The present disclosure is generally related to electrostatic discharge protection circuits, and more particularly to diode strings for electrostatic discharge protection.
Electrostatic discharge (ESD) refers to the phenomenon whereby an electrical current of high amplitude and short duration is discharged at the package nodes of an integrated circuit due to static charge build-up on the integrated circuit (IC) package or on a nearby object, such as a human being or an IC handling machine. Without ESD protection circuitry, an ESD event can damage the IC. Accordingly, circuit designers have developed ESD protection circuitry to discharge ESD currents in a short time in a nondestructive manner
A diode string represents one type of ESD circuit that can be used to discharge ESD currents. The diode string is formed in bulk material of a semiconductor substrate by series-connecting P-N junctions typically formed in nwell regions. In particular, each n-well formed in the P-type bulk material is tapped via an n+ diffusion and is connected to the p+ junction of the next diode. The combination of a P+ diffusion contained in an nwell over a P-type substrate forms a parasitic PNP transistor by default, such that the “diode string” is really a chain of PNP transistors. Within the diode string, each PNP transistor has a vertical current gain (β), which effects the diode string operation, including the total substrate current, the effective on resistance (Ron), and so on.
As the process technologies advance and the semiconductor technology scales, the vertical current gain (β) also tends to get smaller due to the n-well retrograde doping profile, in order to fight latch-up. Unfortunately, as the vertical current gain (β) decreases, the on-resistance (Ron) of the diode string increases, which can adversely impact the performance of the diode string in response to an ESD event by reducing the amount of current shunted to the substrate. In general, shunting current to the substrate provides an extra current path which contributes to lowering the effective resistance otherwise exhibited by the series connection of diodes.
In an embodiment, a circuit includes an input terminal and an electrostatic discharge (ESD) protection circuit. The ESD protection circuit includes a diode string formed from a plurality of P-N junction devices arranged in series. The diode string includes an input coupled to the input terminal and includes at least one output coupled to a first power supply terminal. The circuit further includes a plurality of shunt elements. Each of the plurality of shunt elements includes a first terminal coupled to one of the plurality of P-N junction devices and a second terminal coupled to the first power supply terminal. Each of the plurality of shunt elements is controllable to selectively couple the one of the plurality of P-N junction devices to the power supply terminal to distribute current flow to the first power supply terminal in response to an ESD event.
In another embodiment, a circuit includes an input terminal and an ESD circuit. The ESD protection circuit includes a diode string formed from P-N junctions of a plurality of bipolar junction transistors. The diode string includes a first terminal coupled to the input terminal and a second terminal coupled to a power supply terminal. The ESD protection circuit further includes a plurality of shunt elements, each of which includes a first terminal coupled to an anode terminal of a diode of the diode string and a second terminal to the power supply terminal. Each of the plurality of shunt elements is controllable to selectively provide a current flow path from the anode terminal to the power supply terminal in response to an ESD event.
In still another embodiment, a circuit for ESD protection includes a first conductive terminal, a second conductive terminal, and a diode string formed from P-N junctions of a plurality of bipolar junction transistors. The diode string includes an input coupled to the first conductive terminal and includes an output coupled to the second conductive terminal. The circuit further includes a plurality of controllable shunt elements, each of which has a first terminal coupled to an anode of a diode from the diode string, a second terminal coupled to a power supply terminal, and a control terminal. The circuit also includes a controller coupled to the control terminal of each of the plurality of controllable shunt elements to controllably alter the effective-beta or “pseudo-beta” of each diode of the diode string in response to an ESD event.
In the following discussion, the use of the same reference numerals in different drawings indicates similar or identical items.
In general, the vertical current gain (β) of the transistors of a diode string strongly determines string characteristics, such as total substrate current, on-resistance, and the like. Additionally, the vertical current gain (β) also varies with both temperature and transistor collector current density.
The collector current (IC) of the transistor is proportional to the emitter current (IE) times the vertical current gain (β) over the vertical current gain plus one (β+1) as showing the following equation:
If we consider a 4-stage diode string as shown in
As technology scales, (β) tends to reduce in magnitude due to retrograde nwell doping profiles. However, even if the vertical current gain (β) were equal to one for this 4-stage diode string, up to ninety-four percent (½+¼+⅛+ 1/16) of the injected emitter current flows to the substrate instead of through the diode string.
Similarly, by a related analysis the on-resistance RON exhibited by a 4-high diode string is given by the following equation:
where RD is the on-resistance of one diode in the string. As the technology scales and the vertical current gain (β) approaches zero, the on-resistance (RON) of the diode string approaches number of stages times the resistance of each diode (i.e., 4RD) as compared to a lower value produced by non-zero (β), such as two or two and a half times the diode resistance, which would be better in terms of the on resistance.
