Patent Application
20240342762
The present invention relates to a cleaning basket.
Patent Literature 1 discloses a cleaning basket for cleaning polycrystalline silicon in a state in which the polycrystalline silicon is accommodated in the cleaning basket. The cleaning basket is provided with a plurality of through holes formed in a bottom plate part thereof and a plurality of through holes formed in a peripheral wall part thereof. The through holes formed in the peripheral wall part each have an inner peripheral surface having a bottom portion that has an inclined surface which gradually inclines downward from an inner side to an outer side. This allows the cleaning basket disclosed in Patent Literature 1 to prevent a cleaning liquid from remaining in the cleaning basket as much as possible when the polycrystalline silicon is washed, and to prevent generation of an oxide stain on the polycrystalline silicon.
In the cleaning basket disclosed in Patent Literature 1, the through holes formed in the peripheral wall part each have an inner peripheral surface having a bottom portion which has the inclined surface. Such a configuration for preventing the cleaning liquid from remaining in the cleaning basket has room for improvement. It is an object of an aspect of the present invention to reduce an amount of a cleaning liquid remaining in a cleaning basket and to improve efficiency of drying polycrystalline silicon accommodated in the cleaning basket.
In order to solve the foregoing problem, a cleaning basket in accordance with an aspect of the present invention is a cleaning basket used for at least one of cleaning and drying of polycrystalline silicon in a state in which the polycrystalline silicon is accommodated in the cleaning basket, the cleaning basket including: a bottom plate provided with a plurality of through holes formed therein; oblique plates each of which has an inner surface that makes, with an upper surface of the bottom plate, an angle of not less than 10° and not more than 80°, the oblique plates each being connected to the bottom plate and inclining in an upward and outward direction; and side plates which are connected to the oblique plates and which extend in an upward direction, the bottom plate, the oblique plates, and the side plates forming an accommodation space accommodating the polycrystalline silicon.
According to an aspect of the present invention, it is possible to both reduce a cleaning liquid remaining in a cleaning basket and improve efficiency of drying polycrystalline silicon accommodated in the cleaning basket.
A method for producing polycrystalline silicon to be cleaned includes, for example, a silicon depositing step of depositing polycrystalline silicon by reacting a chlorosilane compound and hydrogen in a reactor. The Siemens process is known as a method for depositing polycrystalline silicon. In the Siemens process, trichlorosilane and hydrogen are reacted in a bell-shaped (bell-jar) reactor. Then, polycrystalline silicon is deposited on the surface of a core rod which is for polycrystalline silicon deposition and which is provided so as to set up inside the reactor, so that a grown polycrystalline silicon rod is obtained.
The method for producing the polycrystalline silicon may further include the step of crushing the polycrystalline silicon rod obtained in the silicon depositing step and the step of classifying the polycrystalline silicon 1 thus crushed. Furthermore, the method for producing the polycrystalline silicon includes a cleaning step of cleaning the polycrystalline silicon crushed or the polycrystalline silicon classified and a drying step of drying the polycrystalline silicon cleaned.
In the cleaning step, fluonitric acid as a cleaning liquid is brought into contact with the polycrystalline silicon. The “fluonitric acid” refers to an aqueous solution in which nitric acid and hydrogen fluoride are mixed. On the polycrystalline silicon taken out of the reactor, usually, an oxide layer containing a contaminant may be formed, due to natural oxidation, so as to have a thickness of several nanometers. The oxide layer is a layer made of SiO2. Bringing this polycrystalline silicon into contact with the fluonitric acid causes a reaction as follows.
Mainly due to the action of the hydrogen fluoride, the surface of the polycrystalline silicon is etched and the oxide layer present on the surface is removed. Meanwhile, mainly due to the action of the nitric acid, a new oxide layer is formed on the surface of the polycrystalline silicon. Simultaneous progression of (i) removal of the oxide layer and (ii) formation of the new oxide layer causes the polycrystalline silicon to be etched, so that the contaminant adhered to the surface of the polycrystalline silicon and the contaminant incorporated in the polycrystalline silicon are removed. Such a contaminant include, for example, organic substances, metal, and resin. Major examples of the metal that can be contaminants or impurities encompass Na, Mg, Al, K, Ca, Cr, Fe, Ni, Co, Cu, Zn, and W.
