Claims
- 1. A process for producing a high molecular weight monovinylidene aromatic polymer, comprising free radically polymerizing a vinyl aromatic monomer in the presence of less than 10 ppm of a vinyl acid catalyst having a pKa at 25.degree. C. of less than 2.0.
- 2. The process of claim 1 wherein the acid catalyst is a vinyl functional sulfonic or vinyl functional phosphonic acid of the formula: ##STR3## wherein X is O and n is either 0 or 1; Y is H, methyl or phenyl; Z is C1-C6 alkyl, aryl or O--Y; and R is --C(.dbd.O)OCH.sub.2 CH(Y), --C(.dbd.O)NHCH2CH(Y)--, phenyl or a direct bond.
- 3. The process of claim 2 wherein the vinyl acid is 2-sulfoethylmethacrylate, acrylamidopropanesulfonic acid, 2-sulfopropylmethacrylate, styrenesulfonic acid, or 2-sulfatoethylmethacrylate.
- 4. The process of claim 1 wherein the vinyl aromatic monomer is styrene.
- 5. The process of claim 1 wherein the acid catalyst is dispersed in a (meth)acrylic acid or ester thereof, before combining with the vinyl aromatic monomer.
- 6. The process of claim 1 wherein a free radical initiator is also present.
- 7. The process of claim 6 wherein the free radical initiator is selected from the group consisting of tert-butylperoxybenzoate, tert-butylperoxyacetate, di-tert-butylperoxide, dibenzoylperoxide, dilauroylperoxide, 1,1-bis-tert-butyl peroxycyclohexane, 1,1-bis-tert-butylperoxy-3,3,5-trimethylcyclohexane and dicumylperoxide.
- 8. The process of claim 1 wherein the molecular weight of the high molecular weight polymer is from 250,000 to 400,000.
- 9. The process of claim 1 wherein a polymerization reaction mixture comprising high molecular weight polymer, unreacted monomer and any solvent is produced and contains less than 600 ppm 1-phenyltetralin dimer, based on the weight of the polymerization reaction mixture.
- 10. The process of claim 1 which additionally comprises producing a low molecular weight polymer either after, or previous to, the production of high molecular weight polymer, to produce a polymodal composition.
CROSS REFERENCE STATEMENT
This application is a continuation-in-part of U.S. Ser. No. 08/806,764, filed Feb. 26, 1997 and granted on Oct. 5, 1999 as U.S. Pat. No. 5,962,605, which is a divisional of U.S. Ser. No. 08/606,182, filed Feb. 23, 1996 and granted on Nov. 23, 1999 as U.S. Pat. No. 5,990,255, which is a continuation of U.S. application Ser. No. 08/459,007, filed Jun.2, 1995, now abandoned, which is a continuation-in-part of U.S. application Ser. No. 355,716, filed Dec. 14, 1994, now abandoned.
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Divisions (1)
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606182 |
Feb 1996 |
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Continuations (1)
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Jun 1995 |
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Continuation in Parts (2)
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Dec 1994 |
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