Embodiments of a circuit and associated methods are described below with respect to
Before addressing the circuits for providing ESD protection using a pseudo beta (β), it is useful to understand the basic operation of a PNP bipolar junction transistor (BJT) and the corresponding performance provided by a diode string comprised of PNP BJT devices. An example of a PNP BJT device is described below with respect to
A highly conductive region (salicide) 107 is formed on p+ diffusion area 106 for electrically connecting to an emitter terminal 116. Similarly, conductive regions 109 and 111 connect n+ diffusion area 108 and p+ diffusion area 110 to base terminal 118 and collector terminal 120, respectively. A P-N junction connection forms between p+ diffusion area 106 and the n-well 104. The n+ diffusion area 108 forms an ohmic contact to the cathode of the PN junction, including a parasitic resistance 114. Further a parasitic resistance 122 couples the interior collector region 124 to the collector terminal 120 through the p-type bulk material of the semiconductor substrate 102.
In active mode, the emitter-base voltage (VEB) between the emitter terminal 116 and the base terminal 118 causes the p+ type emitter to be higher in electrical potential than the n+ type base, forward biasing the base-emitter junction. The base current (IB) flowing out from the n+ diffused area 108 to the base terminal 118 is proportional to the emitter current (IE) flowing from the emitter terminal 116 into p+ diffused area 106 as a function of one over the vertical current gain (β) plus 1 as shown in Equation 4 below.
Further, the collector current (IC) is proportional to the emitter current (IE) as a function of the vertical current gain divided by the vertical current gain (β) plus one according to Equation 5 below:
In a diode stack or diode string, several BJT devices, such as the PNP BJT 112, are connected such that the n+ diffusion area 108 and associated conductor 109 is connected to the p+ diffusion area 106 of a next BJT device in the string. In particular, each n-well 104 is tapped and fed to the p+ diffusion area 106 of the next BJT in the string. Any number of P-N junctions can be strung together in this way. Further, the n-wells 104 also form a rectifying junction with the substrate such that the “diode string” represents a chain of PNP connected transistors. An example of a four-stage diode string is described below with respect to
In this configuration, BJT 206 has an emitter connected to the first conductive terminal 202, a base, and a collector connected to ground. BJT 208 has an emitter connected to the base of BJT 206, a base, and a collector connected to ground. BJT 210 has an emitter connected to the base of BJT 208, a base, and a collector connected to ground. BJT 212 has an emitter connected to the base of BJT 210, a base connected to the second conductive terminal 204, and a collector connected to ground.
In operation, when a differential voltage between the first and second conductive terminals 202 and 204 exceeds the turn on voltage equivalent to approximately four diode drops, the BJTs 206, 208, 210, and 212 are forward biased to sink current from conductive terminal 202 to ground. Unfortunately, the small vertical current gain (β) leads to an on resistance that approximately matches the overall diode resistance across the diode string 200, such as four times the diode resistance (4Rd).
Analyzing the effect of PNP bipolar current gain or (β) on the performance of the diode string, it should be appreciated that the collector current of BJT 206 is approximately equal to the emitter current times a beta factor β(β/(β+1)) as described above with respect to Equation 3. Since the emitter current of BJT 208 equals the base current of BJT 206, which is reduced as indicated above with respect to Equation 2, the collector current flowing into BJT 208 is also lower in proportion to the vertical current gain (β) according to the following equation:
and the base current (IB2) of BJT 208, which is the emitter current of BJT 210, is reduced according to the following equation:
Thus, for a vertical current gain value of one (β=1), the collector current of BJT 206 is one-half of the emitter current flowing from conductive terminal 202 into the emitter of BJT 206. In this example, the collector current of BJT 208 is one-fourth of that same emitter current. As a result, a larger portion of the current is dissipated through BJT 206 than through subsequent BJTs 208, 210, and 212 through the diode string. Due to the value of the vertical current gain (β), each stage or transistor within the “diode string” has less voltage applied to it because less emitter current flows to each subsequent stage. Thus, the vertical current gain (β) has a substantial impact on the performance of the diode string.
In general, the vertical current gain (β) strongly determines diode string characteristics, such as total substrate current, on-resistance, and the like. If the vertical current gain (β) is equal to one for a four-diode “high” string, approximately ninety-four (94%) of the current flows to the substrate through the collector currents as compared to current flow through the diode string because the diode resistances operate to divide the current flow at each stage. As technology scales, the vertical gain factor (β) tends to be smaller and smaller due to n-well retrograde doping profiles in order to fight latch-up. As the vertical gain factor (β) approaches zero, the resistance of the diode string approaches four times the diode resistance (i.e., 4Rd) due to a corresponding loss of substrate shunting through the collectors. An example of a circuit to provide a reduced effective resistance of the diode string through shunt elements is described below with respect to
In the illustrated example, a shunt element is added to each stage of the diode string, e.g., to the base of each BJT 206, 208, 210, and 210, providing a current/voltage divider that operates to reduce the effective resistance of each stage of the diode string. The extra current flow path to ground causes each transistor stage to appear as if it has a higher vertical current gain (β) than it actually does. The overall resistance exhibited by the diode string is reduced and is highly independent of the default vertical current gain (β) for the process.