Specific examples of a method for bringing the fluonitric acid into contact with the polycrystalline silicon encompass a method in which a cleaning basket 1 accommodating the polycrystalline silicon is immersed into a first cleaning bath filled with the fluonitric acid. The cleaning basket 1 will be described later. After the cleaning basket 1 has been immersed in the first cleaning bath, the cleaning basket 1 is taken out of the first cleaning bath and is then immersed into a second cleaning bath filled with ultrapure water. This can wash away the fluonitric acid adhered to the polycrystalline silicon.
After the cleaning basket 1 has been immersed in the second cleaning bath, the cleaning basket 1 is taken out of the second cleaning bath and is then accommodated in a drying machine in the drying step described above. The polycrystalline silicon accommodated in the cleaning basket 1 is dried by hot air from the drying machine. The drying machine blows the hot air to the cleaning basket 1 from above the cleaning basket 1.
The polycrystalline silicon used as, for example, a raw material for semiconductors or a raw material for solar cells needs to be highly pure. Specifically, in a case where a slight amount of heavy metal is adhered to a surface of polycrystalline silicon or in a case where an appearance defect, such as a stain, on a surface of polycrystalline silicon is found after the cleaning step or the drying step, such polycrystalline silicon is regarded as a defective product. In order to keep the polycrystalline silicon highly pure, the method for producing the highly pure polycrystalline silicon needs to be achieved with multiple elaborate measures against the contamination.
The cleaning basket 1 is used for cleaning and/or drying of polycrystalline silicon in a state in which the polycrystalline silicon is accommodated in the cleaning basket 1. That is, the cleaning basket 1 is used in the above-described cleaning step and/or the above-described drying step. As illustrated in
The bottom plate 2 has an edge 21 on a positive direction side of the X axis and an edge 22 on a negative direction side of the X axis. Connecting the edge 21 and the edge 22 to the side plates 5 allows the side plates 5 to support the bottom plate 2. The oblique plates 3 have respective edges 31 on the positive direction side of the X axis and respective edges 32 on the negative direction side of the X axis. Connecting the edges 31 and the edges 32 to the side plates 5 allows the side plates 5 to support the oblique plates 3. The oblique plates 3 are each provided with a plurality of through holes H3 formed therein.
The side plates 4 have respective edges 41 on the positive direction side of the X axis and respective edges 42 on the negative direction side of the X axis. Connecting the edges 41 and the edges 42 to the side plates 5 allows the side plates 5 to support the side plates 4. The side plates 4 are each provided with a plurality of through holes H4 formed therein. Note that scope of application of an aspect of the present invention is not limited to the cleaning basket 1 having the side plates 4 each provided with the through holes H4, but an aspect of the present invention is applicable to a cleaning basket having side plates 4 provided with no through holes H4 formed therein.
In a case where the side plates 4 are each provided with the plurality of through holes H4, a fluid in the cleaning basket 1 is easily dispersed in the Y-axis direction, as compared with a case where the side plates 4 are not each provided with the plurality of through holes H4. This makes it easier for the fluid in the cleaning basket 1 to drain out of the cleaning basket 1. Thus, it is possible for a cleaning liquid in the cleaning basket 1 to more quickly drain out of the cleaning basket 1. In addition, it is possible to improve efficiency of drying portions of the polycrystalline silicon accommodated in the cleaning basket 1 which portions are located in the vicinities of the side plates 4.
The plurality of through holes H4 each have a diameter of preferably not less than 2 mm and not more than 10 mm and more preferably not less than 4 mm and not more than 6 mm in order to achieve, in a well-balanced manner, drainage of a liquid and air and prevention of falling of the polycrystalline silicon through the through holes.
The plurality of through holes H4 each have an inner peripheral surface that is an inclined surface which inclines downward from an inner side of the cleaning basket 1 to an outer side of the cleaning basket 1. An angle between a negative direction of the Z axis and a direction in which the inner peripheral surface of each of the plurality of through holes H4 extends is preferably not less than 10° and not more than 80° and particularly preferably not less than 30° and not more than 60°. This makes it easy for the fluid passing through the plurality of through holes H4 to flow out of the cleaning basket 1 along the inclined surfaces.
