according to claim 29, wherein the substrate G includes silica molecules.
- 31. The process according to claim 30, wherein the substrate G is formed from a material selected from the group consisting of glass, ceramics, and silica-containing minerals.
- 32. The process according to claim 29, wherein the substrate G includes organic molecules.
- 33. The process according to claim 29, wherein R is methyl.
- 34. The process according to claim 29, wherein the film consists of chains of dimethylsiloxane.
- 35. In a process of manufacturing a water-resistant film for protecting a surface G containing OH or nitrogen-hydrogen bonds, wherein the process comprises the steps of:
a) coating the surface G, in the presence of a tertiary amine with a polymer having
i) an anchor group with the formula 35wherein
Si is a silicone atom, and R comprises nonpolar groups; ii) a chain of siloxane groups, the chain having a first end and a second end, the first end of the chain being chemically bound to the silicon atom of the anchor group, the chain having the formula 36and iii) a terminal group of atoms chemically bound to the second end of the chain, the terminal group having the formula 37wherein
R1 comprises inert groups, and X is a unit selected from a group consisting of esters, ethers and halogens; b) allowing the X unit of the terminal group to react with water in the surrounding air to produce a new terminal group having the formula 38and c) replacing the new terminal group with a final terminal group having the structure 39wherein
R1 comprises inert groups; and d) applying a tertiary amine to the surface in order to form a non-reactive amine salt during the coating and the replacing steps.
- 36. The improvement according to claim 35, wherein the siloxane groups consist of dimethylsiloxane groups.
- 37. The improvement according to claim 36, wherein the final terminal group consists of a trimethylsiloxane group.
- 38. The improvement according to claim 35, wherein is the same as R.
- 39. The improvement according to claim 35, wherein R is selected from a group consisting of phenyl, ethyl, methyl, butyl, amyl, and alkyl groups.
- 40. The improvement according to claim 35, wherein the step of replacing the new terminal group comprises the substeps of:
a) contacting the surface with a capping agent having the formula 40b) allowing the capping agent to react with the new terminal group to result in an inert final terminal group.
- 41. A process for treating a surface of a substrate G containing OH or nitrogen hydrogen bonds and surrounded by air, the process including the steps of:
a) moistening the surface with water; b) contacting the surface with a mixture of a tertiary amine and a silane group having the formula 41wherein
R represents polar or nonpolar groups comprising hydrocarbons or halogenated hydrocarbons, and X is selected from the group consisting of esters, ethers, and halogens; c) allowing the silane groups to react with the OH or nitrogen hydrogen bonds and water at the surface to create a film formed of chains having the formula 42d) allowing the X unit at the end of the chain to react with water in the surrounding air to produce a molecule having the structure 43 at the end of the chain; and e) contacting the surface with a mixture of a tertiary amine and a capping agent having the formulaY−Zwherein
Y is a carrier molecule, Z is a terminal group of the capping agent; and f) allowing the capping agent to react with the molecule to result in a new molecule chain having the formula 44
- 42. The process recited in claim 41 wherein the carrier molecule Y of the capping agent is chlorine.
- 43. The process recited in claim 42 wherein the terminal group Z of the capping agent has the formula
RELATED APPLICATIONS
[0001] This is a continuation-in-part of parent application Ser. No. 09/185,202 filed on Nov. 3, 1998 and entitled CAPPED SILICONE FILM AND METHOD OF MANUFACTURE THEREOF.
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
09185202 |
Nov 1998 |
US |
Child |
09879617 |
Jun 2001 |
US |