According to the invention the objects are at least temporarily cleaned in a cleaning fluid comprising a dense phase gas and water. Preferably towards the end of the cleaning procedure, at least a fraction of the water is filtered out of the cleaning fluid. It is advantageous to remove essentially all water by filtration. Thus, after the cleaning procedure is finished it is no more necessary to dry the objects. At least, the time needed for drying the objects is minimized.
According to a preferred embodiment the objects are placed in a cleaning chamber and washed with a cleaning fluid comprising a dense phase gas and water. At least a fraction of the cleaning fluid is withdrawn from the cleaning chamber and water is filtered out of the fraction of the cleaning fluid. After the filtration step the filtered cleaning fluid is transferred back to the cleaning chamber.
In one preferred embodiment, the filtration device is placed in a pipe, and the cleaning fluid is pumped through the pipe continuously during the cleaning process whereby water is removed from the cleaning fluid. The pipe may be the pipe which is used for emptying the cleaning fluid into the recovery and distillation vessel. Optionally, the flow through the pipe is supported by pumping. The complete cleaning fluid is pumped through the pipe during the cycle at least once, optionally two, five, fifty or more times.
Preferably the cleaning method comprises at least a step of cleaning the objects in a dense phase gas and water and a step of cleaning the objects in dense phase gas only. Between these two steps the water is filtered out of the cleaning fluid according to the invention.
The filtration of water out of the cleaning fluid is preferably carried out by passing the cleaning fluid through a filtration device which comprises a hygroscopic material, especially a silica gel or a molecular sieve. In particular it is preferred to use a molecular sieve with a pore size between 3 Å and 4 Å.
According to a preferred embodiment the objects are cleaned in a cleaning chamber in a cleaning fluid comprising a dense phase gas and water. At least part of the water is filtered out of the cleaning fluid inside the cleaning chamber. This is preferably achieved by placing a filtration device inside the cleaning chamber.
According to a preferred embodiment the cleaning procedure is started with a cleaning fluid comprising a mixture of a dense phase gas, such as carbon dioxide, with a relative high content of water. The cleaning fluid is continuously passed through the filtration device and thus the water fraction continuously decreases. Towards the end of the cleaning procedure the objects are cleaned essentially in dense phase gas only.
Preferably the filtration device comprises a mechanical filter. The mechanical filter removes fibers, dirt, and other particulate material from the cleaning fluid and protects the hygroscopic material, such as a molecular sieve or a silica gel. In one embodiment, the cleaning chamber comprises a rotating drum. Simple net filters, for example made of steel wire, are arranged on the rotating drum to collect loose fibers during a garment cleaning cycle. The hygroscopic material may be provided on the exterior surface of the rotating drum or in a pipe connected to the cleaning chamber.
The filtration device is ideally constructed in such a manner that it can be easily be changed or replaced.
The cleaning fluid preferably comprises dense phase carbon dioxide in liquid or super-critical state. The cleaning result may be further improved by adding additives, in particular water-soluble additives, to the cleaning fluid.
The invention allows carbon dioxide-dry cleaning in the presence of water, but solves the problem caused by water which is present on carbon dioxide-dry-cleaned garments after the cleaning process. Equally, passing the cleaning fluid many times during the treatment process through a mechanical filter, effectively removes all solid particles, such as loose fibers, mites, and other particulate material, as it were, from the distribution equilibrium. In addition, certain surfactants used for detaching particulates from the substrate to be cleaned, e.g. of cationic type, are removed as well as they are strongly bound to the particulate material.
| Number | Date | Country | Kind |
|---|---|---|---|
| 04012617.9 | May 2004 | EP | regional |
This application claims the priority of International Application No. PCT/EP2005/005660, filed May 25, 2005, and European Patent Application No. EP 04012617.9, filed May 27, 2004, the disclosures of which are expressly incorporated by reference herein.
| Filing Document | Filing Date | Country | Kind | 371c Date |
|---|---|---|---|---|
| PCT/EP05/05660 | 5/25/2005 | WO | 00 | 8/20/2007 |