The side plates 5 are each connected to the bottom plate 2, the oblique plates 3, and the side plates 4 and extend in an upward direction, that is, in a positive direction of the Z axis. In addition, as illustrated in
The plurality of through holes H5 each have a diameter of preferably not less than 2 mm and not more than 10 mm and more preferably not less than 4 mm and not more than 6 mm in order to achieve, in a well-balanced manner, the drainage of a liquid and air and the prevention of falling of polycrystalline silicon through the through holes.
The plurality of through holes H5 each have an inner peripheral surface that is an inclined surface which inclines downward from an inner side of the cleaning basket 1 to an outer side of the cleaning basket 1. An angle between the negative direction of the Z axis and a direction in which the inner peripheral surface of each of the plurality of through holes H5 extends is preferably not less than 10° and not more than 80° and particularly preferably not less than 30° and not more than 60°. The side plates 5 each have an edge 51 on a negative direction side of the Z axis. The edge 51 of each of the side plates 5 is located on the negative direction side of the Z axis relative to the connection part between the bottom plate 2 and the side plate 5. This makes it possible for a fluid to drain out of the cleaning basket 1 through the plurality of through holes H2 (described later) of the bottom plate 2.
As illustrated in
This allows the fluid in the cleaning basket 1 to flow toward the center of the bottom plate 2 along the oblique plates 3. This can makes it easy for the fluid to drain through the plurality of through holes H2 provided in the bottom plate 2. Thus, it is possible to reduce an amount of the cleaning liquid remaining in the cleaning basket 1 and to improve the efficiency of drying the polycrystalline silicon accommodated in the cleaning basket 1. In addition, it is possible to reduce a risk of the occurrence of a remainder of the liquid which is likely to occur near corners at which the bottom plate 2 is connected to lower edges of the side plates 5 and to lower edges of the oblique plates 3.
Further, connecting the oblique plates 3 in inclined states to the bottom plate 2 causes a load of the polycrystalline silicon accommodated in the cleaning basket 1 to be applied dispersedly to the bottom plate 2 and the oblique plates 3. This makes it possible to reduce the load applied by the polycrystalline silicon to the bottom plate 2. Thus, it is possible to reduce a risk that the bottom plate 2 may deform due to the load. In addition, in a case where the cleaning basket 1 accommodates the polycrystalline silicon, a pressure loss occurs due to a long distance between an upper end of the polycrystalline silicon and the bottom plate 2. Thus, it is preferable that the fluid easily drain through the plurality of through holes H2 of the bottom plate 2.
The plurality of through holes H3 each have a diameter of preferably not less than 2 mm and not more than 10 mm and more preferably not less than 4 mm and not more than 6 mm in order to achieve, in a well-balanced manner, the drainage of the liquid and air and the prevention of falling of polycrystalline silicon through the through holes. The plurality of through holes H3 each have an inner peripheral surface which is provided in the oblique plate 3 so as to extend in a direction perpendicular to the inner surface 33 of the oblique plate 3. Note that, alternatively, the inner peripheral surface of each of the plurality of through holes H3 may be provided in the oblique plate 3 so as to extend in the negative direction of the Z axis.
The side plates 4 are connected to the respective oblique plates 3 and extend in an upward direction, that is, in the positive direction of the Z axis. Note that the “upward direction” which is a direction in which the side plates 4 extend does not necessarily refer to the positive direction of the Z axis but may also refer to a direction which inclines from the positive direction of the Z axis. This will be described in Embodiment 3 in more detail. In addition, the bottom plate 2, the oblique plates 3, and the side plates 4 form an accommodation space SP1 for accommodating the polycrystalline silicon.
As illustrated in
In a case where the plurality of through holes H2 are round holes, the plurality of through holes H2 each have a diameter of preferably not less than 2 mm and not more than 10 mm and more preferably not less than 4 mm and not more than 6 mm in order to achieve, in a well-balanced manner, the drainage of the liquid and air and the prevention of falling of the polycrystalline silicon through the through holes. On the other hand, in a case where the plurality of through holes H2 are the long holes, the plurality of through holes H2 each have a width of preferably not less than 1 mm and not more than 4 mm, for the same reason. Further, the plurality of through holes H2 each have a length of preferably not less than 10 mm and not more than 200 mm and more preferably not less than 20 mm and not more than 100 mm.
