Claims
- 1. A cationic electrodeposition coating composition containing a base resin and a curing agent represented by the following general formula (2): ##STR8## wherein each of A.sup.1 -A.sup.11 is a structure derived from an aromatic diisocyanate compound chosen from among a group represented by ##STR9## each of R.sup.1 -R.sup.7 is a residue obtained by removing active hydrogen from an active hydrogen containing compound and at least one of which is a residue obtained by removing active hydrogen from glycol ether; and f, g, h and i are 0 or 1, said glycol ether being represented by the following general formula (1)
- Ra(OCH.sub.2 CHRb)nOH (1)
- wherein
- Ra: Alkyl group with a carbon number of 5-12
- Rb: Hydrogen atom or methyl group
- n: Integer 1-4,
- at least twenty percent of the total amount (mol) of said R.sup.1 -R.sup.7 is residues obtained by removing active hydrogen from glycol ether represented by said general formula (1), the group of residues comprising said R.sup.1 -R.sup.7 containing not only residues derived from glycol ether represented by said general formula (1) but also residues obtained by removing active hydrogen from at least one type of active hydrogen containing compound chosen from among RcOH (Rc denotes a hydrocarbon group with a carbon number of 1-10 which may contain a hydroxyl group), Rd(OCH.sub.2 CHRe)mOH (Rd denotes an alkyl group with a carbon number of 1-4, Re denotes a hydrogen atom or a methyl group, and m denotes an integer 1-4), compounds which contain active methylene, oxime compounds, amino alcohols, imidazole and lactam.
- 2. The cationic electrodeposition coating composition containing a curing agent as described in claim 1, which has a glass transition temperature of 45.degree. C. or lower.
- 3. The cationic electrodeposition coating composition containing a curing agent as described in claim 2, for which the total weight of said R.sup.1 -R.sup.7 accounts for 10-55% of the molecular weight of the compound represented by said general formula (2).
- 4. A cationic electrodeposition coating composition comprising a base resin and a curing agent, said curing agent containing compound I containing an aromatic isocyanurate ring and three or more isocyanate groups all of which are blocked with glycol ether, as well as compound II containing an aromatic isocyanurate ring and at least three isocyanate groups blocked with at least one type of active hydrogen containing compound chosen from among RcOCH (Rc denotes a hydrocarbon group with a carbon number of 1-10 which may contain a hydroxyl group), Rd(OCH.sub.2 CHRe)mOH (Rd denotes an alkyl group with a carbon number of 1-4, Re denotes a hydrogen atom or a methyl group, and m denotes an integer 1-4), compounds which contain active methylene, oxime compounds, amino alcohol, imidazole and lactam and wherein at least twenty percent of the total amount (mol) of the blocked isocyanate groups contained in said compound I and in said compound II are isocyanate groups blocked with said glycol ether.
- 5. The cationic electrodeposition coating composition of claim 4, wherein said curing agent has a glass transition temperature of 45.degree. C. or lower.
- 6. The cationic electrodeposition coating composition of claim 5, wherein the total weight of the part blocking said isocyanate group accounts for 10-55% of the average molecular weight of said compounds I and II.
- 7. A cationic electrodeposition coating composition comprising a base resin and a curing agent, said curing agent containing a compound containing an aromatic isocyanurate ring and 3 or more blocked isocyanate groups wherein at least one of said blocked isocyanate groups is blocked with glycol ether, and wherein the weight ratio between said base resin and said curing agent is 90/10-50-50.
- 8. The cationic electrodeposition coating composition of claim 7, wherein said base resin comprises modified epoxy resin containing an oxazolidone ring.
Priority Claims (1)
Number |
Date |
Country |
Kind |
6-49806 |
Feb 1994 |
JPX |
|
CROSS REFERENCE TO A RELATED APPLICATION
This is a divisional application of application Ser. No. 08/392,170 filed Feb. 22, 1995, abandoned.
US Referenced Citations (3)
Number |
Name |
Date |
Kind |
3996223 |
Gupta et al. |
Dec 1976 |
|
4293669 |
Rottmaier et al. |
Oct 1981 |
|
5276072 |
Ishii et al. |
Jan 1994 |
|
Divisions (1)
|
Number |
Date |
Country |
Parent |
392170 |
Feb 1995 |
|