Patent Application
20220305526
This application is based upon and claims the benefit of priority from Japanese Patent Application No. 2021-048861 filed on Mar. 23, 2021 the contents of which are incorporated herein by reference.
The present invention relates to a coating method and a coating film curing apparatus.
A coating method for curing coating material on a workpiece by irradiating the coating material applied to the workpiece with electron beam is known. For efficient treatment and uniform curing of the coating material, it is preferable to uniformly and efficiently irradiate the coating material on the workpiece with the electron beam. However, the electron beam tends to spread radially. This is because charge repulsion acts between electrons constituting the electron beam. Therefore, the electron beam is easily irradiated also to a position other than the target position. That is, it is not easy to efficiently irradiate the workpiece with the electron beam. Further, depending on the shape of the workpiece, efficient irradiation of the electron beam becomes more difficult.
JP 4715018 B2 discloses a technique for uniformly irradiating an object with an electron beam using a deflector constituted by an electromagnetic lens. However, the deflector has certain restrictions on the range in which the electron beam can be deflected. In particular, when the workpiece has a three dimensional shape, it is difficult to appropriately set the position and orientation of the deflector with respect to the workpiece. That is, it is not easy to efficiently irradiate a three dimensional workpiece with an electron beam using a deflector.
Efficient irradiation of coat material applied to a workpiece with an electron beam is a problem. An object of the present invention is to solve the above-mentioned problem.
A coating method according to one aspect of the present invention includes a coating step of applying coating material to a workpiece, and a curing step of curing the coating material by irradiating the applied coating material with an electron beam emitted from an electron beam irradiation unit, wherein in the curing step, the potential of the workpiece is higher than the potential of the electron beam irradiation unit.
A coating film curing apparatus according to one aspect of the present invention includes an electron beam irradiation unit that irradiates a coating material applied to a workpiece with an electron beam to cure the coating material, wherein the potential of the workpiece is higher than the potential of the electron beam irradiation unit during the irradiation of the electron beam.
According to the present invention, it is possible to provide a coating method and a coating film curing apparatus capable of efficiently irradiating a coating material applied to a workpiece with electron beams.
The above and other objects, features, and advantages of the present invention will become more apparent from the following description when taken in conjunction with the accompanying drawings, in which a preferred embodiment of the present invention is shown by way of illustrative example.
Hereinafter, a coating method and a coating film curing apparatus according to an embodiment of the present invention will be described.
The coating film curing apparatus 10 is an apparatus that irradiates a workpiece W with an electron beam. The coating film curing apparatus 10 includes a plurality of electron beam irradiation mechanisms 12 and a control unit 14. Here, for the purpose of efficient processing of the workpiece W, the coating film curing apparatus 10 has four electron beam irradiation mechanisms 12. However, the number of the electron beam irradiation mechanisms 12 may be 1 to 3 or 5 or more.
The workpiece W has a conductive member B and a film of coating material (hereinafter referred to as “coating film”) F. By applying a coating material to the conductive member B, the coating film F is formed on the conductive member B. The coating material (coating film F) is a resin material that is cured by being irradiated with an electron beam. The conductive member B is, for example, a metal body of an automobile. The workpiece W is formed by applying the coating material to the conductive member B. Thereafter, the workpiece W is transferred by a conveyor C and processed by the coating film curing apparatus 10.
Each of the plurality of electron beam irradiation mechanisms 12 has a base 16, a driving unit 18, and a head 20. The base 16 is a base of the electron beam irradiation mechanism 12 and is installed, for example, on a floor of a factory. The driving unit 18 is a mechanism for changing the position and the orientation of the head 20 (and an electron beam irradiation unit 22 described later). The driving unit 18 can be constituted by, for example, a plurality of arms and a plurality of operation mechanisms. The plurality of arms are connected by a plurality of joints. Each of the plurality of operation mechanisms may be, for example, a motor to relatively move or rotate the plurality of arms.
The electron beam irradiation unit 22 is attached to the head 20. The head 20 includes a potential application unit 24. The electron beam irradiation unit 22 cures the coating material by irradiating the coating material on the workpiece W with electron beams. The electron beam irradiation unit 22 generates an electron beam, accelerates the generated electron beam, and further irradiates the workpiece W with the accelerated electron beam. When the electron beam is emitted from the electron beam irradiation unit 22, the potential application unit 24 applies a negative potential to the electron beam irradiation unit 22. This makes it easy to set the potential of the workpiece W higher than the potential of the electron beam irradiation unit 22. That is, without applying a positive potential to the workpiece W, for example, in a state in which the workpiece W is grounded, the potential application unit 24 can make the potential of the workpiece W higher than the potential of the electron beam irradiation unit 22. This will be described in detail later.
The control unit 14 is formed by combining hardware (processor) and software (program), for example. The control unit 14 controls the driving unit 18, the electron beam irradiation unit 22, and the potential application unit 24. The control unit 14 controls the driving unit 18 and the electron beam irradiation unit 22 so that the electron beam can be emitted onto the coating film F onto the workpiece W while the position and orientation of the electron beam irradiation unit 22 are changed so as to follow the surface of the workpiece W.
The reason why the potential of the workpiece W is set higher than that of the electron beam irradiation unit 22 by the potential application unit 24 or the like will be described below.
In both
When the electron beam EB is emitted (when the coating material is cured), the potential of the workpiece W is set higher than that of the electron beam irradiation unit 22. Thus, the electron beam EB made up from electrons having negative charge is attracted to the workpiece W. Eventually, the electron beams EB converge. As a result, the electron beams EB are efficiently and intensively emitted onto the workpiece W. That is, the utilization efficiency of the electron beams EB is improved.