Further, since the oblique plates 3, as well as the bottom plate 2, are each provided with the plurality of through holes H3, it is easier for the fluid in the cleaning basket 1 to drain out of the cleaning basket 1, as compared with a case where only the bottom plate 2, among the bottom plate 2, the oblique plates 3, and the side plates 4 and 5, is provided with a plurality of through holes formed therein. Thus, it is possible for a cleaning liquid in the cleaning basket 1 to more quickly drain out of the cleaning basket 1. In addition, it is possible to improve efficiency of drying portions of the polycrystalline silicon accommodated in the cleaning basket 1 which portions are located in the vicinities of the oblique plates 3.
The bottom-plate aperture ratio is preferably not less than 10% and not more than 50% and more preferably not less than 15% and not more than 35%. This makes it possible to both maintain a sufficient strength of the bottom plate 2 and make it easy for the fluid to drain through the plurality of through holes H2 provided in the bottom plate 2. More specifically, the bottom-plate aperture ratio refers to a ratio of the total of the aperture areas of the plurality of through holes H2 provided in the bottom plate 2, relative to the area of the upper surface 23 of a case where the through holes H2 are not provided in the bottom plate 2.
Further, the bottom-plate aperture ratio is preferably not smaller than an oblique-plate aperture ratio which is a ratio of a total of aperture areas of the plurality of through holes H3 provided in each of the oblique plates 3, relative to an area of the inner surface 33 of each of the oblique plate 3. This can make it easier for the fluid to drain through the plurality of through holes H2 provided in the bottom plate 2 than through the plurality of through holes H3 provided in each of the oblique plates 3. Therefore, it is possible for the fluid in the vicinity of the bottom plate 2 where the fluid is difficult to drain to efficiently drain through the plurality of through holes H2 provided in the bottom plate 2, while the fluid is caused to drain through the plurality of through holes H3 provided in each of the oblique plates 3.
More specifically, the oblique-plate aperture ratio refers to a ratio of the total of the aperture areas of the plurality of through holes H3 provided in each of the oblique plates 3, relative to the area of the inner surface 33 of a case where the through holes H3 are not provided in the oblique plates 3.
Further, the oblique-plate aperture ratio is preferably not smaller than a side-plate aperture ratio which is a ratio of a total of aperture areas of the plurality of through holes H4 provided in each of the side plates 4, relative to an area of an inner surface 43 of each of the side plates 4. This can makes it easier for the fluid to drain through the plurality of through holes H3 provided in each of the oblique plates 3 than through the plurality of through holes H4 provided in each of the side plates 4. Thus, the aperture ratios of the side plate 4, the oblique plate 3, and the bottom plate 2 are larger in this order. Therefore, it is possible for the fluid to efficiently drain through the plurality of through holes provided in the side plates 4, the plurality of through holes provided in the oblique plates 3, and the plurality of through holes provided in the bottom plate 2.
In a case where each of the side plates 4, each of the oblique plates 3, and the bottom plate 2 have the same aperture ratio, hot air blown to the cleaning basket 1 toward the negative direction of the Z axis is expelled through each of the side plates 4, each of the oblique plates 3, and the bottom plate 2 more easily in this order. In contrast, in a case where the aperture ratios of the side plate 4, the oblique plate 3, and the bottom plate 2 are larger in this order, it is possible to achieve uniformity of easy expelling of air through each of the side plates 4, each of the oblique plates 3, and the bottom plate 2. This makes it possible for the fluid to efficiently drain through the plurality of through holes provided in the side plates 4, the plurality of through holes provided in the oblique plates 3, and the plurality of through holes provided in the bottom plate 2.
More specifically, the side-plate aperture ratio refers to a ratio of the total of aperture areas of the plurality of through holes H4 provided in each of the side plates 4, relative to the area of the inner surface 43 of a case where the through holes H4 are not provided in the side plates 4.
Further, the oblique-plate aperture ratio is preferably not less than 60% and not more than 100% of the bottom-plate aperture ratio and more preferably not less than 70% and not more than 85% of the bottom-plate aperture ratio. This can make it easier for the fluid to drain through the plurality of through holes H2 provided in the bottom plate 2 than through the plurality of through holes H3 provided in each of the oblique plates 3, while sufficient strengths of the oblique plates 3 is maintained.
