Claims
- 1. A chemical laser including a laser cavity, an exhaust, a pump for removing exhaust gases from the laser cavity at a rate and sufficiently low pressure to sustain lasing action and provide a closed system, the pump including a metal selected from the class consisting of titanium, zirconium, hafnium, vanadium, niobium, tantalum, yttrium, scandium, elements 57-71 of the periodic table, lithium, sodium, potassium, rubidium, cesium, beryllium, palladium, magnesium, strontium, calcium, barium, boron, gallium and mixtures and alloys thereof;
- the exhaust gases being selected from the class consisting of hydrogen, deuterium and their halides, the halogens, nitrogen, CO.sub.2, oxygen and water vapor;
- cryogenic adsorption means to remove nitrogen and CO.sub.2 ; and
- condensing means to remove the halides of hydrogen and deuterium and water vapor; the metal of said pump being adapted to react with oxygen, hydrogen, deuterium and the halogens to form solid reaction products therewith.
- 2. The chemical laser of claim 1 in which the pump includes a reactor.
- 3. A chemical laser including a laser cavity, an exhaust, a pump for removing exhaust gases from the laser cavity at a rate and sufficiently low pressure to sustain lasing action and provide a closed system, the pump comprising a metal selected from the class consisting of titanium, zirconium and mixtures and alloys thereof, the exhaust gases selected from the class consisting of hydrogen, deuterium and their halides, the halogens, nitrogen, CO.sub.2, oxygen and water vapor;
- cryogenic adsorption means to remove nitrogen and CO.sub.2 ; and
- condensing means to remove the halides of hydrogen and deuterium and water vapor; the metal of said pump being adapted to react with oxygen, hydrogen, deuterium and the halogens to form solid reaction products therewith.
- 4. The chemical laser of claim 3 in which the pump includes a reactor.
- 5. A process for pumping a chemical laser comprising, reacting oxygen, the halogens, hydrogen and deuterium exhaust gases with a metal selected from the class consisting of titanium, zirconium, hafnium, vanadium, niobium, tantalum, yttrium, scandium, elements 57-71 of the periodic table, lithium, sodium, potassium, rubidium, cesium, beryllium, palladium, magnesium, strontium, calcium, barium, boron, gallium and mixtures and alloys thereof to form solid reaction products therewith; cryogenically adsorbing nitrogen and CO.sub.2 ; condensing water vapor and the halides of hydrogen and deuterium; and the pumping process occuring at a rate and sufficiently low pressure to sustain lasing action and provide a closed system.
- 6. A process for pumping a chemical laser comprising reacting hydrogen, oxygen, the halogens and deuterium exhaust gases with a metal selected from the class consisting of calcium, titanium, zirconium and mixtures and alloys thereof to form solid reaction products therewith; cryogenically adsorbing nitrogen and CO.sub.2 ; condensing water vapor and the halides of hydrogen and deuterium; and the reaction occuring at a rate and sufficiently low pressure to sustain lasing action and provide a closed system.
- 7. A process for operating a chemical laser comprising:
- transmitting lasing reactants including flourine forming compounds in a carrier gas into a combustion region;
- combining the reactants in the combustor to form atomic fluorine and byproduct gasses;
- passing the atomic fluorine and by product gases into a laser cavity to produce lasing action;
- pumping oxygen, deuterium, hydrogen and halogen exhaust gases by reaction with a metal selected from the class consisting of titanium, zirconium, hafnium, vanadium, niobium, tantalum, yttrium, scandium, elements 57-71 of the periodic table, lithium, sodium, potassium, rubidium, cesium, beryllium, palladium, magnesium, strontium, calcium, barium, boron, gallium and mixtures and alloys thereof to form solid reaction products therewith;
- cryogenically adsorbing nitrogen and CO.sub.2 ;
- condensing water vapor and the halides of hydrogen and deuterium; and
- the pumping process occuring at a rate and sufficiently low pressure to sustain lasing action and provide a closed system.
- 8. A process for operating a chemical laser comprising:
- transmitting lasing reactants including fluorine forming compounds in a carrier diluent gas into a combustion region;
- combining the reactants in the combustor to form atomic fluorine and by product gasses;
- passing the atomic fluorine into a laser cavity to produce lasing action;
- pumping oxygen, deuterium, hydrogen and halogen exhaust gases by reaction with a metal selected from the class consisting of calcium, titanium, zirconium and mixtures and alloys thereof to form solid reaction products therewith;
- cryogenically absorbing nitrogen and CO.sub.2 ;
- condensing water vapor and the halides of hydrogen and deuterium; and
- the pumping process occuring at a rate and sufficiently low pressure to sustain lasing action and provide a closed system.
Parent Case Info
This is a continuation, of application Ser. No. 286,246, filed 9/5/72.
Government Interests
The Government has rights in this invention pursuant to Contract No. F33657-72-C-0628 awarded by the Department of the Air Force.
US Referenced Citations (14)
Non-Patent Literature Citations (2)
Entry |
Spencer et al., "Initial Performance of a CW Chemical Laser", 1970, pp. 155-160, Opto-Electronics 2. |
Hinchen et al., "cw HF Electric-Discharge Mixing Laser", pp. 386-388, App. Phys. Let., vol. 17, #9. |
Continuations (1)
|
Number |
Date |
Country |
Parent |
286246 |
Sep 1972 |
|