Claims
- 1. A dry cleaning process for removing contaminants from the surface of a fabric substrate, the process comprising the step of contacting a fabric substrate with a liquid- and/or vapor-phase cleaning composition comprising at least one mono-, di-, or trialkoxy-substituted perfluoroalkane, perfluorocycloalkane, perfluorocycloalkyl-containing perfluoroalkane, or perfluorocycloalkylene-containing perfluoroalkane compound, said compound optionally containing one or more additional catenary heteroatoms.
- 2. The process of claim 1 wherein said compound has a boiling point in the range of from about 25° C. to about 200° C.
- 3. The process of claim 1 wherein said compound is represented by the general formula
- 4. The process of claim 3 wherein x is 1; Rh is an alkyl group having from 1 to about 6 carbon atoms; and Rf but not Rh can contain one or more catenary heteroatoms.
- 5. The process of claim 4 wherein Rf is selected from the group consisting of linear or branched perfluoroalkyl groups having from 3 to about 6 carbon atoms, perfluorocycloalkyl-containing perfluoroalkyl groups having from 5 to about 8 carbon atoms, and perfluorocycloalkyl groups having from 5 to about 6 carbon atoms; and Rh is an alkyl group having from 1 to about 3 carbon atoms.
- 6. The process of claim 1, wherein the cleaning composition further comprises surfactant.
- 7. The process of claim 6, wherein the surfactant comprises a nonionic surfactant chosen from the group consisting of an ethoxylated alcohol, an ethoxylated alkylphenol, an ethoxylated fatty acid, an alkylaryl sulfonate, a glycerol ester, an ethoxylated fluoroalcohol, a fluorinated sulfonamide, and mixtures thereof.
- 8. The process of claim 6, wherein the cleaning composition comprises from about 0.1 to about 5 percent by weight surfactant.
- 9. A dry cleaning process for removing contaminants from the surface of a fabric substrate, the process comprising the step of contacting a fabric substrate with a liquid- and/or vapor-phase cleaning composition comprising at least one compound selected from the group consisting of c-C6F11CF2OC2H5, c-C6F11CF2OCH3, 4-CF3-c-C6F10CF2OCH3,
- 10. The process of claim 9, wherein the cleaning composition further comprises surfactant.
- 11. The process of claim 10, wherein the surfactant comprises a nonionic surfactant chosen from the group consisting of an ethoxylated alcohol, an ethoxylated alkylphenol, an ethoxylated fatty acid, an alkylaryl sulfonate, a glycerol ester, an ethoxylated fluoroalcohol, a fluorinated sulfonamide, and mixtures thereof.
- 12. The process of claim 10, wherein the cleaning composition comprises from about 0.1 to about 5 percent by weight surfactant.
- 13. A cleaning composition comprising (a) a major amount of at least one mono-, di-, or trialkoxy-substituted perfluoroalkane, perfluorocycloalkane, perfluorocycloalkyl-containing perfluoroalkane, or perfluorocycloalkylene-containing perfluoroalkane compound, said compound optionally containing one or more additional catenary heteroatoms; and (b) surfactant.
- 14. The composition of claim 13, wherein said compound has a boiling point in the range of from about 25° C. to about 200° C.
- 15. The composition of claim 13, wherein said compound is represented by the general formula
- 16. The composition of claim 13, wherein the surfactant comprises a nonionic surfactant.
- 17. The composition of claim 16, wherein the nonionic surfactant is selected from the group consisting of an ethoxylated alcohol, an ethoxylated alkylphenol, an ethoxylated fatty acids, an alkylaryl sulfonate, a glycerol ester, an ethoxylated fluoroalcohol, a fluorinated sulfonamide, and mixtures thereof.
- 18. The composition of claim 13, wherein the composition comprises from about 0.1 to about 5 percent by weight surfactant.
- 19. A composition comprising (a) a major amount of at least one compound selected from the group consisting of c-C6F11CF2OC2H5, c-C6F11CF2OCH3, 4 -CF3 -c-C6F10CF2OCH3,
- 20. The composition of claim 19, wherein the surfactant comprises a nonionic surfactant.
- 21. The composition of claim 20, wherein the nonionic surfactant is selected from the group consisting of an ethoxylated alcohol, an ethoxylated alkylphenol, an ethoxylated fatty acids, an alkylaryl sulfonate, a glycerol ester, an ethoxylated fluoroalcohol, a fluorinated sulfonamide, and mixtures thereof.
- 22. The composition of claim 19, wherein the composition comprises from about 0.1 to about 5 percent by weight surfactant.
- 23. A process for removing contaminants from a substrate comprising the steps of contacting a substrate with a liquid- and/or vapor-phase cleaning composition comprising (a) at least one mono-, di-, or trialkyloxy-substituted perfluoroalkane, perfluorocycloalkane, perfluorocycloalkyl-containing perfluoroalkane, or perfluorocycloalkylene-containing perfluoroalkane compound, said compound optionally containing one or more additional catenary heteroatoms; and (b) surfactant.
Parent Case Info
[0001] This application is a continuation-in-part of application Ser. No. 08/573,416 filed Dec. 15, 1995.
Continuations (2)
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Number |
Date |
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| Parent |
08649361 |
May 1996 |
US |
| Child |
10025046 |
Dec 2001 |
US |
| Parent |
09282815 |
Mar 1999 |
US |
| Child |
10025046 |
Dec 2001 |
US |
Continuation in Parts (2)
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Number |
Date |
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08573416 |
Dec 1995 |
US |
| Child |
08649361 |
May 1996 |
US |
| Parent |
08375812 |
Jan 1995 |
US |
| Child |
08573416 |
Dec 1995 |
US |