Claims
- 1. A method for fabricating thick film resistor assemblies comprising the steps of:
- applying a ceramic adhesive dielectric material to one side of a metallic carrier substrate so as to form a plurality of resistive units on said substrate, including fracture areas between any two adjacent resistive areas;
- heating said ceramic adhesive-coated carrier substrate to cure said ceramic adhesive, whereby said adhesive becomes solid;
- applying a coating of resistive material to said solidified ceramic adhesive dielectric material;
- heating the resultant assembly to eliminate any organic component from said resistive material;
- applying conductive material to form one or more conductors to said resistive material;
- heating the resultant assembly to eliminate any organic component in said conductive material;
- firing the total assembly to a temperature of at least 704 degrees centigrade for a period within the range of from 40 to 80 minutes with the temperature reaching its maximum range for a period within the range of 8 to 12 minutes centered about the midpoint of said firing period, to eliminate the adhesive characteristic of said ceramic material;
- separating said carrier substrate from said assembly; and
- separating said resistive units by manually applying pressure at each of said fracture areas, whereby said resistive units are separated from each other.
- 2. The method for fabricating thick film resistive assemblies as claimed in claim 1, wherein:
- said step of applying said resistive material and said step of applying said conductive material are reversed.
- 3. A method for fabricating thick film resistive assemblies as claimed in claim 1, wherein:
- that heating of said carrier substrate and said ceramic adhesive dielectric material occurs in an air atmosphere at a temperature within the range of 300-330 degrees centigrade.
- 4. A method for fabricating thick film resistor assemblies as claimed in claim 1, wherein:
- said application of resistive material to said ceramic adhesive dielectric material is done by a screening process.
- 5. A method for fabricating thick film resistor assemblies as claimed in claim 1, wherein:
- said application of said conductive material to said resistive material is done by a screening process.
- 6. A method for fabricating thick film resistor assemblies as claimed in claim 1, wherein:
- the heating of said resistive material occurs at a temperature within the range of 140-160 degrees centigrade.
- 7. A method for fabricating thick film resistor assemblies as claimed in claim 1, wherein:
- the heating of said conductors occurs at a temperature within the range of 140-160 degrees centigrade.
- 8. A method for fabricating thick film resistor assemblies as claimed in claim 1, wherein:
- the heating of said resistive material is done for a period within the range of eight to twelve minutes.
- 9. A method for fabricating thick film resistors as claimed in claim 1, wherein:
- the heating of said conductors occurs for a period within the range of eight to twelve minutes.
Parent Case Info
This application is a continuation-in-part of co-pending application Ser. No. 07/171,321 filed on Mar. 21, 1988 now abandoned.
US Referenced Citations (4)
Number |
Name |
Date |
Kind |
4349496 |
Levinson |
Sep 1982 |
|
4366198 |
Ramspacher, Jr. |
Dec 1982 |
|
4370288 |
Rice, Jr. et al. |
Jan 1983 |
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4734233 |
Toda et al. |
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|
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
171321 |
Mar 1988 |
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