Claims
- 1. A process, comprising copolymerizing ethylene and/or other olefinic monomers, alone or mixed with two or more monomers, with carbon monoxide to produce alternating olefin/carbon monoxide copolymers, wherein said copolymerizing is conducted in the presence of a catalytic system consisting of:
- a) a Cu, Ag or Au salt,
- b) a bidentate chelating base containing two phosphorous or nitrogen atoms,
- c) a Lewis acid, and
- d) optionally an oxidizing agent.
- 2. The process of claim 1, wherein said olefinic monomers are .alpha.-olefins.
- 3. The process of claim 2, wherein said .alpha.-olefins are selected from the group consisting of ethylene, propylene, 1-butene, 1-pentene, cyclopentene, styrene and mixtures thereof.
- 4. The process of claim 1, wherein said copolymerizing is carried out in a closed reactor in a solvent at a temperature of 50.degree.-120.degree. C., a pressure of 40.times.10.sup.5 to 100.times.10.sup.5 Pa and for a polymerization time of 3-9 hours.
- 5. The process of claim 1, wherein said copolymerizing is conducted in the presence of a solvent and wherein the quantity of said catalyst is 10.sup.-2 to 10.sup.-5 grams-atom of Cu, Ag or Au per liter of solvent.
- 6. The process of claim 1, wherein said salt contains an anion selected from the group consisting of acetate, trifluoromethanesulphonate, trifluoroacetate, toxilate, sulphate, chloride, hexafluorophosphate and diethylcarbamate.
- 7. The process of claim 1, wherein said bidentate chelating base has the formula
- R.sub.1 R.sub.2 -M-R-M-R.sub.3 R.sub.4
- wherein:
- M is a phosphorous or nitrogen atom;
- R is a polymethylene radical containing 2-4 carbon atoms, a cycloalkylidene radical containing 2-10 carbon atoms or a phenylene radical;
- R.sub.1, R.sub.2, R.sub.3, and R.sub.4, which may be the same or different, are an alkyl radical containing 1-6 carbon atoms, a cycloalkyl radical containing 3-6 carbon atoms or an aromatic radical containing 6-12 carbon atoms.
- 8. The process of claim 1, wherein said bidentate chelating base is selected from a group consisting of 1,3-bis(diphenylphosphine)propane, 1,4-bis(dicyclohexylphosphine)butane, and 1,2-bis(diphenylphosphine)cyclohexane.
- 9. The process of claim 1, wherein said bidentate chelating base is 2,2'-bipyridyl.
- 10. The process of claim 1, wherein said bidentate chelating base is 4,4'-dimethyl-2,2'-bipyridyl.
- 11. The process of claim 1, wherein said Lewis acid has the formula AX.sub.n wherein n=3 or 5, or addition products thereof with bases, wherein
- A is B, Al, Ga, In, As, P or Sb; and
- X is a halogen, an aliphatic radical, an aromatic monovalent radical or a substituted aromatic monovalent radical.
- 12. The process of claim 1, wherein said Lewis acid is selected from the group consisting of boron trifluoride, boron trifluoride etherate, antimonium pentafluoride, arsenic pentafluoride, gallium trifluoride, aluminum trichloride, boron trichloride, boron tribromide, aluminum tribromide, tris-(pentafluorophenyl)-boron, triphenyl boron, NaBF.sub.4, NH.sub.4 PF.sub.6, NaB(C.sub.6 H.sub.5).sub.4 and NH.sub.3 R.sup.+ B(C.sub.6 H.sub.5).sub.3 CH.sub.3.sup.-, wherein R is H, alkyl, or cycloalkyl.
- 13. The process of claim 12, wherein said Lewis acid is selected from a group consisting of boron trifluoride, aluminum trifluoride, and tris-(pentafluorophenyl)-boron.
- 14. The process of claim 1, wherein said oxidizing agent is a 1,4-quinone compound, a nitroaromatic compound, or NOBF.sub.4.
- 15. The process of claim 1, wherein said oxidizing agent is 1,4-benzoquinone or 1,4-naphthoquinone.
- 16. The process of claim 1, wherein said oxidizing agent is a nitroaromatic compound.
- 17. The process of claim 16, wherein said nitroaromatic compound is nitrobenzene.
- 18. The process of claim 1, wherein component a) is a Cu salt.
- 19. The process of claim 1, wherein component a) is a Ag salt.
- 20. The process of claim 1, wherein component a) is a Au salt.
Priority Claims (1)
| Number |
Date |
Country |
Kind |
| 002538 A/93 |
Dec 1993 |
ITX |
|
Parent Case Info
This is a division of application Ser. No. 08/348,126 filed on Nov. 28, 1994 now U.S. Pat. No. 5,556,823.
US Referenced Citations (5)
Divisions (1)
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Number |
Date |
Country |
| Parent |
348126 |
Nov 1994 |
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