Claims
- 1. A process for making a coin blank or like articles comprising:
- a) cleaning a ferrous metal blank so that it will be essentially free of oxide;
- b) electroplating said blank with a strike of nickel;
- c) electroplating the strike of nickel with a coating of copper by first depositing a thin, initial film of copper at a low current density in a bath that is about 1/6 to 1/4 of the full current density and then depositing the remainder of the copper coating at a full current density in the same bath to minimize or avoid bridging of micropores in the ferrous metal blank.
- 2. A process as in claim 1, in which in cleaning the blank an acid pickle is used to remove oxides followed immediately by a buffer wash.
- 3. A process as in claim 1, in which the nickel used for the nickel strike is dull nickel.
- 4. A process as in claim 1, in which the copper is coated using a acid bath.
- 5. A process as in claim 1, in which the low current density at which the copper is coated is about 1.2 to 1.5 amps per square foot.
- 6. A process as in claim 1, in which the low current density at which the copper is coated is about 1.2 to 1.8 amps per square foot, and the full current density is about 6-7 amps per square foot.
- 7. A process as in claim 1, in which the nickel strike is about 0.8 to 1.2% of the final weight of the coin, and the coating of copper is about 4 to 7% of the final weight of the coin.
- 8. A process as in claim 1, in which following the application of the copper coating and prior to application of any outer nickel coating the coin blank is annealed at a temperature in the range 500.degree. C.-600.degree. C. in the presence of a reducing atmosphere.
- 9. A process for making a coin blank or like articles comprising:
- a) cleaning a ferrous metal blank so that it will be essentially free of oxide;
- b) electroplating said blank with a strike of nickel;
- c) electroplating the strike of nickel with a coating of copper by first depositing a thin, initial film of copper at a low current density in a bath that is about 1/6 to 1/4 of the full current density and then depositing the remainder of the copper coating at a full current density in the same bath to minimize or avoid bridging of micropores in the ferrous metal blank.
- d) electroplating the copper with an outer layer of nickel by first depositing a thin, initial film of nickel at a low current density that is about 1/6 to 1/4 of the full current density and then depositing the remainder of the nickel coating at a full current density to minimize or avoid bridging of micropores in the ferrous metal blank.
- 10. A process of making a coin as in claim 9 including the step of pressing the coated blank in a coining operation without the development of cracks or pores which would expose the ferrous metal.
- 11. A process as in claim 9, in which the low current density at which the outer layer of nickel is coated at about 0.5 to 0.7 amps per square foot.
- 12. A process as in claim 9, in which the low current density at which the outer layer of nickel is coated is about 0.5 to 0.7 amps per square foot, and the full current density at which the outer layer of nickel is coated is about 3-4 amps per square foot.
- 13. A process as in claim 9, in which the nickel strike is about 0.8 to 1.2% of the final weight of the coin, and the coating of copper is about 4 to 7% of the final weight of the coin, and the outer layer of nickel is about 1 to 11/2 of the final weight of the coin.
- 14. A process as in claim 9, in which following the outer nickel coating the coin blank is annealed at a temperature in the range 200.degree. C. to 400.degree. C. in the presence of a reducing atmosphere to promote the removal of entrapped hydrogen followed by annealing at a temperature of at least 530.degree. C. to remove stress, improve the grain structure of the copper and promote bonding between the copper and the nickel.
Priority Claims (1)
Number |
Date |
Country |
Kind |
2019568 |
Jun 1990 |
CAX |
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Parent Case Info
This is a continuation of application Ser. No. 07/568,739, filed on Aug. 17, 1990, which was abandoned upon the filing hereof.
US Referenced Citations (9)
Foreign Referenced Citations (7)
Number |
Date |
Country |
360046 |
Aug 1936 |
CAX |
964223 |
Mar 1975 |
CAX |
1105210 |
Jul 1981 |
CAX |
1198073 |
Dec 1985 |
CAX |
0163419 |
May 1988 |
EPX |
523322 |
Nov 1940 |
GBX |
897279 |
May 1962 |
GBX |
Non-Patent Literature Citations (2)
Entry |
A. Kenneth Graham, Electroplating Engineering Handbook, second edition, Reinhold Publishing Corp., New York, 1962, pp. 670-671. |
Frederick A. Lowenheim, Electroplating, McGraw-Hill Book Co., New York, 1978, pp. 194-202. |
Continuations (1)
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Number |
Date |
Country |
Parent |
568739 |
Aug 1990 |
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