Wolf S. “Silicon Processing for the VLSI-ERA: vol. 1-Process Technology”, 1986, Lattice Pr., vol. 1, p. 441.* |
Alexander Kalnitsky, Irfan Saadat, Albert Bergemont and Pascale Francis, “CoSi2 Integrated fuses on poly silicon for low voltage 0.18 μm CMOS applications”, National Semiconductor, Santa Clara, CA 95052, 0-7803-5413-399, 4 pp. (1999). |
Mohsen Alavi, Mark Bohr, Jeff Hicks, Martin Denham, Allen Cassens, Dave Douglas, Min-Chun Tsai, “A PROM Element Based on Salicide Agglomeration of Poly Fuses in a CMOS Logic Process”, IEEE International Electron Devices Meeting (Dec. '97) 4 pp. |
Jerome B. Lasky, James S. Nakos, Orison J. Cain, and Peter J. Geiss, “Comparison of Transformation to Low-Resistivity Phase and Agglomeration of TiSi2 and CoSi2”, IEEE Transactions on Electron Devices, vol. 38, No. 2, Feb. 1991, pp. 262-269. |