Claims
- 1. A method for removing a protecting group from a linker molecule or a synthesis intermediate comprising the steps of:a) applying to a surface a catalyst system comprising i) a radiation sensitive compound or group, said radiation sensitive compound or group producing a catalyst when irradiated, and ii) an autocatalytic compound or group, said autocatalytic compound or group generating a protecting group removing product when said autocatalytic compound is activated by said catalyst; and b) irradiating at least a part of said surface to remove said protecting group from the linker molecule or the synthesis intermediate.
- 2. The method recited in claim 1 wherein said radiation sensitive compound or group is a photosensitive compound or group.
- 3. The method recited in claim 1 wherein said autocatalytic compound or group is a member selected from the group consisting of a masked acid and pentafluorobenzoic acid.
- 4. The method recited in claim 1 wherein said synthesis intermediate is a member selected from the group consisting of a nucleotide, a DMT protected nucleotide, a polynucleotide, an amino acid, and a polypeptide.
- 5. The method recited in claim 2 wherein said photosensitive compound or group is a member selected from the group consisting of a photoactivated catalyst, a photoactivated acid catalyst and toluenesulfonic acid.
- 6. The method recited in claim 1 wherein said protecting group is 5′ dimethoxytrityl.
- 7. The method recited in claim 2 wherein said photosensitive compound or group and said autocatalytic compound or group are parts of the same compound.
- 8. A method for removing a protecting group from a linker molecule or a synthesis intermediate comprising the steps of:a) applying to a surface a catalyst system comprising i) a photosensitive acid compound or group, the photosensitive acid, compound, or group producing a catalyst when irradiated, and ii) an autocatalytic compound or group, the autocatalytic compound or group generating a protecting group removing product when the autocatalytic compound or group is activated by the catalyst; and b) irradiating at least a part of said surface to remove said protecting group from the linker molecule or the synthesis intermediate.
- 9. The method of claim 8 wherein the photosensitive acid compound or group is a photoactivated acid catalyst.
- 10. The method of claim 8 wherein the autocatalytic compound or group is a member selected from the group consisting of a masked acid and pentafluorobenzoic acid.
- 11. The method of claim 8 wherein the synthesis intermediate is a member selected from the group consisting of a nucleotide, a DMT protected nucleotide, a polynucleotide, an amino acid and a polypeptide.
- 12. The method of claim 8 wherein the protecting group is an acid removable group.
- 13. The method of claim 8 wherein the photosensitive acid, compound, or group is toluenesulfonic acid.
- 14. The method of claim 9 wherein the photoactivated acid catalyst is selected from the group consisting of naphthoquinone diazide sulfonic acids, 2,1,4-diazonaphthoquinone sulfonic acid esters, 2,1,5-diazonaphthoquinone sulfonic acid esters, 1,1-bis[p-chlorophenyl]-2,2,2-trichloroethane, 1,1-bis[p-methoxyphenyl]-2,2,2-trichloroethane, 1,2,5,6,9,10-hexabromocyclododecane, 1,10-dibromodecane, 1,1-bis[p-chlorophenyl]-2,2-dichloroethane, 4,4-dichloro-2-(trichloromethyl)benzhydrol, hexachlorodimethylsulfone, 2-chloro-6-(trichloromethyl)pyridine, o,o-diethyl-o-(3,5,6-trichloro-2-pyridyl)phosphorothionate, 1,2,3,4,5,6-hexachlorocyclohexane, N(1,1-bis[p-chlorophenyl]-2,2,2trichloroethyl)acetamide, tris[2,3-dibromopropyl]isocyanurate, 2,2-bis[p-chlorophenyl]-1,1-dichloroethylene, tris[trichloromethyl]striazine, 1,1-bis(chlorophenyl)-2,2,2-trichloroethanol, tris(1,2,3-methanesulfonyl)benzene, tris(trichloromethyl)triazine, and toluenesulfonic acid esters.
- 15. The method of claim 8 wherein the protecting group is selected from the group consisting of dimethoxytrityl, tert-butylcarbamate, trifluoroacetyl, 9-fluorenylmethoxycarbonyl, isobutyrl, benzoyl, phenoxyacetyl, acetamidomethyl, acetyl, tert-amyloxycarbonyl, benzyl, benzyloxycarbonyl, 2-(4-biphenylyl)-2-propyloxycarbonyl, 2-bromobenzyloxycarbonyl, tert-butyl, tert-butyloxycarbonyl, 1-carbobenzoxamido-2,2,2-trifluoroethyl, 2,6-dichlorobenzyl, 2-(3,5-dimethoxyphenyl)-2-propyloxycarbonyl, 2,4-dinitrophenyl, dithiasuccinyl, formyl, 4-methoxybenzenesulfonyl, 4-methoxybenzyl, 4-methylbenzyl, o-nitrophenylsulfonyl, 2-phenyl-2-propyloxycarbonyl, alpha.-2,4,5-tetramethylbenzyloxycarbonyl, p-toluenesulfonyl, xanthenyl, benzyl ester, N-hydroxysuccinimide ester, p-nitrobenzyl ester, p-nitrophenyl ester, phenyl ester, p-nitrocarbonate, p-nitrobenzylcarbonate, trimethylsilyl and pentachlorophenyl ester.
