Claims
- 1. A method for the generation of nickel (0) species from nickel (II) compounds comprising contacting a nickel (II) compound with
- (i) an organophosphine ligand of the formula PR".sub.3 or R".sub.2 P-Z-PR".sub.2 wherein each R" is independently selected from the group consisting of alkyl, aryl and alkaryl radicals having up to 20 carbon atoms and -Z- is an alkylene, alkenylene, or arylene radical;
- (ii) a bidentate ligand selected from the group consisting of 2,2'-bipyridine, 2-picolinic acid, ethylenediamine tetraacetic acid, N,N,N',N'-tetramethylethylenediamine, 1,10-phenanthroline, N,N'-bis(salicylidene)ethylenediamine, and polyvinyl pyridine;
- (iii) a tertiary-alkyl organometallic compound of the structure: ##STR9## wherein each R' is independently selected from the group consisting of H and alkyl groups having in the range of 1 up to 20 carbon atoms, and M is selected from the group consisting of Li, Na, K, and MgX, wherein X is a halogen;
- wherein said contacting is carried out in a substantially anhydrous, non-polar, ethereal solvent system, optionally containing up to 95 volume percent of an aliphatic or aromatic hydrocarbon diluent at a temperature in the range of about 0.degree. up to 100.degree. C. for a time in the range of about 0.5 up to 24 hours.
- 2. A method for the generation of nickel (0) species from nickel (II) compounds comprising contacting a nickel (II) compound with
- (i) an organophosphine ligand of the formula PR".sub.3 or R".sub.2 P-Z-PR".sub.2 wherein each R" is independently selected from the group consisting of alkyl, aryl and alkaryl radicals having up to 20 carbon atoms and -Z- is an alkylene, alkenylene, or arylene radical;
- (ii) a bidentate ligand selected from the group consisting of 2,2'-bipyridine, 2-picolinic acid, ethylenediamine tetraacetic acid, N,N,N',N'-tetramethylethylenediamine, 1,10-phenanthroline, N,N'-bis(salicylidene)ethylenediamine, and polyvinyl pyridine; and
- (iii) a tertiary-alkyl halide of the structure: ##STR10## wherein each R' is independently selected from the group consisting of H and alkyl groups having in the range of 1 up to 20 carbon atoms, and X is a halogen; and
- (iv) a metal, M, selected from the groups consisting of Li, Na, K or Mg;
- wherein said contacting is carried out in a substantially anhydrous, non-polar, ethereal solvent system, optionally containing up to 95 volume percent of an aliphatic or aromatic hydrocarbon diluent at a temperature in the range of about 0.degree. up to 100.degree. C. for a time in the range of about 0.5 up to 24 hours.
- 3. A process in accordance with claim 1 wherein said nickel (II) compound is selected from the group consisting of nickel acetylacetonate, nickel sulfate, nickel nitrate, nickel oxide, the nickel hydroxides, the nickel halides, and the nickel carboxylates.
- 4. A process in accordance with claim 1 wherein said organophosphine ligand is selected from the group consisting of triphenylphosphine, tricyclohexylphosphine, tribenzylphosphine, diphenylbutylphosphine, 1,4-bis(diphenylphosphino)butane, 1,6-bis-(diphenylphosphino)hexane, 1,1'-bis(diphenylphosphino)ferrocene, 2,2'-bis(diphenylphosphinomethyl)-1,1'-biphenyl, bis(.alpha.,.alpha.'-diphenylphosphino)-o-xylene, and 1,2-bis(diphenylphosphino)ethane.
- 5. A process in accordance with claim 1 wherein said tertiary-alkyl organometallic compound is selected from the group consisting of t-butylmagnesium chloride, t-butyl lithium, t-butyl sodium, t-butyl potassium, t-amylmagnesium chloride, t-amyl lithium, t-amyl sodium, and t-amyl potassium.
- 6. A process in accordance with claim 1, wherein the molar ratio of tertiary-alkyl organometallic compound to nickel falls in the range of about 0.2:1 up to 5:1.
- 7. A process in accordance with claim 1 wherein the molar ratio of nitrogen-containing ligand to nickel falls in the range of about 0.5:1 up to 20:1.
- 8. A process in accordance with claim 1 wherein the molar ratio of organophosphine to nickel falls in the range of about 0.3:1 up to 30:1.
- 9. A process in accordance with claim 1 wherein said solvent system comprises at least one ether selected from the group consisting of dimethyl ether, tetrahydrofuran, diisopropyl ether, dibutyl ether, ethylene glycol dimethyl ether, dioxane, and methyl t-butyl ether, and, optionally, up to 95 volume % of an aliphatic or aromatic hydrocarbon selected from the group consisting of benzene, toluene, xylene, hexane, octane, cyclohexane, and mixtures of any two or more thereof.
Parent Case Info
This is a divisional of copending application Ser. No. 07/346,769 filed on May 3, 1989 and now U.S. Pat. No. 4,939,309.
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Divisions (1)
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Number |
Date |
Country |
Parent |
346769 |
May 1989 |
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