1. Field of the Invention
The invention relates to a cleaning mechanism for an image sensor package, and in particular to a mechanism for efficiently and quickly cleaning an image sensor in package processes, so as to increase the production yield.
2. Description of the Related Art
Referring to
In order to finish the above-mentioned package processes, the chamber 24 of the substrate 10 has to be efficiently cleaned, so as to decrease the particle.
Please refer to
The body element 40 is formed with a chamber 46. The rotating device 42 is arranged within the chamber 46 of the body element 40. The cleaning device 44 is arranged within the chamber 46 of the body element 40 and is located on the upper end of the body element 40. So as to while the substrate 10 formed with frame layer 18 mounted on the rotating device 42, the chamber 24 of the substrate 10 is faced the cleaning mechanism 44, respectively, the cleaner of the cleaning mechanism 44 is to clean the chamber 46 of the substrate 10.
However, the conventional cleaning mechanism for cleaning an image sensor package has following drawbacks.
1. Since a right angle is formed between the substrate 10 and frame layer 18, so particle is easily hide in the right angle, thus, cleaner can not efficiently clean the chamber 24.
An object of the invention is to provide a cleaning mechanism for an image sensor package, wherein the processes for packaging an image sensor may be efficiently cleaned, so as to increase the production yield.
To achieve the above-mentioned object, the invention provides a cleaning mechanism for an image sensor package, the cleaning mechanism is for cleaning the substrate and the frame layer arranged on the substrate of the image sensor to form a chamber between the frame layer and the substrate. The mechanism includes a seal up body is formed with a cleaning room, the substrate formed with frame layer is fixed on the top end of the cleaning room, then, the chamber is faced down direction of the cleaning room. A rotating device is located within the cleaning room of the seal up body. A cleaning device is mounted on the bottom end of the cleaning room of the seal up body, and is cleaned the chamber of the substrate by cleaner.
Please refer to
The seal up body 50 has a lower element 56, a periphery wall 58, and a upped cover 60 to form a chamber 62.
The cleaning device 54 is located within the cleaning room 62 of the seal up body 50, and mounted on the bottom end of the cleaning room 62 of the seal up body 50, the cleaning device 54 may be ejected the cleaner. In the embodiment, the cleaner is water or N2 or CO2.
The vacuum pump 54 is located within the cleaning room 62 of the seal up body 50 to absorb the cleaner and particle.
Please refer to
While the invention has been described by way of an example and in terms of a preferred embodiment, it is to be understood that the invention is not limited to the disclosed embodiment. To the contrary, it is intended to cover various modifications. Therefore, the scope of the appended claims should be accorded the broadest interpretation so as to encompass all such modifications.