- 16. A method for removing a protecting group from a linker molecule or a synthesis intermediate comprising the steps of:a) applying to a surface a catalyst system comprising i) a synthesis intermediate having an acid removable protecting group, and ii) a photosensitive acid, compound, or group, the photosensitive acid, compound, or group producing an acid when irradiated, and iii) an autocatalytic compound or group, the autocatalytic compound or group generating a protecting group removing product when the autocatalytic compound or group is activated by the acid, and b) irradiating at least a part of the surface with light to remove the acid removable protecting group from the linker molecule or the synthesis intermediate.
- 17. The method of claim 16 wherein the photosensitive acid, compound, or group is a photoactivated acid catalyst.
- 18. The method of claim 16 wherein the synthesis intermediate is a member selected from the group consisting of a nucleotide, a DMT protected nucleotide, a polynucleotide, an amino acid and a polypeptide.
- 19. The method of claim 16 wherein the photosensitive acid, compound, or group is toluenesulfonic acid.
- 20. The method of claim 17 wherein the photoactivated acid catalyst is selected from the group consisting of naphthoquinone diazide sulfonic acids, 2,1,4-diazonaphthoquinone sulfonic acid esters, 2,1,5-diazonaphthoquinone sulfonic acid esters, 1,1-bis[p-chlorophenyl]-2,2,2-trichloroethane, 1,1-bis[p-methoxyphenyl]-2,2,2-trichloroethane, 1,2,5,6,9,10-hexabromocyclododecane, 1,10-dibromodecane, 1,1-bis[p-chlorophenyl]-2,2-dichloroethane, 4,4-dichloro-2-(trichloromethyl)benzhydrol, hexachlorodimethylsulfone, 2-chloro-6-(trichloromethyl)pyridine, o,o-diethyl-o-(3,5,6-trichloro-2-pyridyl)phosphorothionate, 1,2,3,4,5,6-hexachlorocyclohexane, N(1,1-bis[p-chlorophenyl]-2,2,2trichloroethyl)acetamide, tris[2,3-dibromopropyl]isocyanurate, 2,2-bis[p-chlorophenyl]-1,1-dichloroethylene, tris[trichloromethyl]striazine, 1,1-bis(chlorophenyl)-2,2,2-trichloroethanol, tris(1,2,3-methanesulfonyl)benzene, tris(trichloromethyl)triazine, and toluenesulfonic acid esters.
- 21. The method of claim 16 wherein the acid removable protecting group is selected from the group consisting of dimethoxytrityl, tert-butylcarbamate, trifluoroacetyl, 9-fluorenylmethoxycarbonyl, isobutyrl, benzoyl, phenoxyacetyl, acetamidomethyl, acetyl, tert-amyloxycarbonyl, benzyl, benzyloxycarbonyl, 2-(4-biphenylyl)-2-propyloxycarbonyl, 2-bromobenzyloxycarbonyl, tert-butyl, tert-butyloxycarbonyl, 1-carbobenzoxamido-2,2,2-trifluoroethyl, 2,6-dichlorobenzyl, 2-(3,5-dimethoxyphenyl)-2-propyloxycarbonyl, 2,4-dinitrophenyl, dithiasuccinyl, formyl, 4-methoxybenzenesulfonyl, 4-methoxybenzyl, 4-methylbenzyl, o-nitrophenylsulfenyl, 2-phenyl-2-propyloxycarbonyl, alpha.-2,4,5-tetramethylbenzyloxycarbonyl, p-toluenesulfonyl, xanthenyl, benzyl ester, N-hydroxysuccinimide ester, p-nitrobenzyl ester, p-nitrophenyl ester, phenyl ester, p-nitrocarbonate, p-nitrobenzylcarbonate, trimethylsilyl and pentachlorophenyl ester.
STATEMENT OF RELATED APPLICATIONS
This is a continuation of U.S. application Ser. No. 08/969,227, filed Nov. 13, 1997 now U.S. Pat. No. 6,083,697, which claims the benefit of the filing date of U.S. Ser. No. 60/030,826, filed Nov. 14, 1996.
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Provisional Applications (1)
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Number |
Date |
Country |
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60/030826 |
Nov 1996 |
US |
Continuations (1)
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Number |
Date |
Country |
Parent |
08/969227 |
Nov 1997 |
US |
Child |
09/578282 |
|
US |