Chemical dispensing apparatus of FOX process device

Abstract

A chemical dispensing apparatus adapted to perform a FOX process and further adapted to eliminate contamination particles from a chemical solution being dispensed on a wafer. The chemical dispensing apparatus includes a helium gas container, a first bottle, a second bottle, a first helium supply pipe, a second helium supply pipe, a first regulator, a second regulator, a first air valve, a second air valve, a first chemical supply pipe, a manual valve, a second chemical supply pipe, a filter, a flowmeter, a suck back control valve, a nozzle, a first vent line, a first pressure sensor, a first vent valve, a second pressure sensor, and a second vent valve.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 illustrates a conventional chemical dispensing apparatus adapted for use in the performance of a FOX process; and

FIG. 2 illustrates a chemical dispensing apparatus adapted for use in the performance of a FOX process according to one embodiment of the invention.

Claims

1. A chemical dispensing apparatus adapted for use in the performance of a flow oxide (FOX) process, the apparatus comprising: a first bottle adapted to store a chemical solution;a nozzle adapted to apply the chemical solution to a wafer;a first chemical supply pipe connecting the first bottle and the nozzle and comprising a filter adapted to remove contaminate particles from the chemical solution applied to the wafer.

2. The chemical dispensing apparatus of claim 1, further comprising: a helium gas container storing helium;a second bottle adapted to store supplemental chemical solution;a first helium supply pipe connected between the helium gas container and the first bottle;a first regulator installed on the first helium supply pipe and adapted to controlling pressure of helium supplied to the first bottle; and,a first valve installed on the first helium supply pipe and adapted to switch on and off a flow of helium into the first bottle;

3. The chemical dispensing apparatus of claim 2, further comprising: a second helium supply pipe connected between the helium gas container and the second bottle;a second regulator installed on the second helium supply pipe and adapted to controlling pressure of helium supplied to the second bottle; and,a second valve installed on the second helium supply pipe and adapted to switch on and off a flow of helium into the second bottle.

4. The chemical dispensing apparatus of claim 3, further comprising: a second chemical supply pipe adapted to transfer supplemental chemical solution from the second bottle to the first bottle; anda manual valve installed on the second chemical supply pipe and adapted to switch on and off the transfer flow of chemical solution from the second bottle to the first bottle.

5. The chemical dispensing apparatus of claim 4, further comprising: a flowmeter installed on the first chemical supply pipe and adapted to measure flow of the chemical solution from the first bottle to the nozzle.

6. The chemical dispensing apparatus of claim 4, further comprising: a suck back control valve installed on the first chemical supply pipe and adapted to apply a suck back vacuum to the first chemical supply pipe.

7. The chemical dispensing apparatus of claim 4, wherein the nozzle is adapted to spray the chemical solution onto the wafer.

8. The chemical dispensing apparatus of claim 4, further comprising: a first vent line connected to the first bottle;a first pressure sensor connected to the first vent line and adapted to measure pressure in the first vent line; anda first vent valve connected to the first vent line and adapted to vent chemical solution from the first bottle.

9. The chemical dispensing apparatus of claim 4, further comprising: a second vent line connected to the second bottle;a second pressure sensor connected to the second vent line and adapted to measure pressure in the second vent line; anda second vent valve connected to the second vent line and adapted to vent chemical solution from the second bottle.

10. A chemical dispensing apparatus adapted for use in the performance of a flow oxide (FOX) process, the apparatus comprising: a first bottle adapted to store a chemical solution;a nozzle adapted to apply the chemical solution to a wafer;a first chemical supply pipe connecting the first bottle and the nozzle and comprising a filter adapted to remove contaminate particles from the chemical solution applied to the wafer;a second bottle adapted to store supplemental chemical solution;a first helium supply pipe connected between a helium gas container and the first bottle;a second helium supply pipe connected between the helium gas container and the second bottle;a second chemical supply pipe adapted to transfer supplemental chemical solution from the second bottle to the first bottle;a manual valve install on the second chemical supply pipe and adapted to switch on and off the transfer flow of chemical solution from the second bottle to the first bottle;a flowmeter installed on the first chemical supply pipe and adapted to measure flow of the chemical solution from the first bottle to the nozzle; anda suck back control valve installed on the first chemical supply pipe and adapted to apply a suck back vacuum to the first chemical supply pipe.

11. The chemical dispensing apparatus of claim 10, further comprising: a first vent line connected to the first bottle;a first pressure sensor connected to the first vent line and adapted to measure pressure in the first vent line;a first vent valve connected to the first vent line and adapted to vent chemical solution from the first bottle;a second vent line connected to the second bottle;a second pressure sensor connected to the second vent line and adapted to measure pressure in the second vent line; anda second vent valve connected to the second vent line and adapted to vent chemical solution from the second bottle.