Claims
- 1. A compound having the formula Z--B--Y--B'--Z .nHA wherein Y is a bivalent organic radical selected from the group consisting of C.sub.5 -C.sub.12 cycloalkylene, C.sub.5 -C.sub.12 cycloalkylenebis (loweralkyl), C.sub.6 -C.sub.12 arylene and loweralkylarylene, C.sub.7 -C.sub.12 aryleneloweralkyl, and C.sub.8 -C.sub.12 arylenebis (loweralkyl); B is a carbamylguanidino group; B' is B; and Z is selected from the group consisting of C.sub.6 -C.sub.14 aryl; C.sub.7 -C.sub.14 aralkyl and C.sub.6 -C.sub.14 aryl and aralkyl substituted with one or more radicals selected from the group consisting of loweralkyl, trifluoromethyl, loweralkoxy, trifluoromethoxy, loweralkylthio, halo, loweralkylsulfonyl, fluorosulfonyl and alkylsulfinyl; and pharmacologically acceptable addition salts of these compounds with acids represented by nHA wherein n=0, 1/3, 1/2, 2/3, 1, and 2 and HA is an inorganic or organic acid.
- 2. A compound according to claim 1 wherein Y is selected from the group consisting of C.sub.5 -C.sub.8 cycloalkylene, C.sub.5 -C.sub.8 cycloalkylenebis(loweralkyl), C.sub.6 -C.sub.8 arylene and loweralkylarylene, C.sub.7 -C.sub.8 aryleneloweralkyl, and C.sub.8 arylenebis(loweralkyl) radicals.
- 3. A compound according to claim 1 wherein Z is selected from the group consisting of phenyl, naphthyl, phenyl C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkylphenyl, C.sub.1 -C.sub.3 alkylbenzyl, trifluoromethylphenyl, trifluoromethylbenzyl, C.sub.1 -C.sub.4 alkoxyphenyl, trifluoromethoxyphenyl, C.sub.1 -C.sub.4 alkylthiophenyl, halophenyl, halobenzyl, C.sub.1 -C.sub.4 alkylsulfonylphenyl, and fluorosulfonylphenyl radicals.
- 4. A compound according to claim 1 having the formula: ##STR18##
- 5. A compound according to claim 1 having the formula: ##STR19##
- 6. A compound according to claim 5 wherein Y is selected from the group consisting of C.sub.5 -C.sub.8 cycloalkylene, C.sub.5 -C.sub.8 cycloalkylenebis(loweralkyl), C.sub.6 -C.sub.8 arylene and loweralkylarylene, C.sub.7 -C.sub.8 aryleneloweralkyl, and C.sub.8 arylenebis(loweralkyl) radicals.
- 7. A compound according to claim 5 wherein Z is selected from the group consisting of phenyl, naphthyl, phenyl C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkylphenyl, C.sub.1 -C.sub.3 alkylbenzyl, trifluoromethylphenyl, trifluoromethylbenzyl, C.sub.1 -C.sub.4 alkoxyphenyl, trifluoromethoxyphenyl, C.sub.1 -C.sub.4 alkylthiophenyl, halophenyl, halobenzyl, C.sub.1 -C.sub.4 alkylsulfonylphenyl, and fluorosulfonylphenyl radicals.
- 8. A compound according to claim 5 wherein Y is selected from the group consisting of C.sub.5 -C.sub.8 cycloalkylene, C.sub.5 -C.sub.8 cycloalkylenebis(loweralkyl), C.sub.6 -C.sub.8 arylene and loweralkylarylene, C.sub.7 -C.sub.8 aryleneloweralkyl, and C.sub.8 arylenebis(loweralkyl) radicals, and Z is selected from the group consisting of phenyl, naphthyl, phenyl C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkylphenyl, C.sub.1 -C.sub.3 alkylbenzyl, trifluoromethylphenyl, trifluoromethylbenzyl, C.sub.1 -C.sub.4 alkoxyphenyl, trifluoromethoxyphenyl, C.sub.1 -C.sub.4 alkylthiophenyl, halophenyl, halobenzyl, C.sub.1 -C.sub.4 alkylsulfonylphenyl, and fluorosulfonylphenyl radicals.
- 9. A compound according to claim 8 wherein Y is selected from the group consisting of 1,4-cyclohexylenedimethyl and .alpha.,.alpha.'-m-xylylene radicals and Z is selected from the group consisting of phenyl, 4-tolyl, 1-phenylethyl, 3-trifluoromethylphenyl, 4-trifluoromethylphenyl, 4-ethoxyphenyl, 3-methylthiophenyl, 4-methylthiophenyl, 2-fluorophenyl, 3-fluorophenyl, 4-fluorophenyl, 2-chlorophenyl, 3-chlorophenyl, 4-chlorophenyl, 2-bromophenyl, 3-bromophenyl, 4-bromophenyl, 4-iodophenyl, and 4-methylthio-3-chlorophenyl radicals.
- 10. A compound cccording to claim 1 wherein said acid, HA, is selected from the group consiting of hydrochloric acid, hydrobromic acid, nitric acid, sulfuric acid, acetic acid, glycolic acid, 2,3-dihydroxypropionic acid, saccharic acid, gluconic acid, lactobionic acid, maleic acid, fumaric acid, lactic acid, citric acid, malic acid, methanesulfonic acid, and ethanesulfonic acid.
RELATED APPLICATIONS
This application is a division of assignee's copending application Ser. No. 546,549, filed Feb. 3, 1975 now U.S. Pat. No. 4,022,962.
US Referenced Citations (2)
Number |
Name |
Date |
Kind |
3903084 |
DuCharme et al. |
Sep 1975 |
|
4022834 |
Gunderson |
May 1977 |
|
Divisions (1)
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Number |
Date |
Country |
Parent |
546549 |
Feb 1975 |
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