The present invention relates to a ceramic capacitor and a method of manufacturing the capacitor.
A conventional ceramic capacitor disclosed in Japanese Patent Laid-Open Publication No. 2003-243240 includes a thin dielectric layer which has a thickness ranging from 1 to 2 μm and a dielectric constant greater than 3500 and electrodes provided on both surfaces of the dielectric layer, thus having a large capacitance.
Having a direct-current (DC) voltage applied between these electrodes, the capacitor has the capacitance significantly decrease. For example, having a DC voltage of 3.15V per 1 μm of the thickness of the dielectric layer applied, the capacitor may have the capacitance decrease at a capacitance-decreasing rate more than 50%.
Material powder having a tetragonal perovskite crystal structure essentially containing BaTiO3 is provided. The material powder has a c-axis/a-axis ratio ranging from 1.009 to 1.011 and an average particle diameter not larger than 0.5 μm. A dielectric layer is provided by mixing the material powder with additive. The dielectric layer has a tetragonal perovskite crystal structure essentially containing BaTiO3. The dielectric layer has a c-axis/a-axis ratio ranging from 1.005 to 1.009 and an average particle diameter not larger than 0.5 μm. An electrode is formed on the dielectric layer, thus, providing a ceramic capacitor.
This ceramic capacitor has a large capacitance and a small capacitance-decreasing rate.
A method of manufacturing ceramic capacitor 101 will be described below.
First, material powder essentially containing BaTiO3 and having a tetragonal perovskite crystal structure is prepared. The material powder has a c-axis/a-axis ratio ranging from 1.009 to 1.011 and an average particle diameter not larger than 0.5 μm. First, pre-material powder made of BaTiO3 and having an average particle diameter ranging from 0.1 μm to 0.5 μm is prepared by a solid reaction method.
Next, the material powder is mixed with additive to provide dielectric layer 1 essentially containing BaTiO3 having a tetragonal perovskite crystal structure. Dielectric layer 1 has a c-axis/a-axis ratio ranging from 1.005 to 1.009 and an average particle diameter not larger than 0.5 μm. The pre-material powder of samples 1 to 4 and comparative example 1 shown in
After sintering the laminated body, the interval between electrodes 2A and 2B (thickness T1 of dielectric layer 1) ranges from about 1 μm to 2 μm, as shown in
A direct-current (DC) voltage of 3.15V per 1 μm of the thickness of dielectric layer 1 was applied between electrodes 2A and 2B of the samples of ceramic capacitors 101 using material powder of samples 1 to 4 and comparative example 1. Then, a capacitance-decreasing rate of the capacitance of each of the samples after the applying of the DC voltage to the capacitance just after the manufacturing of the samples was measured.
Each sample using material powder of samples 1 to 4 includes dielectric layer 1 having a large dielectric constant not smaller than 3500 and exhibits a capacitance-decreasing rate not higher than 40%. In contrary, the sample using the material powder of comparative example 1 includes dielectric layer 1 having a large dielectric constant of 3625 but exhibits a capacitance-decreasing rate of 53.4%.
While the dielectric constant is determined by the final crystal structure of dielectric layer 1 of completed ceramic capacitor 101, the capacitance-decreasing rate is not determined only by the final crystal structure of dielectric layer 1 and depends also on the crystal structure of the pre-material powder. The material powder having the c-axis/a-axis ratio larger than the c-axis/a-axis ratio of the final crystal structure is added with the additive, thereby having a fine stress of the crystal structure enabled to control and having a small fine defect. This can provide the capacitor with the large dielectric constant more than 3500 and the capacitance-decreasing rate not larger than of 40%.
According to this embodiment, MgO as the additive is mixed to the material powder, but MnO2, Dy2O3, V2O5, or Ba—Al—Si—O-base glass as the additive may be mixed to the material powder.
According to this embodiment, the material powder of samples 1 to 4 having the c-axis/a-axis ratios ranging from 1.009 to 1.011 is selected accurately by the x-ray diffraction-Rietveld analysis method from the pre-material powder obtained by the solid reaction method. Alternatively, the material powder having the c-axis/a-axis ratio ranging from 1.009 to 1.011 may be obtained by performing predetermined heat treating for the pre-material powder to a predetermined heat treatment, for example, by heating the pre-material powder up to a temperature ranging from 600 to 1300° C. in atmosphere of oxygen having partial pressure not lower than 0.2 atms. According to this embodiment, the pre-material powder is heated in the atmosphere of oxygen having partial pressure not lower than 0.2 atms. The pre-material powder may be heated in air (oxygen having partial pressure of 0.2 atms), preferably in oxygen having high partial pressure ranging from 0.2 to 1 atms (an atmospheric pressure). The pre-material powder may be heated in oxygen having partial pressure higher than 1 atms depending on the cost of a heat treatment apparatus.
A ceramic capacitor manufactured by a method according to the present invention has a large capacitance and a small capacitance-decreasing rate, thus being useful for electronic devices having small sizes.
Number | Date | Country | Kind |
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2004-279058 | Sep 2004 | JP | national |
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/JP2005/016397 | 9/7/2005 | WO | 00 | 3/15/2007 |