In addition, the electron beam EB (electrons) is accelerated by the potential difference between the electron beam irradiation unit 22 and the workpiece W. That is, the electron beam EB (electrons) at the time of reaching the coating material (coating film F) on the workpiece W is in a more accelerated state than the electron beam EB (electrons) at the time of being emitted from the electron beam irradiation unit 22. Because the coating material is irradiated with the electron beams EB of higher energy, the coating material becomes harder.
Further, since the workpiece W is an automobile body or the like, the surface of the workpiece W, which is a design surface, has a three dimensional shape. For this reason, the workpiece W has a portion (shadow portion) that becomes a shadow when viewed from the electron beam irradiation unit 22. The potential of the workpiece W is made higher than that of the electron beam irradiation unit 22, whereby the electron beams EB are attracted to the workpiece W and as a result, the electron beams EB converge. Therefore, part of the electron beams EB bend around the workpiece W and further are emitted onto the shadow portion of the workpiece W described above. As a result, the workpiece W having the three dimensional shape is efficiently and uniformly irradiated with the electron beams EB.
Hereinafter, a coating method according to the present embodiment will be described.
In the step of grounding the workpiece W, the conductive member B (here, a metal body of an automobile) constituting the workpiece W is grounded. Thereafter, in the electrostatic coating process, the negative potential application process, and the electron beam irradiation process, this grounding is maintained. As a result, as will be described later, efficient electrostatic coating and efficient electron beam irradiation become possible.
In the electrostatic coating process, for example, an electrostatic spray gun is used to generate charged particles (fog) of the coating material and spray the generated fog onto the workpiece W. As a result, the coating material is applied to the workpiece W. At this time, the workpiece W is in a grounded state because of the grounding process. Therefore, the charged (particles of) coating material having reached the workpiece W returns to a uncharged state, and the application of the coating material proceeds. If the workpiece W is not grounded, the accumulation of electric charge on the workpiece W increases as the application of the coating material proceeds. The accumulation of electric charge on the workpiece W prevents the charged particles of the coating material from reaching the workpiece W and ultimately prevents the application of the coating material.
In the negative potential application step, the potential application unit 24 applies a negative potential to the electron beam irradiation unit 22. As a result, the potential of the grounded workpiece W becomes higher than that of the electron beam irradiation unit 22. In this manner, by combining the grounding of the workpiece W and the application of the negative potential to the electron beam irradiation unit 22, the potential of the workpiece W can be reliably made higher than the potential of the electron beam irradiation unit 22.
Further, by applying a negative potential to the electron beam irradiation unit 22 in the negative potential application process, it is possible to efficiently shift from the electrostatic coating process to the electron beam irradiation process. That is, the process can be shifted from the electrostatic coating process to the electron beam irradiation process while the workpiece W remains grounded. Here, the potential of the workpiece W can be made higher than the potential of the electron beam irradiation unit 22 by applying a positive potential to the workpiece W instead of applying a negative potential to the electron beam irradiation unit 22. In this case, however, it is necessary to release the grounding of the workpiece W before applying a positive potential to the workpiece W. Therefore, the process becomes complicated.
In the electron beam irradiation step, in a state where the workpiece W is grounded and a negative potential is applied to the electron beam irradiation unit 22, the coating material on the workpiece W is irradiated with the electron beam EB from the electron beam irradiation unit 22. As a result, the coating material is cured by the electron beam EB. At this time, the potential of the workpiece W is higher than that of the electron beam irradiation unit 22. Therefore, the electron beam EB from the electron beam irradiation unit 22 is efficiently emitted onto the workpiece W. As a result, the coating material is cured efficiently.
In a case where the workpiece W has a three dimensional shape, it is preferable that the control unit 14 controls the driving unit 18 and the electron beam irradiation unit 22 to irradiate the coating material with the electron beam EB while changing the position and orientation of the electron beam irradiation unit 22 along the surface of the workpiece W. As a result, it is possible to further improve the uniformity of electron beam irradiation on the workpiece W having a three dimensional shape, as compared with a case where the electron beam irradiation unit 22 is fixed.
Here, by performing the grounding of the workpiece W (step S1), the electrostatic coating (step S2), and the electron beam irradiation (step S4) in this order, efficient processing can be performed. That is, after the workpiece W is grounded, electrostatic coating and electron beam irradiation can be performed without changing the grounded state.
As described above, in the present embodiment, by efficiently irradiating the coating film F on the workpiece W with the electron beam EB, the coating film F can be cured efficiently. In particular, when the workpiece W has a three dimensional shape, the uniformity of electron beam irradiation onto the workpiece W can be improved.
A modification of the present embodiment will be described. Although the electrostatic coating is used in step S2 in this embodiment, a method other than the electrostatic coating may be used. For example, a coating material may be applied to the workpiece W by a common spray gun. In this case, the workpiece W is sprayed with a fog of uncharged coating material. Therefore, the grounding step (step S1) may be performed after coating instead of before coating.
In this embodiment, the workpiece W is grounded and a negative potential is applied to the electron beam irradiation unit 22. Thus, the potential of the workpiece W is set higher than that of the electron beam irradiation unit 22. However, other techniques may be used. An example of other techniques is to apply a positive potential to the workpiece W. In this case, the electron beam irradiation unit 22 may be grounded without applying a negative potential to the electron beam irradiation unit 22.
The invention that can be understood from each of the above embodiments will be described below.
The present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the gist of the present invention.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2021-048861 | Mar 2021 | JP | national |