Furthermore, the side-plate aperture ratio is preferably not less than 10% and not more than 60% of the bottom-plate aperture ratio and more preferably not less than 20% and not more than 40% of the bottom-plate aperture ratio. This can make it easier for the fluid to drain through the plurality of through holes H2 provided in the bottom plate 2 than through the plurality of through holes H4 provided in each of the side plates 4, while sufficient strengths of the side plates 4 is maintained.
The lower surface 24 of the bottom plate 2 is provided with recesses 25 so that a space SP2 is formed upwards from the lower surface 24. Each of the recesses 25 has an upper surface 26 provided with the through holes H2 which allow the upper surface 26 of the recess 25 and the upper surface 23 of the bottom plate 2 to communicate with each other. Accordingly, the spaces SP2 are formed by the recesses 25, below the plurality of through holes H2 provided in the bottom plate 2. Thus, since the fluid that has drained through the plurality of through holes H2 passes the spaces SP2, the fluid can easily and efficiently drain out of the cleaning basket 1. Further, it is possible to ensure a sufficient thickness of the bottom plate 2 in a portion in which the lower surface 24 is provided with no recesses 25. This makes it possible to maintain a sufficient strength of the bottom plate 2.
As described above, the plurality of through holes H2 provided in the bottom plate 2 allow the upper surface 23 of the bottom plate 2 and a surface of the bottom plate 2 opposite to the upper surface 23 of the bottom plate 2 to communicate each other, that is, the upper surface 23 of the bottom plate 2 and the upper surfaces 26 of the recesses 25 to communicate with each other. A distance D1 between the upper surface 23 of the bottom plate 2 and the upper surface 26 of each of the recesses 25 is preferably not less than 1 mm and not more than 8 mm and more preferably not less than 2 mm and not more than 6 mm. Note that, in a case where the lower surface 24 of the bottom plate 2 is provided with no recesses 25, the surface of the bottom plate 2 opposite to the upper surface 23 of the bottom plate 2 corresponds to the lower surface 24 of the bottom plate 2. In this case, a distance between the upper surface 23 of the bottom plate 2 and the lower surface 24 of the bottom plate 2 is preferably not less than 1 mm and not more than 8 mm and more preferably not less than 2 mm and not more than 6 mm.
In this way, a sufficient thickness of the bottom plate 2 is ensured in a portion provided with the through holes H2. This makes it possible to maintain a sufficient strength of the bottom plate 2. At the same time, it is possible to make it easy for the fluid to drain out of the cleaning basket 1 through the plurality of through holes H2 provided in the bottom plate 2.
The following will describe Embodiment 2 of the present invention. Note that, for convenience of explanation, members identical in function to those described in Embodiment 1 are given identical reference numerals, and descriptions of such members are not repeated.
As illustrated in the reference numeral 201 of
As illustrated in the reference numeral 202 of
As illustrated in the reference numeral 203 of
The following will describe Embodiment 3 of the present invention. Note that, for convenience of explanation, members identical in function to those described in Embodiment 1 are given identical reference numerals, and descriptions of such members are not repeated.
As illustrated in the reference numeral 301 of
Further, as illustrated in the reference numeral 303 of
A polycrystalline silicon rod produced through the Siemens process was crushed to pieces with use of a hammer. Polycrystalline silicon pieces thus obtained were accommodated in a cleaning basket. The cleaning basket accommodating the polycrystalline silicon pieces was then immersed in a first cleaning bath filled with fluonitric acid, so that the polycrystalline silicon pieces were cleaned. The cleaning basket was taken out of the first cleaning bath and was then immersed in a second cleaning bath filled with ultrapure water, so that the fluonitric acid adhered to the polycrystalline silicon pieces was washed away. The cleaning basket was taken out of the second cleaning bath and was then accommodated in a drying machine. As a result of blowing hot air at a temperature of 120° C. from the drying machine to the polycrystalline silicon pieces accommodated in the cleaning basket for 20 minutes, the polycrystalline silicon pieces were completely dried.
Used was the cleaning basket that had: a bottom plate provided with a plurality of through holes formed therein; oblique plates each having an inner surface which made an angle of 45° with an upper surface of the bottom plate; and side plates which were connected to the oblique plates and which extended in an upward direction. In the cleaning basket used in Example 1, a bottom-plate aperture ratio was 25%, an oblique-plate aperture ratio was 18%, and a side-plate aperture ratio was 8%. In addition, a distance between the upper surface of the bottom plate and a surface of the bottom plate opposite to the upper surface of the bottom plate was 5 mm.
