Number | Name | Date | Kind |
---|---|---|---|
3670403 | Lawrence et al. | Jun 1972 | |
4244752 | Henderson et al. | Jan 1981 | |
4306916 | Wollesen et al. | Dec 1981 | |
4398964 | Makwah | Aug 1983 | |
4914048 | Scovell et al. | Apr 1990 | |
5045900 | Tamagawa | Sep 1991 | |
5102816 | Manukonda et al. | Apr 1992 | |
5268324 | Aitken et al. | Dec 1993 | |
5283203 | Gill et al. | Feb 1994 | |
5350941 | Madan | Sep 1994 | |
5455190 | Hsu | Oct 1995 | |
5489540 | Liu et al. | Feb 1996 | |
5498891 | Sato | Mar 1996 | |
5512498 | Okamoto | Apr 1996 |
Number | Date | Country |
---|---|---|
62-149163 | Jul 1987 | JPX |
234201 | Nov 1994 | TWX |
Entry |
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H. Mikoshiba et al., 1986 Symp. VLSI Technol., p. 41, "A novel CMOS process utilizing after gate implantation process" May 1986. |
Nagisetty, R. et al., "A Novel Self-Aligned Punchthrough Implant: A Simulation Study", IEEE Transactions on Electron Devices 43:1312-1314 (1996) (no month). |