Claims
- 1. A method of depositing a coating having an infrared reflecting film comprising the steps of:providing a cathode defined as a first cathode which when sputtered in a non-reactive atmosphere deposits an infrared reflecting film having the possibility of two levels of resistivity, one level of resistivity higher than the other level of resistivity, the resistivity having a higher level provides an emissivity higher than the emissivity provided by the lower level of resistivity; sputtering a metal cathode defined as a second cathode in an atmosphere having sufficient reactive gas to deposit a metal oxide film over a surface of a substrate, the metal oxide film having preferential crystal growth orientation to provide the infrared reflecting film having the lower level of resistivity, and sputtering the first cathode in a non-reactive atmosphere to deposit an infrared reflecting metal film on the metal oxide film wherein the reflecting metal film deposited on the metal oxide film has the lower level of resistivity to provide a low emissivity coated article.
- 2. The method of claim 1 wherein the infrared metal is silver and the silver film has {220} planes and {111} planes determined by the grazing-angle method wherein the peaks of the {220} planes are higher than the {111} planes.
- 3. The method of claim 2 wherein the reactive gas is oxygen.
- 4. The method of claim 3 wherein the atmosphere is 80% oxygen and remaining atmosphere is an inert gas.
- 5. The method of claim 1 wherein the metal oxide film is zinc oxide.
- 6. The method of claim 5 wherein peaks for the {103} zinc oxide planes are higher than other index peaks.
- 7. The method of claim 1 further including the steps of:depositing a metal oxide support film between the substrate and the metal oxide film; depositing primer over the infrared reflecting layer; depositing an antireflecting layer defined as a second antireflecting layer over the primer.
- 8. The method of claim 7 wherein at least one of the metal oxide support films or antireflective layer is zinc stannate.
- 9. The method of claim 7 further including the step of depositing an infrared reflecting metal over the antireflective layer, a primer layer over the second deposited infrared reflective metal layer and an antireflective layer over the second deposited primer layer.
- 10. The method of claim 9 wherein the second antireflective layer includes a zinc stannate layer and a zinc oxide layer.
Parent Case Info
This is a division of application Ser. No. 08/807,352, filed Feb. 27, 1997 now U.S. Pat. No. 5,821,001.
This application claims the benefit of U.S. Provisional Application No. 60/015,718 filed Apr. 25, 1996.
US Referenced Citations (11)
Foreign Referenced Citations (10)
Number |
Date |
Country |
0 183 052 |
Jun 1986 |
EP |
0 226 993 |
Jul 1987 |
EP |
0 275 474 |
Jul 1988 |
EP |
0 335 309 |
Oct 1989 |
EP |
0 336 257 |
Oct 1989 |
EP |
0 339 274 |
Nov 1989 |
EP |
0 183 052 |
Dec 1991 |
EP |
0 275 474 |
Jul 1992 |
EP |
0 719 876 |
Dec 1994 |
EP |
0 747 330 |
Dec 1996 |
EP |
Non-Patent Literature Citations (1)
Entry |
Minami, T. et al., “Properties of transparent zinc-stannate conducting films prepared by radio frequency magnetron sputtering”, Journal of Vacuum Science and Technology A, vol. 13, No. 3 (1995) pp. 1095-1099. |
Provisional Applications (1)
|
Number |
Date |
Country |
|
60/015718 |
Apr 1996 |
US |