How easily a cleaning liquid remained in the cleaning basket was evaluated depending on whether, when the cleaning basket was taken out, there was an oxide stain that might be generated on surfaces of the polycrystalline silicon pieces after drying the polycrystalline silicon with use of the drying machine.
In Example 1, blowing hot air at a temperature of 120° C. to the polycrystalline silicon pieces for 20 minutes caused the polycrystalline silicon pieces to be dried completely. At this time, temperatures at a plurality of parts of the cleaning basket were measured, and the temperatures at all measurement points of the plurality of parts were higher than 100° C. In light of this, as a drying time, measured was a period of time from a point in time when the hot air had started to be blown to the polycrystalline silicon pieces to a point in time when the temperatures at all the measurement points of the plurality of parts of the cleaning basket had become higher than 100° C. The drying time thus measured was used to evaluate drying efficiency. Table 1 shows evaluation results of Example 1.
In each of Examples 2 and 3, the polycrystalline silicon pieces were cleaned/washed and dried as in Example 1 except that each of the oblique plates included in the cleaning basket made, with the upper surface of the bottom plate, an angle shown in Table 1. Table 1 shows evaluation results of Examples 2 and 3.
In Example 4, the polycrystalline silicon pieces were cleaned/washed and dried as in Example 1 except that no through holes were provided in the side plates included in the cleaning basket. Table 1 shows evaluation results of Example 4.
In Example 5, the polycrystalline silicon pieces were cleaned/washed and dried as in Example 1 except that, in the cleaning basket, a distance between the upper surface of the bottom plate and a surface opposite to the upper surface took a value shown in Table 1. Table 1 shows the evaluation results of Example 5.
In each of Comparative Examples 1 and 2, the polycrystalline silicon pieces were cleaned/washed and dried as in Example 1 except that each of the oblique plates included in the cleaning basket made, with the upper surface of the bottom plate, an angle shown in Table 1. Table 1 shows evaluation results of Comparative Examples 1 and 2. In both Comparative Examples 1 and 2, oxide stains generated were found on the polycrystalline silicon pieces that had been dried for 20 minutes. Further, the drying times of both Comparative Examples 1 and 2 were each needed to be approximately 1.2 times longer than the drying time of Example 1.
Aspects of the present invention can also be expressed as follows:
A cleaning basket in accordance with an aspect of the present invention is a cleaning basket used for at least one of cleaning and drying of polycrystalline silicon in a state in which the polycrystalline silicon is accommodated in the cleaning basket, the cleaning basket including: a bottom plate provided with a plurality of through holes formed therein; oblique plates each of which has an inner surface that makes, with an upper surface of the bottom plate, an angle of not less than 10° and not more than 80°, the oblique plates each being connected to the bottom plate and inclining in an upward and outward direction; and side plates which are connected to the oblique plates and which extend in an upward direction, the bottom plate, the oblique plates, and the side plates forming an accommodation space accommodating the polycrystalline silicon.
According to the above configuration, since a fluid in the cleaning basket flows toward the center of the bottom plate along the oblique plates, it is possible to make it easy for the fluid to drain through the plurality of through holes provided in the bottom plate. Thus, it is possible to reduce an amount of a cleaning liquid remaining in the cleaning basket and to improve the efficiency of drying the polycrystalline silicon accommodated in the cleaning basket. In addition, it is possible to reduce a risk of the occurrence of a remainder of the liquid at the bottom plate.
The oblique plates, as well as the bottom plate, may be each provided with a plurality of through holes formed therein. According to the above configuration, as compared with a configuration where only the bottom plate, among the bottom plate, the oblique plates, and the side plates, is provided with the plurality of through holes, since a fluid in the cleaning basket easily drains out of the cleaning basket, it is possible for a cleaning liquid in the cleaning basket to more quickly drain out of the cleaning basket. In addition, it is possible to improve efficiency of drying portions of the polycrystalline silicon accommodated in the cleaning basket which portions are located in the vicinities of the oblique plates.