While the resistive elements 402, 404, 406, and 408 are depicted as discrete, static resistances, it should be appreciated that each of the resistive elements 402, 404, 406, and 408 may be implemented as externally controlled shunt elements, such as switches, or as adjustable resistors, making it possible to selectively alter the effective resistance of the diode string. Further, the inclusion of resistive elements within the diode string allows for a reduced “holding value” for the diode string to continue to dissipate current during an ESD event. In an example, the resistive elements make it possible to implement I-V curves with negative differential resistance regimes using only diodes that trigger with an on-voltage associated with the effective threshold voltage of the diode string but that hold at a lower voltage threshold. In a four diode stack, for example, the diode string may trigger at a voltage level of approximately four times the diode threshold voltage (4φ) but hold at voltages of two or three times the threshold voltage (2φ or 3φ).
As discussed below with respect to
Graph 508 illustrates the emitter voltage of BJT 208 versus vertical current gain (β) due to the process used to fabricate BJT 208 for different resistance values of the resistive element 404 of diode string 400. As shown, for resistive element 404 having a resistance of approximately five ohms (5Ω) as compared to a resistance value of approximately one kilo-ohm (1 kΩ), this stage of the diode string demonstrates up to approximately a three volt reduction in the peak voltage levels.
Graph 510 illustrates the emitter voltage of BJT 210 versus vertical current gain (β) due to the process used to fabricate BJT 210 for different resistance values of the resistive element 406 of diode string 400. As shown, for resistive element 406 having a resistance of approximately five ohms (5Ω) as compared to a resistance value of approximately one kilo-ohm (1 kΩ), this stage of diode string 400 demonstrates more than a two volt reduction in the peak voltage levels.
Graph 512 illustrates the emitter voltage of BJT 212 versus vertical current gain (β) due to the process used to fabricate BJT 212 for different resistance values of the resistive element 408 of diode string 400. As shown, for resistive element 408 having a resistance of approximately five ohms (5Ω) as compared to a resistance value of approximately one kilo-ohm (1 kΩ), this stage of diode string 400 demonstrates less than a one and a half volt reduction in the peak voltage levels. However, for certain resistance and vertical current gain (β) value combinations, this stage of diode string 400 is turned off, reducing the effective diode string “height” by one.
In the illustrated example, the emitter voltages are significantly reduced when the resistances of the resistive elements are relatively low. Similarly, different combinations of the resistance values and the vertical current gain (β) values can be employed to modulate the height of the diode string as described below with respect to
Graph 608 corresponds to the emitter-base voltage (VEB) of BJT 208 in
Graph 610 corresponds to the emitter-base voltage (VEB) of BJT 210 in
Graph 612 corresponds to the emitter-base voltage (VEB) of BJT 212 in
MOSFET 712 includes a drain connected to the base of BJT 206 and to the emitter of BJT 208 and includes a source connected to ground. MOSFET 714 includes a drain connected to the base of BJT 208 and to the emitter of BJT 210 and includes a source connected to ground. MOSFET 716 includes a drain connected to the base of BJT 210 and to the emitter of BJT 212 and includes a source connected to ground. MOSFET 718 includes a drain connected to the base of BJT 212 and to conductive terminal 204 and includes a source connected to ground.
In an example, in response to an ESD event, controller 710 activates rail clamp 730 to limit a voltage differential between conductive terminal 204 and ground. Controller 710 also activates controllable shunt elements (MOSFETs 712, 714, 716, and 718) to selectively alter the effective resistance of the diode string 400 presented by BJTs 206, 208, 210, and 212, distributing current across the diode string such that ESD event-related current is dissipated through the collector currents of the collectors of MOSFETs 712, 714, 716, and 718 (as needed). Depending on the combination of the vertical current gain (β) and the resistance presented by each of the MOSFETs 712, 714, 716, and 718, some of the BJTs 206, 208, 210, and 212 may remain off during an ESD event.
In conjunction with the circuits and methods described above with respect to
While the above-referenced figures depicted static resistors in
Although the present invention has been described with reference to preferred embodiments, workers skilled in the art will recognize that changes may be made in form and detail without departing from the spirit and scope of the invention.