A bottom-plate aperture ratio may be not smaller than an oblique-plate aperture ratio, the bottom-plate aperture ratio being a ratio of a total of aperture areas of the plurality of through holes provided in the bottom plate, relative to an area of the upper surface of the bottom plate, the oblique-plate aperture ratio being a ratio of a total of aperture areas of the plurality of through holes provided in each of the oblique plates, relative to an area of an inner surface of each of the oblique plates.
According to the above configuration, it is possible to make it easier for a fluid to drain through the plurality of through holes provided in the bottom plate than through the plurality of through holes provided in each of the oblique plates. Therefore, it is possible for the fluid in the vicinity of the bottom plate where the fluid is difficult to drain to efficiently drain through the plurality of through holes provided in the bottom plate, while the fluid is caused to drain through the plurality of through holes provided in each of the oblique plates.
The side plates, as well as the bottom plate and the oblique plates, may be each provided with a plurality of through holes formed therein. According to the above configuration, as compared with a configuration where the plurality of through holes are not provided in the side plates, since a fluid in the cleaning basket easily drains out of the cleaning basket, it is possible for a cleaning liquid in the cleaning basket to more quickly drain out of the cleaning basket. In addition, it is possible to improve efficiency of drying portions of the polycrystalline silicon accommodated in the cleaning basket which portions are located in the vicinities of the side plates.
The oblique-plate aperture ratio may be not smaller than a side-plate aperture ratio, which is a ratio of a total of aperture areas of the plurality of through holes provided in each of the side plates, relative to an area of an inner surface of each of the side plates. According to the above configuration, it is possible to make it easier for a fluid to drain through the plurality of through holes provided in each of the oblique plates than through the plurality of through holes provided in each of the side plates. Thus, the aperture ratios of the side plate, the oblique plate, and the bottom plate are larger in this order. Therefore, it is possible for the fluid to efficiently drain through the plurality of through holes provided in the side plates, the plurality of through holes provided in the oblique plates, and the plurality of through holes provided in the bottom plate.
The bottom-plate aperture ratio may be not less than 10% and not more than 50%. According to the above configuration, it is possible to both maintain a sufficient strength of the bottom plate and make it easy for a fluid to drain through the plurality of through holes provided in the bottom plate.
The oblique-plate aperture ratio may be not less than 60% and not more than 100% of the bottom-plate aperture ratio. According to the above configuration, it is possible to make it easier for a fluid to drain through the plurality of through holes provided in the bottom plate than through the plurality of through holes provided in each of the oblique plates, while sufficient strengths of the oblique plates are maintained.
The side-plate aperture ratio may be not less than 10% and not more than 60% of the bottom-plate aperture ratio. According to the above configuration, it is possible to make it easier for a fluid to drain through the plurality of through holes provided in the bottom plate than through the plurality of through holes provided in each of the side plates, while sufficient strengths of the side plates are maintained.
The plurality of through holes provided in the bottom plate may cause the upper surface of the bottom plate and a surface of the bottom plate opposite to the upper surface of the bottom plate to communicate with each other, and a distance between the upper surface of the bottom plate and the surface of the bottom plate opposite to the upper surface of the bottom plate may be not less than 1 mm and not more than 8 mm. According to the above configuration, since a sufficient thickness in a portion provided with the through holes is ensured for the bottom plate, a sufficient strength of the bottom plate is maintained. At the same time, it is possible to make it easy for a fluid to drain out of the cleaning basket through the plurality of through holes provided in the bottom plate.
The bottom plate may have a lower surface provided with recesses each forming a space that extends upwards from the lower surface of the bottom plate, and the recesses each may have an upper surface provided with a plurality of through holes formed therein, the plurality of through holes causing the upper surface of the recess and the upper surface of the bottom plate to communicate with each other. According to the above configuration, spaces are formed by the recesses, below the plurality of through holes provided in the bottom plate. Since a fluid that has drained through the plurality of through holes passes the spaces, it is possible for the fluid to efficiently drain out of the cleaning basket.
The present invention is not limited to the embodiments, but can be altered by a skilled person in the art within the scope of the claims. The present invention also encompasses, in its technical scope, any embodiment derived by combining technical means disclosed in differing embodiments.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2021-130346 | Aug 2021 | JP | national |
| Filing Document | Filing Date | Country | Kind |
|---|---|---|---|
| PCT/JP2022/027647 | 7/14/2022 | WO |
